JP6230794B2 - 電子部品内蔵基板及びその製造方法 - Google Patents
電子部品内蔵基板及びその製造方法 Download PDFInfo
- Publication number
- JP6230794B2 JP6230794B2 JP2013017749A JP2013017749A JP6230794B2 JP 6230794 B2 JP6230794 B2 JP 6230794B2 JP 2013017749 A JP2013017749 A JP 2013017749A JP 2013017749 A JP2013017749 A JP 2013017749A JP 6230794 B2 JP6230794 B2 JP 6230794B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- resin
- electronic component
- semiconductor chip
- connecting member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000000758 substrate Substances 0.000 title claims description 282
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 229920005989 resin Polymers 0.000 claims description 198
- 239000011347 resin Substances 0.000 claims description 198
- 239000004065 semiconductor Substances 0.000 claims description 100
- 229910000679 solder Inorganic materials 0.000 claims description 90
- 238000000034 method Methods 0.000 claims description 29
- 239000004020 conductor Substances 0.000 claims description 15
- 230000002093 peripheral effect Effects 0.000 claims description 9
- 238000007789 sealing Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000000465 moulding Methods 0.000 claims 1
- 239000000463 material Substances 0.000 description 23
- 239000003822 epoxy resin Substances 0.000 description 15
- 230000004048 modification Effects 0.000 description 15
- 238000012986 modification Methods 0.000 description 15
- 229920000647 polyepoxide Polymers 0.000 description 15
- 239000010949 copper Substances 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 229920001187 thermosetting polymer Polymers 0.000 description 10
- 229910052718 tin Inorganic materials 0.000 description 8
- 239000010931 gold Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000003755 preservative agent Substances 0.000 description 4
- 230000002335 preservative effect Effects 0.000 description 4
- 238000003672 processing method Methods 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000011800 void material Substances 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/52—Mounting semiconductor bodies in containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/145—Organic substrates, e.g. plastic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3135—Double encapsulation or coating and encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49811—Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
- H01L23/49816—Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49827—Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49833—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers the chip support structure consisting of a plurality of insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
- H01L23/5389—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates the chips being integrally enclosed by the interconnect and support structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/03—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
- H01L25/10—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers
- H01L25/105—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in group H01L27/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
- H01L25/50—Multistep manufacturing processes of assemblies consisting of devices, each device being of a type provided for in group H01L27/00 or H01L29/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32135—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/32145—Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48151—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/48221—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/48225—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/48227—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
- H01L2224/48228—Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item the bond pad being disposed in a recess of the surface of the item
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73253—Bump and layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83192—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed only on another item or body to be connected to the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/10—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/1011—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
- H01L2225/1017—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support
- H01L2225/1023—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support the support being an insulating substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/10—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/1011—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
- H01L2225/1017—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support
- H01L2225/1035—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support the device being entirely enclosed by the support, e.g. high-density interconnect [HDI]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/10—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/1011—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
- H01L2225/1041—Special adaptations for top connections of the lowermost container, e.g. redistribution layer, integral interposer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2225/00—Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
- H01L2225/03—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
- H01L2225/10—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
- H01L2225/1005—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
- H01L2225/1011—All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
- H01L2225/1047—Details of electrical connections between containers
- H01L2225/1058—Bump or bump-like electrical connections, e.g. balls, pillars, posts
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1532—Connection portion the connection portion being formed on the die mounting surface of the substrate
- H01L2924/1533—Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
- H01L2924/15331—Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Description
[第1の実施の形態に係る電子部品内蔵基板の構造]
まず、第1の実施の形態に係る電子部品内蔵基板の構造について説明する。図1は、第1の実施の形態に係る電子部品内蔵基板を例示する断面図である。
次に、第1の実施の形態に係る電子部品内蔵基板の製造方法について説明する。図2〜図4は、第1の実施の形態に係る電子部品内蔵基板の製造工程を例示する図である。
第1の実施の形態の変形例1では、第1の実施の形態よりも更に薄型化が可能な電子部品内蔵基板の例を示す。なお、第1の実施の形態の変形例1において、既に説明した実施の形態と同一構成部品についての説明は省略する。
第1の実施の形態の変形例2では、電子部品内蔵基板の厚さを変えずに第1の実施の形態よりも基板接続部材を小径化する例を示す。なお、第1の実施の形態の変形例2において、既に説明した実施の形態と同一構成部品についての説明は省略する。
第1の実施の形態の応用例では、第1の実施の形態に係る電子部品内蔵基板の一方の面に半導体パッケージを搭載する例を示す。なお、第1の実施の形態の応用例において、既に説明した実施の形態と同一構成部品についての説明は省略する。
10、10B、30 基板
11、31、33、320 絶縁層
11x、31x、33x ビアホール
12、14、32、34、36、330、350 配線層
12p、14p、34p、36p、330p、330q、350p パッド
13、15、35、37、340、360 ソルダーレジスト層
13x、15x、15y、35x、37x、340x、340y、360x 開口部
14B、15B 嵩上げ部
20 基板接続部材
21、21A、21B コア
22、22A、22B 導電材料
41 接合部
42 アンダーフィル樹脂
50、410、430 半導体チップ
51 チップ本体
52 突起電極
55 樹脂フィルム
60 モールド樹脂
100、300 半導体パッケージ
160、200 外部接続端子
310 配線基板
370 貫通電極
420、440 ボンディングワイヤ
450 封止樹脂
500 ピックアップ治具
Claims (11)
- 第1の基板と、
前記第1の基板上に実装された電子部品と、
前記第1の基板上に設けられ、前記電子部品の上面を露出し側面を被覆する第1の樹脂と、
前記電子部品及び前記第1の樹脂の上方に設けられ、前記第1の基板上に積層された第2の基板と、
前記第1の基板と前記第2の基板との間に設けられ、前記第1の基板と前記第2の基板とを電気的に接続する基板接続部材と、
前記電子部品の上面及び前記第1の樹脂の上面と前記第2の基板の下面との間に充填された第2の樹脂と、
前記基板接続部材、前記電子部品、前記第1の樹脂、及び前記第2の樹脂を封止して、前記第1の基板と前記第2の基板との間に充填された第3の樹脂と、を有し、
前記第2の樹脂により、前記電子部品の上面及び前記第1の樹脂の上面と前記第2の基板の下面とが接着されており、
前記第2の基板に、開口部を設けたソルダーレジスト層が設けられ、
前記第2の樹脂が、前記電子部品及び前記第1の樹脂と前記第2の基板の前記開口部との間に充填されている電子部品内蔵基板。 - 前記第2の樹脂の外縁部が、前記第1の樹脂の上面から側方にはみ出して設けられている請求項1記載の電子部品内蔵基板。
- 前記第2の樹脂が、前記第1の樹脂の上面を露出して設けられている請求項1記載の電子部品内蔵基板。
- 前記電子部品の上面と前記第1の樹脂の上面が面一である請求項1乃至3の何れか一項記載の電子部品内蔵基板。
- 前記電子部品は半導体チップであり、
前記半導体チップは、回路形成面を前記第1の基板に向けてフリップチップ実装されており、
前記回路形成面と前記第1の基板との間に前記第1の樹脂が充填されている請求項1乃至4の何れか一項記載の電子部品内蔵基板。 - 前記基板接続部材は、コアと、前記コアの外周面を被覆する導電材料と、を備え、
前記コアは、前記第1の基板の第1のパッドと、前記第2の基板の第2のパッドとに接している請求項1乃至5の何れか一項記載の電子部品内蔵基板。 - 前記第2のパッドに、前記第1の基板側に突起する嵩上げ部が設けられている請求項6記載の電子部品内蔵基板。
- 第1の基板上に電子部品を実装すると共に、前記第1の基板上に前記電子部品の上面を露出し側面を被覆する第1の樹脂を形成する工程と、
前記電子部品の上面及び前記第1の樹脂の上面に、半硬化状態の第2の樹脂を貼り付ける工程と、
開口部を設けたソルダーレジスト層が設けられた第2の基板に基板接続部材を搭載する工程と、
前記電子部品及び前記第1の樹脂と前記基板接続部材とを内側に向けて前記第1の基板上に前記第2の基板を積層し、加熱しながら前記第2の基板を前記第1の基板側に押圧して、前記第1の基板と前記第2の基板とを前記基板接続部材を介して電気的に接続すると共に、前記電子部品の上面及び前記第1の樹脂の上面と前記第2の基板の下面の前記開口部との間に前記第2の樹脂を充填する工程と、
前記第1の基板と前記第2の基板との間に、前記基板接続部材、前記電子部品、前記第1の樹脂、及び前記第2の樹脂を封止する第3の樹脂を充填する工程と、を有し、
前記第2の樹脂により、前記電子部品の上面及び前記第1の樹脂の上面と前記第2の基板の下面とが接着される電子部品内蔵基板の製造方法。 - 前記第1の樹脂を形成する工程は、
前記第1の基板に半硬化状態の第1の樹脂を貼り付ける工程と、
前記電子部品を半硬化状態の前記第1の樹脂上から圧入し、前記電子部品を前記第1の基板と電気的に接続すると共に、前記電子部品の上面を露出し前記電子部品の側面を被覆する前記第1の樹脂を成型する工程と、を含む請求項8記載の電子部品内蔵基板の製造方法。 - 前記第1の樹脂を形成する工程では、
前記電子部品の上面と前記第1の樹脂の上面が面一となる請求項8又は9記載の電子部品内蔵基板の製造方法。 - 前記電子部品は半導体チップであり、
前記第1の樹脂を形成する工程では、
前記半導体チップは、回路形成面を前記第1の基板に向けてフリップチップ実装され、
前記回路形成面と前記第1の基板との間に前記第1の樹脂が充填される請求項8乃至10の何れか一項記載の電子部品内蔵基板の製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013017749A JP6230794B2 (ja) | 2013-01-31 | 2013-01-31 | 電子部品内蔵基板及びその製造方法 |
US14/150,952 US8987919B2 (en) | 2013-01-31 | 2014-01-09 | Built-in electronic component substrate and method for manufacturing the substrate |
KR1020140010161A KR102032844B1 (ko) | 2013-01-31 | 2014-01-28 | 전자 부품 내장 기판 및 그 제조 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013017749A JP6230794B2 (ja) | 2013-01-31 | 2013-01-31 | 電子部品内蔵基板及びその製造方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017149394A Division JP6454384B2 (ja) | 2017-08-01 | 2017-08-01 | 電子部品内蔵基板及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014150154A JP2014150154A (ja) | 2014-08-21 |
JP6230794B2 true JP6230794B2 (ja) | 2017-11-15 |
Family
ID=51222051
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013017749A Active JP6230794B2 (ja) | 2013-01-31 | 2013-01-31 | 電子部品内蔵基板及びその製造方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8987919B2 (ja) |
JP (1) | JP6230794B2 (ja) |
KR (1) | KR102032844B1 (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9721872B1 (en) | 2011-02-18 | 2017-08-01 | Amkor Technology, Inc. | Methods and structures for increasing the allowable die size in TMV packages |
KR101366461B1 (ko) | 2012-11-20 | 2014-02-26 | 앰코 테크놀로지 코리아 주식회사 | 반도체 디바이스 및 그 제조 방법 |
US9799592B2 (en) | 2013-11-19 | 2017-10-24 | Amkor Technology, Inc. | Semicondutor device with through-silicon via-less deep wells |
WO2015045089A1 (ja) * | 2013-09-27 | 2015-04-02 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
KR101607981B1 (ko) | 2013-11-04 | 2016-03-31 | 앰코 테크놀로지 코리아 주식회사 | 반도체 패키지용 인터포저 및 이의 제조 방법, 제조된 인터포저를 이용한 반도체 패키지 |
KR102164545B1 (ko) * | 2014-09-11 | 2020-10-12 | 삼성전자 주식회사 | 반도체 패키지, 및 이를 포함하는 패키지 온 패키지 장치 및 모바일 장치 |
JP6623508B2 (ja) * | 2014-09-30 | 2019-12-25 | 日亜化学工業株式会社 | 光源及びその製造方法、実装方法 |
US9754849B2 (en) * | 2014-12-23 | 2017-09-05 | Intel Corporation | Organic-inorganic hybrid structure for integrated circuit packages |
JP6444269B2 (ja) * | 2015-06-19 | 2018-12-26 | 新光電気工業株式会社 | 電子部品装置及びその製造方法 |
EP3226291B1 (en) * | 2016-04-01 | 2024-04-03 | Nichia Corporation | Method of manufacturing a light emitting element mounting base member, and light emitting element mounting base member |
DE102016107792B4 (de) * | 2016-04-27 | 2022-01-27 | Infineon Technologies Ag | Packung und halbfertiges Produkt mit vertikaler Verbindung zwischen Träger und Klammer sowie Verfahren zum Herstellen einer Packung und einer Charge von Packungen |
US9960328B2 (en) | 2016-09-06 | 2018-05-01 | Amkor Technology, Inc. | Semiconductor device and manufacturing method thereof |
US10622340B2 (en) | 2016-11-21 | 2020-04-14 | Samsung Electronics Co., Ltd. | Semiconductor package |
US10522505B2 (en) * | 2017-04-06 | 2019-12-31 | Advanced Semiconductor Engineering, Inc. | Semiconductor device package and method for manufacturing the same |
KR101963292B1 (ko) | 2017-10-31 | 2019-03-28 | 삼성전기주식회사 | 팬-아웃 반도체 패키지 |
JP6917295B2 (ja) * | 2017-12-25 | 2021-08-11 | 新光電気工業株式会社 | 電子部品内蔵基板、シート基板 |
KR102448248B1 (ko) * | 2018-05-24 | 2022-09-27 | 삼성전자주식회사 | Pop형 반도체 패키지 및 그 제조 방법 |
US11676941B2 (en) | 2018-12-07 | 2023-06-13 | Amkor Technology Singapore Holding Pte. Ltd. | Semiconductor package and fabricating method thereof |
TWI770440B (zh) * | 2018-12-07 | 2022-07-11 | 美商艾馬克科技公司 | 半導體封裝和其製造方法 |
US10903169B2 (en) * | 2019-04-30 | 2021-01-26 | Advanced Semiconductor Engineering, Inc. | Conductive structure and wiring structure including the same |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003347722A (ja) | 2002-05-23 | 2003-12-05 | Ibiden Co Ltd | 多層電子部品搭載用基板及びその製造方法 |
JP2006196709A (ja) * | 2005-01-13 | 2006-07-27 | Sharp Corp | 半導体装置およびその製造方法 |
JP5135828B2 (ja) * | 2007-02-28 | 2013-02-06 | ソニー株式会社 | 基板およびその製造方法、半導体パッケージおよびその製造方法、並びに半導体装置およびその製造方法 |
JP2009266979A (ja) * | 2008-04-24 | 2009-11-12 | Shinko Electric Ind Co Ltd | 半導体装置 |
JP2010147153A (ja) * | 2008-12-17 | 2010-07-01 | Shinko Electric Ind Co Ltd | 半導体装置及びその製造方法 |
JP5481724B2 (ja) * | 2009-12-24 | 2014-04-23 | 新光電気工業株式会社 | 半導体素子内蔵基板 |
JP5454681B2 (ja) * | 2010-05-26 | 2014-03-26 | 株式会社村田製作所 | モジュール基板およびその製造方法 |
JP2012009655A (ja) * | 2010-06-25 | 2012-01-12 | Shinko Electric Ind Co Ltd | 半導体パッケージおよび半導体パッケージの製造方法 |
KR101818507B1 (ko) * | 2012-01-11 | 2018-01-15 | 삼성전자 주식회사 | 반도체 패키지 |
-
2013
- 2013-01-31 JP JP2013017749A patent/JP6230794B2/ja active Active
-
2014
- 2014-01-09 US US14/150,952 patent/US8987919B2/en active Active
- 2014-01-28 KR KR1020140010161A patent/KR102032844B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2014150154A (ja) | 2014-08-21 |
US8987919B2 (en) | 2015-03-24 |
KR20140098694A (ko) | 2014-08-08 |
US20140210109A1 (en) | 2014-07-31 |
KR102032844B1 (ko) | 2019-10-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6230794B2 (ja) | 電子部品内蔵基板及びその製造方法 | |
JP5886617B2 (ja) | 配線基板及びその製造方法、半導体パッケージ | |
JP6173781B2 (ja) | 配線基板及び配線基板の製造方法 | |
US6546620B1 (en) | Flip chip integrated circuit and passive chip component package fabrication method | |
US6356453B1 (en) | Electronic package having flip chip integrated circuit and passive chip component | |
JP6566879B2 (ja) | 電子部品内蔵基板 | |
US7936061B2 (en) | Semiconductor device and method of manufacturing the same | |
JP2006302929A (ja) | 電子部品接続用突起電極とそれを用いた電子部品実装体およびそれらの製造方法 | |
JP7111457B2 (ja) | 半導体装置及びその製造方法 | |
JP6454384B2 (ja) | 電子部品内蔵基板及びその製造方法 | |
JP2015159197A (ja) | 配線基板及びその製造方法 | |
JP2018125349A (ja) | 半導体装置及びその製造方法 | |
JP2016149517A (ja) | 配線基板及びその製造方法 | |
JP5734624B2 (ja) | 半導体パッケージの製造方法 | |
JP6671256B2 (ja) | 配線基板及びその製造方法 | |
JP5036397B2 (ja) | チップ内蔵基板の製造方法 | |
JP7163162B2 (ja) | 半導体パッケージ | |
JP2003133366A (ja) | 半導体装置及びその製造方法 | |
US20230276575A1 (en) | Embedded printed circuit board | |
JP2010067623A (ja) | チップ内蔵基板及びその製造方法 | |
US20230199967A1 (en) | Embedded printed circuit board | |
JP2004319830A (ja) | 電子部品、その実装基材、電子部品装置及び電子部品の製造方法 | |
JP5794853B2 (ja) | 半導体装置の製造方法 | |
KR100752648B1 (ko) | 솔더 조인트 신뢰성이 개선된 반도체 패키지 및 그제조방법 | |
JP6623056B2 (ja) | 配線基板、半導体装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20151118 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20160908 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161004 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20161129 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20170509 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20170801 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20170809 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20171010 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20171018 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6230794 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |