JP6219229B2 - ヒータ給電機構 - Google Patents
ヒータ給電機構 Download PDFInfo
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- JP6219229B2 JP6219229B2 JP2014103511A JP2014103511A JP6219229B2 JP 6219229 B2 JP6219229 B2 JP 6219229B2 JP 2014103511 A JP2014103511 A JP 2014103511A JP 2014103511 A JP2014103511 A JP 2014103511A JP 6219229 B2 JP6219229 B2 JP 6219229B2
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- heater
- power supply
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6831—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B1/00—Details of electric heating devices
- H05B1/02—Automatic switching arrangements specially adapted to apparatus ; Control of heating devices
- H05B1/0227—Applications
- H05B1/023—Industrial applications
- H05B1/0233—Industrial applications for semiconductors manufacturing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/02—Details
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/22—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible
- H05B3/28—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material
- H05B3/283—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater non-flexible heating conductor embedded in insulating material the insulating material being an inorganic material, e.g. ceramic
Description
基板を載置するステージを複数のヒータを用いてゾーン化し、ゾーン毎に温度制御可能なヒータ給電機構であって、
前記複数のヒータに接続される複数のヒータ用端子と、
前記複数のヒータ用端子に接続される複数のヒータ配線と、
前記複数のヒータ配線をオフセットするオフセット構造と、を有し、
前記複数のヒータ用端子は、前記ステージを保持する保持プレート上の外周部であって、前記基板、前記ヒータ及び前記ヒータ配線よりも外側に配置される、ヒータ給電機構が提供される。
まず、本発明の一実施形態に係る半導体製造装置1の全体構成について、図1を参照しながら説明する。図1は、本発明の一実施形態に係る半導体製造装置1の縦断面を示す。本実施形態では、半導体製造装置1の一例として容量結合型プラズマエッチング装置を挙げる。
図2は、一実施形態に係るヒータ給電機構100の縦断面の一例を示す。図3(a)は、一実施形態に係る保持プレート13の上面、図3(b)は、一実施形態に係る保持プレート13の下面を示す。図3(c)及び図3(d)は、一実施形態に係るヒータ給電機構100が有する給電アセンブリAs1,As2を示す。
ヒータ給電機構100は、図3(c)及び図3(d)に示すように、2種類の給電アセンブリAs1、As2(以下、総称して「給電アセンブリAs」ともいう。)を有する。図3(c)に示すように、給電アセンブリAs1は、複数個のヒータ用端子71、複数本のヒータ配線72及びオフセット構造73を一単位としたアセンブリである。複数個のヒータ用端子71は、ヒータ用端子71に接続された複数本のヒータ配線72とそれぞれ接続されている。複数本のヒータ配線72は、ケース73aの内部でオフセットされる。ケース73aは、例えば、樹脂で構成されてもよい。
10:チャンバ
12:ステージ(下部電極)
13:保持プレート
28:排気装置
38:シャワーヘッド(上部電極)
40:静電チャック
44:交流電源
42:直流電圧源
47,49:給電線
71:ヒータ用端子
72:ヒータ配線
73:オフセット構造
73a:ケース
73b:ケース
74:コネクタ
76:電極用端子
77:直流電流用の配線
80:集約部
100:ヒータ給電機構
As1、As2:給電アセンブリ
Claims (7)
- 基板を載置するステージを複数のヒータを用いてゾーン化し、ゾーン毎に温度制御可能なヒータ給電機構であって、
前記複数のヒータに接続される複数のヒータ用端子と、
前記複数のヒータ用端子に接続される複数のヒータ配線と、
前記複数のヒータ配線をオフセットするオフセット構造と、を有し、
前記複数のヒータ用端子は、前記ステージを保持する保持プレート上の外周部であって、前記基板、前記ヒータ及び前記ヒータ配線よりも外側に配置される、ヒータ給電機構。 - 前記オフセット構造にてオフセットされた複数のヒータ配線を纏める集約部と、
前記集約部で纏められた前記複数のヒータ配線と接続されるコネクタと、
を有する請求項1に記載のヒータ給電機構。 - 前記オフセット構造は、所定個数のヒータ用端子及び所定本のヒータ配線を一単位としたアセンブリとして組み立てられた状態で前記保持プレートに装着される、
請求項1又は2に記載のヒータ給電機構。 - 前記オフセット構造は、電極用端子とヒータ用端子とを含む所定個数の端子、及び直流電流用の配線とヒータ配線とを含む所定本の配線を一単位としたアセンブリとして組み立てられた状態で前記保持プレートに装着される、
請求項1〜3のいずれか一項に記載のヒータ給電機構。 - 前記ステージは、静電チャックを有し、前記複数のヒータは、前記静電チャックに設けられる、
請求項1〜4のいずれか一項に記載のヒータ給電機構。 - 前記複数のヒータ用端子が配置される前記保持プレート上の外周部は、前記ステージ上の基板が載置されない領域に対応する、
請求項1〜5のいずれか一項に記載のヒータ給電機構。 - 前記保持プレートは、絶縁性部材により構成される、
請求項1〜6のいずれか一項に記載のヒータ給電機構。
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014103511A JP6219229B2 (ja) | 2014-05-19 | 2014-05-19 | ヒータ給電機構 |
KR1020167029093A KR102330245B1 (ko) | 2014-05-19 | 2015-05-08 | 히터 급전 기구 |
US15/300,349 US20170140958A1 (en) | 2014-05-19 | 2015-05-08 | Heater power feeding mechanism |
CN201580020523.5A CN106233435B (zh) | 2014-05-19 | 2015-05-08 | 加热器供电机构 |
PCT/JP2015/063286 WO2015178222A1 (ja) | 2014-05-19 | 2015-05-08 | ヒータ給電機構 |
KR1020217037732A KR102400032B1 (ko) | 2014-05-19 | 2015-05-08 | 히터 급전 기구 |
TW104115486A TWI646614B (zh) | 2014-05-19 | 2015-05-15 | Heater power supply mechanism |
US17/399,055 US11756806B2 (en) | 2014-05-19 | 2021-08-11 | Heater power feeding mechanism |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014103511A JP6219229B2 (ja) | 2014-05-19 | 2014-05-19 | ヒータ給電機構 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015220368A JP2015220368A (ja) | 2015-12-07 |
JP6219229B2 true JP6219229B2 (ja) | 2017-10-25 |
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JP2014103511A Active JP6219229B2 (ja) | 2014-05-19 | 2014-05-19 | ヒータ給電機構 |
Country Status (6)
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US (2) | US20170140958A1 (ja) |
JP (1) | JP6219229B2 (ja) |
KR (2) | KR102330245B1 (ja) |
CN (1) | CN106233435B (ja) |
TW (1) | TWI646614B (ja) |
WO (1) | WO2015178222A1 (ja) |
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CN106233435A (zh) | 2016-12-14 |
KR102400032B1 (ko) | 2022-05-19 |
TW201613013A (en) | 2016-04-01 |
US20170140958A1 (en) | 2017-05-18 |
TWI646614B (zh) | 2019-01-01 |
KR102330245B1 (ko) | 2021-11-23 |
US20210366741A1 (en) | 2021-11-25 |
CN106233435B (zh) | 2019-07-05 |
JP2015220368A (ja) | 2015-12-07 |
KR20170003917A (ko) | 2017-01-10 |
US11756806B2 (en) | 2023-09-12 |
WO2015178222A1 (ja) | 2015-11-26 |
KR20210144930A (ko) | 2021-11-30 |
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