JP6216405B2 - ウェハキャリア、システム、及びウェハ処理方法 - Google Patents
ウェハキャリア、システム、及びウェハ処理方法 Download PDFInfo
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- JP6216405B2 JP6216405B2 JP2016084390A JP2016084390A JP6216405B2 JP 6216405 B2 JP6216405 B2 JP 6216405B2 JP 2016084390 A JP2016084390 A JP 2016084390A JP 2016084390 A JP2016084390 A JP 2016084390A JP 6216405 B2 JP6216405 B2 JP 6216405B2
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/16—Controlling or regulating
- C30B25/165—Controlling or regulating the flow of the reactive gases
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Description
本願は、2010年12月30日に出願された米国仮特許出願第61/428,250の出願日の利益を主張するものであり、この仮特許出願は、その開示内容を引用することにより、本明細書の一部をなすものとする。
[実施形態例]
[実施形態1]
(a)内面を画定する壁構造体を有するチャンバと、
(b)前記チャンバ内に配置され、かつ上流−下流軸を中心に回転可能なスピンドルであって、ウェハキャリアを、該キャリアの上面がキャリア位置において前記上流方向に面するように、前記軸を中心に回転するよう支持するようになっているスピンドルと、
(c)前記チャンバ内に取り付けられたリングであって、前記上流方向に面している上面を有し、該反応器が動作状態にあるとき、前記スピンドル上に支持された前記ウェハキャリアを密に包囲し、かつ該リングの前記上面が前記キャリアの前記上面と実質的に連続するように構成及び配置されているリングと
を具備する反応器。
[実施形態2]
前記キャリア位置の上流で前記チャンバと連通しているガス入口要素と、前記キャリア位置の下流で前記チャンバと連通しているガス排出装置とを更に具備し、前記リングは、前記軸から離れて外側に面している周囲面を有し、前記リングは、該反応器が動作状態にあるとき、前記リングの前記周囲面と前記チャンバの前記内面との間に間隙があるように配置されている、実施形態1に記載の反応器。
[実施形態3]
前記スピンドルは、前記ウェハキャリアと解除可能に係合するようになっており、前記チャンバは、ウェハキャリアの挿入及び除去のための開口部を有している、実施形態1に記載の反応器。
[実施形態4]
前記チャンバ壁構造体は固定壁構造体を含み、前記リングは、前記上流方向及び下流方向において前記固定壁構造体に対して移動可能である、実施形態3に記載の反応器。
[実施形態5]
前記チャンバ壁構造体は、前記内面の一部を画定するシャッタを備え、該シャッタは、前記上流方向及び前記下流方向において前記チャンバの前記固定壁構造体に対して移動可能であり、前記リングの前記周囲面と前記シャッタとの間に間隙が画定されている、請求項4に記載の反応器。
[実施形態6]
前記リングは、前記シャッタに、前記上流方向及び前記下流方向において該シャッタと移動するように取り付けられている、実施形態5に記載の反応器。
[実施形態7]
前記リングは、前記軸を中心に回転しないように固定されている、実施形態1に記載の反応器。
[実施形態8]
前記リングは、前記軸を中心に回転可能である、実施形態1に記載の反応器。
[実施形態9]
前記リングは、前記スピンドルとは無関係に前記軸を中心に回転可能である、実施形態8に記載の反応器。
[実施形態10]
前記チャンバ内にヒータを更に具備し、該ヒータは、前記スピンドルに支持される前記ウェハキャリアを加熱するようになっている、実施形態1に記載の反応器。
[実施形態11]
前記リングは、該リングの前記上面の下方に中空空間を画定している、実施形態1に記載の反応器。
[実施形態12]
前記リングは、複数の同心リングから形成されている、実施形態1に記載の反応器。
[実施形態13]
前記同心リングの各々は、同じか又は異なる材料から構成されている、実施形態12に記
載の反応器。
[実施形態14]
前記リングは、前記チャンバ内に含まれるヒータによって発生する熱に対する断熱体として作用する、実施形態1に記載の反応器。
[実施形態15]
前記複数の同心リングのうちの少なくとも1つは加熱要素を含む、実施形態12に記載の反応器。
[実施形態16]
前記リングの前記上面は、ガスを前記チャンバ内に導入する少なくとも1つのオリフィスを備えている、実施形態1に記載の反応器。
[実施形態17]
前記シャッタは、ガスを前記チャンバ内に導入する少なくとも1つのオリフィスを備えている、実施形態5に記載の反応器。
[実施形態18]
(a)反応チャンバ内にウェハキャリアを、該チャンバ内のリングが前記キャリアを包囲するように、上流方向に面している前記キャリア及び前記リングの上面が実質的に互いに連続するように、かつ前記キャリア上に配置されるウェハの表面が前記上流方向に面するように配置するステップと、
(b)1種又は複数種の処理ガスを、前記上流方向とは反対の下流方向において、前記ウェハキャリア及び前記ウェハの前記上面に向けるステップであって、その間に、前記ウェハキャリア及び前記ウェハを、上流−下流軸を中心に回転させ、それにより、前記処理ガスが、前記キャリアの前記上面及び前記ウェハの前記表面にわたって外側に流れ、かつ前記リングの前記上面にわたって前記キャリアの前記上面から外側に流れるようにする、1種又は複数種の処理ガスを前記ウェハキャリア及び前記ウェハの前記上面に向けるステップと
を含む、ウェハを処理する方法。
[実施形態19]
前記リングから下流の前記チャンバからガスを排気するステップであって、それにより、前記リングの前記上面にわたって外側に流れる前記ガスが、前記リングと前記チャンバの壁との間の間隙内を下流に進むようにする、排気するステップを更に含む、実施形態18に記載の方法。
[実施形態20]
前記向けるステップの後に、前記チャンバから前記ウェハキャリアを取り除くステップと、新たなウェハが配置された別のウェハキャリアを用いて上述したステップを繰り返すステップと、を更に含む、実施形態19に記載の方法。
[実施形態21]
前記向けるステップの後に、かつ前記キャリアを取り除くステップの前に、前記リングを上流又は下流に移動させるステップを更に含む、実施形態20に記載の方法。
[実施形態22]
前記向けるステップの後に前記リングを移動させる前記ステップは、前記リングに機械的に接続されたシャッタを、動作位置から、該シャッタが前記チャンバ壁の開口部を閉塞しない開放位置まで移動させるステップを含み、前記ウェハキャリアを取り除く前記ステップは、前記キャリアが開放位置にある間に、該キャリアを前記チャンバから前記開口部を通して取り除くステップを含む、実施形態21に記載の方法。
[実施形態23]
前記シャッタ及び前記リングは、該シャッタ及び該リングが動作位置にあるとき協働して前記間隙を画定する、実施形態22に記載の方法。
[実施形態24]
前記ウェハキャリアを加熱するステップを更に含み、前記リングは、前記ウェハキャリアから前記チャンバの前記壁への熱伝達を妨げるように作用する、実施形態18に記載の方法。
[実施形態25]
円形上面と、該上面の境界を画す周囲面と、ウェハ処理反応器のスピンドルを前記上面及び前記周囲面が該スピンドルと同心であるように係合するようになっている取付具とを有する本体を備え、該本体は、各々がウェハを保持するようになっている複数のポケットを更に画定し、該ポケットは、ウェハを、該ウェハの一部が前記周囲面の約5mm以内に位置するように保持するようになっている外側ポケットを含む、ウェハキャリア。
[実施形態26]
前記上面は、直径が約465mmであり、前記ポケットは、各々が約6インチの直径のウェハを保持するようになっている少なくとも6個のポケットを含む、実施形態25に記載のウェハキャリア。
Claims (15)
- 円形上面と、該上面の境界を画す周囲面と、ウェハ処理反応器のスピンドルを前記上面及び前記周囲面が該スピンドルと同心であるように係合するようになっている取付具とを有する本体を備え、該本体は、各々がウェハを保持するようになっている複数のポケットを更に画定し、該ポケットは、ウェハを、該ウェハの一部が前記周囲面の約5mm以内に位置するように保持するようになっている外側ポケットを含み、
前記ウェハキャリアの前記本体は、前記周囲面の回りで上方に傾斜するリップを含む、ウェハキャリア。 - 各ポケットの最外部分と前記ウェハキャリアの前記本体の前記周囲面との間の距離は、約5mm未満である、請求項1に記載のウェハキャリア。
- 前記スピンドルは、前記ウェハキャリアに解除可能に係合するようになっている、請求項1に記載のウェハキャリア。
- 請求項1に記載のウェハキャリアと、前記ウェハキャリアの前記本体を包囲するリングであって、該リングは上流方向に面する上面を有し、前記リングは、該リングが前記本体を密に包囲し、かつ、前記リングの前記上面が前記ウェハキャリアの前記本体の前記上面と実質的に連続するように、前記ウェハキャリアの前記本体の周囲に配置される、リングとを含むシステム。
- 前記リングは上流−下流軸を中心に回転しないように固定されている、請求項4に記載のシステム。
- 前記リングは上流−下流軸を中心に回転可能である、請求項4に記載のシステム。
- 前記リングは複数の同心リングで形成される、請求項4に記載のシステム。
- 前記リングの前記上面は上方に傾斜している、請求項4に記載のシステム。
- 前記複数のポケットの各々は、前記ウェハキャリアの前記本体の前記上面に対してくぼみ、前記複数のポケットの各々は、ウェハが前記上面と同一平面上にあるように該ポケットに該ウェハを保持するようになっている上流に面した面を含む、請求項1に記載のウェハキャリア。
- 円形上面と、該上面の境界を画す周囲面と、ウェハ処理反応器のスピンドルを前記上面及び前記周囲面が該スピンドルと同心であるように係合するようになっている取付具とを有する本体を備えるウェハキャリアを提供するステップであって、該本体は、各々がウェハを保持するようになっている複数のポケットを更に画定し、該複数のポケットの各々は、ウェハを、該ウェハの一部が前記周囲面の約5mm以内に位置するように保持するようになっている外側ポケットを含む、ウェハキャリアを提供するステップと、
前記ウェハキャリアに向かって下流方向に反応ガスを放出するステップであって、前記ウェハキャリアと前記ウェハが回転されて、該ガスが前記ウェハ上に実質的に均一な厚さの膜に堆積するように、反応ガスを放出するステップと
を備え、
前記ウェハキャリアの前記本体は、前記周囲面の回りで上方に傾斜するリップを含む、ウェハ処理方法。 - 前記放出するステップの間に前記ウェハ上に堆積される前記膜は、前記ウェハを横切って約2%の精度以内で実質的に均一である、請求項10に記載の方法。
- 前記放出するステップの間に前記ウェハ上に堆積される前記膜は、前記ウェハを横切って約7%の精度以内で実質的に均一である、請求項10に記載の方法。
- 各ポケットの最外部分と前記ウェハキャリアの前記本体の前記周辺面との距離は約5mm未満である、請求項10に記載の方法。
- 前記ウェハキャリアの前記本体をリングが包囲し、前記リングは、上流方向に面する上面を有し、前記リングは前記リングが前記本体を密に包囲し、かつ、前記リングの前記上面が前記ウェハキャリアの前記本体の前記上面と実質的に連続するように前記ウェハキャリアの前記本体の回りに配置され、前記方法はさらに、前記ウェハキャリアと前記複数のウェハが回転されて、該ガスが前記ウェハキャリアと前記リングの上を外側に流れるように、前記ウェハキャリアに向かって下流方向に反応ガスを放出するステップを備える、請求項10に記載の方法。
- 前記ウェハキャリアと前記リングの下流に位置したガス排気装置を介して前記ガスを排気するステップをさらに備える、請求項14に記載の方法。
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JP2016195254A (ja) | 2016-11-17 |
EP2659026A1 (en) | 2013-11-06 |
JP5926742B2 (ja) | 2016-05-25 |
US20180230596A1 (en) | 2018-08-16 |
KR20140000319A (ko) | 2014-01-02 |
TWI482234B (zh) | 2015-04-21 |
WO2012092064A8 (en) | 2013-08-22 |
JP2014504023A (ja) | 2014-02-13 |
CN103502508A (zh) | 2014-01-08 |
KR101855217B1 (ko) | 2018-05-08 |
EP2659026B1 (en) | 2015-06-17 |
US20120171870A1 (en) | 2012-07-05 |
US20160251758A1 (en) | 2016-09-01 |
CN105755450A (zh) | 2016-07-13 |
TW201246429A (en) | 2012-11-16 |
CN103502508B (zh) | 2016-04-27 |
US9938621B2 (en) | 2018-04-10 |
WO2012092064A1 (en) | 2012-07-05 |
US10167554B2 (en) | 2019-01-01 |
CN105755450B (zh) | 2019-03-15 |
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