JP6105574B2 - 被覆材用樹脂組成物 - Google Patents
被覆材用樹脂組成物 Download PDFInfo
- Publication number
- JP6105574B2 JP6105574B2 JP2014519956A JP2014519956A JP6105574B2 JP 6105574 B2 JP6105574 B2 JP 6105574B2 JP 2014519956 A JP2014519956 A JP 2014519956A JP 2014519956 A JP2014519956 A JP 2014519956A JP 6105574 B2 JP6105574 B2 JP 6105574B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin composition
- meth
- atom
- component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011342 resin composition Substances 0.000 title claims description 52
- 239000000463 material Substances 0.000 title claims description 44
- 239000011248 coating agent Substances 0.000 title claims description 29
- 238000000576 coating method Methods 0.000 title claims description 29
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 44
- -1 dinaphthothiophene compound Chemical class 0.000 claims description 36
- 125000003118 aryl group Chemical group 0.000 claims description 21
- 125000004429 atom Chemical group 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 12
- 125000000524 functional group Chemical group 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 9
- 239000003999 initiator Substances 0.000 claims description 8
- 229910052717 sulfur Chemical group 0.000 claims description 8
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims description 7
- 125000001624 naphthyl group Chemical group 0.000 claims description 7
- LVJFCQSYEZPHJO-UHFFFAOYSA-N 12-thiapentacyclo[11.8.0.02,11.03,8.014,19]henicosa-1(13),2(11),3(8),4,6,9,14,16,18,20-decaen-4-ylmethyl prop-2-enoate Chemical compound C(C=C)(=O)OCC1=CC=CC=2C=CC3=C(C4=C(S3)C=3C=CC=CC3C=C4)C12 LVJFCQSYEZPHJO-UHFFFAOYSA-N 0.000 claims description 6
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical group C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 6
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 6
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 125000000962 organic group Chemical group 0.000 claims description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 6
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims description 6
- 125000004434 sulfur atom Chemical group 0.000 claims description 5
- MJDOQXICWBBRJC-UHFFFAOYSA-N 2-(12-thiapentacyclo[11.8.0.02,11.03,8.014,19]henicosa-1(13),2(11),3(8),4,6,9,14,16,18,20-decaen-4-yl)ethyl prop-2-enoate Chemical compound C(C=C)(=O)OCCC1=CC=CC=2C=CC3=C(C4=C(S3)C=3C=CC=CC=3C=C4)C1=2 MJDOQXICWBBRJC-UHFFFAOYSA-N 0.000 claims description 3
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical group [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 125000004450 alkenylene group Chemical group 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 3
- 125000000732 arylene group Chemical group 0.000 claims description 3
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 125000001072 heteroaryl group Chemical group 0.000 claims description 3
- 125000005842 heteroatom Chemical group 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 claims description 3
- 239000011593 sulfur Chemical group 0.000 claims description 3
- 125000003396 thiol group Chemical group [H]S* 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 1
- 229930192474 thiophene Natural products 0.000 claims 1
- 239000010410 layer Substances 0.000 description 18
- 230000003287 optical effect Effects 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 13
- 239000007788 liquid Substances 0.000 description 13
- 239000011521 glass Substances 0.000 description 11
- 239000002244 precipitate Substances 0.000 description 10
- 239000002585 base Substances 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- 238000002834 transmittance Methods 0.000 description 7
- SYXXZXWLYNODHL-UHFFFAOYSA-N dinaphthothiophene Chemical group C1=CC=CC2=C(C3=C(C4=CC=CC=C4C=C3)S3)C3=CC=C21 SYXXZXWLYNODHL-UHFFFAOYSA-N 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 239000002985 plastic film Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 230000003595 spectral effect Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- 241000511976 Hoya Species 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 239000007870 radical polymerization initiator Substances 0.000 description 3
- 229910052724 xenon Inorganic materials 0.000 description 3
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 3
- SQWIEBKHVLRDRG-UHFFFAOYSA-N (2,6-dimethylphenyl)-diphenylphosphorylmethanone Chemical compound CC1=CC=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 SQWIEBKHVLRDRG-UHFFFAOYSA-N 0.000 description 2
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 2
- YTWSMYGVWSAPGB-UHFFFAOYSA-N 10-ethenyl-12-thiapentacyclo[11.8.0.02,11.03,8.014,19]henicosa-1(13),2(11),3,5,7,9,14,16,18,20-decaene Chemical compound C(=C)C1=CC=2C=CC=CC=2C=2C3=C(SC=21)C=1C=CC=CC=1C=C3 YTWSMYGVWSAPGB-UHFFFAOYSA-N 0.000 description 2
- CEXQWAAGPPNOQF-UHFFFAOYSA-N 2-phenoxyethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOC1=CC=CC=C1 CEXQWAAGPPNOQF-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- IEWRMZSVIVEQCP-UHFFFAOYSA-N [methoxy(phenyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound C=1C=CC=CC=1P(=O)(OC)C(=O)C1=C(C)C=C(C)C=C1C IEWRMZSVIVEQCP-UHFFFAOYSA-N 0.000 description 2
- GUCYFKSBFREPBC-UHFFFAOYSA-N [phenyl-(2,4,6-trimethylbenzoyl)phosphoryl]-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C(=O)C1=C(C)C=C(C)C=C1C GUCYFKSBFREPBC-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical group C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- VFHVQBAGLAREND-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethylphenyl)methanone Chemical compound CC1=CC(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 VFHVQBAGLAREND-UHFFFAOYSA-N 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 125000004437 phosphorous atom Chemical group 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 239000013557 residual solvent Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 1
- KWVVOKMSNYUZCL-UHFFFAOYSA-N (2,4-dimethylbenzoyl)-phenylphosphinic acid Chemical compound CC1=CC(C)=CC=C1C(=O)P(O)(=O)C1=CC=CC=C1 KWVVOKMSNYUZCL-UHFFFAOYSA-N 0.000 description 1
- QAWHMCKOUTZPAL-UHFFFAOYSA-N (2,6-dibromophenyl)-diphenylphosphorylmethanone Chemical compound BrC1=CC=CC(Br)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 QAWHMCKOUTZPAL-UHFFFAOYSA-N 0.000 description 1
- JLLAWIKMLAQZCZ-UHFFFAOYSA-N (2,6-dichlorophenyl)-diphenylphosphorylmethanone Chemical compound ClC1=CC=CC(Cl)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 JLLAWIKMLAQZCZ-UHFFFAOYSA-N 0.000 description 1
- PYIMUNFRJFKRDE-UHFFFAOYSA-N (2,6-dimethoxyphenyl)-[methoxy(phenyl)phosphoryl]methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(OC)C1=CC=CC=C1 PYIMUNFRJFKRDE-UHFFFAOYSA-N 0.000 description 1
- ZTESOBUXHNQNGT-UHFFFAOYSA-N (2,6-dimethylphenyl)-diphenylphosphanylmethanone Chemical compound CC1=CC=CC(C)=C1C(=O)P(C=1C=CC=CC=1)C1=CC=CC=C1 ZTESOBUXHNQNGT-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- QWHUYUGHATYPGB-UHFFFAOYSA-N 1-[methoxy(methyl)phosphoryl]-2-methylpropan-1-one Chemical compound COP(C)(=O)C(=O)C(C)C QWHUYUGHATYPGB-UHFFFAOYSA-N 0.000 description 1
- MFULLOGPOIYABI-UHFFFAOYSA-N 1-[methoxy(phenyl)phosphoryl]-2-methylpropan-1-one Chemical compound CC(C)C(=O)P(=O)(OC)C1=CC=CC=C1 MFULLOGPOIYABI-UHFFFAOYSA-N 0.000 description 1
- QTFWVMNQFWUOOH-UHFFFAOYSA-N 1-diphenylphosphoryl-2,2-dimethylheptan-1-one Chemical compound C=1C=CC=CC=1P(=O)(C(=O)C(C)(C)CCCCC)C1=CC=CC=C1 QTFWVMNQFWUOOH-UHFFFAOYSA-N 0.000 description 1
- PIOUPIXFXCOVGD-UHFFFAOYSA-N 1-diphenylphosphoryl-2-ethylhexan-1-one Chemical compound C=1C=CC=CC=1P(=O)(C(=O)C(CC)CCCC)C1=CC=CC=C1 PIOUPIXFXCOVGD-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- HLIQLHSBZXDKLV-UHFFFAOYSA-N 2-(2-hydroxyethoxy)-1-phenoxyethanol Chemical compound OCCOCC(O)OC1=CC=CC=C1 HLIQLHSBZXDKLV-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- XXHDHAPOSIFMIG-UHFFFAOYSA-N 2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]-1-phenoxyethanol Chemical compound OCCOCCOCCOCC(O)OC1=CC=CC=C1 XXHDHAPOSIFMIG-UHFFFAOYSA-N 0.000 description 1
- OBFOSROPNNOGQF-UHFFFAOYSA-N 2-[2-[2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]-1-phenoxyethanol Chemical compound OCCOCCOCCOCCOCCOCC(O)OC1=CC=CC=C1 OBFOSROPNNOGQF-UHFFFAOYSA-N 0.000 description 1
- YCPMSWJCWKUXRH-UHFFFAOYSA-N 2-[4-[9-[4-(2-prop-2-enoyloxyethoxy)phenyl]fluoren-9-yl]phenoxy]ethyl prop-2-enoate Chemical compound C1=CC(OCCOC(=O)C=C)=CC=C1C1(C=2C=CC(OCCOC(=O)C=C)=CC=2)C2=CC=CC=C2C2=CC=CC=C21 YCPMSWJCWKUXRH-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- QPXVRLXJHPTCPW-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-(4-propan-2-ylphenyl)propan-1-one Chemical compound CC(C)C1=CC=C(C(=O)C(C)(C)O)C=C1 QPXVRLXJHPTCPW-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- ZWVHTXAYIKBMEE-UHFFFAOYSA-N 2-hydroxyacetophenone Chemical class OCC(=O)C1=CC=CC=C1 ZWVHTXAYIKBMEE-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- PGJKTKAYCLVULZ-UHFFFAOYSA-N 2-methylbut-2-enoic acid prop-2-enoic acid Chemical compound OC(=O)C=C.CC=C(C)C(O)=O PGJKTKAYCLVULZ-UHFFFAOYSA-N 0.000 description 1
- MWDGNKGKLOBESZ-UHFFFAOYSA-N 2-oxooctanal Chemical compound CCCCCCC(=O)C=O MWDGNKGKLOBESZ-UHFFFAOYSA-N 0.000 description 1
- RZVINYQDSSQUKO-UHFFFAOYSA-N 2-phenoxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC1=CC=CC=C1 RZVINYQDSSQUKO-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- PMGJMVAMSUFURL-UHFFFAOYSA-N 5,20-bis(ethenyl)-12-thiapentacyclo[11.8.0.02,11.03,8.014,19]henicosa-1(13),2(11),3(8),4,6,9,14,16,18,20-decaene Chemical compound C(=C)C=1C=CC=2C=CC3=C(C4=C(S3)C=3C=CC=CC=3C(=C4)C=C)C=2C=1 PMGJMVAMSUFURL-UHFFFAOYSA-N 0.000 description 1
- VEHGWOMBMHXNOH-UHFFFAOYSA-N 6,18-bis(ethenyl)-12-thiapentacyclo[11.8.0.02,11.03,8.014,19]henicosa-1(13),2(11),3(8),4,6,9,14,16,18,20-decaene Chemical compound C(=C)C1=CC=2C=CC3=C(C4=C(S3)C=3C=CC=C(C=3C=C4)C=C)C=2C=C1 VEHGWOMBMHXNOH-UHFFFAOYSA-N 0.000 description 1
- IKHGUXGNUITLKF-UHFFFAOYSA-N Acetaldehyde Chemical compound CC=O IKHGUXGNUITLKF-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical group C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- SRDIKKIBPZKIOO-UHFFFAOYSA-N C(=C)C1=CC2=C(C3=C(S2)C=2C=C(C=CC=2C=C3)C=C)C=2C=CC=CC1=2 Chemical compound C(=C)C1=CC2=C(C3=C(S2)C=2C=C(C=CC=2C=C3)C=C)C=2C=CC=CC1=2 SRDIKKIBPZKIOO-UHFFFAOYSA-N 0.000 description 1
- VVKBLKAHEULGSW-UHFFFAOYSA-N C(=C)OC1=CC=2C=CC3=C(C4=C(S3)C=3C=CC=C(C=3C=C4)OC=C)C=2C=C1 Chemical compound C(=C)OC1=CC=2C=CC3=C(C4=C(S3)C=3C=CC=C(C=3C=C4)OC=C)C=2C=C1 VVKBLKAHEULGSW-UHFFFAOYSA-N 0.000 description 1
- XPOTZJLKYZYZQX-UHFFFAOYSA-N C(C(=C)C)(=O)OCC1=CC=2C=CC=CC=2C=2C3=C(SC=21)C=1C=CC=CC=1C=C3 Chemical compound C(C(=C)C)(=O)OCC1=CC=2C=CC=CC=2C=2C3=C(SC=21)C=1C=CC=CC=1C=C3 XPOTZJLKYZYZQX-UHFFFAOYSA-N 0.000 description 1
- DMTLQBISMSUAEG-UHFFFAOYSA-N C(C(=C)C)(=O)OCCC1=CC=2C=CC=CC2C=2C3=C(SC21)C=2C=CC=CC2C=C3 Chemical compound C(C(=C)C)(=O)OCCC1=CC=2C=CC=CC2C=2C3=C(SC21)C=2C=CC=CC2C=C3 DMTLQBISMSUAEG-UHFFFAOYSA-N 0.000 description 1
- CTXCVEUSCMKHFW-UHFFFAOYSA-N C(C)(C)OP(=O)C1=CC=C(C=C1)C(C1=CC(=CC=C1)C(C)(C)C)=O Chemical compound C(C)(C)OP(=O)C1=CC=C(C=C1)C(C1=CC(=CC=C1)C(C)(C)C)=O CTXCVEUSCMKHFW-UHFFFAOYSA-N 0.000 description 1
- BCEPFWYZGNQUEX-UHFFFAOYSA-N C(C=C)(=O)CC1=CC=CC=2C=CC3=C(C4=C(S3)C=3C=CC=CC3C=C4)C12 Chemical compound C(C=C)(=O)CC1=CC=CC=2C=CC3=C(C4=C(S3)C=3C=CC=CC3C=C4)C12 BCEPFWYZGNQUEX-UHFFFAOYSA-N 0.000 description 1
- WJKDFYUHDFJFQZ-UHFFFAOYSA-N C1=CC(P(=O)OC)=CC=C1C1=CC=CC=C1C Chemical compound C1=CC(P(=O)OC)=CC=C1C1=CC=CC=C1C WJKDFYUHDFJFQZ-UHFFFAOYSA-N 0.000 description 1
- UDNWJAMUYPCLPD-UHFFFAOYSA-N C=CC(=O)CCC1=CC=CC2=C1C3=C(C=C2)SC4=C3C=CC5=CC=CC=C54 Chemical compound C=CC(=O)CCC1=CC=CC2=C1C3=C(C=C2)SC4=C3C=CC5=CC=CC=C54 UDNWJAMUYPCLPD-UHFFFAOYSA-N 0.000 description 1
- POATXWYDVORIMN-UHFFFAOYSA-N COP(=O)C1=CC=CC=C1C1=CC=CC=C1C Chemical compound COP(=O)C1=CC=CC=C1C1=CC=CC=C1C POATXWYDVORIMN-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 239000004606 Fillers/Extenders Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 208000034189 Sclerosis Diseases 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical group C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- LFOXEOLGJPJZAA-UHFFFAOYSA-N [(2,6-dimethoxybenzoyl)-(2,4,4-trimethylpentyl)phosphoryl]-(2,6-dimethoxyphenyl)methanone Chemical compound COC1=CC=CC(OC)=C1C(=O)P(=O)(CC(C)CC(C)(C)C)C(=O)C1=C(OC)C=CC=C1OC LFOXEOLGJPJZAA-UHFFFAOYSA-N 0.000 description 1
- NSRRXKMZJVBCPJ-UHFFFAOYSA-N [(2-butylphenyl)-phenylphosphoryl]-phenylmethanone Chemical group C(CCC)C1=C(C=CC=C1)P(C1=CC=CC=C1)(C(C1=CC=CC=C1)=O)=O NSRRXKMZJVBCPJ-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910001515 alkali metal fluoride Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- LJOLGGXHRVADAA-UHFFFAOYSA-N benzo[e][1]benzothiole Chemical compound C1=CC=C2C(C=CS3)=C3C=CC2=C1 LJOLGGXHRVADAA-UHFFFAOYSA-N 0.000 description 1
- CSNNWDJQKGMZPO-UHFFFAOYSA-N benzoic acid;2-hydroxy-1,2-diphenylethanone Chemical compound OC(=O)C1=CC=CC=C1.C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 CSNNWDJQKGMZPO-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- XVKKIGYVKWTOKG-UHFFFAOYSA-N diphenylphosphoryl(phenyl)methanone Chemical compound C=1C=CC=CC=1P(=O)(C=1C=CC=CC=1)C(=O)C1=CC=CC=C1 XVKKIGYVKWTOKG-UHFFFAOYSA-N 0.000 description 1
- STSOCJAMYLSXKR-UHFFFAOYSA-N diphenylphosphoryl-(2,3,4,6-tetramethylphenyl)methanone Chemical compound CC1=C(C)C(C)=CC(C)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 STSOCJAMYLSXKR-UHFFFAOYSA-N 0.000 description 1
- RTWRNNFUXCOKNO-UHFFFAOYSA-N diphenylphosphoryl-(2,3,6-trimethylphenyl)methanone Chemical compound CC1=CC=C(C)C(C(=O)P(=O)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1C RTWRNNFUXCOKNO-UHFFFAOYSA-N 0.000 description 1
- PODOEQVNFJSWIK-UHFFFAOYSA-N diphenylphosphoryl-(2,4,6-trimethoxyphenyl)methanone Chemical compound COC1=CC(OC)=CC(OC)=C1C(=O)P(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 PODOEQVNFJSWIK-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- LYXOWKPVTCPORE-UHFFFAOYSA-N phenyl-(4-phenylphenyl)methanone Chemical compound C=1C=C(C=2C=CC=CC=2)C=CC=1C(=O)C1=CC=CC=C1 LYXOWKPVTCPORE-UHFFFAOYSA-N 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 238000000870 ultraviolet spectroscopy Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/38—Esters containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/38—Esters containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
- C08F228/06—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a heterocyclic ring containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F28/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
- C08F28/06—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a heterocyclic ring containing sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Polymerisation Methods In General (AREA)
Description
(1)(A)成分として、下記一般式(1)で表されるエチレン性不飽和二重結合を有する重合性官能基を1つ以上有するジナフトチオフェン系化合物、
(B)成分として、1つ以上の芳香環を含有する単官能(メタ)アクリレート、
(C)成分として、光ラジカル重合開始剤、
を含有し、組成物の総量に対して、前記(A)成分の含有割合は15〜60質量部の範囲であり、前記(B)成分の含有割合は40〜85質量部の範囲であることを特徴とする被覆材用樹脂組成物が提供される。
また、重合性官能基を有するジナフトチオフェン系化合物の代わりに、このような官能基を有さないジナフトチオフェン系化合物を用いた場合(比較例5)、容易に溶解しない析出物が発生してしまった。さらに、ジナフトチオフェン系化合物を用いなかった場合(比較例1)、屈折率が低くなってしまった。
以上より、重合性官能基を有するジナフトチオフェン系化合物と、芳香環を含有する単官能(メタ)アクリレートと、光ラジカル重合開始剤との組み合わせによる相乗効果によって、高い屈折率と高い透明性を有し且つ溶剤の使用が不要である被覆材用樹脂組成物が得られることが分かった。
好ましくは、前記(B)成分が、ベンジル(メタ)アクリレート及びフェノキシエチル(メタ)アクリレートから選ばれる1つ以上を含む。
好ましくは、前記重合性官能基は、(メタ)アクリロイル基又はアリルエーテル基である。
好ましくは、前記一般式(1)において、a=b=c=0であり、d=1である。
好ましくは、前記(A)成分は、6−(メタ)アクリロイルメチルジナフトチオフェン、6−(メタ)アクリロイルエチルジナフトチオフェン、2,12−ジアリルエーテルジナフトチオフェン、及び3,11−ジアリルエーテルジナフトチオフェンから選ばれる1つ以上を含む。
好ましくは、前記(C)成分の含有割合は、組成物の総量に対して、0.2〜10質量部である。
本明細書において、被覆材とは、ガラス基板、プラスチックフィルム、プラスチックシート等の基材上を、表面保護、意匠性を付与、および反射防止や光導波といった機能性を付与することを目的に被覆する材料を意味する。
本発明の樹脂組成物は(B)成分として、1つ以上の芳香環を有する単官能(メタ)アクリレートを含有する。芳香環の数は、例えば、1,2,3であり、好ましくは、1つである。
本実施の樹脂組成物は、(C)光ラジカル重合開始剤を含有する。光ラジカル重合開始剤は、エネルギー線を照射することによりラジカルが発生する化合物であれば、特に制限されない。
本実施形態の目的を損なわない範囲で、酸化防止剤、シランカップリング剤、アクリルゴム、ウレタンゴム等の各種エラストマー、光増感剤、光安定剤、溶剤、増量材、充填剤、補強材、可塑剤、増粘剤、染料、顔料、難燃剤及び界面活性剤等の添加剤を含有しても良い。
ジナフトチオフェン化合物は、特開2011−178985(上記特許文献5)に記載の合成方法([実施例][0106]〜[0121])にて製造したものを用いた。
(A−1)6−メタクリロイルオキシメチルジナフトチオフェン(略号:DNTMA)
(A−2)6−ビニルジナフトチオフェン(略号:VDNT)
(A−3)6−メタクリロイルオキシエチルジナフトチオフェン(略号:EDNTMA)
(A−4)2,12−ジアリルオキシジナフトチオフェン(略号:DAODNT)
(A−5)3,11−ジアリルオキシジナフトチオフェン(略号:i−DAODNT)
(A−6)ジナフトチオフェン(略号:DNT)
(B−1)ベンジルメタクリレート(共栄社化学社製「ライトエステルBZ」)
(B−2)ベンジルアクリレート(大阪有機化学工業社製「ビスコート#160」)
(B−3)フェノキシエチルメタクリレート(共栄社化学社製「ライトエステルPO」)
(B−4)フェノキシエチルアクリレート(共栄社化学社製「ライトアクリレートPO−A」)
(B−5)2−(o−フェニルフェノキシ)エチルアクリレート(新中村化学工業社製「NKエステルA−LEN−10」)
(C−1)ベンジルジメチルケタール(BASF社製「イルガキュアー651」)
(C−2)1−ヒドロキシ−シクロヘキシルフェニルケトン(BASF社製「イルガキュアー184」)
(C−3)ビス(2,4,6−トリメチルベンゾイル)−フェニルフォスフィンオキサイド(BASF社製「イルガキュアー819」)
(D−1)ビスフェノールA型エポキシアクリレート(共栄社化学社製「エポキシエステル3002M」)
(D−2)スチレン(和光純薬工業社製「スチレン」)
(D−3)メチルメタクリレート(三菱ガス化学社製「MMA」)
(D−4)9,9−ビス[4−(2−アクリロイルオキシエトキシ)フェニル]フルオレン(大阪ガスケミカル社製「BPFEA」)
表1〜表3に示す種類の原材料を、表1〜表3に示す組成割合(単位は質量部)で混合し、被覆材用樹脂組成物を調製し、後述の評価を実施した。溶媒は用いなかった。各種評価結果を表1〜表3に示す。特記しない限り、23℃、湿度50%の環境下で実施した。
30mlのバイアル瓶に樹脂組成物10mlを入れ密封したサンプルを準備し、サンプルを温度23℃の雰囲気中に24時間静置し、24時間後の液の状態を目視で確認し、以下の基準で評価した。
○:静置前と変化がなかった
△:析出物や分離物がみられるが50℃加温により再溶解した
×:析出物や分離物がみられ50℃加温でも再溶解しなかった
尚、混合後の液の状態を目視で確認し、析出物や分離物がみられた試料については続く評価は実施しなかった。
(1)液屈折率
液屈折率の評価は、多波長アッベ屈折率計(アタゴ社製「DR−M2」)を用いて、温度25℃、波長589nmにおける屈折率を測定した。
(2)硬化物屈折率
樹脂組成物を容積15mm×15mm×1.0mmのシリコーンゴム製の型枠に流し込み、超高圧水銀ランプ搭載装置(HOYA社製「UL−750」)にて、365nmの波長の照射強度30mW/cm2、積算光量30,000mJ/cm2の条件にて硬化した硬化物試験片を作成し、屈折率を評価した。屈折率の評価は、分光プリズムカプラ屈折率測定装置(メトリコン社製「MODEL 2010 PRISM COUPLER」)を用いて、波長633nmにおける屈折率を測定した。
樹脂組成物を耐熱ガラス(商品名「耐熱パイレックス(登録商標)ガラス」、25mm×25mm×2.0mm)上に膜厚30μmで塗布した後に、超高圧水銀ランプ搭載装置(HOYA社製「UL−750」)にて、365nmの波長の照射強度50mW/cm2、積算光量30,000mJ/cm2の条件にて硬化した試験片を作成し、紫外−可視分光光度計(島津製作所社製「UV−2550」)、リファレンスを耐熱ガラスとして、450nmの透過率を測定した。
125μm厚のポリエステルフィルム(東洋紡社製「コスモシャインA4100」)上に、樹脂組成物を超高圧水銀ランプ搭載装置(HOYA社製「UL−750」)にて、365nmの波長の照射強度50mW/cm2、積算光量30,000mJ/cm2、窒素雰囲気下の条件にて硬化して形状が20mm×20mm×80μmの樹脂組成物の硬化膜を形成した試験片を作製した。
このようにして得られた各試験片に対して、温度23℃、相対湿度50%の環境下で、硬化膜に縦2mm×横2mm×25マスになるようにカットラインを入れた後、セロファンテープ(ニチバン社製型式CT−405AP:幅24mm、粘着力23N/10mm)を貼り付けて180°剥離を実施した。180°剥離後に残ったマスの数を数え、以下の基準で評価した。その他、特に明示のない条件はJIS K 5600−5−6に従った。
○:25枚全て残った
△:15枚以上24枚以下残った
×:14枚未満であった
実施例1〜18では、何れも液安定性・屈折率・分光透過率・密着性の点で優れた結果が得られた。但し、実施例1では、ジナフトチオフェン系化合物の配合割合が少ないため、屈折率が若干低かった。実施例6では、ジナフトチオフェン系化合物の配合割合が多いため、液安定性及び密着性が若干悪化した。また、ビニル基を有するジナフトチオフェン系化合物を用いた実施例10では、(メタ)アクリロイル基又はアリルエーテル基を有するジナフトチオフェン系化合物を用いた実施例1〜9、実施例11〜14に比べて、液安定性、分光透過率及び密着性が好ましくなかった。この結果は、(メタ)アクリロイル基又はアリルエーテル基を有するジナフトチオフェン系化合物を用いることの優位性を示している。さらに、実施例3と実施例11〜13を比較すると、実施例3のようにDNTMAを用いた場合、屈折率及び分光透過率が特に高くなることが分かった。さらに、実施例14のように、(B)成分として芳香環を2つ有するアクリレートを用いたところ、液安定性、分光透過率及び密着性が悪化した。
Claims (12)
- (A)成分として、下記一般式(1)で表されるエチレン性不飽和二重結合を有する重合性官能基を1つ以上有するジナフトチオフェン系化合物、
(B)成分として、1つ以上の芳香環を含有する単官能(メタ)アクリレート、
(C)成分として、光ラジカル重合開始剤、
を含有し、組成物の総量に対して、前記(A)成分の含有割合は15〜34質量部の範囲であり、前記(B)成分の含有割合は66〜85質量部の範囲であることを特徴とする被覆材用樹脂組成物。 - 前記(B)成分は、1つの芳香環を含有する単官能(メタ)アクリレートである請求項1に記載の被覆材用樹脂組成物。
- 前記(B)成分は、ベンジル(メタ)アクリレート及びフェノキシエチル(メタ)アクリレートから選ばれる1つ以上を含むことを特徴とする請求項1又は2に記載の被覆材用樹脂組成物。
- 前記重合性官能基は、(メタ)アクリロイル基又はアリルエーテル基であることを特徴とする請求項1〜3の何れか1項に記載の被覆材用樹脂組成物。
- 前記一般式(1)において、a=b=c=0であり、d=1である請求項1〜3のいずれか1項に記載の被覆材用樹脂組成物。
- 前記(A)成分は、6−(メタ)アクリロイルオキシメチルジナフトチオフェン、6−(メタ)アクリロイルオキシエチルジナフトチオフェン、2,12−ジアリルオキシジナフトチオフェン、及び3,11−ジアリルオキシジナフトチオフェンから選ばれる1つ以上を含む請求項1〜5のいずれか1項に記載の被覆材用樹脂組成物。
- 前記(C)成分の含有割合は、組成物の総量に対して、0.2〜10質量部である請求項1〜6のいずれか1項に記載の被覆材用樹脂組成物。
- 請求項1〜7のいずれか1項に記載の被覆材用樹脂組成物からなることを特徴とする被覆材。
- 請求項8に記載の被覆材を形成した基材。
- 請求項1〜7のいずれか1項に記載の被覆材用樹脂組成物からなる層を基板上に形成したのちに、前記の被覆材用樹脂組成物より低い屈折率を有する層を形成してなること特徴とする膜。
- 請求項10に記載の膜を有する基材。
- 請求項11に記載の基材を有する素子。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014519956A JP6105574B2 (ja) | 2012-06-06 | 2013-05-30 | 被覆材用樹脂組成物 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012129380 | 2012-06-06 | ||
JP2012129380 | 2012-06-06 | ||
JP2014519956A JP6105574B2 (ja) | 2012-06-06 | 2013-05-30 | 被覆材用樹脂組成物 |
PCT/JP2013/065007 WO2013183532A1 (ja) | 2012-06-06 | 2013-05-30 | 被覆材用樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2013183532A1 JPWO2013183532A1 (ja) | 2016-01-28 |
JP6105574B2 true JP6105574B2 (ja) | 2017-03-29 |
Family
ID=49711924
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014519956A Active JP6105574B2 (ja) | 2012-06-06 | 2013-05-30 | 被覆材用樹脂組成物 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6105574B2 (ja) |
KR (1) | KR102135467B1 (ja) |
CN (1) | CN104350111B (ja) |
TW (1) | TWI574978B (ja) |
WO (1) | WO2013183532A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015029996A1 (ja) * | 2013-08-30 | 2015-03-05 | 電気化学工業株式会社 | 被覆材用樹脂組成物 |
JP6155449B2 (ja) * | 2013-08-30 | 2017-07-05 | デンカ株式会社 | 光学部品用高屈折率接着剤組成物 |
JP6455477B2 (ja) * | 2016-03-31 | 2019-01-23 | 三菱ケミカル株式会社 | 積層フィルム |
JP6815603B2 (ja) * | 2016-11-22 | 2021-01-20 | スガイ化学工業株式会社 | ジナフトチオフェン誘導体及びその製造方法 |
JPWO2019167947A1 (ja) * | 2018-02-27 | 2021-03-04 | ソニー株式会社 | 化合物、ポリマー及び有機材料 |
CN109741858B (zh) * | 2018-12-04 | 2020-07-14 | 广州中国科学院先进技术研究所 | 绿色印刷的全聚合物柔性透明电极及其制备方法 |
JPWO2023068239A1 (ja) * | 2021-10-19 | 2023-04-27 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3990004B2 (ja) | 1997-06-19 | 2007-10-10 | 株式会社 アーデル | 光学用接着剤組成物 |
JP3956597B2 (ja) | 2000-09-26 | 2007-08-08 | 三菱化学株式会社 | 光硬化性組成物及びその硬化物 |
AU2004230413C1 (en) | 2003-04-17 | 2011-01-27 | Essilor International (Compagnie Generale D'optique) | Photocurable adhesive composition and its use in the optical field |
JP2007197400A (ja) * | 2006-01-30 | 2007-08-09 | Tosoh Corp | ジベンゾチオフェン誘導体、製造方法及びその用途 |
JP2010007004A (ja) * | 2008-06-30 | 2010-01-14 | Sanyo Chem Ind Ltd | 活性エネルギー線硬化型樹脂組成物 |
JP5246062B2 (ja) * | 2009-06-25 | 2013-07-24 | トヨタ自動車株式会社 | 車載制御装置 |
WO2011083652A1 (ja) | 2010-01-07 | 2011-07-14 | 日本合成化学工業株式会社 | 活性エネルギー線硬化性組成物及びその用途 |
JP5240798B2 (ja) | 2010-02-04 | 2013-07-17 | 学校法人神奈川大学 | 屈折率向上剤、並びにそれを含む樹脂組成物、重合若しくは硬化性組成物及び光学材料 |
JP5493088B2 (ja) * | 2010-02-04 | 2014-05-14 | 学校法人神奈川大学 | ジベンゾチオフェン骨格を有する化合物における屈折率付与効果を増大させる方法 |
JP5877507B2 (ja) | 2010-12-24 | 2016-03-08 | 学校法人神奈川大学 | 耐硬化収縮性の硬化性組成物、当該硬化性組成物を硬化させた硬化物、及び方法 |
-
2013
- 2013-05-30 WO PCT/JP2013/065007 patent/WO2013183532A1/ja active Application Filing
- 2013-05-30 KR KR1020147033269A patent/KR102135467B1/ko active IP Right Grant
- 2013-05-30 CN CN201380029992.4A patent/CN104350111B/zh active Active
- 2013-05-30 JP JP2014519956A patent/JP6105574B2/ja active Active
- 2013-06-04 TW TW102119700A patent/TWI574978B/zh active
Also Published As
Publication number | Publication date |
---|---|
CN104350111A (zh) | 2015-02-11 |
KR20150024319A (ko) | 2015-03-06 |
JPWO2013183532A1 (ja) | 2016-01-28 |
CN104350111B (zh) | 2017-10-10 |
TW201404787A (zh) | 2014-02-01 |
WO2013183532A1 (ja) | 2013-12-12 |
KR102135467B1 (ko) | 2020-07-17 |
TWI574978B (zh) | 2017-03-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6105574B2 (ja) | 被覆材用樹脂組成物 | |
JP5878830B2 (ja) | 光学部品用接着剤組成物 | |
CN106414525B (zh) | 光固化性树脂组合物 | |
JP6063228B2 (ja) | 光硬化性樹脂組成物 | |
JP2020090671A (ja) | 被覆材用樹脂組成物 | |
JP6456632B2 (ja) | 感光性樹脂組成物 | |
KR101679137B1 (ko) | 수지 조성물, 그것을 사용한 터치 패널 센서용 투명막 및 터치 패널 | |
JP6155449B2 (ja) | 光学部品用高屈折率接着剤組成物 | |
CN105404094A (zh) | 硬化性组合物、硬化膜及其制造方法、触摸屏及显示装置 | |
JP7002237B2 (ja) | 光硬化性高屈折率樹脂組成物 | |
KR101273993B1 (ko) | 폴리실록산 조성물과 그의 제조 방법 및, 경화막과 그의 형성 방법 | |
WO2020059260A1 (ja) | 感光性樹脂組成物、硬化膜、積層体、転写フィルム、及び、タッチパネルの製造方法 | |
JP7035728B2 (ja) | 液晶パネル封止材樹脂組成物、および該液晶パネル封止材樹脂組成物で端部を封止したフィルム液晶パネル | |
JP5754233B2 (ja) | 硬化性組成物および光学接着剤 | |
JP2011231239A (ja) | 光ラジカル重合性組成物及びその重合方法並びにその重合物 | |
JP5849432B2 (ja) | 硬化性組成物および光学接着剤 | |
KR20210086896A (ko) | 경화성 조성물, 상기 경화성 조성물의 제조 방법, 상기 경화성 조성물의 경화물, 상기 경화물의 제조 방법 및 상기 경화물을 포함한 장치 | |
JP2015063623A (ja) | (メタ)アクリル酸系共重合体、ネガ型感光性樹脂組成物およびその硬化物 | |
JP2021055051A (ja) | 紫外線硬化性樹脂組成物、発光装置、及び発光装置の製造方法 | |
JP2016141731A (ja) | 樹脂組成物及び光学部材 | |
JP2017002294A (ja) | レジスト光硬化性組成物、プリント配線板及び電子部品の製造方法 | |
WO2019224887A1 (ja) | 転写型感光性フィルム、樹脂硬化膜付き電極基板及びタッチパネル | |
JP2023039162A (ja) | 硬化性樹脂組成物および硬化物 | |
WO2023148123A1 (en) | Composition, cured film, device including the same, and manufacturing method for the cured film | |
KR20240141313A (ko) | 조성물, 경화막, 이를 포함하는 디바이스, 및 경화막의 제조 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20160511 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20161011 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20161208 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20170221 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20170302 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6105574 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |