JP6100482B2 - 磁気トンネリング接合装置、メモリ、メモリシステム及び電子装置 - Google Patents
磁気トンネリング接合装置、メモリ、メモリシステム及び電子装置 Download PDFInfo
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- JP6100482B2 JP6100482B2 JP2012171804A JP2012171804A JP6100482B2 JP 6100482 B2 JP6100482 B2 JP 6100482B2 JP 2012171804 A JP2012171804 A JP 2012171804A JP 2012171804 A JP2012171804 A JP 2012171804A JP 6100482 B2 JP6100482 B2 JP 6100482B2
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- film
- magnetic
- perpendicular magnetization
- magnetic tunneling
- junction device
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/10—Magnetoresistive devices
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F13/00—Interconnection of, or transfer of information or other signals between, memories, input/output devices or central processing units
- G06F13/14—Handling requests for interconnection or transfer
- G06F13/16—Handling requests for interconnection or transfer for access to memory bus
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
- G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
- G11C11/165—Auxiliary circuits
- G11C11/1659—Cell access
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
- H10N50/85—Materials of the active region
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- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mram Or Spin Memory Techniques (AREA)
- Hall/Mr Elements (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2011-0079627 | 2011-08-10 | ||
| KR1020110079627A KR101831931B1 (ko) | 2011-08-10 | 2011-08-10 | 외인성 수직 자화 구조를 구비하는 자기 메모리 장치 |
| US13/398,640 US8772846B2 (en) | 2011-08-10 | 2012-02-16 | Magnetic tunneling junction devices, memories, memory systems, and electronic devices |
| US13/398,640 | 2012-02-16 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2013038421A JP2013038421A (ja) | 2013-02-21 |
| JP2013038421A5 JP2013038421A5 (https=) | 2015-08-20 |
| JP6100482B2 true JP6100482B2 (ja) | 2017-03-22 |
Family
ID=47678274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012171804A Active JP6100482B2 (ja) | 2011-08-10 | 2012-08-02 | 磁気トンネリング接合装置、メモリ、メモリシステム及び電子装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US8772846B2 (https=) |
| JP (1) | JP6100482B2 (https=) |
| KR (1) | KR101831931B1 (https=) |
| CN (1) | CN102956813B (https=) |
| DE (1) | DE102012105595B4 (https=) |
| TW (1) | TWI550604B (https=) |
Families Citing this family (30)
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| US9299923B2 (en) * | 2010-08-24 | 2016-03-29 | Samsung Electronics Co., Ltd. | Magnetic devices having perpendicular magnetic tunnel junction |
| KR101831931B1 (ko) * | 2011-08-10 | 2018-02-26 | 삼성전자주식회사 | 외인성 수직 자화 구조를 구비하는 자기 메모리 장치 |
| KR20130034260A (ko) * | 2011-09-28 | 2013-04-05 | 에스케이하이닉스 주식회사 | 반도체 장치의 제조방법 |
| US9007818B2 (en) | 2012-03-22 | 2015-04-14 | Micron Technology, Inc. | Memory cells, semiconductor device structures, systems including such cells, and methods of fabrication |
| US8923038B2 (en) | 2012-06-19 | 2014-12-30 | Micron Technology, Inc. | Memory cells, semiconductor device structures, memory systems, and methods of fabrication |
| US9054030B2 (en) | 2012-06-19 | 2015-06-09 | Micron Technology, Inc. | Memory cells, semiconductor device structures, memory systems, and methods of fabrication |
| US9379315B2 (en) | 2013-03-12 | 2016-06-28 | Micron Technology, Inc. | Memory cells, methods of fabrication, semiconductor device structures, and memory systems |
| JP6122353B2 (ja) * | 2013-06-25 | 2017-04-26 | ルネサスエレクトロニクス株式会社 | 半導体パッケージ |
| US9368714B2 (en) | 2013-07-01 | 2016-06-14 | Micron Technology, Inc. | Memory cells, methods of operation and fabrication, semiconductor device structures, and memory systems |
| US9466787B2 (en) | 2013-07-23 | 2016-10-11 | Micron Technology, Inc. | Memory cells, methods of fabrication, semiconductor device structures, memory systems, and electronic systems |
| JP6225835B2 (ja) * | 2013-08-28 | 2017-11-08 | 株式会社デンソー | 磁気抵抗素子およびそれを用いた磁気センサ |
| US9461242B2 (en) | 2013-09-13 | 2016-10-04 | Micron Technology, Inc. | Magnetic memory cells, methods of fabrication, semiconductor devices, memory systems, and electronic systems |
| US9608197B2 (en) | 2013-09-18 | 2017-03-28 | Micron Technology, Inc. | Memory cells, methods of fabrication, and semiconductor devices |
| JP2015061043A (ja) | 2013-09-20 | 2015-03-30 | 株式会社東芝 | 抵抗変化メモリ |
| US10454024B2 (en) | 2014-02-28 | 2019-10-22 | Micron Technology, Inc. | Memory cells, methods of fabrication, and memory devices |
| US9281466B2 (en) | 2014-04-09 | 2016-03-08 | Micron Technology, Inc. | Memory cells, semiconductor structures, semiconductor devices, and methods of fabrication |
| US9269888B2 (en) | 2014-04-18 | 2016-02-23 | Micron Technology, Inc. | Memory cells, methods of fabrication, and semiconductor devices |
| KR20160019253A (ko) * | 2014-08-11 | 2016-02-19 | 에스케이하이닉스 주식회사 | 전자 장치 |
| US9349945B2 (en) | 2014-10-16 | 2016-05-24 | Micron Technology, Inc. | Memory cells, semiconductor devices, and methods of fabrication |
| KR102268187B1 (ko) | 2014-11-10 | 2021-06-24 | 삼성전자주식회사 | 자기 기억 소자 및 그 제조 방법 |
| US9768377B2 (en) | 2014-12-02 | 2017-09-19 | Micron Technology, Inc. | Magnetic cell structures, and methods of fabrication |
| KR102376480B1 (ko) * | 2014-12-17 | 2022-03-21 | 삼성전자주식회사 | 자기 메모리 장치 및 그의 형성방법 |
| US10439131B2 (en) | 2015-01-15 | 2019-10-08 | Micron Technology, Inc. | Methods of forming semiconductor devices including tunnel barrier materials |
| US9960346B2 (en) * | 2015-05-07 | 2018-05-01 | Micron Technology, Inc. | Magnetic tunnel junctions |
| US10784045B2 (en) * | 2015-09-15 | 2020-09-22 | International Business Machines Corporation | Laminated magnetic materials for on-chip magnetic inductors/transformers |
| US10430618B2 (en) * | 2015-10-09 | 2019-10-01 | George Mason University | Vanishable logic to enhance circuit security |
| JP6713650B2 (ja) | 2016-05-10 | 2020-06-24 | 国立研究開発法人物質・材料研究機構 | 垂直磁化膜と垂直磁化膜構造並びに磁気抵抗素子および垂直磁気記録媒体 |
| US9680089B1 (en) | 2016-05-13 | 2017-06-13 | Micron Technology, Inc. | Magnetic tunnel junctions |
| CN114497268B (zh) * | 2020-10-26 | 2025-10-21 | Tdk株式会社 | 光检测元件及接收装置 |
| DE112022003362T5 (de) * | 2021-07-01 | 2024-05-02 | Sony Semiconductor Solutions Corporation | Magnetisches speicherelement und halbleitervorrichtung |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6980469B2 (en) * | 2003-08-19 | 2005-12-27 | New York University | High speed low power magnetic devices based on current induced spin-momentum transfer |
| US7471491B2 (en) | 2004-03-30 | 2008-12-30 | Kabushiki Kaisha Toshiba | Magnetic sensor having a frequency filter coupled to an output of a magnetoresistance element |
| US7973349B2 (en) * | 2005-09-20 | 2011-07-05 | Grandis Inc. | Magnetic device having multilayered free ferromagnetic layer |
| US7777261B2 (en) * | 2005-09-20 | 2010-08-17 | Grandis Inc. | Magnetic device having stabilized free ferromagnetic layer |
| US20080246104A1 (en) * | 2007-02-12 | 2008-10-09 | Yadav Technology | High Capacity Low Cost Multi-State Magnetic Memory |
| US7732881B2 (en) | 2006-11-01 | 2010-06-08 | Avalanche Technology, Inc. | Current-confined effect of magnetic nano-current-channel (NCC) for magnetic random access memory (MRAM) |
| US8063459B2 (en) * | 2007-02-12 | 2011-11-22 | Avalanche Technologies, Inc. | Non-volatile magnetic memory element with graded layer |
| JP2008010590A (ja) | 2006-06-28 | 2008-01-17 | Toshiba Corp | 磁気抵抗素子及び磁気メモリ |
| JP2008041716A (ja) * | 2006-08-01 | 2008-02-21 | Ulvac Japan Ltd | 磁気抵抗素子、磁気抵抗素子の製造方法及び磁気抵抗素子の製造装置 |
| FR2904724B1 (fr) | 2006-08-03 | 2011-03-04 | Commissariat Energie Atomique | Dispositif magnetique en couches minces a forte polarisation en spin perpendiculaire au plan des couches, jonction tunnel magnetique et vanne de spin mettant en oeuvre un tel dispositif |
| US7869266B2 (en) | 2007-10-31 | 2011-01-11 | Avalanche Technology, Inc. | Low current switching magnetic tunnel junction design for magnetic memory using domain wall motion |
| JP2009081215A (ja) * | 2007-09-25 | 2009-04-16 | Toshiba Corp | 磁気抵抗効果素子およびそれを用いた磁気ランダムアクセスメモリ |
| EP2065886A1 (en) * | 2007-11-27 | 2009-06-03 | Hitachi Ltd. | Magnetoresistive device |
| KR100905737B1 (ko) | 2007-12-07 | 2009-07-01 | 상지대학교산학협력단 | 수직자기이방성을 갖는 스핀밸브 자기저항소자 |
| DE102008048562A1 (de) | 2008-09-23 | 2010-04-29 | Knorr-Bremse Systeme für Schienenfahrzeuge GmbH | Ventilanordnung zur Brems- sowie Zusatzgeräteansteuerung einer pneumatischen Bremsanlage eines Fahrzeuges |
| US8223533B2 (en) | 2008-09-26 | 2012-07-17 | Kabushiki Kaisha Toshiba | Magnetoresistive effect device and magnetic memory |
| US8102703B2 (en) | 2009-07-14 | 2012-01-24 | Crocus Technology | Magnetic element with a fast spin transfer torque writing procedure |
| US8331141B2 (en) * | 2009-08-05 | 2012-12-11 | Alexander Mikhailovich Shukh | Multibit cell of magnetic random access memory with perpendicular magnetization |
| KR101046939B1 (ko) | 2009-09-02 | 2011-07-19 | (주)거진아이템 | 지하철 공기 정화장치 |
| US8445979B2 (en) | 2009-09-11 | 2013-05-21 | Samsung Electronics Co., Ltd. | Magnetic memory devices including magnetic layers separated by tunnel barriers |
| JP5600344B2 (ja) | 2010-03-10 | 2014-10-01 | 株式会社日立製作所 | 磁気抵抗効果素子及び磁気メモリ |
| KR101766899B1 (ko) * | 2010-04-21 | 2017-08-10 | 삼성전자주식회사 | 자기 메모리 소자 |
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| JP2012043967A (ja) * | 2010-08-19 | 2012-03-01 | Sony Corp | 磁気メモリ素子 |
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| JP5740878B2 (ja) * | 2010-09-14 | 2015-07-01 | ソニー株式会社 | 記憶素子、メモリ装置 |
| KR101463948B1 (ko) * | 2010-11-08 | 2014-11-27 | 삼성전자주식회사 | 자기 기억 소자 |
| JP2012146727A (ja) * | 2011-01-07 | 2012-08-02 | Sony Corp | 記憶素子及び記憶装置 |
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| US8947914B2 (en) * | 2011-03-18 | 2015-02-03 | Samsung Electronics Co., Ltd. | Magnetic tunneling junction devices, memories, electronic systems, and memory systems, and methods of fabricating the same |
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| KR20110074500A (ko) | 2011-06-07 | 2011-06-30 | 손광수 | 나노선 배열 방법 |
| FR2977999B1 (fr) | 2011-07-12 | 2013-08-23 | Thales Sa | Oscillateur spintronique et utilisation de celui-ci dans des dispositifs radiofrequence |
| KR101831931B1 (ko) * | 2011-08-10 | 2018-02-26 | 삼성전자주식회사 | 외인성 수직 자화 구조를 구비하는 자기 메모리 장치 |
| US8885395B2 (en) * | 2012-02-22 | 2014-11-11 | Avalanche Technology, Inc. | Magnetoresistive logic cell and method of use |
-
2011
- 2011-08-10 KR KR1020110079627A patent/KR101831931B1/ko active Active
-
2012
- 2012-02-16 US US13/398,640 patent/US8772846B2/en active Active
- 2012-06-27 DE DE102012105595.5A patent/DE102012105595B4/de active Active
- 2012-07-04 TW TW101124101A patent/TWI550604B/zh active
- 2012-08-02 JP JP2012171804A patent/JP6100482B2/ja active Active
- 2012-08-10 CN CN201210285196.4A patent/CN102956813B/zh active Active
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2014
- 2014-06-17 US US14/306,792 patent/US8987798B2/en active Active
-
2015
- 2015-02-10 US US14/618,534 patent/US9356228B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US8987798B2 (en) | 2015-03-24 |
| US20140297968A1 (en) | 2014-10-02 |
| KR20130017283A (ko) | 2013-02-20 |
| US9356228B2 (en) | 2016-05-31 |
| DE102012105595A1 (de) | 2013-02-14 |
| JP2013038421A (ja) | 2013-02-21 |
| TW201308324A (zh) | 2013-02-16 |
| KR101831931B1 (ko) | 2018-02-26 |
| CN102956813B (zh) | 2017-09-05 |
| US8772846B2 (en) | 2014-07-08 |
| US20150155477A1 (en) | 2015-06-04 |
| DE102012105595B4 (de) | 2021-10-07 |
| CN102956813A (zh) | 2013-03-06 |
| US20130042081A1 (en) | 2013-02-14 |
| TWI550604B (zh) | 2016-09-21 |
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