JP6077023B2 - 静電気除去装置及び静電気除去方法 - Google Patents

静電気除去装置及び静電気除去方法 Download PDF

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JP6077023B2
JP6077023B2 JP2015003219A JP2015003219A JP6077023B2 JP 6077023 B2 JP6077023 B2 JP 6077023B2 JP 2015003219 A JP2015003219 A JP 2015003219A JP 2015003219 A JP2015003219 A JP 2015003219A JP 6077023 B2 JP6077023 B2 JP 6077023B2
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workpiece
fixing table
work
nozzle
back surface
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JP2016129107A (ja
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啓 宇澤
啓 宇澤
孝夫 久保
孝夫 久保
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株式会社伸興
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Priority to JP2015003219A priority Critical patent/JP6077023B2/ja
Priority to TW104133876A priority patent/TWI559493B/zh
Priority to KR1020150154201A priority patent/KR101747795B1/ko
Priority to CN201510774168.2A priority patent/CN105792493B/zh
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  • Elimination Of Static Electricity (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
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JP2015003219A 2015-01-09 2015-01-09 静電気除去装置及び静電気除去方法 Active JP6077023B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2015003219A JP6077023B2 (ja) 2015-01-09 2015-01-09 静電気除去装置及び静電気除去方法
TW104133876A TWI559493B (zh) 2015-01-09 2015-10-15 靜電去除裝置及靜電去除方法
KR1020150154201A KR101747795B1 (ko) 2015-01-09 2015-11-04 정전기 제거 장치 및 정전기 제거 방법
CN201510774168.2A CN105792493B (zh) 2015-01-09 2015-11-13 静电除去装置和静电除去方法

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JP2015003219A JP6077023B2 (ja) 2015-01-09 2015-01-09 静電気除去装置及び静電気除去方法

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JP2016129107A JP2016129107A (ja) 2016-07-14
JP6077023B2 true JP6077023B2 (ja) 2017-02-08

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KR (1) KR101747795B1 (zh)
CN (1) CN105792493B (zh)
TW (1) TWI559493B (zh)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
CN107329289A (zh) * 2017-07-19 2017-11-07 武汉华星光电技术有限公司 去静电剥离装置及液晶面板制作设备
CN108633155A (zh) * 2018-06-19 2018-10-09 深圳市华星光电半导体显示技术有限公司 除静电支撑结构、基板运载设备
CN109068467A (zh) * 2018-09-18 2018-12-21 张家港康得新光电材料有限公司 一种除静电装置及除静电方法
CN109727541A (zh) * 2019-03-15 2019-05-07 广州林恩静电科学技术应用有限公司 平板显示产品静电失效的两步分离解决方法及应用及装置
WO2020191715A1 (en) * 2019-03-28 2020-10-01 Esd Technology Consulting & Licensing Co., Ltd. Device and method for mitigating static charges
CN111139632A (zh) * 2019-12-09 2020-05-12 亳州新诚达时装有限公司 一种服装辅料的检索装置
CN112788824B (zh) * 2020-12-24 2024-04-30 Tcl华星光电技术有限公司 静电去除装置、蒸镀装置及静电去除方法
CN116298566B (zh) * 2023-05-19 2023-08-04 埃用仪器(苏州)有限公司 一种工业用静电测试仪

Family Cites Families (14)

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Publication number Priority date Publication date Assignee Title
JPH07312337A (ja) * 1994-05-18 1995-11-28 Dainippon Screen Mfg Co Ltd 基板加熱処理装置
JPH08320459A (ja) * 1995-05-25 1996-12-03 Advanced Display:Kk 液晶表示装置の製法およびそれに用いる製造装置
JP2000294472A (ja) * 1999-04-05 2000-10-20 Toshiba Corp 除電機能付きステージ及び被加工体の除電方法及びそれを用いた加工装置とシール剤塗布装置
DE60037251T2 (de) * 1999-07-02 2008-10-09 Matsushita Electric Industrial Co., Ltd., Kadoma Anordnung zur Herstellung von Löthöckern auf Halbleitersubstraten unter Generierung elektrischer Ladung, Methode und Anordnung zum Entfernen dieser Ladungen, und elektrische Ladung generierendes Halbleitersubstrat
EP1503614A3 (en) * 2003-07-29 2014-10-01 Toray Industries, Inc. A static eliminator and a static eliminating method for an insulating sheet
JP4421874B2 (ja) * 2003-10-31 2010-02-24 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP4396847B2 (ja) * 2004-12-22 2010-01-13 Ｓｍｃ株式会社 除電装置付きエア浮上装置及び該浮上装置における除電方法
JP4500173B2 (ja) * 2005-02-01 2010-07-14 オリンパス株式会社 静電気除去方法および基板処理装置
JP2006303138A (ja) * 2005-04-20 2006-11-02 Seiko Epson Corp 半導体製造装置及び半導体装置の製造方法
JP4331169B2 (ja) * 2006-02-02 2009-09-16 株式会社アルバック 静電気除去装置
JP4498379B2 (ja) * 2007-04-03 2010-07-07 春日電機株式会社 除帯電電極構造
JP2009064950A (ja) * 2007-09-06 2009-03-26 Omron Corp 基板保持装置および基板リリース方法
CN102097349B (zh) * 2010-11-16 2012-06-27 嘉盛半导体(苏州)有限公司 用于半导体封装工艺的芯片卸载装置
KR101554508B1 (ko) * 2014-07-09 2015-09-22 (주)선재하이테크 제전 기능을 갖춘 거치대 및 이를 이용하는 기판 탑재용 스테이지에 대한 제전 장치

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Publication number Publication date
CN105792493B (zh) 2018-06-08
KR101747795B1 (ko) 2017-06-15
TWI559493B (zh) 2016-11-21
CN105792493A (zh) 2016-07-20
KR20160086257A (ko) 2016-07-19
TW201626536A (zh) 2016-07-16
JP2016129107A (ja) 2016-07-14

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