JP6066592B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP6066592B2
JP6066592B2 JP2012133273A JP2012133273A JP6066592B2 JP 6066592 B2 JP6066592 B2 JP 6066592B2 JP 2012133273 A JP2012133273 A JP 2012133273A JP 2012133273 A JP2012133273 A JP 2012133273A JP 6066592 B2 JP6066592 B2 JP 6066592B2
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Japan
Prior art keywords
exposure
substrate
shot
vibration
control unit
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JP2012133273A
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English (en)
Japanese (ja)
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JP2013258283A5 (OSRAM
JP2013258283A (ja
Inventor
正俊 遠藤
正俊 遠藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
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Canon Inc
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Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2012133273A priority Critical patent/JP6066592B2/ja
Priority to US13/901,647 priority patent/US9946169B2/en
Priority to CN201310222560.7A priority patent/CN103488053B/zh
Priority to CN201510685960.0A priority patent/CN105242498A/zh
Priority to KR1020130066235A priority patent/KR101697231B1/ko
Publication of JP2013258283A publication Critical patent/JP2013258283A/ja
Publication of JP2013258283A5 publication Critical patent/JP2013258283A5/ja
Priority to KR1020170004131A priority patent/KR101839358B1/ko
Application granted granted Critical
Publication of JP6066592B2 publication Critical patent/JP6066592B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
    • G06F1/16—Constructional details or arrangements
    • G06F1/18—Packaging or power distribution
    • G06F1/183—Internal mounting support structures, e.g. for printed circuit boards, internal connecting means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
    • H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
    • H01R13/62—Means for facilitating engagement or disengagement of coupling parts or for holding them in engagement
    • H01R13/629—Additional means for facilitating engagement or disengagement of coupling parts, e.g. aligning or guiding means, levers, gas pressure electrical locking indicators, manufacturing tolerances

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Engineering & Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
JP2012133273A 2012-06-12 2012-06-12 露光装置及びデバイス製造方法 Active JP6066592B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2012133273A JP6066592B2 (ja) 2012-06-12 2012-06-12 露光装置及びデバイス製造方法
US13/901,647 US9946169B2 (en) 2012-06-12 2013-05-24 Exposure apparatus and device manufacturing method
CN201510685960.0A CN105242498A (zh) 2012-06-12 2013-06-06 曝光设备和装置制造方法
CN201310222560.7A CN103488053B (zh) 2012-06-12 2013-06-06 曝光设备和装置制造方法
KR1020130066235A KR101697231B1 (ko) 2012-06-12 2013-06-11 노광 장치 및 디바이스 제조 방법
KR1020170004131A KR101839358B1 (ko) 2012-06-12 2017-01-11 노광 장치 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012133273A JP6066592B2 (ja) 2012-06-12 2012-06-12 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2013258283A JP2013258283A (ja) 2013-12-26
JP2013258283A5 JP2013258283A5 (OSRAM) 2015-07-30
JP6066592B2 true JP6066592B2 (ja) 2017-01-25

Family

ID=49715063

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012133273A Active JP6066592B2 (ja) 2012-06-12 2012-06-12 露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US9946169B2 (OSRAM)
JP (1) JP6066592B2 (OSRAM)
KR (2) KR101697231B1 (OSRAM)
CN (2) CN105242498A (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003075456A1 (en) * 2002-03-04 2003-09-12 Matsushita Electric Industrial Co., Ltd. Mute circuit for preventing pop noise, and speaker drive circuit

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6438219B2 (ja) * 2014-06-17 2018-12-12 キヤノン株式会社 ステージ装置、リソグラフィ装置、物品の製造方法、および決定方法
EP4520218A3 (en) 2016-07-28 2025-05-21 Lashify, Inc. Artificial lash extensions
US9835959B1 (en) * 2016-10-17 2017-12-05 Cymer, Llc Controlling for wafer stage vibration
CN120814720A (zh) 2016-12-20 2025-10-21 拉什菲股份有限公司 人造睫毛延长部和施用器
JP7005183B2 (ja) * 2017-06-19 2022-01-21 キヤノン株式会社 露光方法、露光装置および、物品製造方法
JP1686171S (OSRAM) 2018-10-19 2021-05-24
SG11202103836WA (en) 2018-10-19 2021-05-28 Lashify Inc Applicators for applying eyelash extensions and methods for use and manufacture thereof
USD863679S1 (en) 2018-10-19 2019-10-15 Lashify, Inc. False eyelash applicator
USD995914S1 (en) 2022-07-20 2023-08-15 Lashify, Inc. Combined tweezer and applicator for artificial lash extensions
USD984050S1 (en) 2022-07-20 2023-04-18 Lashify, Inc. Combined curler and applicator for natural lashes and artificial lash extensions
USD980521S1 (en) 2022-07-20 2023-03-07 Lashify, Inc. Artificial lash extension separating comb
USD1072354S1 (en) 2024-01-08 2025-04-22 Lashify, Inc. Rounded tweezer and applicator for artificial lash extensions

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5760878A (en) 1995-08-30 1998-06-02 Canon Kabushiki Kaisha Exposure apparatus and alignment discrimination method
JP3564833B2 (ja) * 1995-11-10 2004-09-15 株式会社ニコン 露光方法
JPH09219361A (ja) * 1996-02-09 1997-08-19 Nikon Corp 露光装置
JPH10199795A (ja) * 1997-01-14 1998-07-31 Nikon Corp 走査露光方法及び装置
JPH1187233A (ja) * 1997-09-08 1999-03-30 Canon Inc 投影露光装置
JP4194160B2 (ja) 1998-02-19 2008-12-10 キヤノン株式会社 投影露光装置
JP4272750B2 (ja) 1998-06-23 2009-06-03 キヤノン株式会社 露光装置及び除振装置、システム同定装置及びその方法
JP2001291662A (ja) * 2000-02-04 2001-10-19 Nikon Corp 露光方法及び露光装置、並びにデバイス製造方法
JP2002110526A (ja) * 2000-10-03 2002-04-12 Canon Inc 走査露光方法及び走査露光装置
KR100629390B1 (ko) 2004-09-21 2006-09-29 삼성전자주식회사 광학계 위치제어수단을 갖는 반도체 제조용 노광장치 및이를 이용한 노광방법
US7417714B2 (en) 2004-11-02 2008-08-26 Nikon Corporation Stage assembly with measurement system initialization, vibration compensation, low transmissibility, and lightweight fine stage
CN102929104B (zh) 2005-06-02 2016-08-03 卡尔蔡司Smt有限责任公司 光学成像装置
US7804579B2 (en) 2007-06-21 2010-09-28 Asml Netherlands B.V. Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003075456A1 (en) * 2002-03-04 2003-09-12 Matsushita Electric Industrial Co., Ltd. Mute circuit for preventing pop noise, and speaker drive circuit

Also Published As

Publication number Publication date
US20130329207A1 (en) 2013-12-12
JP2013258283A (ja) 2013-12-26
KR20170010027A (ko) 2017-01-25
US9946169B2 (en) 2018-04-17
CN103488053B (zh) 2015-11-18
KR20130139177A (ko) 2013-12-20
KR101839358B1 (ko) 2018-03-16
KR101697231B1 (ko) 2017-01-17
CN103488053A (zh) 2014-01-01
CN105242498A (zh) 2016-01-13

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