JP5950175B2 - フッ素系界面活性剤、コーティング組成物、レジスト組成物及び硬化物 - Google Patents

フッ素系界面活性剤、コーティング組成物、レジスト組成物及び硬化物 Download PDF

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JP5950175B2
JP5950175B2 JP2015549879A JP2015549879A JP5950175B2 JP 5950175 B2 JP5950175 B2 JP 5950175B2 JP 2015549879 A JP2015549879 A JP 2015549879A JP 2015549879 A JP2015549879 A JP 2015549879A JP 5950175 B2 JP5950175 B2 JP 5950175B2
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polymerizable monomer
ring
coating composition
fluorosurfactant
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JPWO2015137229A1 (ja
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良平 清水
良平 清水
慎 笹本
慎 笹本
啓 高野
啓 高野
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DIC Corp
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
    • C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F32/00—Homopolymers and copolymers of cyclic compounds having no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/18—Introducing halogen atoms or halogen-containing groups
    • C08F8/24—Haloalkylation
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D201/00—Coating compositions based on unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/65—Additives macromolecular
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/12—Polymerisation in non-solvents
    • C08F2/16—Aqueous medium
    • C08F2/22—Emulsion polymerisation
    • C08F2/24—Emulsion polymerisation with the aid of emulsifying agents
    • C08F2/30—Emulsion polymerisation with the aid of emulsifying agents non-ionic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1818—C13or longer chain (meth)acrylate, e.g. stearyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Paints Or Removers (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2015549879A 2014-03-13 2015-03-05 フッ素系界面活性剤、コーティング組成物、レジスト組成物及び硬化物 Active JP5950175B2 (ja)

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Application Number Priority Date Filing Date Title
JP2014050176 2014-03-13
JP2014050176 2014-03-13
PCT/JP2015/056489 WO2015137229A1 (ja) 2014-03-13 2015-03-05 フッ素系界面活性剤、コーティング組成物、レジスト組成物及び硬化物

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JP2015241879A Division JP6137289B2 (ja) 2014-03-13 2015-12-11 フッ素系界面活性剤、レジスト組成物、硬化物及びフッ素系界面活性剤の製造方法

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JP5950175B2 true JP5950175B2 (ja) 2016-07-13
JPWO2015137229A1 JPWO2015137229A1 (ja) 2017-04-06

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JP2015549879A Active JP5950175B2 (ja) 2014-03-13 2015-03-05 フッ素系界面活性剤、コーティング組成物、レジスト組成物及び硬化物
JP2015241879A Active JP6137289B2 (ja) 2014-03-13 2015-12-11 フッ素系界面活性剤、レジスト組成物、硬化物及びフッ素系界面活性剤の製造方法

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JP (2) JP5950175B2 (ko)
KR (1) KR102326845B1 (ko)
CN (1) CN106103517B (ko)
TW (1) TWI640829B (ko)
WO (1) WO2015137229A1 (ko)

Families Citing this family (13)

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Publication number Priority date Publication date Assignee Title
TWI709576B (zh) 2016-02-23 2020-11-11 日商迪愛生股份有限公司 彩色阻劑組成物、濾色器及彩色阻劑組成物之製造方法
KR102558671B1 (ko) * 2016-03-31 2023-07-26 동우 화인켐 주식회사 청색 감광성 수지 조성물, 이를 포함하는 청색 컬러필터 및 디스플레이 소자
CN108700811B (zh) * 2016-03-31 2022-08-30 Dnp精细化工股份有限公司 树脂组合物、彩色滤光片和图像显示装置
JP6790570B2 (ja) * 2016-08-10 2020-11-25 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
JP2018081168A (ja) * 2016-11-15 2018-05-24 Dic株式会社 カラーレジスト組成物、カラーフィルター及び液晶表示装置
WO2019065185A1 (ja) * 2017-09-28 2019-04-04 株式会社Ｄｎｐファインケミカル 着色樹脂組成物、硬化物、カラーフィルタ、及び表示装置
JP2021004922A (ja) * 2019-06-25 2021-01-14 東洋インキＳｃホールディングス株式会社 感光性着色組成物、並びにこれを用いたカラーフィルタ、液晶表示装置
WO2021045209A1 (ja) * 2019-09-04 2021-03-11 ダイキン工業株式会社 含フッ素共重合体
CN113552768A (zh) 2020-04-24 2021-10-26 东洋油墨Sc控股株式会社 感光性着色组合物、彩色滤光片及图像显示装置
JP2021009409A (ja) * 2020-10-16 2021-01-28 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
JP7267532B1 (ja) 2022-04-20 2023-05-02 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、画像表示装置、及び固体撮像素子
JP7267533B1 (ja) 2022-04-20 2023-05-02 東洋インキＳｃホールディングス株式会社 感光性組成物、光学フィルタ、画像表示装置、及び固体撮像素子
JP7464184B1 (ja) 2023-02-01 2024-04-09 ａｒｔｉｅｎｃｅ株式会社 感光性着色組成物、それを用いた膜、カラーフィルタ、固体撮像素子、及び画像表示装置

Citations (2)

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JP2009244729A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP2013209505A (ja) * 2012-03-30 2013-10-10 Dic Corp フッ素原子含有重合性樹脂、それを用いた活性エネルギー線硬化性組成物、その硬化物及び物品。

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JPS644610A (en) * 1987-06-27 1989-01-09 Mitsubishi Rayon Co Preparation of block copolymer
JP2004143440A (ja) * 2002-09-27 2004-05-20 Fuji Photo Film Co Ltd インクジェットプリンタ用油性インク組成物及びそれを用いた画像形成方法
JP2009096988A (ja) * 2007-09-25 2009-05-07 Fujifilm Corp 光硬化性コーティング組成物、オーバープリント及びその製造方法
JP5531495B2 (ja) 2009-08-07 2014-06-25 Ｄｉｃ株式会社 カラーレジスト組成物、カラーフィルター及び液晶表示装置
JP5682773B2 (ja) * 2009-10-26 2015-03-11 Dic株式会社 フッ素系界面活性剤、それを用いたコーティング組成物及びレジスト組成物
JP2012068374A (ja) * 2010-09-22 2012-04-05 Dic Corp カラーレジスト組成物、カラーフィルター及び液晶表示装置
JP5923878B2 (ja) * 2011-06-23 2016-05-25 Dic株式会社 フッ素系界面活性剤、それを用いたコーティング組成物及びレジスト組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009244729A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp 感光性樹脂組成物、遮光性カラーフィルター及びその製造方法、並びに、固体撮像素子
JP2013209505A (ja) * 2012-03-30 2013-10-10 Dic Corp フッ素原子含有重合性樹脂、それを用いた活性エネルギー線硬化性組成物、その硬化物及び物品。

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TWI640829B (zh) 2018-11-11
JP6137289B2 (ja) 2017-05-31
TW201539128A (zh) 2015-10-16
KR20160132829A (ko) 2016-11-21
JP2016102212A (ja) 2016-06-02
CN106103517B (zh) 2020-09-11
CN106103517A (zh) 2016-11-09
WO2015137229A1 (ja) 2015-09-17
KR102326845B1 (ko) 2021-11-17
JPWO2015137229A1 (ja) 2017-04-06

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