JP5912416B2 - 薄膜蒸着用マスクフレーム組立体及びその製造方法 - Google Patents

薄膜蒸着用マスクフレーム組立体及びその製造方法 Download PDF

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Publication number
JP5912416B2
JP5912416B2 JP2011237373A JP2011237373A JP5912416B2 JP 5912416 B2 JP5912416 B2 JP 5912416B2 JP 2011237373 A JP2011237373 A JP 2011237373A JP 2011237373 A JP2011237373 A JP 2011237373A JP 5912416 B2 JP5912416 B2 JP 5912416B2
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JP
Japan
Prior art keywords
mask
partial
pattern
frame assembly
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2011237373A
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English (en)
Japanese (ja)
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JP2012126990A (ja
Inventor
義 信 申
義 信 申
宰 ▲せき▼ 朴
宰 ▲せき▼ 朴
永 根 ▲そう▼
永 根 ▲そう▼
▲かん▼ 冬 金
▲かん▼ 冬 金
圭 範 金
圭 範 金
▲てい▼ 宇 許
▲てい▼ 宇 許
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Display Co Ltd
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Samsung Display Co Ltd
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Publication date
Application filed by Samsung Display Co Ltd filed Critical Samsung Display Co Ltd
Publication of JP2012126990A publication Critical patent/JP2012126990A/ja
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Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49826—Assembling or joining

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
  • Surface Treatment Of Glass (AREA)
JP2011237373A 2010-12-14 2011-10-28 薄膜蒸着用マスクフレーム組立体及びその製造方法 Expired - Fee Related JP5912416B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020100127858A KR101759347B1 (ko) 2010-12-14 2010-12-14 박막 증착용 마스크 프레임 조립체 및 그 제조방법
KR10-2010-0127858 2010-12-14

Publications (2)

Publication Number Publication Date
JP2012126990A JP2012126990A (ja) 2012-07-05
JP5912416B2 true JP5912416B2 (ja) 2016-04-27

Family

ID=46198031

Family Applications (1)

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JP2011237373A Expired - Fee Related JP5912416B2 (ja) 2010-12-14 2011-10-28 薄膜蒸着用マスクフレーム組立体及びその製造方法

Country Status (5)

Country Link
US (1) US8869738B2 (ko)
JP (1) JP5912416B2 (ko)
KR (1) KR101759347B1 (ko)
CN (1) CN102560336B (ko)
TW (1) TWI535869B (ko)

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* Cited by examiner, † Cited by third party
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KR101309864B1 (ko) * 2010-02-02 2013-09-16 엘지디스플레이 주식회사 마스크 어셈블리
KR101232181B1 (ko) * 2010-02-03 2013-02-12 엘지디스플레이 주식회사 마스크 어셈블리
KR101813549B1 (ko) * 2011-05-06 2018-01-02 삼성디스플레이 주식회사 분할 마스크와 그 분할 마스크를 포함한 마스크 프레임 조립체의 조립장치
KR102278925B1 (ko) 2013-10-25 2021-07-19 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 조립체
KR20160000069A (ko) * 2014-06-23 2016-01-04 삼성디스플레이 주식회사 마스크 프레임 어셈블리 및 그 제조방법
US9905813B2 (en) 2015-06-29 2018-02-27 Samsung Display Co., Ltd. Organic light-emitting display device, organic layer depositing apparatus, and method of manufacturing organic light-emitting display device using the organic layer depositing apparatus
CN205974646U (zh) * 2015-07-17 2017-02-22 凸版印刷株式会社 蒸镀用金属掩模
KR102549358B1 (ko) * 2015-11-02 2023-06-29 삼성디스플레이 주식회사 증착 마스크 조립체 및 이를 이용한 표시 장치의 제조 방법
CN107452659A (zh) * 2016-05-31 2017-12-08 上海微电子装备（集团）股份有限公司 分体式承版台
CN106019819A (zh) * 2016-07-22 2016-10-12 京东方科技集团股份有限公司 掩膜板及其制作方法
CN206706184U (zh) * 2017-05-12 2017-12-05 京东方科技集团股份有限公司 掩模板以及掩模片
WO2019064473A1 (ja) * 2017-09-29 2019-04-04 シャープ株式会社 蒸着用マスク、蒸着用マスクの製造方法及び表示装置の製造方法
KR102067581B1 (ko) 2017-11-06 2020-01-21 삼성디스플레이 주식회사 증착 마스크 및 이를 이용한 표시 장치의 제조 방법
KR102465374B1 (ko) 2018-09-12 2022-11-10 삼성디스플레이 주식회사 표시 패널 및 이를 포함하는 표시 장치
CN109913809B (zh) * 2019-04-30 2021-03-23 京东方科技集团股份有限公司 一种掩膜装置及一种蒸镀方法
KR20210044947A (ko) 2019-10-15 2021-04-26 삼성디스플레이 주식회사 마스크 조립체, 표시 장치의 제조장치 및 표시 장치의 제조방법
KR20220010687A (ko) * 2020-07-17 2022-01-26 삼성디스플레이 주식회사 마스크 및 마스크 제조방법
CN115786846A (zh) * 2022-11-09 2023-03-14 季华实验室 一种掩膜组件、蒸镀方法和蒸镀设备

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US6938783B2 (en) * 2000-07-26 2005-09-06 Amerasia International Technology, Inc. Carrier tape
JP4693297B2 (ja) * 2000-08-10 2011-06-01 キヤノン株式会社 放射線撮像装置および放射線撮像システム
KR100382491B1 (ko) * 2000-11-28 2003-05-09 엘지전자 주식회사 유기 ｅｌ의 새도우 마스크
US6589382B2 (en) * 2001-11-26 2003-07-08 Eastman Kodak Company Aligning mask segments to provide a stitched mask for producing OLED devices
KR100490534B1 (ko) 2001-12-05 2005-05-17 삼성에스디아이 주식회사 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체
KR100908232B1 (ko) 2002-06-03 2009-07-20 삼성모바일디스플레이주식회사 유기 전자 발광 소자의 박막 증착용 마스크 프레임 조립체
US6955726B2 (en) * 2002-06-03 2005-10-18 Samsung Sdi Co., Ltd. Mask and mask frame assembly for evaporation
JP2004225126A (ja) * 2003-01-24 2004-08-12 Pioneer Electronic Corp 成膜用マスクとその製造方法
KR20050019502A (ko) 2003-08-19 2005-03-03 삼성전자주식회사 노광방법 및 장치
JP2005163099A (ja) * 2003-12-02 2005-06-23 Seiko Epson Corp マスク、マスクの製造方法、有機ｅｌ装置の製造方法、有機ｅｌ装置
JP2005174843A (ja) 2003-12-15 2005-06-30 Sony Corp 蒸着用マスクおよびその製造方法
JP4208856B2 (ja) * 2004-04-28 2009-01-14 キヤノン株式会社 液体吐出ヘッドの製造方法
JP2006035075A (ja) * 2004-07-26 2006-02-09 Seiko Epson Corp 液滴吐出装置、液滴付与方法、電気光学装置の製造方法および電子機器
JP4285456B2 (ja) * 2005-07-20 2009-06-24 セイコーエプソン株式会社 マスク、マスクの製造方法、成膜方法及び電気光学装置の製造方法
KR20070027300A (ko) 2005-09-06 2007-03-09 오리온오엘이디 주식회사 새도우마스크 및 그 제조 방법
KR100647076B1 (ko) 2005-09-15 2006-11-23 황천익 플로어힌지 케이싱의 위치고정 장치
KR101322130B1 (ko) 2006-12-22 2013-10-25 엘지디스플레이 주식회사 대면적 증착용 마스크 및 대면적 증착용 마스크의 제조방법
JP2010090415A (ja) * 2008-10-06 2010-04-22 Seiko Epson Corp 蒸着マスク
KR101202346B1 (ko) * 2009-04-16 2012-11-16 삼성디스플레이 주식회사 박막 증착용 마스크 프레임 조립체, 그 제조 방법 및 유기 발광 표시 장치의 제조 방법
KR100941007B1 (ko) 2009-09-28 2010-02-05 (주)한 송 대면적 ａｍｏｌｅｄ 모바일 혹은 ｔｖ 원장 다면취 패널 제작용 분할마스크 및 이를 이용한 마스크프레임어셈블리의 제조방법

Also Published As

Publication number Publication date
US8869738B2 (en) 2014-10-28
CN102560336A (zh) 2012-07-11
CN102560336B (zh) 2016-12-07
US20120145076A1 (en) 2012-06-14
JP2012126990A (ja) 2012-07-05
KR20120066493A (ko) 2012-06-22
TWI535869B (zh) 2016-06-01
TW201224174A (en) 2012-06-16
KR101759347B1 (ko) 2017-08-01

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