JP5819054B2 - Ｓａｃｐ法およびｓａｃｐ法を行うための粒子光学系 - Google Patents

Ｓａｃｐ法およびｓａｃｐ法を行うための粒子光学系 Download PDF

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JP5819054B2
JP5819054B2 JP2010250911A JP2010250911A JP5819054B2 JP 5819054 B2 JP5819054 B2 JP 5819054B2 JP 2010250911 A JP2010250911 A JP 2010250911A JP 2010250911 A JP2010250911 A JP 2010250911A JP 5819054 B2 JP5819054 B2 JP 5819054B2
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optical system
particle optical
incident
sacp
beam deflector
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JP2011100733A5 (enExample
JP2011100733A (ja
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プライクスツァス ディルク
プライクスツァス ディルク
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Carl Zeiss Microscopy GmbH
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Carl Zeiss Microscopy GmbH
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1478—Beam tilting means, i.e. for stereoscopy or for beam channelling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/295—Electron or ion diffraction tubes
    • H01J37/2955—Electron or ion diffraction tubes using scanning ray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1506—Tilting or rocking beam around an axis substantially at an angle to optical axis
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2010250911A 2009-11-09 2010-11-09 Ｓａｃｐ法およびｓａｃｐ法を行うための粒子光学系 Active JP5819054B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009052392.8 2009-11-09
DE200910052392 DE102009052392A1 (de) 2009-11-09 2009-11-09 SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens

Publications (3)

Publication Number Publication Date
JP2011100733A JP2011100733A (ja) 2011-05-19
JP2011100733A5 JP2011100733A5 (enExample) 2014-12-25
JP5819054B2 true JP5819054B2 (ja) 2015-11-18

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JP2010250911A Active JP5819054B2 (ja) 2009-11-09 2010-11-09 Ｓａｃｐ法およびｓａｃｐ法を行うための粒子光学系

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US (1) US9093246B2 (enExample)
EP (1) EP2320217B1 (enExample)
JP (1) JP5819054B2 (enExample)
DE (1) DE102009052392A1 (enExample)

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US20250110069A1 (en) 2023-09-29 2025-04-03 Fei Company Method and system for orientating a sample for inspection with charged particle microscopy

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Also Published As

Publication number Publication date
DE102009052392A1 (de) 2011-12-15
EP2320217B1 (en) 2019-02-13
US20110108736A1 (en) 2011-05-12
EP2320217A3 (en) 2015-01-07
EP2320217A8 (en) 2011-07-13
JP2011100733A (ja) 2011-05-19
US9093246B2 (en) 2015-07-28
EP2320217A2 (en) 2011-05-11

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