DE602008003970D1 - Strahlstromkalibriersystem - Google Patents

Strahlstromkalibriersystem

Info

Publication number
DE602008003970D1
DE602008003970D1 DE602008003970T DE602008003970T DE602008003970D1 DE 602008003970 D1 DE602008003970 D1 DE 602008003970D1 DE 602008003970 T DE602008003970 T DE 602008003970T DE 602008003970 T DE602008003970 T DE 602008003970T DE 602008003970 D1 DE602008003970 D1 DE 602008003970D1
Authority
DE
Germany
Prior art keywords
strahlstromkalibriersystem
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602008003970T
Other languages
English (en)
Inventor
Pavel Adamec
Fang Zhou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Original Assignee
ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH filed Critical ICT Integrated Circuit Testing Gesellschaft fuer Halbleiterprueftechnik mbH
Publication of DE602008003970D1 publication Critical patent/DE602008003970D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
    • H01J2237/24535—Beam current
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/282—Determination of microscope properties
    • H01J2237/2826—Calibration
DE602008003970T 2008-02-08 2008-02-08 Strahlstromkalibriersystem Active DE602008003970D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP08101448A EP2088614B1 (de) 2008-02-08 2008-02-08 Strahlstromkalibriersystem

Publications (1)

Publication Number Publication Date
DE602008003970D1 true DE602008003970D1 (de) 2011-01-27

Family

ID=39590844

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602008003970T Active DE602008003970D1 (de) 2008-02-08 2008-02-08 Strahlstromkalibriersystem

Country Status (4)

Country Link
US (1) US7982179B2 (de)
EP (1) EP2088614B1 (de)
JP (1) JP4879288B2 (de)
DE (1) DE602008003970D1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009052392A1 (de) * 2009-11-09 2011-12-15 Carl Zeiss Nts Gmbh SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens
EP2365511B1 (de) 2010-03-10 2013-05-08 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Rückkopplungsschleife für eine Emitter Blitzreinigung
US8835884B2 (en) * 2010-12-22 2014-09-16 Hitachi High-Technologies Corporation Charged particle beam apparatus with cleaning photo-irradiation apparatus
US10049852B2 (en) 2014-11-05 2018-08-14 Howmedica Osteonics Corp. Assessment and calibration of a high energy beam
US9620331B1 (en) * 2015-11-19 2017-04-11 Carl Zeiss Microscopy Ltd. Method for analyzing an object and charged particle beam device for carrying out the method
AU2018273352B2 (en) 2017-05-22 2023-07-27 Howmedica Osteonics Corp. Device for in-situ fabrication process monitoring and feedback control of an electron beam additive manufacturing process
US10245448B2 (en) * 2017-07-21 2019-04-02 Varian Medical Systems Particle Therapy Gmbh Particle beam monitoring systems and methods
US10395887B1 (en) * 2018-02-20 2019-08-27 Technische Universiteit Delft Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column
US10504687B2 (en) * 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
EP3597333A1 (de) 2018-07-19 2020-01-22 Howmedica Osteonics Corporation System und verfahren für prozessinterne elektronenstrahlprofil- und positionsanalysen
EP3716313A1 (de) * 2019-03-28 2020-09-30 ASML Netherlands B.V. Blendenanordnung mit integrierter strommessung
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
JP7076021B1 (ja) * 2021-03-10 2022-05-26 浜松ホトニクス株式会社 ライトガイド、電子線検出器、及び荷電粒子装置
DE102021118561B4 (de) 2021-07-19 2023-03-30 Carl Zeiss Multisem Gmbh Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskopes mit schneller Strahlstromregelung, Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop
US20230411109A1 (en) * 2022-06-16 2023-12-21 Fei Company Methods for determining the virtual source location of a liquid metal ion source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3842271A (en) * 1973-04-24 1974-10-15 American Optical Corp Scanning electron microscope
JPH0487244A (ja) * 1990-07-27 1992-03-19 Hitachi Ltd 走査型電子顕微鏡
US5345085A (en) * 1993-03-26 1994-09-06 Etec Systems, Inc. Method and structure for electronically measuring beam parameters
JPH07105888A (ja) * 1993-10-05 1995-04-21 Jeol Ltd 走査電子顕微鏡
JP2001202912A (ja) * 2000-01-21 2001-07-27 Nikon Corp 荷電粒子線装置の開口と光軸の軸合わせ方法
US6545277B1 (en) * 2000-08-15 2003-04-08 Applied Materials, Inc. High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM
EP1255278B1 (de) * 2001-04-24 2005-06-15 Advantest Corporation Teilchenstrahl-Raster-Spiegelmikroskop
EP1300870B1 (de) * 2001-10-05 2007-04-04 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Elektronenstrahlvorrrichtung mit Mehrfachstrahl
US6639219B2 (en) * 2001-11-09 2003-10-28 International Business Machines Corporation Electron scatter in a thin membrane to eliminate detector saturation

Also Published As

Publication number Publication date
JP2009187949A (ja) 2009-08-20
US20090200497A1 (en) 2009-08-13
EP2088614B1 (de) 2010-12-15
JP4879288B2 (ja) 2012-02-22
US7982179B2 (en) 2011-07-19
EP2088614A1 (de) 2009-08-12

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