JP5796349B2 - 記憶素子の製造方法 - Google Patents

記憶素子の製造方法 Download PDF

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Publication number
JP5796349B2
JP5796349B2 JP2011114439A JP2011114439A JP5796349B2 JP 5796349 B2 JP5796349 B2 JP 5796349B2 JP 2011114439 A JP2011114439 A JP 2011114439A JP 2011114439 A JP2011114439 A JP 2011114439A JP 5796349 B2 JP5796349 B2 JP 5796349B2
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JP
Japan
Prior art keywords
layer
magnetization
memory
storage
current
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Expired - Fee Related
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JP2011114439A
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English (en)
Japanese (ja)
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JP2012244030A5 (enExample
JP2012244030A (ja
Inventor
肥後　豊
豊 肥後
細見　政功
政功 細見
大森　広之
広之 大森
別所　和宏
和宏 別所
徹哉 浅山
徹哉 浅山
一陽 山根
一陽 山根
裕行 内田
裕行 内田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
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Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP2011114439A priority Critical patent/JP5796349B2/ja
Priority to TW101111174A priority patent/TWI473088B/zh
Priority to US13/461,437 priority patent/US8625342B2/en
Priority to KR1020120051402A priority patent/KR101983077B1/ko
Priority to CN201210152766.2A priority patent/CN102800804B/zh
Publication of JP2012244030A publication Critical patent/JP2012244030A/ja
Publication of JP2012244030A5 publication Critical patent/JP2012244030A5/ja
Application granted granted Critical
Publication of JP5796349B2 publication Critical patent/JP5796349B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3286—Spin-exchange coupled multilayers having at least one layer with perpendicular magnetic anisotropy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00—Thin magnetic films, e.g. of one-domain structure
    • H01F10/32—Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324—Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/329—Spin-exchange coupled multilayers wherein the magnetisation of the free layer is switched by a spin-polarised current, e.g. spin torque effect
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/20—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors
    • H10B61/22—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having three or more electrodes, e.g. transistors of the field-effect transistor [FET] type
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Hall/Mr Elements (AREA)
JP2011114439A 2011-05-23 2011-05-23 記憶素子の製造方法 Expired - Fee Related JP5796349B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011114439A JP5796349B2 (ja) 2011-05-23 2011-05-23 記憶素子の製造方法
TW101111174A TWI473088B (zh) 2011-05-23 2012-03-29 Memory elements and memory devices
US13/461,437 US8625342B2 (en) 2011-05-23 2012-05-01 Storage element and storage device
KR1020120051402A KR101983077B1 (ko) 2011-05-23 2012-05-15 기억 소자의 제조 방법
CN201210152766.2A CN102800804B (zh) 2011-05-23 2012-05-16 存储元件和存储装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011114439A JP5796349B2 (ja) 2011-05-23 2011-05-23 記憶素子の製造方法

Publications (3)

Publication Number Publication Date
JP2012244030A JP2012244030A (ja) 2012-12-10
JP2012244030A5 JP2012244030A5 (enExample) 2014-06-19
JP5796349B2 true JP5796349B2 (ja) 2015-10-21

Family

ID=47199844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011114439A Expired - Fee Related JP5796349B2 (ja) 2011-05-23 2011-05-23 記憶素子の製造方法

Country Status (5)

Country Link
US (1) US8625342B2 (enExample)
JP (1) JP5796349B2 (enExample)
KR (1) KR101983077B1 (enExample)
CN (1) CN102800804B (enExample)
TW (1) TWI473088B (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5600344B2 (ja) 2010-03-10 2014-10-01 株式会社日立製作所 磁気抵抗効果素子及び磁気メモリ
JP5725735B2 (ja) * 2010-06-04 2015-05-27 株式会社日立製作所 磁気抵抗効果素子及び磁気メモリ
JP5786341B2 (ja) 2010-09-06 2015-09-30 ソニー株式会社 記憶素子、メモリ装置
US8796797B2 (en) * 2012-12-21 2014-08-05 Intel Corporation Perpendicular spin transfer torque memory (STTM) device with enhanced stability and method to form same
CN103794224B (zh) * 2014-01-27 2017-01-11 华中科技大学 一种基于相变磁性材料的非易失性逻辑器件及逻辑操作方法
CN106030840B (zh) * 2014-03-25 2019-03-01 英特尔公司 磁畴壁逻辑器件及互连
KR20170037707A (ko) * 2015-09-25 2017-04-05 삼성전자주식회사 자기 기억 소자 및 이의 제조 방법
US10439130B2 (en) * 2016-10-27 2019-10-08 Tdk Corporation Spin-orbit torque type magnetoresistance effect element, and method for producing spin-orbit torque type magnetoresistance effect element
JP6832818B2 (ja) * 2017-09-21 2021-02-24 キオクシア株式会社 磁気記憶装置
US12364164B2 (en) * 2022-12-10 2025-07-15 International Business Machines Corporation Reactive serial resistance reduction for magnetoresistive random-access memory devices

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6130814A (en) 1998-07-28 2000-10-10 International Business Machines Corporation Current-induced magnetic switching device and memory including the same
JP3667244B2 (ja) * 2001-03-19 2005-07-06 キヤノン株式会社 磁気抵抗素子、それを用いたメモリ素子、磁気ランダムアクセスメモリ及び磁気ランダムアクセスメモリの記録再生方法
JP2003017782A (ja) 2001-07-04 2003-01-17 Rikogaku Shinkokai キャリヤスピン注入磁化反転型磁気抵抗効果膜と該膜を用いた不揮発性メモリー素子及び該素子を用いたメモリー装置
KR100468861B1 (ko) * 2003-01-07 2005-01-29 삼성전자주식회사 고선택성을 가지는 자기저항 메모리
US7242045B2 (en) * 2004-02-19 2007-07-10 Grandis, Inc. Spin transfer magnetic element having low saturation magnetization free layers
JP4550552B2 (ja) * 2004-11-02 2010-09-22 株式会社東芝 磁気抵抗効果素子、磁気ランダムアクセスメモリ、磁気抵抗効果素子の製造方法
JP4877575B2 (ja) * 2005-05-19 2012-02-15 日本電気株式会社 磁気ランダムアクセスメモリ
JP2007048790A (ja) * 2005-08-05 2007-02-22 Sony Corp 記憶素子及びメモリ
US7224601B2 (en) * 2005-08-25 2007-05-29 Grandis Inc. Oscillating-field assisted spin torque switching of a magnetic tunnel junction memory element
JP2007081280A (ja) * 2005-09-16 2007-03-29 Fujitsu Ltd 磁気抵抗効果素子及び磁気メモリ装置
JP2008283207A (ja) * 2005-10-19 2008-11-20 Toshiba Corp 磁気抵抗効果素子、磁気ランダムアクセスメモリ、電子カード及び電子装置
JP4444241B2 (ja) * 2005-10-19 2010-03-31 株式会社東芝 磁気抵抗効果素子、磁気ランダムアクセスメモリ、電子カード及び電子装置
JP2007266498A (ja) * 2006-03-29 2007-10-11 Toshiba Corp 磁気記録素子及び磁気メモリ
JP2007305882A (ja) * 2006-05-12 2007-11-22 Sony Corp 記憶素子及びメモリ
JP2008098523A (ja) * 2006-10-13 2008-04-24 Toshiba Corp 磁気抵抗効果素子および磁気メモリ
FR2910716B1 (fr) * 2006-12-26 2010-03-26 Commissariat Energie Atomique Dispositif magnetique multicouches, procede pour sa realisation, capteur de champ magnetique, memoire magnetique et porte logique mettant en oeuvre un tel dispositif
JP4682998B2 (ja) * 2007-03-15 2011-05-11 ソニー株式会社 記憶素子及びメモリ
FR2931011B1 (fr) * 2008-05-06 2010-05-28 Commissariat Energie Atomique Element magnetique a ecriture assistee thermiquement

Also Published As

Publication number Publication date
CN102800804B (zh) 2017-01-18
TW201248626A (en) 2012-12-01
JP2012244030A (ja) 2012-12-10
KR20120130702A (ko) 2012-12-03
KR101983077B1 (ko) 2019-05-29
US8625342B2 (en) 2014-01-07
TWI473088B (zh) 2015-02-11
CN102800804A (zh) 2012-11-28
US20120300541A1 (en) 2012-11-29

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