JP5754853B2 - 半導体製造装置のガス分流供給装置 - Google Patents

半導体製造装置のガス分流供給装置 Download PDF

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Publication number
JP5754853B2
JP5754853B2 JP2012016266A JP2012016266A JP5754853B2 JP 5754853 B2 JP5754853 B2 JP 5754853B2 JP 2012016266 A JP2012016266 A JP 2012016266A JP 2012016266 A JP2012016266 A JP 2012016266A JP 5754853 B2 JP5754853 B2 JP 5754853B2
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Japan
Prior art keywords
flow rate
gas
control unit
pressure
branch
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JP2012016266A
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English (en)
Japanese (ja)
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JP2013156801A (ja
JP2013156801A5 (https=
Inventor
功ニ 西野
功ニ 西野
土肥　亮介
亮介 土肥
池田　信一
信一 池田
薫 平田
薫 平田
和之 森崎
和之 森崎
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Fujikin Inc
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Fujikin Inc
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Priority to JP2012016266A priority Critical patent/JP5754853B2/ja
Application filed by Fujikin Inc filed Critical Fujikin Inc
Priority to US14/375,758 priority patent/US20140373935A1/en
Priority to KR1020147018214A priority patent/KR101677971B1/ko
Priority to CN201280068410.9A priority patent/CN104081304B/zh
Priority to PCT/JP2012/006626 priority patent/WO2013114486A1/ja
Priority to TW101140130A priority patent/TWI505386B/zh
Publication of JP2013156801A publication Critical patent/JP2013156801A/ja
Publication of JP2013156801A5 publication Critical patent/JP2013156801A5/ja
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0664—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/2496—Self-proportioning or correlating systems
    • Y10T137/2544—Supply and exhaust type

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
  • Control Of Non-Electrical Variables (AREA)
JP2012016266A 2012-01-30 2012-01-30 半導体製造装置のガス分流供給装置 Active JP5754853B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2012016266A JP5754853B2 (ja) 2012-01-30 2012-01-30 半導体製造装置のガス分流供給装置
KR1020147018214A KR101677971B1 (ko) 2012-01-30 2012-10-17 반도체 제조 장치의 가스 분류 공급 장치
CN201280068410.9A CN104081304B (zh) 2012-01-30 2012-10-17 半导体制造装置的气体分流供给装置
PCT/JP2012/006626 WO2013114486A1 (ja) 2012-01-30 2012-10-17 半導体製造装置のガス分流供給装置
US14/375,758 US20140373935A1 (en) 2012-01-30 2012-10-17 Gas branched flow supplying apparatus for semiconductor manufacturing equipment
TW101140130A TWI505386B (zh) 2012-01-30 2012-10-30 And a gas shunt supply device for a semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012016266A JP5754853B2 (ja) 2012-01-30 2012-01-30 半導体製造装置のガス分流供給装置

Publications (3)

Publication Number Publication Date
JP2013156801A JP2013156801A (ja) 2013-08-15
JP2013156801A5 JP2013156801A5 (https=) 2014-12-18
JP5754853B2 true JP5754853B2 (ja) 2015-07-29

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JP2012016266A Active JP5754853B2 (ja) 2012-01-30 2012-01-30 半導体製造装置のガス分流供給装置

Country Status (6)

Country Link
US (1) US20140373935A1 (https=)
JP (1) JP5754853B2 (https=)
KR (1) KR101677971B1 (https=)
CN (1) CN104081304B (https=)
TW (1) TWI505386B (https=)
WO (1) WO2013114486A1 (https=)

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JP6246606B2 (ja) * 2014-01-31 2017-12-13 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN105551995A (zh) * 2014-10-30 2016-05-04 北京北方微电子基地设备工艺研究中心有限责任公司 一种真空腔室的充气气路及半导体加工设备
US20160363500A1 (en) * 2015-01-23 2016-12-15 Innovative Pressure Testing, Llc System and method for improving pressure test efficiency
JP6516666B2 (ja) * 2015-04-08 2019-05-22 東京エレクトロン株式会社 ガス供給制御方法
US9904299B2 (en) * 2015-04-08 2018-02-27 Tokyo Electron Limited Gas supply control method
US10768641B2 (en) * 2015-08-26 2020-09-08 Fujikin Incorporated Flow dividing system
JP6748586B2 (ja) * 2016-07-11 2020-09-02 東京エレクトロン株式会社 ガス供給システム、基板処理システム及びガス供給方法
CN106155120A (zh) * 2016-09-08 2016-11-23 中国航空工业集团公司西安飞机设计研究所 一种多路流量分配方法及多路流量分配系统
JP7245600B2 (ja) * 2016-12-15 2023-03-24 株式会社堀場エステック 流量制御装置、及び、流量制御装置用プログラム
WO2018147354A1 (ja) * 2017-02-10 2018-08-16 株式会社フジキン 流量測定方法および流量測定装置
WO2018235900A1 (ja) * 2017-06-22 2018-12-27 株式会社フジキン 流量制御装置および流量制御装置の流量制御方法
JP7164938B2 (ja) * 2017-07-31 2022-11-02 株式会社堀場エステック 流量制御装置、流量制御方法、及び、流量制御装置用プログラム
JP7208634B2 (ja) * 2017-07-31 2023-01-19 株式会社フジキン 流体制御システムおよび流量測定方法
JP7157476B2 (ja) * 2018-04-27 2022-10-20 株式会社フジキン 流量制御方法および流量制御装置
CN111986971B (zh) * 2019-05-23 2024-05-17 北京北方华创微电子装备有限公司 微波源进气装置及半导体工艺设备
CN112460608B (zh) * 2020-11-27 2022-09-16 潮州深能环保有限公司 一种垃圾焚烧发电厂污泥管道输送系统及其输送方法
CN113857147A (zh) * 2021-09-13 2021-12-31 安徽万维克林精密装备有限公司 一种多功能自动吹扫装置
JP7665482B2 (ja) * 2021-09-24 2025-04-21 株式会社Ｓｃｒｅｅｎホールディングス 基板処理システム、及び群管理装置

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JPH11212653A (ja) * 1998-01-21 1999-08-06 Fujikin Inc 流体供給装置
JP3522535B2 (ja) * 1998-05-29 2004-04-26 忠弘 大見 圧力式流量制御装置を備えたガス供給設備
KR100348853B1 (ko) * 1998-08-24 2002-08-17 가부시키가이샤 후지킨 압력식 유량제어장치에 있어서의 막힘 검출방법 및 그검출장치
KR100427563B1 (ko) * 1999-04-16 2004-04-27 가부시키가이샤 후지킨 병렬분류형 유체공급장치와, 이것에 사용하는 유체가변형압력식 유량제어방법 및 유체가변형 압력식 유량제어장치
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JP2010169657A (ja) * 2008-12-25 2010-08-05 Horiba Stec Co Ltd 質量流量計及びマスフローコントローラ
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JP5430621B2 (ja) * 2011-08-10 2014-03-05 Ｃｋｄ株式会社 ガス流量検定システム及びガス流量検定ユニット

Also Published As

Publication number Publication date
CN104081304B (zh) 2017-08-29
TWI505386B (zh) 2015-10-21
CN104081304A (zh) 2014-10-01
JP2013156801A (ja) 2013-08-15
KR20140098840A (ko) 2014-08-08
TW201336007A (zh) 2013-09-01
WO2013114486A1 (ja) 2013-08-08
KR101677971B1 (ko) 2016-11-21
US20140373935A1 (en) 2014-12-25

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