KR101677971B1 - 반도체 제조 장치의 가스 분류 공급 장치 - Google Patents

반도체 제조 장치의 가스 분류 공급 장치 Download PDF

Info

Publication number
KR101677971B1
KR101677971B1 KR1020147018214A KR20147018214A KR101677971B1 KR 101677971 B1 KR101677971 B1 KR 101677971B1 KR 1020147018214 A KR1020147018214 A KR 1020147018214A KR 20147018214 A KR20147018214 A KR 20147018214A KR 101677971 B1 KR101677971 B1 KR 101677971B1
Authority
KR
South Korea
Prior art keywords
flow rate
gas
branch
process gas
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020147018214A
Other languages
English (en)
Korean (ko)
Other versions
KR20140098840A (ko
Inventor
코우지 니시노
료우스케 도히
노부카즈 이케다
카오루 히라타
카즈유키 모리사키
Original Assignee
가부시키가이샤 후지킨
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 후지킨 filed Critical 가부시키가이샤 후지킨
Publication of KR20140098840A publication Critical patent/KR20140098840A/ko
Application granted granted Critical
Publication of KR101677971B1 publication Critical patent/KR101677971B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0664—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/2496—Self-proportioning or correlating systems
    • Y10T137/2544—Supply and exhaust type

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
  • Control Of Non-Electrical Variables (AREA)
KR1020147018214A 2012-01-30 2012-10-17 반도체 제조 장치의 가스 분류 공급 장치 Active KR101677971B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012016266A JP5754853B2 (ja) 2012-01-30 2012-01-30 半導体製造装置のガス分流供給装置
JPJP-P-2012-016266 2012-01-30
PCT/JP2012/006626 WO2013114486A1 (ja) 2012-01-30 2012-10-17 半導体製造装置のガス分流供給装置

Publications (2)

Publication Number Publication Date
KR20140098840A KR20140098840A (ko) 2014-08-08
KR101677971B1 true KR101677971B1 (ko) 2016-11-21

Family

ID=48904576

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147018214A Active KR101677971B1 (ko) 2012-01-30 2012-10-17 반도체 제조 장치의 가스 분류 공급 장치

Country Status (6)

Country Link
US (1) US20140373935A1 (https=)
JP (1) JP5754853B2 (https=)
KR (1) KR101677971B1 (https=)
CN (1) CN104081304B (https=)
TW (1) TWI505386B (https=)
WO (1) WO2013114486A1 (https=)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6246606B2 (ja) * 2014-01-31 2017-12-13 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
CN105551995A (zh) * 2014-10-30 2016-05-04 北京北方微电子基地设备工艺研究中心有限责任公司 一种真空腔室的充气气路及半导体加工设备
US20160363500A1 (en) * 2015-01-23 2016-12-15 Innovative Pressure Testing, Llc System and method for improving pressure test efficiency
JP6516666B2 (ja) * 2015-04-08 2019-05-22 東京エレクトロン株式会社 ガス供給制御方法
US9904299B2 (en) * 2015-04-08 2018-02-27 Tokyo Electron Limited Gas supply control method
US10768641B2 (en) * 2015-08-26 2020-09-08 Fujikin Incorporated Flow dividing system
JP6748586B2 (ja) * 2016-07-11 2020-09-02 東京エレクトロン株式会社 ガス供給システム、基板処理システム及びガス供給方法
CN106155120A (zh) * 2016-09-08 2016-11-23 中国航空工业集团公司西安飞机设计研究所 一种多路流量分配方法及多路流量分配系统
JP7245600B2 (ja) * 2016-12-15 2023-03-24 株式会社堀場エステック 流量制御装置、及び、流量制御装置用プログラム
WO2018147354A1 (ja) * 2017-02-10 2018-08-16 株式会社フジキン 流量測定方法および流量測定装置
WO2018235900A1 (ja) * 2017-06-22 2018-12-27 株式会社フジキン 流量制御装置および流量制御装置の流量制御方法
JP7164938B2 (ja) * 2017-07-31 2022-11-02 株式会社堀場エステック 流量制御装置、流量制御方法、及び、流量制御装置用プログラム
JP7208634B2 (ja) * 2017-07-31 2023-01-19 株式会社フジキン 流体制御システムおよび流量測定方法
JP7157476B2 (ja) * 2018-04-27 2022-10-20 株式会社フジキン 流量制御方法および流量制御装置
CN111986971B (zh) * 2019-05-23 2024-05-17 北京北方华创微电子装备有限公司 微波源进气装置及半导体工艺设备
CN112460608B (zh) * 2020-11-27 2022-09-16 潮州深能环保有限公司 一种垃圾焚烧发电厂污泥管道输送系统及其输送方法
CN113857147A (zh) * 2021-09-13 2021-12-31 安徽万维克林精密装备有限公司 一种多功能自动吹扫装置
JP7665482B2 (ja) * 2021-09-24 2025-04-21 株式会社Ｓｃｒｅｅｎホールディングス 基板処理システム、及び群管理装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004246826A (ja) * 2003-02-17 2004-09-02 Stec Inc マスフローコントローラ

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3025395B2 (ja) * 1993-07-12 2000-03-27 株式会社山武 流量制御弁装置
JP3291161B2 (ja) * 1995-06-12 2002-06-10 株式会社フジキン 圧力式流量制御装置
US5865205A (en) * 1997-04-17 1999-02-02 Applied Materials, Inc. Dynamic gas flow controller
JP3586075B2 (ja) * 1997-08-15 2004-11-10 忠弘 大見 圧力式流量制御装置
JPH11212653A (ja) * 1998-01-21 1999-08-06 Fujikin Inc 流体供給装置
JP3522535B2 (ja) * 1998-05-29 2004-04-26 忠弘 大見 圧力式流量制御装置を備えたガス供給設備
KR100348853B1 (ko) * 1998-08-24 2002-08-17 가부시키가이샤 후지킨 압력식 유량제어장치에 있어서의 막힘 검출방법 및 그검출장치
KR100427563B1 (ko) * 1999-04-16 2004-04-27 가부시키가이샤 후지킨 병렬분류형 유체공급장치와, 이것에 사용하는 유체가변형압력식 유량제어방법 및 유체가변형 압력식 유량제어장치
JP3626874B2 (ja) 1999-04-16 2005-03-09 忠弘 大見 並列分流型の流体供給装置
US6210482B1 (en) * 1999-04-22 2001-04-03 Fujikin Incorporated Apparatus for feeding gases for use in semiconductor manufacturing
US6119710A (en) * 1999-05-26 2000-09-19 Cyber Instrument Technologies Llc Method for wide range gas flow system with real time flow measurement and correction
US6564824B2 (en) * 2001-04-13 2003-05-20 Flowmatrix, Inc. Mass flow meter systems and methods
JP3604354B2 (ja) * 2001-06-13 2004-12-22 Ｓｍｃ株式会社 質量流量測定方法および質量流量制御装置
US6913031B2 (en) * 2001-10-18 2005-07-05 Ckd Corporation Pulse shot type flow controller and pulse shot type flow controlling method
JP4082901B2 (ja) * 2001-12-28 2008-04-30 忠弘 大見 圧力センサ、圧力制御装置及び圧力式流量制御装置の温度ドリフト補正装置
US6766260B2 (en) * 2002-01-04 2004-07-20 Mks Instruments, Inc. Mass flow ratio system and method
JP2003323217A (ja) 2002-05-01 2003-11-14 Stec Inc 流量制御システム
JP2004280788A (ja) * 2003-02-28 2004-10-07 Advanced Energy Japan Kk ガス分流システム
JP4195837B2 (ja) * 2003-06-20 2008-12-17 東京エレクトロン株式会社 ガス分流供給装置及びガス分流供給方法
JP4399227B2 (ja) * 2003-10-06 2010-01-13 株式会社フジキン チャンバの内圧制御装置及び内圧被制御式チャンバ
JP4856905B2 (ja) * 2005-06-27 2012-01-18 国立大学法人東北大学 流量レンジ可変型流量制御装置
JP4814706B2 (ja) 2006-06-27 2011-11-16 株式会社フジキン 流量比可変型流体供給装置
JP5459895B2 (ja) * 2007-10-15 2014-04-02 Ｃｋｄ株式会社 ガス分流供給ユニット
JP2010169657A (ja) * 2008-12-25 2010-08-05 Horiba Stec Co Ltd 質量流量計及びマスフローコントローラ
JP5562712B2 (ja) * 2010-04-30 2014-07-30 東京エレクトロン株式会社 半導体製造装置用のガス供給装置
JP5430621B2 (ja) * 2011-08-10 2014-03-05 Ｃｋｄ株式会社 ガス流量検定システム及びガス流量検定ユニット

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004246826A (ja) * 2003-02-17 2004-09-02 Stec Inc マスフローコントローラ

Also Published As

Publication number Publication date
CN104081304B (zh) 2017-08-29
TWI505386B (zh) 2015-10-21
CN104081304A (zh) 2014-10-01
JP2013156801A (ja) 2013-08-15
KR20140098840A (ko) 2014-08-08
JP5754853B2 (ja) 2015-07-29
TW201336007A (zh) 2013-09-01
WO2013114486A1 (ja) 2013-08-08
US20140373935A1 (en) 2014-12-25

Similar Documents

Publication Publication Date Title
KR101677971B1 (ko) 반도체 제조 장치의 가스 분류 공급 장치
KR101632602B1 (ko) 반도체 제조 장치의 가스 분류 공급 장치
KR101510146B1 (ko) 가스 분류 공급 장치 및 이것을 사용한 가스 분류 공급 방법
JP4585035B2 (ja) 流量比率制御装置
CN109716257B (zh) 流量比率控制装置、存储有流量比率控制装置用程序的程序存储介质及流量比率控制方法
JP6321972B2 (ja) 圧力式流量制御装置及びその流量制御開始時のオーバーシュート防止方法
KR101565437B1 (ko) 반도체 제조 장치용의 가스 공급 장치
KR101428826B1 (ko) 유량 비율 제어 장치
KR101887360B1 (ko) 압력식 유량 제어 장치
JP2015138338A5 (https=)
CN103282748A (zh) 气体供应装置用流量控制器的流量测定装置及流量测定方法
JP2013156801A5 (https=)
CN112204493A (zh) 用于多通道质量流量和比率控制系统的方法和装置

Legal Events

Date Code Title Description
A201 Request for examination
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

D13-X000 Search requested

St.27 status event code: A-1-2-D10-D13-srh-X000

D14-X000 Search report completed

St.27 status event code: A-1-2-D10-D14-srh-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20191016

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 10

U11 Full renewal or maintenance fee paid

Free format text: ST27 STATUS EVENT CODE: A-4-4-U10-U11-OTH-PR1001 (AS PROVIDED BY THE NATIONAL OFFICE)

Year of fee payment: 10