CN104081304B - 半导体制造装置的气体分流供给装置 - Google Patents

半导体制造装置的气体分流供给装置 Download PDF

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Publication number
CN104081304B
CN104081304B CN201280068410.9A CN201280068410A CN104081304B CN 104081304 B CN104081304 B CN 104081304B CN 201280068410 A CN201280068410 A CN 201280068410A CN 104081304 B CN104081304 B CN 104081304B
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CN
China
Prior art keywords
gas
valve
control unit
flow
branch line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN201280068410.9A
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English (en)
Chinese (zh)
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CN104081304A (zh
Inventor
西野功二
土肥亮介
池田信
池田信一
平田薰
森崎和之
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Fujikin Inc
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Fujikin Inc
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Publication of CN104081304A publication Critical patent/CN104081304A/zh
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Expired - Fee Related legal-status Critical Current
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    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • G05D7/0617Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00Control of flow
    • G05D7/06Control of flow characterised by the use of electric means
    • G05D7/0617Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0635Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means
    • G05D7/0641Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means
    • G05D7/0664Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by action on throttling means using a plurality of throttling means the plurality of throttling means being arranged for the control of a plurality of diverging flows from a single flow
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/2496Self-proportioning or correlating systems
    • Y10T137/2544Supply and exhaust type

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Flow Control (AREA)
  • Control Of Non-Electrical Variables (AREA)
CN201280068410.9A 2012-01-30 2012-10-17 半导体制造装置的气体分流供给装置 Expired - Fee Related CN104081304B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012016266A JP5754853B2 (ja) 2012-01-30 2012-01-30 半導体製造装置のガス分流供給装置
JP2012-016266 2012-01-30
PCT/JP2012/006626 WO2013114486A1 (ja) 2012-01-30 2012-10-17 半導体製造装置のガス分流供給装置

Publications (2)

Publication Number Publication Date
CN104081304A CN104081304A (zh) 2014-10-01
CN104081304B true CN104081304B (zh) 2017-08-29

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201280068410.9A Expired - Fee Related CN104081304B (zh) 2012-01-30 2012-10-17 半导体制造装置的气体分流供给装置

Country Status (6)

Country Link
US (1) US20140373935A1 (https=)
JP (1) JP5754853B2 (https=)
KR (1) KR101677971B1 (https=)
CN (1) CN104081304B (https=)
TW (1) TWI505386B (https=)
WO (1) WO2013114486A1 (https=)

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JP6246606B2 (ja) * 2014-01-31 2017-12-13 株式会社Screenホールディングス 基板処理装置
CN105551995A (zh) * 2014-10-30 2016-05-04 北京北方微电子基地设备工艺研究中心有限责任公司 一种真空腔室的充气气路及半导体加工设备
US20160363500A1 (en) * 2015-01-23 2016-12-15 Innovative Pressure Testing, Llc System and method for improving pressure test efficiency
JP6516666B2 (ja) * 2015-04-08 2019-05-22 東京エレクトロン株式会社 ガス供給制御方法
US9904299B2 (en) * 2015-04-08 2018-02-27 Tokyo Electron Limited Gas supply control method
US10768641B2 (en) * 2015-08-26 2020-09-08 Fujikin Incorporated Flow dividing system
JP6748586B2 (ja) * 2016-07-11 2020-09-02 東京エレクトロン株式会社 ガス供給システム、基板処理システム及びガス供給方法
CN106155120A (zh) * 2016-09-08 2016-11-23 中国航空工业集团公司西安飞机设计研究所 一种多路流量分配方法及多路流量分配系统
JP7245600B2 (ja) * 2016-12-15 2023-03-24 株式会社堀場エステック 流量制御装置、及び、流量制御装置用プログラム
WO2018147354A1 (ja) * 2017-02-10 2018-08-16 株式会社フジキン 流量測定方法および流量測定装置
WO2018235900A1 (ja) * 2017-06-22 2018-12-27 株式会社フジキン 流量制御装置および流量制御装置の流量制御方法
JP7164938B2 (ja) * 2017-07-31 2022-11-02 株式会社堀場エステック 流量制御装置、流量制御方法、及び、流量制御装置用プログラム
JP7208634B2 (ja) * 2017-07-31 2023-01-19 株式会社フジキン 流体制御システムおよび流量測定方法
JP7157476B2 (ja) * 2018-04-27 2022-10-20 株式会社フジキン 流量制御方法および流量制御装置
CN111986971B (zh) * 2019-05-23 2024-05-17 北京北方华创微电子装备有限公司 微波源进气装置及半导体工艺设备
CN112460608B (zh) * 2020-11-27 2022-09-16 潮州深能环保有限公司 一种垃圾焚烧发电厂污泥管道输送系统及其输送方法
CN113857147A (zh) * 2021-09-13 2021-12-31 安徽万维克林精密装备有限公司 一种多功能自动吹扫装置
JP7665482B2 (ja) * 2021-09-24 2025-04-21 株式会社Screenホールディングス 基板処理システム、及び群管理装置

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US20010013363A1 (en) * 1999-04-22 2001-08-16 Hirofumi Kitayama Apparatus and method for feeding gases for use in semiconductor manufacturing
CN102235573A (zh) * 2010-04-30 2011-11-09 东京毅力科创株式会社 半导体制造装置用的气体供给装置

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Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
CN1255981A (zh) * 1998-01-21 2000-06-07 株式会社富士金 流体供给设备
US20010013363A1 (en) * 1999-04-22 2001-08-16 Hirofumi Kitayama Apparatus and method for feeding gases for use in semiconductor manufacturing
CN102235573A (zh) * 2010-04-30 2011-11-09 东京毅力科创株式会社 半导体制造装置用的气体供给装置

Also Published As

Publication number Publication date
TWI505386B (zh) 2015-10-21
CN104081304A (zh) 2014-10-01
JP2013156801A (ja) 2013-08-15
KR20140098840A (ko) 2014-08-08
JP5754853B2 (ja) 2015-07-29
TW201336007A (zh) 2013-09-01
WO2013114486A1 (ja) 2013-08-08
KR101677971B1 (ko) 2016-11-21
US20140373935A1 (en) 2014-12-25

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Granted publication date: 20170829