JP5695924B2 - 欠陥推定装置および欠陥推定方法並びに検査装置および検査方法 - Google Patents

欠陥推定装置および欠陥推定方法並びに検査装置および検査方法 Download PDF

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Publication number
JP5695924B2
JP5695924B2 JP2011017294A JP2011017294A JP5695924B2 JP 5695924 B2 JP5695924 B2 JP 5695924B2 JP 2011017294 A JP2011017294 A JP 2011017294A JP 2011017294 A JP2011017294 A JP 2011017294A JP 5695924 B2 JP5695924 B2 JP 5695924B2
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Japan
Prior art keywords
image
pattern
defect
mask
optical image
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Expired - Fee Related
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JP2011017294A
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Japanese (ja)
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JP2011221499A5 (enExample
JP2011221499A (ja
Inventor
阿部　隆幸
隆幸 阿部
土屋　英雄
英雄 土屋
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Nuflare Technology Inc
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Nuflare Technology Inc
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G06T7/001—Industrial image inspection using an image reference approach
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V10/00—Arrangements for image or video recognition or understanding
    • G06V10/40—Extraction of image or video features
    • G06V10/42—Global feature extraction by analysis of the whole pattern, e.g. using frequency domain transformations or autocorrelation
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Theoretical Computer Science (AREA)
  • Quality & Reliability (AREA)
  • Multimedia (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2011017294A 2010-02-01 2011-01-28 欠陥推定装置および欠陥推定方法並びに検査装置および検査方法 Expired - Fee Related JP5695924B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011017294A JP5695924B2 (ja) 2010-02-01 2011-01-28 欠陥推定装置および欠陥推定方法並びに検査装置および検査方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2010020584 2010-02-01
JP2010020584 2010-02-01
JP2010066559 2010-03-23
JP2010066559 2010-03-23
JP2011017294A JP5695924B2 (ja) 2010-02-01 2011-01-28 欠陥推定装置および欠陥推定方法並びに検査装置および検査方法

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JP2011221499A JP2011221499A (ja) 2011-11-04
JP2011221499A5 JP2011221499A5 (enExample) 2014-01-23
JP5695924B2 true JP5695924B2 (ja) 2015-04-08

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JP (1) JP5695924B2 (enExample)

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Publication number Publication date
US20130094752A1 (en) 2013-04-18
US8737676B2 (en) 2014-05-27
US8781212B2 (en) 2014-07-15
US9177372B2 (en) 2015-11-03
US20130093878A1 (en) 2013-04-18
US20150131892A1 (en) 2015-05-14
US20110188734A1 (en) 2011-08-04
US8983113B2 (en) 2015-03-17
JP2011221499A (ja) 2011-11-04

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