JP5640260B2 - クーラント回収方法 - Google Patents

クーラント回収方法 Download PDF

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Publication number
JP5640260B2
JP5640260B2 JP2010144448A JP2010144448A JP5640260B2 JP 5640260 B2 JP5640260 B2 JP 5640260B2 JP 2010144448 A JP2010144448 A JP 2010144448A JP 2010144448 A JP2010144448 A JP 2010144448A JP 5640260 B2 JP5640260 B2 JP 5640260B2
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JP
Japan
Prior art keywords
coolant
filtration
membrane
recovery method
ceramic membrane
Prior art date
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Application number
JP2010144448A
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English (en)
Japanese (ja)
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JP2012006115A (ja
JP2012006115A5 (zh
Inventor
英雄 天池
英雄 天池
慎一 小坂
慎一 小坂
勝文 窪田
勝文 窪田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
NGK Filtech Ltd
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NGK Insulators Ltd
NGK Filtech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NGK Insulators Ltd, NGK Filtech Ltd filed Critical NGK Insulators Ltd
Priority to JP2010144448A priority Critical patent/JP5640260B2/ja
Priority to TW100120660A priority patent/TWI501838B/zh
Priority to KR1020110058125A priority patent/KR101799598B1/ko
Priority to CN201110172424.2A priority patent/CN102294758B/zh
Publication of JP2012006115A publication Critical patent/JP2012006115A/ja
Publication of JP2012006115A5 publication Critical patent/JP2012006115A5/ja
Application granted granted Critical
Publication of JP5640260B2 publication Critical patent/JP5640260B2/ja
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0076Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for removing dust, e.g. by spraying liquids; for lubricating, cooling or cleaning tool or work

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
JP2010144448A 2010-06-25 2010-06-25 クーラント回収方法 Active JP5640260B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010144448A JP5640260B2 (ja) 2010-06-25 2010-06-25 クーラント回収方法
TW100120660A TWI501838B (zh) 2010-06-25 2011-06-14 Coolant recovery method
KR1020110058125A KR101799598B1 (ko) 2010-06-25 2011-06-15 쿨런트 회수 방법
CN201110172424.2A CN102294758B (zh) 2010-06-25 2011-06-23 冷却介质回收方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010144448A JP5640260B2 (ja) 2010-06-25 2010-06-25 クーラント回収方法

Publications (3)

Publication Number Publication Date
JP2012006115A JP2012006115A (ja) 2012-01-12
JP2012006115A5 JP2012006115A5 (zh) 2013-02-28
JP5640260B2 true JP5640260B2 (ja) 2014-12-17

Family

ID=45355551

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010144448A Active JP5640260B2 (ja) 2010-06-25 2010-06-25 クーラント回収方法

Country Status (4)

Country Link
JP (1) JP5640260B2 (zh)
KR (1) KR101799598B1 (zh)
CN (1) CN102294758B (zh)
TW (1) TWI501838B (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013248707A (ja) * 2012-05-31 2013-12-12 Panasonic Corp クーラント廃液の再生方法、クーラント廃液の処理方法、クーラント廃液の処理システム、及び再生クーラント液の製造方法
JP6331474B2 (ja) * 2014-02-28 2018-05-30 ブラザー工業株式会社 工作機械の洗浄液濾過装置
CN105174522B (zh) * 2015-10-09 2017-11-17 浙江瑞翌新材料科技股份有限公司 一种金刚线切割废冷却液的回收方法及系统
CN117774150A (zh) * 2022-09-22 2024-03-29 内蒙古中环光伏材料有限公司 一种去除硅单晶金刚线切片用冷却液中硅粉的方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3249373B2 (ja) * 1996-02-21 2002-01-21 信越半導体株式会社 水溶性スラリー廃液の再利用システム
US5664990A (en) * 1996-07-29 1997-09-09 Integrated Process Equipment Corp. Slurry recycling in CMP apparatus
JP3816200B2 (ja) * 1997-07-18 2006-08-30 東芝セラミックス株式会社 微細粒子を含む液体の処理方法および処理装置
JP3389141B2 (ja) * 1999-04-26 2003-03-24 株式会社スーパーシリコン研究所 スライシング用スラリーの評価方法及びスラリー
JP3314921B2 (ja) * 1999-06-08 2002-08-19 三菱住友シリコン株式会社 半導体材料の切断・加工方法
JP4369054B2 (ja) * 1999-07-01 2009-11-18 エムイーエムシー・エレクトロニック・マテリアルズ・ソシエタ・ペル・アチオニ 使用済グリコール系スラリーの分離、再生および再使用法
JP4609675B2 (ja) * 2007-08-16 2011-01-12 オルガノ株式会社 メタル研磨cmp工程排水処理装置及び方法
JP5173945B2 (ja) * 2008-07-02 2013-04-03 シャープ株式会社 クーラント再生方法およびスラリー再生方法
CN102257604B (zh) * 2008-12-20 2013-07-03 嘉柏微电子材料股份公司 线锯切割方法

Also Published As

Publication number Publication date
JP2012006115A (ja) 2012-01-12
TW201208814A (en) 2012-03-01
CN102294758A (zh) 2011-12-28
TWI501838B (zh) 2015-10-01
CN102294758B (zh) 2015-08-05
KR101799598B1 (ko) 2017-11-20
KR20120000502A (ko) 2012-01-02

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