JP5623390B2 - 真空コーティングチャンバからアルカリ金属又はアルカリ土類金属を除去するための装置及び方法 - Google Patents
真空コーティングチャンバからアルカリ金属又はアルカリ土類金属を除去するための装置及び方法 Download PDFInfo
- Publication number
- JP5623390B2 JP5623390B2 JP2011510915A JP2011510915A JP5623390B2 JP 5623390 B2 JP5623390 B2 JP 5623390B2 JP 2011510915 A JP2011510915 A JP 2011510915A JP 2011510915 A JP2011510915 A JP 2011510915A JP 5623390 B2 JP5623390 B2 JP 5623390B2
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- Japan
- Prior art keywords
- coating chamber
- vacuum coating
- gas
- vacuum
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000001771 vacuum deposition Methods 0.000 title claims description 24
- 238000000034 method Methods 0.000 title claims description 23
- 229910052783 alkali metal Inorganic materials 0.000 title claims description 12
- 150000001340 alkali metals Chemical class 0.000 title claims description 12
- 150000001342 alkaline earth metals Chemical class 0.000 title claims description 11
- 229910052784 alkaline earth metal Inorganic materials 0.000 title claims description 10
- 229910052744 lithium Inorganic materials 0.000 claims description 34
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 24
- 239000011248 coating agent Substances 0.000 claims description 19
- 238000006243 chemical reaction Methods 0.000 claims description 17
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000000428 dust Substances 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims description 3
- 239000000523 sample Substances 0.000 claims description 3
- 238000002604 ultrasonography Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 40
- 238000004140 cleaning Methods 0.000 description 19
- 239000000758 substrate Substances 0.000 description 13
- 229910052760 oxygen Inorganic materials 0.000 description 7
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 230000000873 masking effect Effects 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 238000012545 processing Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910018068 Li 2 O Inorganic materials 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 229910003002 lithium salt Inorganic materials 0.000 description 3
- 159000000002 lithium salts Chemical class 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 231100000252 nontoxic Toxicity 0.000 description 2
- 230000003000 nontoxic effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910000733 Li alloy Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002483 hydrogen compounds Chemical class 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 239000001989 lithium alloy Substances 0.000 description 1
- 150000002642 lithium compounds Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08009925.2A EP2130940B1 (en) | 2008-05-30 | 2008-05-30 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
US12/130,572 | 2008-05-30 | ||
US12/130,572 US8083859B2 (en) | 2008-05-30 | 2008-05-30 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
EP08009925.2 | 2008-05-30 | ||
PCT/EP2009/054214 WO2009144071A1 (en) | 2008-05-30 | 2009-04-08 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011522117A JP2011522117A (ja) | 2011-07-28 |
JP5623390B2 true JP5623390B2 (ja) | 2014-11-12 |
Family
ID=40666844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011510915A Expired - Fee Related JP5623390B2 (ja) | 2008-05-30 | 2009-04-08 | 真空コーティングチャンバからアルカリ金属又はアルカリ土類金属を除去するための装置及び方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5623390B2 (zh) |
KR (1) | KR101613982B1 (zh) |
CN (1) | CN102046833B (zh) |
TW (1) | TWI391506B (zh) |
WO (1) | WO2009144071A1 (zh) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5202420B2 (ja) * | 2009-04-09 | 2013-06-05 | 株式会社アルバック | 真空部品に付着した薄膜の除去方法 |
JP5553898B2 (ja) * | 2010-07-13 | 2014-07-16 | 株式会社アルバック | 成膜装置及び成膜装置の洗浄方法 |
JP5839556B2 (ja) * | 2011-11-18 | 2016-01-06 | 株式会社半導体エネルギー研究所 | 成膜方法 |
RU2503083C1 (ru) * | 2012-05-22 | 2013-12-27 | Закрытое акционерное общество "Инновационный центр "Бирюч" (ЗАО "ИЦ "Бирюч") | Дифференциальный спектрометр ионной подвижности |
TWI495754B (zh) * | 2013-02-01 | 2015-08-11 | Adpv Technology Ltd Intetrust | Vacuum coating equipment vacuum measurement device |
CN105274465B (zh) * | 2015-11-17 | 2018-01-30 | 沈阳仪表科学研究院有限公司 | 真空镀膜腔内部件洁净粗糙表面的再生方法 |
JP7378220B2 (ja) * | 2019-04-17 | 2023-11-13 | 株式会社アルバック | 成膜装置及び真空部品処理方法 |
CN110928012A (zh) * | 2019-12-06 | 2020-03-27 | 深圳市康盛光电科技有限公司 | 一种调光膜用ito导电膜的防电击穿制备方法 |
CN112501616B (zh) * | 2020-11-10 | 2023-03-07 | 合肥综合性国家科学中心能源研究院(安徽省能源实验室) | 一种清除粘附于金属样件表面锂合金的方法及装置 |
KR20230108324A (ko) * | 2020-11-20 | 2023-07-18 | 어플라이드 머티어리얼스, 인코포레이티드 | 리튬 프로세싱 장비를 위한 세정 재료들 및 프로세스들 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5055169A (en) * | 1989-03-17 | 1991-10-08 | The United States Of America As Represented By The Secretary Of The Army | Method of making mixed metal oxide coated substrates |
EP0441368B1 (en) * | 1990-02-09 | 1996-05-08 | Applied Materials, Inc. | Method and device for removing excess material from a sputtering chamber |
DE19609970A1 (de) * | 1996-03-14 | 1997-09-18 | Leybold Systems Gmbh | Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat |
JP2002206160A (ja) | 2001-01-09 | 2002-07-26 | Sumitomo Electric Ind Ltd | 薄膜製造装置、薄膜形成方法および薄膜製造装置用部材 |
US20020185067A1 (en) * | 2001-06-07 | 2002-12-12 | International Business Machines Corporation | Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
JP2003007290A (ja) * | 2001-06-19 | 2003-01-10 | Sanyo Electric Co Ltd | リチウム二次電池用電極の製造装置 |
JP2003229365A (ja) * | 2002-02-04 | 2003-08-15 | Central Glass Co Ltd | 混合クリーニングガス組成物 |
DE10358275A1 (de) * | 2003-12-11 | 2005-07-21 | Wiessner Gmbh | Vorrichtung und Verfahren zum Reinigen wenigstens einer Prozesskammer zum Beschichten wenigstens eines Substrats |
US7887637B2 (en) * | 2004-02-19 | 2011-02-15 | Tokyo Electron Limited | Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning |
JP5025458B2 (ja) * | 2005-02-02 | 2012-09-12 | 東京エレクトロン株式会社 | クリーニング方法、制御プログラム、コンピュータ読み取り可能な記憶媒体およびプラズマ処理装置 |
CN101573179A (zh) * | 2006-09-08 | 2009-11-04 | 西格纳化学有限责任公司 | 锂-多孔金属氧化物组合物和锂剂-多孔金属组合物 |
-
2009
- 2009-04-08 JP JP2011510915A patent/JP5623390B2/ja not_active Expired - Fee Related
- 2009-04-08 KR KR1020107029837A patent/KR101613982B1/ko active IP Right Grant
- 2009-04-08 WO PCT/EP2009/054214 patent/WO2009144071A1/en active Application Filing
- 2009-04-08 CN CN200980120576.9A patent/CN102046833B/zh not_active Expired - Fee Related
- 2009-05-14 TW TW98116043A patent/TWI391506B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TWI391506B (zh) | 2013-04-01 |
KR20110015659A (ko) | 2011-02-16 |
JP2011522117A (ja) | 2011-07-28 |
CN102046833B (zh) | 2013-03-27 |
WO2009144071A1 (en) | 2009-12-03 |
CN102046833A (zh) | 2011-05-04 |
TW201006942A (en) | 2010-02-16 |
KR101613982B1 (ko) | 2016-04-20 |
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