WO2009144071A1 - Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber - Google Patents
Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber Download PDFInfo
- Publication number
- WO2009144071A1 WO2009144071A1 PCT/EP2009/054214 EP2009054214W WO2009144071A1 WO 2009144071 A1 WO2009144071 A1 WO 2009144071A1 EP 2009054214 W EP2009054214 W EP 2009054214W WO 2009144071 A1 WO2009144071 A1 WO 2009144071A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coating chamber
- vacuum coating
- gas
- arrangement
- metals
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4405—Cleaning of reactor or parts inside the reactor by using reactive gases
Definitions
- the invention relates to an arrangement and a method according to the preambles of claims 1 and 11.
- Modern lithium batteries are, as a rule, produced in a vacuum chamber, wherein a substrate is provided with a lithium layer.
- the lithium layer is formed, for example, through the deposition on the substrate of lithium in the vapor state. Since lithium is highly reactive, contact by the operating personnel after opening the vacuum chamber must be avoided. Even if the excess lithium has been pumped out of the vacuum chamber, it is still possible for lithium particles deposited on the inner wall of the vacuum chamber or on facings and/or maskings to harm the operating personnel.
- cleaning a process chamber by means of a gas containing O2 is known (US 2007/0163617 A1 ).
- the cleaning is carried out at increased temperature and under vacuum.
- the gas preferably also contains H radicals, since the cleaning process can also be carried out by means of a plasma.
- the walls of the process chamber are cleaned of tungsten and not of lithium or another aggressive material.
- a further method for cleaning coating chambers is disclosed in DE 103 38 275 A1.
- the process chamber is flushed with a conditioned purge gas before a coating process.
- the purge gas is preferably comprised of O2 and N 2 with a humidity value of maximally 30%.
- the coating chamber is cleaned before the coating process and the coating material is not lithium.
- US 2002/0185067 A1 discloses a device and a method for the in situ cleaning of a throttle valve in a CVD system.
- a cleaning gas is introduced which can comprise F 2 , C 2 F 6 , O 2 or NF 3 . Lithium is not discussed.
- a cleaning process for a coating chamber is furthermore known in which inter alia N 2 and O 2 are employed as cleaning gases (EP 1 612 857 A1 ). These gases are converted to plasma and subsequently serve for cleaning the inner wall of a CVD chamber. High frequency is utilized for the generation of the plasma. However, not Li, but rather Si 3 N 4 or SiO 2 are removed.
- EP 0 441 368 A discloses a device and a method for eliminating excess material from a PVD chamber. During a cleaning cycle a vacuum is generated in the PVD chamber and a gas mixture with reactive gas is introduced into the PVD chamber. The reactive gas is herein activated through plasma discharge. The objects of the cleaning are also screenings. The eliminated material is Ti, W or Al, not however Li.
- JP 2002-206160 discloses an apparatus for manufacturing a thin film of lithium metal or lithium alloy.
- a heater is provided to melt the lithium metal adhering to the inner wall.
- the invention addresses the problem of cleaning such parts of a vacuum coating chamber which during the production of thin-film batteries are unintentionally coated, for example maskings, metal lining sheets and the like.
- the advantage attained with the invention comprises in particular that unintentionally coated parts are cleaned in simple manner and the cycle times or service times are shortened. Since the cleaning can also be carried out cyclically, it is possible to operate a coating installation without interruption.
- the invention consequently relates to a cleaning method in which from a vacuum coating chamber of a coating installation for the coating of substrates with alkali- or alkaline earth-metals, residues of alkali or alkaline earth-metals are removed.
- a gas from the group of N 2 , O 2 or air is introduced which reacts with the alkali- or alkaline earth-metals to form the corresponding solid compounds. Water can still also be additionally introduced into the vacuum coating chamber.
- the corresponding solid compound is removed from the vacuum coating chamber.
- Fig. 1 a vacuum chamber for coating a substrate by means of a vaporized material.
- a coating installation 1 in which a substrate 2 can be coated, is shown in Figure 1 in sectional view.
- This coating installation 1 includes a vacuum coating chamber 3, of which two side-walls 4, 5 are evident.
- Masking 6 is disposed between the substrate 2 and a vapor feed system 7, which comprises a vaporizer crucible 8, a valve 9 and a vapor inlet 10 to 13.
- the end of the vapor inlet is formed by a linear distributor 14 implemented as a vertically oriented tube with linearly disposed openings. These openings are located opposite the masking 6.
- By 15, 16 are denoted covers in the vacuum chamber 3.
- the vaporizer crucible 8 is melted, for example, lithium for the production of thin- film lithium batteries and vaporized.
- lithium for the production of thin- film lithium batteries and vaporized.
- the vaporized material arrives via the vapor inlet 10 to 13 at the distributor 14 and from here, via the masking 6, which does not need to be provided in every case, at the substrate 2.
- the vaporized material also reaches the covers 15, 16 and other parts which it is not intended to reach.
- the unintentionally coated parts must be freed of the coating in order for the operating personnel not to be harmed by the reactive lithium when opening the vacuum chamber 3 and removing the coated substrate 2.
- gas containers 20, 21 , 22 which contain the gases N 2 , O 2 or air. Activation of the gases is not absolutely required.
- These gas tanks 20, 21 , 22 are connected via supply pipes 23, 24, 25 and valves 26, 27, 28 with the vacuum chamber 3. If N 2 is introduced into the vacuum chamber 3, the N 2 molecules combine with lithium according to the equation 6 Li + N 2 ⁇ 2 Li 3 N. This end product is a solid which falls from the vertical surfaces to the bottom of the vacuum chamber 3 or adheres at the site of the reaction.
- air can also be introduced into the vacuum chamber 3.
- This air can herein be enriched with O 2 . Since air contains both nitrogen as well as also oxygen, lithium consequently reacts with the nitrogen as well as also with the oxygen. It is here advantageous if the air has a certain humidity. To this end the air can additionally be enriched with water. If there is also water contained in the air, the following reaction takes place: Li + H 2 O D LiOH + D H 2 .
- LiOH and Li 2 COs are also formed.
- Li 2 COs is formed through the following reaction: 2 LiOH + CO 2 D Li 2 CO 3 + H 2 O.
- Li 2 CO 3 breaks down again into Li 2 O and CO 2 .
- LiOH breaks down into Li 2 O and H 2 O.
- the lithium compounds must in every case be nontoxic and remain stable in air.
- the metal Li or also the other alkali- and alkaline earth-metals, can be made to react with other substances, such as, for example, with halogens or hydrogen compounds of these halogens.
- reaction is not absolutely required, it is nevertheless advantageous to carry out the reaction at increased temperatures.
- a temperature in the range from 30° C up to 200° C can be selected, at which the reaction is started. It is obvious that at higher temperatures the reaction proceeds faster. It is of advantage if the reaction takes place at a pressure of up to 100 mbar.
- the choice of temperature as well as of pressure depends substantially on the design of the vacuum chamber 3. If only pure oxygen is utilized as the gas, the temperature can be, for example, 80° C and the pressure of the oxygen 100 mbar. This ensures optimal reaction conditions.
- a gas sensor 32 to be considered is, for example, a mass spectrometer, a lambda probe or an IR or NIR spectrometer. Via these measuring devices the gas composition can be determined during the process. If a lambda probe is employed, oxygen is preferably added to the gas or gas mixture. In this case the oxygen content can be determined during the process. As long as there is still lithium in the chamber and reacts with the gases, the concentration of the reactive gases is below the concentration of the gases before their introduction into the vacuum chamber 3 vitiated with lithium. As soon as the lithium has reacted with the gases, the concentration of the gases reaches the starting value again. This indicates that the reaction process has been completed.
- the gas composition which had been determined by means of the gas sensor 32, is supplied to an evaluation instrument 33.
- an evaluation instrument 33 When the process is completed, by means of a pump 30 and an extraction fitting 31 the powder on the bottom of the vacuum chamber 3 can be suctioned out. It is also possible to vent the vacuum chamber 3 and subsequently to remove the powder by means of a dust extractor. It is herein advantageous to remove the lithium salt adhering on the walls of the vacuum chamber 3 by means of ultrasound such that it falls to the bottom. This facilitates the cleaning work considerably.
- parameters such as, for example, pressure, temperature or the moisture content in the form of water in the gas or the gas mixture, the reaction with the lithium can be accelerated.
- water is introduced into the vacuum chamber 3 via a feed pipe 35.
- lithium salts remain adhered to the surface after the cleaning process or spall off and consequently fall to the bottom of the vacuum chamber 3 depends substantially on the layer thicknesses of the formed lithium salts. If the lithium layers formed in the coating reaction are very thin, salts with a very small grain diameter are formed in the cleaning process. Such lithium layers remain preferably well adhered on the walls of the vacuum chamber 3. If during the coating process thick lithium layers have been formed on the walls of the vacuum chamber, layers are formed in the cleaning reaction with the gases, which layers are under mechanical stress, which can lead to the spalling of the coating. For this reason it can be advantageous to remove the salt residues still adhering on the walls of the vacuum chamber 3 by means of ultrasound.
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Vapour Deposition (AREA)
- Secondary Cells (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200980120576.9A CN102046833B (en) | 2008-05-30 | 2009-04-08 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
JP2011510915A JP5623390B2 (en) | 2008-05-30 | 2009-04-08 | Apparatus and method for removing alkali metal or alkaline earth metal from a vacuum coating chamber |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08009925.2 | 2008-05-30 | ||
EP08009925.2A EP2130940B1 (en) | 2008-05-30 | 2008-05-30 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
US12/130,572 | 2008-05-30 | ||
US12/130,572 US8083859B2 (en) | 2008-05-30 | 2008-05-30 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009144071A1 true WO2009144071A1 (en) | 2009-12-03 |
Family
ID=40666844
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2009/054214 WO2009144071A1 (en) | 2008-05-30 | 2009-04-08 | Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5623390B2 (en) |
KR (1) | KR101613982B1 (en) |
CN (1) | CN102046833B (en) |
TW (1) | TWI391506B (en) |
WO (1) | WO2009144071A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012008455A1 (en) * | 2010-07-13 | 2012-01-19 | 株式会社アルバック | Film-forming apparatus and method for cleaning film-forming apparatus |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5202420B2 (en) * | 2009-04-09 | 2013-06-05 | 株式会社アルバック | Method for removing thin film adhering to vacuum parts |
JP5839556B2 (en) * | 2011-11-18 | 2016-01-06 | 株式会社半導体エネルギー研究所 | Deposition method |
RU2503083C1 (en) * | 2012-05-22 | 2013-12-27 | Закрытое акционерное общество "Инновационный центр "Бирюч" (ЗАО "ИЦ "Бирюч") | Differential ion mobility spectrometer |
TWI495754B (en) * | 2013-02-01 | 2015-08-11 | Adpv Technology Ltd Intetrust | Vacuum coating equipment vacuum measurement device |
CN105274465B (en) * | 2015-11-17 | 2018-01-30 | 沈阳仪表科学研究院有限公司 | The renovation process of vacuum coating intracavitary part cleaning rough surface |
JP7378220B2 (en) * | 2019-04-17 | 2023-11-13 | 株式会社アルバック | Film forming equipment and vacuum parts processing method |
CN110928012A (en) * | 2019-12-06 | 2020-03-27 | 深圳市康盛光电科技有限公司 | Anti-electric breakdown preparation method of ITO conductive film for light modulation film |
CN112501616B (en) * | 2020-11-10 | 2023-03-07 | 合肥综合性国家科学中心能源研究院(安徽省能源实验室) | Method and device for removing lithium alloy adhered to surface of metal sample piece |
Citations (6)
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EP0441368A1 (en) * | 1990-02-09 | 1991-08-14 | Applied Materials, Inc. | Method and device for removing excess material from a sputtering chamber |
US5055169A (en) * | 1989-03-17 | 1991-10-08 | The United States Of America As Represented By The Secretary Of The Army | Method of making mixed metal oxide coated substrates |
JP2002206160A (en) * | 2001-01-09 | 2002-07-26 | Sumitomo Electric Ind Ltd | Thin film manufacturing apparatus thin film deposition method, and member for thin film manufacturing apparatus |
US20020185067A1 (en) * | 2001-06-07 | 2002-12-12 | International Business Machines Corporation | Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
JP2003229365A (en) * | 2002-02-04 | 2003-08-15 | Central Glass Co Ltd | Mixed cleaning gas composition |
US20070163617A1 (en) * | 2004-02-19 | 2007-07-19 | Tokyo Electron Limited | Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19609970A1 (en) * | 1996-03-14 | 1997-09-18 | Leybold Systems Gmbh | Device for applying thin layers on a substrate |
JP2003007290A (en) * | 2001-06-19 | 2003-01-10 | Sanyo Electric Co Ltd | Manufacturing apparatus of electrode for lithium secondary battery |
DE20321795U1 (en) * | 2003-12-11 | 2010-03-04 | Voith Patent Gmbh | Apparatus for cleaning at least one process chamber for coating at least one substrate |
WO2006082724A1 (en) * | 2005-02-02 | 2006-08-10 | Tokyo Electron Limited | Method for cleaning and method for plasma treatment |
CA2710702A1 (en) * | 2006-09-08 | 2008-03-13 | Signa Chemistry, Inc. | Lithium-porous metal oxide compositions and lithium reagent-porous metal compositions |
-
2009
- 2009-04-08 CN CN200980120576.9A patent/CN102046833B/en not_active Expired - Fee Related
- 2009-04-08 KR KR1020107029837A patent/KR101613982B1/en active IP Right Grant
- 2009-04-08 JP JP2011510915A patent/JP5623390B2/en not_active Expired - Fee Related
- 2009-04-08 WO PCT/EP2009/054214 patent/WO2009144071A1/en active Application Filing
- 2009-05-14 TW TW98116043A patent/TWI391506B/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US5055169A (en) * | 1989-03-17 | 1991-10-08 | The United States Of America As Represented By The Secretary Of The Army | Method of making mixed metal oxide coated substrates |
EP0441368A1 (en) * | 1990-02-09 | 1991-08-14 | Applied Materials, Inc. | Method and device for removing excess material from a sputtering chamber |
JP2002206160A (en) * | 2001-01-09 | 2002-07-26 | Sumitomo Electric Ind Ltd | Thin film manufacturing apparatus thin film deposition method, and member for thin film manufacturing apparatus |
US20020185067A1 (en) * | 2001-06-07 | 2002-12-12 | International Business Machines Corporation | Apparatus and method for in-situ cleaning of a throttle valve in a CVD system |
JP2003229365A (en) * | 2002-02-04 | 2003-08-15 | Central Glass Co Ltd | Mixed cleaning gas composition |
US20070163617A1 (en) * | 2004-02-19 | 2007-07-19 | Tokyo Electron Limited | Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012008455A1 (en) * | 2010-07-13 | 2012-01-19 | 株式会社アルバック | Film-forming apparatus and method for cleaning film-forming apparatus |
JP5553898B2 (en) * | 2010-07-13 | 2014-07-16 | 株式会社アルバック | Film forming apparatus and method for cleaning film forming apparatus |
Also Published As
Publication number | Publication date |
---|---|
TW201006942A (en) | 2010-02-16 |
JP2011522117A (en) | 2011-07-28 |
TWI391506B (en) | 2013-04-01 |
CN102046833A (en) | 2011-05-04 |
CN102046833B (en) | 2013-03-27 |
KR20110015659A (en) | 2011-02-16 |
JP5623390B2 (en) | 2014-11-12 |
KR101613982B1 (en) | 2016-04-20 |
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