JP5614968B2 - 疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法 - Google Patents

疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法 Download PDF

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Publication number
JP5614968B2
JP5614968B2 JP2009243550A JP2009243550A JP5614968B2 JP 5614968 B2 JP5614968 B2 JP 5614968B2 JP 2009243550 A JP2009243550 A JP 2009243550A JP 2009243550 A JP2009243550 A JP 2009243550A JP 5614968 B2 JP5614968 B2 JP 5614968B2
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JP
Japan
Prior art keywords
group
core
general formula
component
silica particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009243550A
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English (en)
Japanese (ja)
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JP2011089018A (ja
Inventor
洋一 綾
洋一 綾
剛 本間
剛 本間
正敏 本間
正敏 本間
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Adeka Corp
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Adeka Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Adeka Corp filed Critical Adeka Corp
Priority to JP2009243550A priority Critical patent/JP5614968B2/ja
Priority to KR1020100092550A priority patent/KR20110044140A/ko
Priority to CN201010528307.0A priority patent/CN102040224B/zh
Publication of JP2011089018A publication Critical patent/JP2011089018A/ja
Application granted granted Critical
Publication of JP5614968B2 publication Critical patent/JP5614968B2/ja
Expired - Fee Related legal-status Critical Current
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C08K7/26—Silicon- containing compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C01P2004/34—Spheres hollow
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/20—Powder free flowing behaviour

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Polymers (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
JP2009243550A 2009-10-22 2009-10-22 疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法 Expired - Fee Related JP5614968B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2009243550A JP5614968B2 (ja) 2009-10-22 2009-10-22 疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法
KR1020100092550A KR20110044140A (ko) 2009-10-22 2010-09-20 소수성 코어 쉘 실리카 입자, 중공 실리카 입자 및 이들 제조방법
CN201010528307.0A CN102040224B (zh) 2009-10-22 2010-10-22 疏水性核壳型二氧化硅粒子、中空二氧化硅粒子和它们的制造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009243550A JP5614968B2 (ja) 2009-10-22 2009-10-22 疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法

Publications (2)

Publication Number Publication Date
JP2011089018A JP2011089018A (ja) 2011-05-06
JP5614968B2 true JP5614968B2 (ja) 2014-10-29

Family

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Family Applications (1)

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JP2009243550A Expired - Fee Related JP5614968B2 (ja) 2009-10-22 2009-10-22 疎水性コアシェルシリカ粒子、中空シリカ粒子およびこれらの製造方法

Country Status (3)

Country Link
JP (1) JP5614968B2 (ko)
KR (1) KR20110044140A (ko)
CN (1) CN102040224B (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014034488A (ja) * 2012-08-08 2014-02-24 Canon Inc 中空粒子の分散液の製造方法、反射防止膜の製造方法及び光学素子の製造方法
AU2013323203B2 (en) * 2012-09-28 2017-04-13 The Regents Of The University Of California Degradable silica nanoshells for ultrasonic imaging/therapy
WO2014098107A1 (ja) * 2012-12-19 2014-06-26 国立大学法人東京大学 中空状有機シリカ構造体及びその製造方法
CN109956479A (zh) * 2017-12-25 2019-07-02 北京化工大学 一种中空微球及其制备方法
CN111218024B (zh) * 2018-11-27 2022-05-13 台湾气凝胶科技材料开发股份有限公司 连续性制备核壳亲疏双极复合气凝胶粉末的方法
KR20220144808A (ko) * 2020-02-27 2022-10-27 에이지씨 가부시키가이샤 중공 실리카 입자 및 중공 실리카 입자의 제조 방법
KR102479902B1 (ko) * 2020-06-10 2022-12-21 주식회사 케이씨텍 중공 실리카 입자의 제조방법 및 이를 사용하여 제조된 중공 실리카 입자
CN112029362B (zh) * 2020-08-21 2021-11-30 帝斯曼先达合成树脂(佛山)有限公司 一种核壳结构纳米粒子及增硬水性丙烯酸树脂涂料的制备方法
KR102644010B1 (ko) * 2021-09-03 2024-03-07 주식회사 케이씨텍 표면개질된 중공실리카 및 표면개질된 중공실리카 분산액
CN113881231A (zh) * 2021-11-01 2022-01-04 青岛新材料科技工业园发展有限公司 一种热塑性增强硅胶颗粒及其制备方法和应用

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1059708A (ja) * 1996-08-16 1998-03-03 Asahi Denka Kogyo Kk 変性コロイダルシリカ
JP2005213491A (ja) * 2004-02-02 2005-08-11 Jsr Corp 膜形成用組成物、シリカ系膜およびシリカ系膜の形成方法
JP2008063565A (ja) * 2006-08-08 2008-03-21 Sekisui Chem Co Ltd 光半導体用熱硬化性組成物、光半導体素子用封止剤、光半導体素子用ダイボンド材、光半導体素子用アンダーフィル材及び光半導体素子
JP2008274261A (ja) * 2007-04-06 2008-11-13 Kaneka Corp 中空シリコーン粒子系被膜形成用塗布液、被膜付基材
JP5086710B2 (ja) * 2007-07-06 2012-11-28 昭和電工株式会社 変性オルガノポリシロキサン、その製造方法、それを含む組成物及び発光ダイオード封止用組成物
JP2009024077A (ja) * 2007-07-19 2009-02-05 Kaneka Corp シリコーン系重合体粒子を含有するシリコーン系組成物およびその製造方法
JP2009114365A (ja) * 2007-11-08 2009-05-28 Momentive Performance Materials Japan Kk 光半導体用シリコーン接着剤組成物及びそれを用いた光半導体装置
JP5329905B2 (ja) * 2008-10-16 2013-10-30 株式会社カネカ ポリシロキサン系組成物およびそれから得られる硬化物
JP2010276855A (ja) * 2009-05-28 2010-12-09 Kaneka Corp 光拡散樹脂および該樹脂を用いた発光装置

Also Published As

Publication number Publication date
CN102040224B (zh) 2015-07-15
JP2011089018A (ja) 2011-05-06
KR20110044140A (ko) 2011-04-28
CN102040224A (zh) 2011-05-04

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