JP5558363B2 - 耐摩耗性および指紋除去性に優れたコーティング組成物およびコーティングフィルム - Google Patents
耐摩耗性および指紋除去性に優れたコーティング組成物およびコーティングフィルム Download PDFInfo
- Publication number
- JP5558363B2 JP5558363B2 JP2010535884A JP2010535884A JP5558363B2 JP 5558363 B2 JP5558363 B2 JP 5558363B2 JP 2010535884 A JP2010535884 A JP 2010535884A JP 2010535884 A JP2010535884 A JP 2010535884A JP 5558363 B2 JP5558363 B2 JP 5558363B2
- Authority
- JP
- Japan
- Prior art keywords
- coating
- functional group
- curable functional
- coating film
- coating composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000576 coating method Methods 0.000 title claims description 63
- 239000011248 coating agent Substances 0.000 title claims description 58
- 239000008199 coating composition Substances 0.000 title claims description 25
- 238000005299 abrasion Methods 0.000 title description 6
- 125000000524 functional group Chemical group 0.000 claims description 34
- 150000001875 compounds Chemical class 0.000 claims description 22
- 239000011230 binding agent Substances 0.000 claims description 20
- 229910052731 fluorine Inorganic materials 0.000 claims description 20
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 17
- 239000011737 fluorine Substances 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 17
- 239000002105 nanoparticle Substances 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 13
- -1 isocyanate compound Chemical class 0.000 claims description 12
- 239000002245 particle Substances 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- SDGKUVSVPIIUCF-UHFFFAOYSA-N 2,6-dimethylpiperidine Chemical compound CC1CCCC(C)N1 SDGKUVSVPIIUCF-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 4
- 239000010419 fine particle Substances 0.000 claims description 4
- 150000002734 metacrylic acid derivatives Chemical class 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 229920002554 vinyl polymer Polymers 0.000 claims description 4
- 229920002284 Cellulose triacetate Polymers 0.000 claims description 3
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 claims description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims description 3
- 238000000016 photochemical curing Methods 0.000 claims description 3
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims description 2
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 2
- 239000012948 isocyanate Substances 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 239000000178 monomer Substances 0.000 claims description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 2
- 229920000728 polyester Polymers 0.000 claims description 2
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 description 14
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 10
- 238000011109 contamination Methods 0.000 description 9
- 239000003921 oil Substances 0.000 description 8
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 239000011247 coating layer Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 230000002209 hydrophobic effect Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000007756 gravure coating Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- MYWOJODOMFBVCB-UHFFFAOYSA-N 1,2,6-trimethylphenanthrene Chemical compound CC1=CC=C2C3=CC(C)=CC=C3C=CC2=C1C MYWOJODOMFBVCB-UHFFFAOYSA-N 0.000 description 1
- HSOOIVBINKDISP-UHFFFAOYSA-N 1-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(CCC)OC(=O)C(C)=C HSOOIVBINKDISP-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- GJKGAPPUXSSCFI-UHFFFAOYSA-N 2-Hydroxy-4'-(2-hydroxyethoxy)-2-methylpropiophenone Chemical compound CC(C)(O)C(=O)C1=CC=C(OCCO)C=C1 GJKGAPPUXSSCFI-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- UHFFVFAKEGKNAQ-UHFFFAOYSA-N 2-benzyl-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=CC=C1 UHFFVFAKEGKNAQ-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- PCKZAVNWRLEHIP-UHFFFAOYSA-N 2-hydroxy-1-[4-[[4-(2-hydroxy-2-methylpropanoyl)phenyl]methyl]phenyl]-2-methylpropan-1-one Chemical compound C1=CC(C(=O)C(C)(O)C)=CC=C1CC1=CC=C(C(=O)C(C)(C)O)C=C1 PCKZAVNWRLEHIP-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- RIWRBSMFKVOJMN-UHFFFAOYSA-N 2-methyl-1-phenylpropan-2-ol Chemical compound CC(C)(O)CC1=CC=CC=C1 RIWRBSMFKVOJMN-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- DBCAQXHNJOFNGC-UHFFFAOYSA-N 4-bromo-1,1,1-trifluorobutane Chemical compound FC(F)(F)CCCBr DBCAQXHNJOFNGC-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 239000002635 aromatic organic solvent Substances 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000007766 curtain coating Methods 0.000 description 1
- 150000001924 cycloalkanes Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Substances CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
- B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
- C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/06—Substrate layer characterised by chemical composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Composite Materials (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Paints Or Removers (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
UV硬化型官能基含有バインダー樹脂としてウレタン系アクリレートであるEB1290(Cytec社製)100gと、ペルフルオロ基含有アクリレートとして化学式1の構造を有する物質(XおよびYは各々Fであり、ZはCH3であり、a、eおよびiは各々2であり、b、c、d、fおよびgは各々1であり、hは3である)5g、光開始剤イルガキュア184 5g、表面がメタクリロキシプロピルトリメトキシシランで表面処理された平均粒径20nmのシリカ粒子10g、メチルエチルケトン100gおよびブチルアセテート100gを配合した後、十分に混合されるようにコーティング組成物を攪拌器で1時間程度攪拌した。前記方法により製造されたコーティング組成物をトリアセチルセルロースフィルム上に硬化厚さ10μmになるように2ロールリバースコーティングを行った。コーティングされたフィルムを60℃オーブンで2分間乾燥した後、中圧水銀ランプでUVエネルギが1J/cm2になるように照射し、指紋除去性を有する耐摩耗コーティングフィルムを製造した。
ペルフルオロ基含有アクリレートとして化学式1の構造を有する物質の代わりに、化学式2の構造を有する物質(XはFであり、ZはCH3であり、jは4であり、kおよびnは各々2であり、mは3である)5gを用いたことを除いては、実施例1と同じ方法によってコーティングフィルムを製造した。
ペルフルオロ基含有アクリレートとして化学式1の構造を有する物質の代わりに、化学式3の構造を有するOptool DAC(DAIKIN社製)5gを用いたことを除いては、実施例1と同じ方法によってコーティングフィルムを製造した。
ペルフルオロ基含有アクリレートとして化学式1の構造を有する物質の代わりに、化学式4の構造を有する物質(化学式4のZはCH3であり、PFPEのXおよびYは各々Fであり、a、eおよびiは各々2であり、b、c、d、fおよびgは各々1であり、hは3である)5gを用いたことを除いては、実施例1と同じ方法によってコーティングフィルムを製造した。
ペルフルオロ基含有アクリレートとして化学式1の構造を有する物質の代わりに、化学式9の構造を有する物質(化学式9のZはCH3であり、PFPEのXおよびYは各々Fであり、a、eおよびiは各々2であり、b、c、d、fおよびgは各々1であり、hは3である)5gを用いたことを除いては、実施例1と同じ方法によってコーティングフィルムを製造した。
ナノ微粒子として表面処理された平均粒径20nmのシリカ粒子の代わりに平均粒径14nmのシリカ粒子10gを用い、溶剤としてブチルアセテートの代わりにメタノール100gを用いたことを除いては、実施例3と同じ方法によってコーティングフィルムを製造した。
ナノ微粒子として表面処理された平均粒径20nmのシリカ粒子の代わりに、平均粒径10nmのフッ化マグネシウム粒子を用いたことを除いては、実施例3と同じ方法によってコーティングフィルムを製造した。
ペルフルオロ基含有アクリレートを用いないことを除いては、実施例3と同じ方法によってコーティングフィルムを製造した。
表面処理されたシリカ粒子を用いないことを除いては、実施例3と同じ方法によってコーティングフィルムを製造した。
Claims (15)
- 前記UV硬化型官能基含有バインダーは、アクリレート類、メタクリレート類またはビニル類の多官能性または単官能性のモノマーまたはオリゴマーを含む、請求項1に記載のコーティング組成物。
- 前記ナノ微粒子は、平均粒径が0.5〜50nmである、請求項1または2に記載のコーティング組成物。
- 前記ナノ微粒子は、シリカ、アルミナ、チタニア、ジルコニアおよびフッ化マグネシウムからなる群から選択される、請求項1〜3のいずれか一項に記載のコーティング組成物。
- 前記ナノ微粒子は、シランカップリング剤、エポキシ化合物、水酸基含有化合物およびイソシアネート化合物からなる群から選択された物質を用いることにより表面処理される、請求項1〜4のいずれか一項に記載のコーティング組成物。
- 溶剤をさらに含む、請求項1〜5のいずれか一項に記載のコーティング組成物。
- 請求項1〜6のうちのいずれか一項によるコーティング組成物を用いて形成された、UV硬化型官能基含有バインダー、フッ素系UV硬化型官能基含有化合物、光開始剤およびナノ微粒子を含み、
前記UV硬化型官能基含有バインダー100重量部を基準に、前記フッ素系UV硬化型官能基含有化合物の含有量は0.5〜20重量部であり、前記ナノ微粒子の含有量は0.5〜50重量部であり、前記光開始剤の含有量は1〜20重量部であり、
前記フッ素系UV硬化型官能基含有化合物は、下記化学式2で示される化合物を含むコーティングフィルム。
- フィルムの厚さが0.5〜300μmである、請求項7に記載のコーティングフィルム。
- 前記コーティングフィルムの一面に基材が備えられる、請求項7または8に記載のコーティングフィルム。
- 請求項1〜6のうちのいずれか一項によるコーティング組成物を基材上にコーティングするステップ、およびコーティングされたコーティング組成物を乾燥および光硬化するステップを含むコーティングフィルムの製造方法。
- 前記基材は、ポリエステル、トリアセチルセルロース、オレフィン共重合体およびポリメチルメタクリレートからなる群から選択された材料から形成される、請求項10に記載のコーティングフィルムの製造方法。
- 前記コーティング時の厚さは0.5〜300μmである、請求項10または11に記載のコーティングフィルムの製造方法。
- 前記光硬化は、紫外線照射量0.05〜2J/cm2を用いて行う、請求項10〜12のいずれか一項に記載のコーティングフィルムの製造方法。
- 請求項7〜9のいずれか一項によるコーティングフィルムを含むディスプレイ装置。
- 前記ディスプレイ装置は、液晶ディスプレイ、有機発光ディスプレイ(OLED)、プラズマディスプレイおよび携帯電話ウィンドウからなる群から選択される、請求項14に記載のディスプレイ装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20070122640 | 2007-11-29 | ||
KR10-2007-0122640 | 2007-11-29 | ||
PCT/KR2008/007060 WO2009069974A2 (en) | 2007-11-29 | 2008-11-28 | Coating composition and coating film having enhanced abrasion resistance and fingerprint traces removability |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014064023A Division JP2014159573A (ja) | 2007-11-29 | 2014-03-26 | 耐摩耗性および指紋除去性に優れたコーティング組成物およびコーティングフィルム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011505452A JP2011505452A (ja) | 2011-02-24 |
JP5558363B2 true JP5558363B2 (ja) | 2014-07-23 |
Family
ID=40679154
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010535884A Active JP5558363B2 (ja) | 2007-11-29 | 2008-11-28 | 耐摩耗性および指紋除去性に優れたコーティング組成物およびコーティングフィルム |
JP2014064023A Withdrawn JP2014159573A (ja) | 2007-11-29 | 2014-03-26 | 耐摩耗性および指紋除去性に優れたコーティング組成物およびコーティングフィルム |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2014064023A Withdrawn JP2014159573A (ja) | 2007-11-29 | 2014-03-26 | 耐摩耗性および指紋除去性に優れたコーティング組成物およびコーティングフィルム |
Country Status (8)
Country | Link |
---|---|
US (1) | US8557890B2 (ja) |
EP (1) | EP2215171B1 (ja) |
JP (2) | JP5558363B2 (ja) |
KR (1) | KR101050650B1 (ja) |
CN (1) | CN101878276B (ja) |
PL (1) | PL2215171T3 (ja) |
TW (1) | TWI432538B (ja) |
WO (1) | WO2009069974A2 (ja) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL2215171T3 (pl) * | 2007-11-29 | 2013-12-31 | Lg Chemical Ltd | Kompozycja powlekająca i warstewka powlekająca mające podwyższoną odporność na ścieranie i zdolność do usuwania odcisków palców |
PL2113527T3 (pl) * | 2008-04-28 | 2014-10-31 | Bayer Ip Gmbh | Odkształcalna folia z powłoką utwardzalną radiacyjnie i wykonane z niej kształtki |
KR101041240B1 (ko) * | 2009-02-27 | 2011-06-14 | 주식회사 엘지화학 | 내마모성 및 내오염성이 우수한 코팅 조성물 및 코팅 필름 |
EP2456823A4 (en) | 2009-07-21 | 2012-12-26 | 3M Innovative Properties Co | CURABLE COMPOSITION, METHOD FOR COATING A PHOTO TOOL, AND COATED PHOTO TOOL |
KR101289947B1 (ko) * | 2009-08-17 | 2013-07-26 | (주)엘지하우시스 | 낙서 방지 코팅 조성물, 이를 이용한 코팅 필름 및 이의 제조 방법 |
EP2292339A1 (en) * | 2009-09-07 | 2011-03-09 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Coating method and coating apparatus |
CN102549042B (zh) | 2009-09-16 | 2015-01-28 | 3M创新有限公司 | 氟化涂料和用其制作的底片 |
US8420281B2 (en) * | 2009-09-16 | 2013-04-16 | 3M Innovative Properties Company | Epoxy-functionalized perfluoropolyether polyurethanes |
KR101129258B1 (ko) * | 2009-12-21 | 2012-03-26 | (주)금강엔터프라이즈 | Uv 경화형 코팅 조성물 및 코팅 필름 |
WO2012008757A2 (ko) * | 2010-07-14 | 2012-01-19 | 주식회사 엘지화학 | 내마모성 및 내오염성이 우수한 눈부심 방지 코팅 조성물 및 눈부심 방지 코팅 필름 |
KR101439581B1 (ko) * | 2010-07-22 | 2014-09-11 | 주식회사 엘지화학 | 표면층 및 이의 제조방법 |
KR101477837B1 (ko) * | 2010-08-13 | 2014-12-30 | 주식회사 엘지화학 | 수지 조성물, 이를 이용한 필름 및 이를 포함하는 장치 |
KR101114916B1 (ko) * | 2010-12-27 | 2012-02-14 | 주식회사 엘지화학 | 유기발광소자용 기판 및 그 제조방법 |
KR101470462B1 (ko) * | 2011-02-14 | 2014-12-08 | 주식회사 엘지화학 | 자기 치유 능력이 있는 uv 경화형 코팅 조성물, 코팅 필름 및 코팅 필름의 제조 방법 |
TWI482670B (zh) * | 2011-04-21 | 2015-05-01 | Creating Nano Technologies Inc | 抗指紋膜之製造方法 |
WO2013008645A1 (ja) * | 2011-07-11 | 2013-01-17 | 東レ株式会社 | 成形材料、塗料組成物および成形材料の製造方法 |
CN102504625A (zh) * | 2011-10-29 | 2012-06-20 | 合肥乐凯科技产业有限公司 | 一种防指纹污染透明硬化膜 |
WO2013105429A1 (ja) * | 2012-01-13 | 2013-07-18 | 東レ株式会社 | 成形材料、塗料組成物および成形材料の製造方法 |
KR101411023B1 (ko) * | 2012-04-19 | 2014-06-23 | 제일모직주식회사 | 윈도우 시트 및 이를 포함하는 디스플레이 장치 |
TWI611920B (zh) * | 2012-01-27 | 2018-01-21 | 第一毛織股份有限公司 | 用於窗片之層合物、含有該層合物之窗片以及含有該層合物之顯示裝置 |
WO2013146642A1 (ja) * | 2012-03-30 | 2013-10-03 | Necライティング株式会社 | 光学素子用透明基材及びこれを用いた液晶表示装置用偏光板、有機エレクトロルミネッセンス素子 |
KR101418409B1 (ko) | 2012-05-31 | 2014-07-09 | 주식회사 엘지화학 | 하드코팅 조성물 |
KR101501686B1 (ko) | 2012-05-31 | 2015-03-11 | 주식회사 엘지화학 | 하드코팅 필름 |
KR101379491B1 (ko) | 2012-05-31 | 2014-04-01 | 주식회사 엘지화학 | 하드코팅 필름 및 이의 제조방법 |
US9938185B2 (en) | 2012-07-02 | 2018-04-10 | Owens-Brockway Glass Container Inc. | Antireflective coating for glass containers |
KR101277461B1 (ko) * | 2012-08-22 | 2013-06-27 | (주) 태양기전 | 패널 코팅 방법 |
KR101470465B1 (ko) | 2012-08-23 | 2014-12-08 | 주식회사 엘지화학 | 하드코팅 필름 |
KR101415840B1 (ko) * | 2012-08-23 | 2014-07-09 | 주식회사 엘지화학 | 하드코팅 필름 |
JP6003550B2 (ja) * | 2012-11-07 | 2016-10-05 | 東レ株式会社 | 成形材料および成形材料の製造方法 |
JPWO2014109178A1 (ja) * | 2013-01-09 | 2017-01-19 | 東レ株式会社 | 成型材料 |
WO2014113617A1 (en) | 2013-01-21 | 2014-07-24 | Innovative Finishes LLC | Refurbished component, electronic device including the same, and method of refurbishing a component of an electronic device |
KR101617387B1 (ko) * | 2013-02-26 | 2016-05-02 | 주식회사 엘지화학 | 코팅 조성물 및 이로부터 제조되는 플라스틱 필름 |
EP2966110A4 (en) * | 2013-03-05 | 2016-09-14 | Asahi Glass Co Ltd | FLUOROUS ETHER COMPOUND, COMPOSITION FOR FORMING A HARD COATING LAYER AND ARTICLES WITH A HARD COATING LAYER |
CN103756383B (zh) * | 2013-12-17 | 2016-09-07 | 张家港康得新光电材料有限公司 | 硬化膜用防粘连涂层组合物及相应的双面硬化膜 |
KR101489475B1 (ko) | 2013-12-27 | 2015-02-03 | (주)유니드 | 나노 무기 소재 결정 박막이 기판 표면에 형성된 적층 구조 |
KR101793901B1 (ko) | 2014-11-28 | 2017-11-07 | 희성전자 주식회사 | 방오 하드 코팅 조성물, 이를 이용한 코팅층의 형성 방법 및 하드 코팅층을 갖는 하드 코팅 시트 |
CN104927570A (zh) * | 2015-06-09 | 2015-09-23 | 王俐帧 | 气动元件用耐磨涂料 |
CN104945979A (zh) * | 2015-06-18 | 2015-09-30 | 成都纳硕科技有限公司 | 一种外墙用水性紫外光固化含氟涂料 |
CN104945975A (zh) * | 2015-06-18 | 2015-09-30 | 成都纳硕科技有限公司 | 一种聚碳酸酯板材用水性紫外光固化抗菌含氟涂料 |
CN107849173B (zh) | 2015-07-30 | 2020-10-16 | Agc株式会社 | 含氟化合物、固化性组合物以及固化物 |
CN108431081A (zh) * | 2015-12-22 | 2018-08-21 | 索尔维特殊聚合物意大利有限公司 | 某些(全)氟聚醚聚合物衍生物作为澄清的涂层组合物中的添加剂的用途 |
CN106497299B (zh) * | 2016-10-11 | 2018-11-16 | 东莞市标塑新材料有限公司 | 一种抗菌防指纹uv光固化自洁组合物及其制备方法和应用 |
CN106243874A (zh) * | 2016-10-11 | 2016-12-21 | 安徽卡塔门窗有限公司 | 浴室用铝合金门及其制备方法 |
CN106280814A (zh) * | 2016-10-11 | 2017-01-04 | 安徽卡塔门窗有限公司 | 浴室用铝合金门及其制备方法 |
CN111148778B (zh) | 2017-09-01 | 2023-06-02 | 索尔维特殊聚合物意大利有限公司 | (全)氟聚醚聚合物及其用途 |
JP6512281B1 (ja) | 2017-12-26 | 2019-05-15 | 東洋インキScホールディングス株式会社 | 活性エネルギー線硬化型ハードコート剤および積層体 |
CN112048245A (zh) * | 2019-06-06 | 2020-12-08 | 佳能株式会社 | 物品、光学装置和涂料 |
CN113861844A (zh) | 2020-06-30 | 2021-12-31 | 科思创德国股份有限公司 | 一种水性涂料组合物 |
KR20220069619A (ko) | 2020-11-20 | 2022-05-27 | 삼성전자주식회사 | 조성물, 이로부터 형성된 필름, 표시 장치, 물품 및 물품 제조방법 |
CN113980522A (zh) * | 2021-11-11 | 2022-01-28 | 卡秀万辉(无锡)高新材料有限公司 | 一种持续耐污的紫外光固化涂料及其制备方法 |
WO2023153450A1 (ja) * | 2022-02-09 | 2023-08-17 | Agc株式会社 | 表面処理剤、コーティング液、物品及び物品の製造方法 |
KR20240020737A (ko) * | 2022-08-08 | 2024-02-16 | 현대자동차주식회사 | 불소계 화합물을 포함하는 자동차 내장부품용 내지문오염 필름 및 이의 제조방법 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US158504A (en) * | 1875-01-05 | Improvement in show-cases | ||
JPH0716940A (ja) | 1993-06-23 | 1995-01-20 | Toray Ind Inc | 防汚性を有する光学物品 |
TW526213B (en) * | 2000-08-29 | 2003-04-01 | Daikin Ind Ltd | Curable fluorine-containing polymer, curable resin composition prepared from same and reflection reducing film |
MXPA03002851A (es) | 2000-10-02 | 2003-07-14 | Kimberly Clark Co | Tintas con base de nanoparticula y los metodos para hacer las mismas. |
JP4149924B2 (ja) | 2001-09-11 | 2008-09-17 | スリーエム イノベイティブ プロパティズ カンパニー | 耐汚染性ナノ複合材ハードコートおよびその製造方法 |
DE10217089A1 (de) * | 2002-04-17 | 2003-10-30 | Inst Neue Mat Gemein Gmbh | Transferverfahren zur Herstellung mikrostrukturierter Substrate |
JP2004258348A (ja) * | 2003-02-26 | 2004-09-16 | Konica Minolta Holdings Inc | 防汚処理された光学フィルムおよび該光学フィルムを表面に有する画像表示装置 |
EP1479738A1 (en) * | 2003-05-20 | 2004-11-24 | DSM IP Assets B.V. | Hydrophobic coatings comprising reactive nano-particles |
JP4248347B2 (ja) * | 2003-09-03 | 2009-04-02 | 富士フイルム株式会社 | 皮膜形成用組成物、反射防止膜、偏光板、画像表示装置及び防汚性コーティング組成物及び防汚性物品 |
JP4784723B2 (ja) | 2003-12-24 | 2011-10-05 | Tdk株式会社 | ハードコート剤組成物及びこれを用いた光情報媒体 |
JP4851446B2 (ja) * | 2004-07-01 | 2012-01-11 | スリーエム イノベイティブ プロパティズ カンパニー | ハードコート組成物 |
KR20060009194A (ko) * | 2004-07-21 | 2006-01-31 | 주식회사 코오롱 | 방현성 및 방오성이 우수한 하드코팅 필름 |
JP2006036835A (ja) * | 2004-07-23 | 2006-02-09 | Jsr Corp | 硬化性樹脂組成物及び反射防止膜 |
JP2006231316A (ja) * | 2004-11-15 | 2006-09-07 | Jsr Corp | 積層体の製造方法 |
AU2005322928B2 (en) * | 2004-12-30 | 2011-03-24 | 3M Innovative Properties Company | Stain-resistant fluorochemical compositions |
JP2006206832A (ja) * | 2005-01-31 | 2006-08-10 | Jsr Corp | 積層体の製造方法 |
JP5125507B2 (ja) * | 2005-04-13 | 2013-01-23 | Jsr株式会社 | 樹脂組成物、硬化膜及び積層体 |
JP4726198B2 (ja) * | 2005-04-27 | 2011-07-20 | 日本化薬株式会社 | 感光性樹脂組成物及びその硬化皮膜を有するフィルム |
JP2007145965A (ja) * | 2005-11-28 | 2007-06-14 | Momentive Performance Materials Japan Kk | ハードコート用樹脂組成物 |
WO2007102370A1 (ja) * | 2006-03-02 | 2007-09-13 | Dow Corning Corporation | 高エネルギー線硬化性組成物 |
JP2007277504A (ja) * | 2006-03-15 | 2007-10-25 | Jsr Corp | 硬化性樹脂組成物及び反射防止膜 |
JP4990665B2 (ja) * | 2006-04-05 | 2012-08-01 | 富士フイルム株式会社 | 光学フィルム、偏光板、及び画像表示装置 |
US7407710B2 (en) | 2006-04-14 | 2008-08-05 | 3M Innovative Properties Company | Composition containing fluoroalkyl silicone and hydrosilicone |
JP2010538147A (ja) * | 2007-09-07 | 2010-12-09 | スリーエム イノベイティブ プロパティズ カンパニー | 表面改質高屈折率ナノ粒子を含む自己組織化反射防止コーティング |
PL2215171T3 (pl) * | 2007-11-29 | 2013-12-31 | Lg Chemical Ltd | Kompozycja powlekająca i warstewka powlekająca mające podwyższoną odporność na ścieranie i zdolność do usuwania odcisków palców |
-
2008
- 2008-11-28 PL PL08854979T patent/PL2215171T3/pl unknown
- 2008-11-28 JP JP2010535884A patent/JP5558363B2/ja active Active
- 2008-11-28 US US12/745,061 patent/US8557890B2/en active Active
- 2008-11-28 KR KR1020080120026A patent/KR101050650B1/ko active IP Right Grant
- 2008-11-28 EP EP20080854979 patent/EP2215171B1/en active Active
- 2008-11-28 WO PCT/KR2008/007060 patent/WO2009069974A2/en active Application Filing
- 2008-11-28 CN CN2008801183854A patent/CN101878276B/zh active Active
- 2008-12-01 TW TW97146594A patent/TWI432538B/zh active
-
2014
- 2014-03-26 JP JP2014064023A patent/JP2014159573A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
JP2014159573A (ja) | 2014-09-04 |
EP2215171A2 (en) | 2010-08-11 |
WO2009069974A2 (en) | 2009-06-04 |
CN101878276B (zh) | 2013-08-07 |
CN101878276A (zh) | 2010-11-03 |
PL2215171T3 (pl) | 2013-12-31 |
TW200932848A (en) | 2009-08-01 |
EP2215171B1 (en) | 2013-07-03 |
US20100304113A1 (en) | 2010-12-02 |
US8557890B2 (en) | 2013-10-15 |
KR20090056913A (ko) | 2009-06-03 |
JP2011505452A (ja) | 2011-02-24 |
KR101050650B1 (ko) | 2011-07-19 |
TWI432538B (zh) | 2014-04-01 |
EP2215171A4 (en) | 2011-05-04 |
WO2009069974A3 (en) | 2009-09-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5558363B2 (ja) | 耐摩耗性および指紋除去性に優れたコーティング組成物およびコーティングフィルム | |
JP5972576B2 (ja) | 耐摩耗性および耐汚染性に優れたコーティング組成物およびコーティングフィルム | |
KR101272984B1 (ko) | 내마모성 및 내오염성이 우수한 눈부심 방지 코팅 조성물 및 눈부심 방지 코팅 필름 | |
TWI527859B (zh) | 硬塗膜 | |
TWI520846B (zh) | 硬塗膜及彼之製法 | |
TWI596169B (zh) | 硬塗料組成物 | |
JP5880871B2 (ja) | 含フッ素高分岐ポリマーを含むコーティング用硬化性組成物 | |
KR101289947B1 (ko) | 낙서 방지 코팅 조성물, 이를 이용한 코팅 필름 및 이의 제조 방법 | |
KR101664735B1 (ko) | 지문방지 하드코팅 조성물 및 이를 이용한 지문방지 하드코팅 필름 | |
JP5199237B2 (ja) | 硬化性フルオロアルキルシリコーン組成物 | |
KR101115145B1 (ko) | 불소계 화합물 및 이를 포함하는 코팅 조성물 | |
TWI598418B (zh) | Anti-fingerprint adhesive and method for producing the same, composition for a hard coat film, base material having a hard coat layer and touch panel | |
TW201514259A (zh) | 折射率調整用塗覆材料組成物及其層合體 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20121129 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130227 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20131126 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140326 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20140410 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140508 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140604 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5558363 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |