JP5558088B2 - 粒子光学装置の歪曲を特定するための方法 - Google Patents
粒子光学装置の歪曲を特定するための方法 Download PDFInfo
- Publication number
- JP5558088B2 JP5558088B2 JP2009278580A JP2009278580A JP5558088B2 JP 5558088 B2 JP5558088 B2 JP 5558088B2 JP 2009278580 A JP2009278580 A JP 2009278580A JP 2009278580 A JP2009278580 A JP 2009278580A JP 5558088 B2 JP5558088 B2 JP 5558088B2
- Authority
- JP
- Japan
- Prior art keywords
- image
- distortion
- sub
- images
- identified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims description 35
- 239000002245 particle Substances 0.000 title claims description 35
- 230000003287 optical effect Effects 0.000 claims description 23
- 230000008859 change Effects 0.000 claims description 3
- 239000000523 sample Substances 0.000 description 12
- 239000013078 crystal Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000003325 tomography Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 241000226585 Antennaria plantaginifolia Species 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000012472 biological sample Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- 238000002173 high-resolution transmission electron microscopy Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000005305 interferometry Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 238000013169 thromboelastometry Methods 0.000 description 1
- 238000004627 transmission electron microscopy Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T5/00—Image enhancement or restoration
- G06T5/80—Geometric correction
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T5/00—Image enhancement or restoration
- G06T5/50—Image enhancement or restoration using two or more images, e.g. averaging or subtraction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10056—Microscopic image
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/20—Special algorithmic details
- G06T2207/20021—Dividing image into blocks, subimages or windows
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
- H01J2237/2823—Resolution
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/282—Determination of microscope properties
- H01J2237/2826—Calibration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Image Processing (AREA)
- Geometry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
Description
・アクイジションタイムの減少、
・オブジェクト・ホルダの移動数の減少、
・オブジェクトのための照明時間の減少(これは、また、オブジェクトのダメージ/分解の減少につながる)。いくつかのイメージにおいて、いくつかのサブイメージは、視野の外側に存在する場合があり、この場合には、これを使うことができない点に留意する必要がある。したがって、実際には、イメージのゲインは、N未満となる。
202 リファレンスグリッド
300 イメージ
301 光軸
303 サブイメージ
304 サブイメージ
Claims (7)
- 粒子光学装置の歪曲を特定する方法であって、
前記装置は、
粒子光学軸に沿って粒子のビームを生成するための粒子源と、
オブジェクトを保持するためのオブジェクト・ホルダであって、前記オブジェクト・ホルダに配置されたオブジェクトを平行移動することが可能であるところのオブジェクト・ホルダと、
前記オブジェクトの複数のイメージを形成するためのプロジェクション・システムと、
前記オブジェクトの前記複数のイメージを取得しかつ保存するための検出器と;
を有し、
当該方法は、
オブジェクトを提供するステップと、
第1のイメージを取得するステップと、
前記歪曲を特定するステップと、
を有し、
前記第1のイメージ内で、サブイメージが定義され、第1のサブイメージが前記オブジェクトの小部分を示し、
一連のイメージが取得され、前記オブジェクトは各々の前記取得の間で平行移動され、
前記イメージの間でなされた前記平行移動が特定され、
各々の前記イメージ内で、前記オブジェクトの前記小部分を示しているサブイメージが特定され、
各々の前記サブイメージの相互間に関する前記サブイメージ歪曲が特定され、かつ
各々の前記サブイメージの前記サブイメージ歪曲が、前記イメージの前記歪曲を特定するために用いられる、方法。 - 他のオブジェクトを提供するステップと、
前記他のオブジェクトのイメージを形成するステップと、
前記歪曲に関して、前記他のオブジェクトの前記イメージを修正するステップと、
を更に有する請求項1記載の方法。 - 前記オブジェクトの前記小部分が、1つのイメージの前記粒子光学軸の周囲の中心に置かれ、かつ、前記粒子光学軸と基準点としての前記イメージとの交差に対して前記イメージの前記歪曲が特定される、請求項1または2に記載の方法。
- 前記特定されたサブイメージ歪曲は、前記サブイメージの、第一および第二の方向の拡大率の変化および回転を含み、その全ては基準点と関連する位置の関数として表される、請求項1ないし3のいずれか1項に記載の方法。
- 前記サブイメージ歪曲は、前記イメージ内の位置の関数として前記イメージの前記歪曲を表すテーブルまたは式を構成するために用いられる、請求項1ないし4のいずれか1項に記載の方法。
- 前記サブイメージ歪曲は、前記プロジェクション・システムの異なる拡大率において、および/または、前記粒子のビームを形成する前記粒子の異なるエネルギーにおいて、特定される、請求項1ないし5のいずれか1項に記載の方法。
- 前記複数のイメージのうちの少なくとも2つが複数のサブイメージを有する、請求項1ないし6のいずれか1項に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP08171413A EP2197018A1 (en) | 2008-12-12 | 2008-12-12 | Method for determining distortions in a particle-optical apparatus |
EP08171413.1 | 2008-12-12 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010140899A JP2010140899A (ja) | 2010-06-24 |
JP5558088B2 true JP5558088B2 (ja) | 2014-07-23 |
Family
ID=40564943
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009278580A Active JP5558088B2 (ja) | 2008-12-12 | 2009-12-08 | 粒子光学装置の歪曲を特定するための方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US8447133B2 (ja) |
EP (2) | EP2197018A1 (ja) |
JP (1) | JP5558088B2 (ja) |
CN (1) | CN101858821B (ja) |
Families Citing this family (76)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB0718706D0 (en) | 2007-09-25 | 2007-11-07 | Creative Physics Ltd | Method and apparatus for reducing laser speckle |
EP2197018A1 (en) | 2008-12-12 | 2010-06-16 | FEI Company | Method for determining distortions in a particle-optical apparatus |
US9335604B2 (en) | 2013-12-11 | 2016-05-10 | Milan Momcilo Popovich | Holographic waveguide display |
US11726332B2 (en) | 2009-04-27 | 2023-08-15 | Digilens Inc. | Diffractive projection apparatus |
US11300795B1 (en) | 2009-09-30 | 2022-04-12 | Digilens Inc. | Systems for and methods of using fold gratings coordinated with output couplers for dual axis expansion |
US11320571B2 (en) | 2012-11-16 | 2022-05-03 | Rockwell Collins, Inc. | Transparent waveguide display providing upper and lower fields of view with uniform light extraction |
US10795160B1 (en) | 2014-09-25 | 2020-10-06 | Rockwell Collins, Inc. | Systems for and methods of using fold gratings for dual axis expansion |
US8233204B1 (en) | 2009-09-30 | 2012-07-31 | Rockwell Collins, Inc. | Optical displays |
US8659826B1 (en) | 2010-02-04 | 2014-02-25 | Rockwell Collins, Inc. | Worn display system and method without requiring real time tracking for boresight precision |
US9274349B2 (en) | 2011-04-07 | 2016-03-01 | Digilens Inc. | Laser despeckler based on angular diversity |
US10670876B2 (en) | 2011-08-24 | 2020-06-02 | Digilens Inc. | Waveguide laser illuminator incorporating a despeckler |
WO2013027004A1 (en) | 2011-08-24 | 2013-02-28 | Milan Momcilo Popovich | Wearable data display |
WO2016020630A2 (en) | 2014-08-08 | 2016-02-11 | Milan Momcilo Popovich | Waveguide laser illuminator incorporating a despeckler |
US9715067B1 (en) | 2011-09-30 | 2017-07-25 | Rockwell Collins, Inc. | Ultra-compact HUD utilizing waveguide pupil expander with surface relief gratings in high refractive index materials |
US8937772B1 (en) | 2011-09-30 | 2015-01-20 | Rockwell Collins, Inc. | System for and method of stowing HUD combiners |
US8903207B1 (en) | 2011-09-30 | 2014-12-02 | Rockwell Collins, Inc. | System for and method of extending vertical field of view in head up display utilizing a waveguide combiner |
US8634139B1 (en) | 2011-09-30 | 2014-01-21 | Rockwell Collins, Inc. | System for and method of catadioptric collimation in a compact head up display (HUD) |
US9599813B1 (en) | 2011-09-30 | 2017-03-21 | Rockwell Collins, Inc. | Waveguide combiner system and method with less susceptibility to glare |
US8749890B1 (en) | 2011-09-30 | 2014-06-10 | Rockwell Collins, Inc. | Compact head up display (HUD) for cockpits with constrained space envelopes |
US9366864B1 (en) | 2011-09-30 | 2016-06-14 | Rockwell Collins, Inc. | System for and method of displaying information without need for a combiner alignment detector |
EP2584584A1 (en) | 2011-10-19 | 2013-04-24 | FEI Company | Method for adjusting a STEM equipped with an aberration corrector |
WO2013102759A2 (en) | 2012-01-06 | 2013-07-11 | Milan Momcilo Popovich | Contact image sensor using switchable bragg gratings |
CN104272096B (zh) | 2012-03-08 | 2016-12-14 | 阿普菲弗有限责任公司 | 基于高空间分辨率测量材料应变的系统及方法 |
US8830588B1 (en) | 2012-03-28 | 2014-09-09 | Rockwell Collins, Inc. | Reflector and cover glass for substrate guided HUD |
US9523852B1 (en) | 2012-03-28 | 2016-12-20 | Rockwell Collins, Inc. | Micro collimator system and method for a head up display (HUD) |
CN106125308B (zh) | 2012-04-25 | 2019-10-25 | 罗克韦尔柯林斯公司 | 用于显示图像的装置和方法 |
EP2704177B1 (en) | 2012-09-04 | 2014-11-26 | Fei Company | Method of investigating and correcting aberrations in a charged-particle lens system |
US9933684B2 (en) * | 2012-11-16 | 2018-04-03 | Rockwell Collins, Inc. | Transparent waveguide display providing upper and lower fields of view having a specific light output aperture configuration |
DE102013101445B9 (de) * | 2013-02-14 | 2022-01-05 | Carl Zeiss Smt Gmbh | Verfahren zur Ermittlung von Verzeichnungseigenschaften eines optischen Systems in einer Messvorrichtung für die Mikrolithographie |
US9674413B1 (en) | 2013-04-17 | 2017-06-06 | Rockwell Collins, Inc. | Vision system and method having improved performance and solar mitigation |
WO2015015138A1 (en) | 2013-07-31 | 2015-02-05 | Milan Momcilo Popovich | Method and apparatus for contact image sensing |
US9244281B1 (en) | 2013-09-26 | 2016-01-26 | Rockwell Collins, Inc. | Display system and method using a detached combiner |
US10732407B1 (en) | 2014-01-10 | 2020-08-04 | Rockwell Collins, Inc. | Near eye head up display system and method with fixed combiner |
US20190287759A1 (en) * | 2014-01-27 | 2019-09-19 | Mochii, Inc. (D/B/A Voxa) | Transmission Electron Microscopy |
US9519089B1 (en) | 2014-01-30 | 2016-12-13 | Rockwell Collins, Inc. | High performance volume phase gratings |
US9244280B1 (en) | 2014-03-25 | 2016-01-26 | Rockwell Collins, Inc. | Near eye display system and method for display enhancement or redundancy |
EP2966668B1 (en) | 2014-07-10 | 2016-10-12 | Fei Company | Method of calibrating a scanning transmission charged-particle microscope |
US10359736B2 (en) | 2014-08-08 | 2019-07-23 | Digilens Inc. | Method for holographic mastering and replication |
WO2016042283A1 (en) | 2014-09-19 | 2016-03-24 | Milan Momcilo Popovich | Method and apparatus for generating input images for holographic waveguide displays |
US9715110B1 (en) | 2014-09-25 | 2017-07-25 | Rockwell Collins, Inc. | Automotive head up display (HUD) |
US10088675B1 (en) | 2015-05-18 | 2018-10-02 | Rockwell Collins, Inc. | Turning light pipe for a pupil expansion system and method |
CN107873086B (zh) | 2015-01-12 | 2020-03-20 | 迪吉伦斯公司 | 环境隔离的波导显示器 |
US9632226B2 (en) | 2015-02-12 | 2017-04-25 | Digilens Inc. | Waveguide grating device |
JP7294806B2 (ja) * | 2015-03-23 | 2023-06-20 | テックインサイツ インコーポレイテッド | イメージング装置における歪み補正に関する方法、システム及び装置 |
US10247943B1 (en) | 2015-05-18 | 2019-04-02 | Rockwell Collins, Inc. | Head up display (HUD) using a light pipe |
US10126552B2 (en) | 2015-05-18 | 2018-11-13 | Rockwell Collins, Inc. | Micro collimator system and method for a head up display (HUD) |
US11366316B2 (en) | 2015-05-18 | 2022-06-21 | Rockwell Collins, Inc. | Head up display (HUD) using a light pipe |
US10108010B2 (en) | 2015-06-29 | 2018-10-23 | Rockwell Collins, Inc. | System for and method of integrating head up displays and head down displays |
EP3121637B1 (de) * | 2015-07-24 | 2021-09-01 | Leica Instruments (Singapore) Pte. Ltd. | Mikroskop und verfahren zum erzeugen eines kombinierten bildes aus mehreren einzelbildern eines objekts |
KR101714213B1 (ko) * | 2015-09-09 | 2017-03-09 | 현대오트론 주식회사 | 렌즈 영상 왜곡 보정 장치 |
WO2017060665A1 (en) | 2015-10-05 | 2017-04-13 | Milan Momcilo Popovich | Waveguide display |
US10598932B1 (en) | 2016-01-06 | 2020-03-24 | Rockwell Collins, Inc. | Head up display for integrating views of conformally mapped symbols and a fixed image source |
CN105744243B (zh) * | 2016-01-21 | 2017-08-29 | 上海应用技术学院 | 基于切交点特征实现的多投影拼接中全自动几何校正方法 |
EP3433659A1 (en) | 2016-03-24 | 2019-01-30 | DigiLens, Inc. | Method and apparatus for providing a polarization selective holographic waveguide device |
WO2017178781A1 (en) | 2016-04-11 | 2017-10-19 | GRANT, Alastair, John | Holographic waveguide apparatus for structured light projection |
CN106093108B (zh) * | 2016-05-19 | 2018-10-16 | 南京航空航天大学 | 基于间隙缺陷识别的单向纤维增韧复合材料等效导热系数预估方法 |
GB2555643A (en) * | 2016-11-08 | 2018-05-09 | Nokia Technologies Oy | Determining an intersection location of an optical axis of a lens with a camera sensor |
CN106500969B (zh) * | 2016-11-17 | 2019-07-26 | 深圳Tcl新技术有限公司 | 显示屏均匀性测试方法及显示屏均匀性测试系统 |
EP3548939A4 (en) | 2016-12-02 | 2020-11-25 | DigiLens Inc. | UNIFORM OUTPUT LIGHTING WAVEGUIDE DEVICE |
US10545346B2 (en) | 2017-01-05 | 2020-01-28 | Digilens Inc. | Wearable heads up displays |
US10295824B2 (en) | 2017-01-26 | 2019-05-21 | Rockwell Collins, Inc. | Head up display with an angled light pipe |
DE102017212214A1 (de) * | 2017-07-17 | 2019-01-17 | Carl Zeiss Microscopy Gmbh | Verfahren zum Aufzeichnen eines Bildes unter Verwendung eines Teilchenmikroskops und Teilchenmikroskop |
WO2019049260A1 (ja) * | 2017-09-07 | 2019-03-14 | 株式会社日立ハイテクノロジーズ | 画像処理装置 |
CN111386495B (zh) | 2017-10-16 | 2022-12-09 | 迪吉伦斯公司 | 用于倍增像素化显示器的图像分辨率的系统和方法 |
CN108022217B (zh) * | 2017-11-26 | 2021-07-30 | 合肥赛为智能有限公司 | 一种空中拍摄形变调整方法 |
JP7404243B2 (ja) | 2018-01-08 | 2023-12-25 | ディジレンズ インコーポレイテッド | 導波管セル内のホログラフィック格子の高スループット記録のためのシステムおよび方法 |
US10914950B2 (en) | 2018-01-08 | 2021-02-09 | Digilens Inc. | Waveguide architectures and related methods of manufacturing |
WO2020023779A1 (en) | 2018-07-25 | 2020-01-30 | Digilens Inc. | Systems and methods for fabricating a multilayer optical structure |
DE102018124401A1 (de) | 2018-10-02 | 2020-04-02 | Carl Zeiss Smt Gmbh | Verfahren zum Aufnehmen eines Bildes mit einem Teilchenmikroskop |
JP2022520472A (ja) | 2019-02-15 | 2022-03-30 | ディジレンズ インコーポレイテッド | 統合された格子を使用してホログラフィック導波管ディスプレイを提供するための方法および装置 |
CN113728258A (zh) | 2019-03-12 | 2021-11-30 | 迪吉伦斯公司 | 全息波导背光及相关制造方法 |
US20200311886A1 (en) * | 2019-03-28 | 2020-10-01 | Carl Zeiss Microscopy Gmbh | Method for determining an image recording aberration |
KR20220016990A (ko) | 2019-06-07 | 2022-02-10 | 디지렌즈 인코포레이티드. | 투과 및 반사 격자를 통합하는 도파관 및 관련 제조 방법 |
CN114341729A (zh) | 2019-07-29 | 2022-04-12 | 迪吉伦斯公司 | 用于使像素化显示器的图像分辨率和视场倍增的方法和设备 |
EP4010872A4 (en) * | 2019-08-09 | 2023-08-30 | The Board of Regents of the University of Texas System | PROCESS FOR HIGH-PERFORMANCE ELECTRON MICROSCOPY |
WO2021041949A1 (en) | 2019-08-29 | 2021-03-04 | Digilens Inc. | Evacuating bragg gratings and methods of manufacturing |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL9100294A (nl) * | 1991-02-20 | 1992-09-16 | Philips Nv | Geladen deeltjesbundelinrichting. |
DE69402283T2 (de) * | 1993-05-21 | 1997-09-18 | Philips Electronics Nv | Energiefilter mit Korrektur von chromatischen Aberrationen zweiter ordnung |
DE69402281T2 (de) * | 1993-09-17 | 1997-09-04 | Essilor Int | Verfahren und Gerät zur absoluten Messung der geometrischen oder optischen Struktur eines optischen Bestandteiles |
EP0840939B1 (en) * | 1996-05-21 | 2005-08-03 | Fei Company | Correction device for the correction of lens aberrations in particle-optical apparatus |
US5627373A (en) * | 1996-06-17 | 1997-05-06 | Hewlett-Packard Company | Automatic electron beam alignment and astigmatism correction in scanning electron microscope |
EP0868739B1 (en) * | 1996-09-20 | 2005-06-01 | Fei Company | Correction device for correcting chromatic aberration in particle-optical apparatus |
EP0981829B1 (en) * | 1997-11-20 | 2008-01-30 | Fei Company | Electrostatic device for correcting chromatic aberration in a particle-optical apparatus |
JP2001511303A (ja) * | 1997-12-11 | 2001-08-07 | フィリップス エレクトロン オプティクス ビー ヴィ | 粒子−光学装置における球面収差補正用の補正デバイス |
EP0962025B1 (en) * | 1997-12-22 | 2004-03-31 | Fei Company | Correction device for correcting chromatic aberration in particle-optical apparatus |
JP2001274973A (ja) * | 2000-03-24 | 2001-10-05 | Sanyo Electric Co Ltd | 顕微鏡画像合成装置、顕微鏡画像合成方法、顕微鏡画像合成処理プログラムを記録したコンピュータ読み取り可能な記録媒体 |
US6552340B1 (en) * | 2000-10-12 | 2003-04-22 | Nion Co. | Autoadjusting charged-particle probe-forming apparatus |
JP3986260B2 (ja) * | 2001-01-19 | 2007-10-03 | 株式会社東芝 | 欠陥検査装置及びそれを用いたデバイス製造方法 |
AU2002358245A1 (en) | 2001-10-10 | 2003-04-22 | Applied Materials Isreal Limited | Method and device for aligning a charged particle beam column |
JP3968421B2 (ja) * | 2002-07-01 | 2007-08-29 | 独立行政法人産業技術総合研究所 | 電子顕微鏡観察像の画像処理方法および画像処理プログラム並びに記録媒体 |
JP5373251B2 (ja) * | 2005-04-05 | 2013-12-18 | エフ イー アイ カンパニ | 収差補正手段を備える粒子光学装置 |
NL1029847C2 (nl) * | 2005-09-01 | 2007-03-05 | Fei Co | Werkwijze voor het bepalen van lensfouten in een deeltjes-optisch apparaat. |
EP1783811A3 (en) * | 2005-11-02 | 2008-02-27 | FEI Company | Corrector for the correction of chromatic aberrations in a particle-optical apparatus |
JP4790567B2 (ja) | 2005-11-30 | 2011-10-12 | 日本電子株式会社 | ロンチグラムを用いた収差測定方法及び収差補正方法及び電子顕微鏡 |
EP1796130A1 (en) * | 2005-12-06 | 2007-06-13 | FEI Company | Method for determining the aberration coefficients of the aberration function of a particle-optical lens. |
JP4801518B2 (ja) * | 2006-07-07 | 2011-10-26 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微方法および荷電粒子線装置 |
JP5134804B2 (ja) * | 2006-10-06 | 2013-01-30 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡および走査電子顕微鏡像の歪み校正 |
JP4891788B2 (ja) * | 2007-01-15 | 2012-03-07 | 日本電子株式会社 | 電子顕微鏡像の歪み補正方法及び輝度補正方法 |
JP5223208B2 (ja) * | 2007-03-01 | 2013-06-26 | 株式会社日立製作所 | 透過型電子顕微鏡 |
JP5129509B2 (ja) * | 2007-05-14 | 2013-01-30 | 株式会社日立ハイテクノロジーズ | 透過型電子顕微鏡及び撮影方法 |
EP2197018A1 (en) | 2008-12-12 | 2010-06-16 | FEI Company | Method for determining distortions in a particle-optical apparatus |
-
2008
- 2008-12-12 EP EP08171413A patent/EP2197018A1/en not_active Withdrawn
-
2009
- 2009-12-08 JP JP2009278580A patent/JP5558088B2/ja active Active
- 2009-12-11 EP EP09178788A patent/EP2197017A3/en not_active Withdrawn
- 2009-12-11 US US12/636,592 patent/US8447133B2/en active Active
- 2009-12-11 CN CN200910260522.4A patent/CN101858821B/zh active Active
-
2013
- 2013-03-13 US US13/799,223 patent/US8885973B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20100246993A1 (en) | 2010-09-30 |
EP2197017A3 (en) | 2011-01-26 |
US8447133B2 (en) | 2013-05-21 |
US20130266240A1 (en) | 2013-10-10 |
CN101858821B (zh) | 2014-03-26 |
JP2010140899A (ja) | 2010-06-24 |
US8885973B2 (en) | 2014-11-11 |
CN101858821A (zh) | 2010-10-13 |
EP2197017A2 (en) | 2010-06-16 |
EP2197018A1 (en) | 2010-06-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5558088B2 (ja) | 粒子光学装置の歪曲を特定するための方法 | |
US11170483B2 (en) | Sample observation device and sample observation method | |
Britton et al. | Factors affecting the accuracy of high resolution electron backscatter diffraction when using simulated patterns | |
US7633064B2 (en) | Electric charged particle beam microscopy and electric charged particle beam microscope | |
EP1804272B1 (en) | Method for determining the aberration coefficients of the aberration function of a particle-opticle lens. | |
US8692196B2 (en) | Method of use for a multipole detector for a transmission electron microscope | |
JP5080657B2 (ja) | 走査電子顕微鏡 | |
JP2003014667A (ja) | 電子線を用いた観察装置及び観察方法 | |
JP2016212349A (ja) | 3次元情報取得装置、及び、3次元情報取得方法 | |
JP5106627B2 (ja) | 回折像取得方法、及び荷電粒子線装置 | |
US11728130B2 (en) | Method of recording an image using a particle microscope | |
JP2019207403A (ja) | オーバービュー画像を提供する方法 | |
JP2006153837A (ja) | 走査型電子顕微鏡及びそれを用いたパターン計測方法並びに走査型電子顕微鏡の機差補正装置 | |
JP2006153894A (ja) | 電子線を用いた観察装置及び観察方法 | |
BÁRCENA‐GONZÁLEZ et al. | Strain mapping accuracy improvement using super‐resolution techniques | |
US10152785B2 (en) | Positional error correction in a tomographic imaging apparatus | |
JP6163063B2 (ja) | 走査透過電子顕微鏡及びその収差測定方法 | |
US11545337B2 (en) | Scanning transmission electron microscope and adjustment method of optical system | |
JP4409850B2 (ja) | 三次元座標測定装置及び方法 | |
JP4409861B2 (ja) | 三次元座標測定装置及び方法 | |
TWI742524B (zh) | 電子束裝置及圖像處理方法 | |
Postek et al. | Nanomanufacturing concerns about measurements made in the SEM Part V: dealing with noise | |
Rouwane et al. | High resolution and large field of view imaging using a stitching procedure coupled with distortion corrections |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20121204 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131126 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140225 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20140513 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20140604 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5558088 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |