JP5497647B2 - ワーク搬送装置 - Google Patents

ワーク搬送装置 Download PDF

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Publication number
JP5497647B2
JP5497647B2 JP2010528299A JP2010528299A JP5497647B2 JP 5497647 B2 JP5497647 B2 JP 5497647B2 JP 2010528299 A JP2010528299 A JP 2010528299A JP 2010528299 A JP2010528299 A JP 2010528299A JP 5497647 B2 JP5497647 B2 JP 5497647B2
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JP
Japan
Prior art keywords
workpiece
shaft
drive
transmission
workpiece transfer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010528299A
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English (en)
Japanese (ja)
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JP2011502211A (ja
JP2011502211A5 (enExample
Inventor
エッサー，シュテファン
ツェーヒ，マルティン
Original Assignee
エルリコン トレーディング アクチェンゲゼルシャフト，トリューブバハ
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Application filed by エルリコン トレーディング アクチェンゲゼルシャフト，トリューブバハ filed Critical エルリコン トレーディング アクチェンゲゼルシャフト，トリューブバハ
Publication of JP2011502211A publication Critical patent/JP2011502211A/ja
Publication of JP2011502211A5 publication Critical patent/JP2011502211A5/ja
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/64—Movable or adjustable work or tool supports characterised by the purpose of the movement
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H21/00—Gearings comprising primarily only links or levers, with or without slides
    • F16H21/10—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane
    • F16H21/12—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion
    • F16H21/14—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion by means of cranks, eccentrics, or like members fixed to one rotary member and guided along tracks on the other
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
    • H10P72/32—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations
    • H10P72/3212—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips or lead frames

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Retarders (AREA)
  • Gear Transmission (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Specific Conveyance Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Agricultural Machines (AREA)
  • Soil Working Implements (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
JP2010528299A 2007-10-08 2008-10-02 ワーク搬送装置 Active JP5497647B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07405302A EP2048263B1 (de) 2007-10-08 2007-10-08 Werkstückträgereinrichtung
EP07405302.6 2007-10-08
PCT/EP2008/008349 WO2009046928A1 (en) 2007-10-08 2008-10-02 Workpiece carrier device

Publications (3)

Publication Number Publication Date
JP2011502211A JP2011502211A (ja) 2011-01-20
JP2011502211A5 JP2011502211A5 (enExample) 2011-11-24
JP5497647B2 true JP5497647B2 (ja) 2014-05-21

Family

ID=38982780

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010528299A Active JP5497647B2 (ja) 2007-10-08 2008-10-02 ワーク搬送装置

Country Status (14)

Country Link
US (2) US8596626B2 (enExample)
EP (2) EP2048263B1 (enExample)
JP (1) JP5497647B2 (enExample)
KR (1) KR20100071057A (enExample)
CN (1) CN101827955B (enExample)
AT (1) ATE503858T1 (enExample)
BR (1) BRPI0818592A2 (enExample)
DE (1) DE502007006849D1 (enExample)
ES (1) ES2362016T3 (enExample)
MX (1) MX2010003727A (enExample)
PL (2) PL2048263T3 (enExample)
RU (1) RU2485211C2 (enExample)
TW (1) TWI481448B (enExample)
WO (1) WO2009046928A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2362016T3 (es) * 2007-10-08 2011-06-27 Oerlikon Trading Ag, Trübbach Dispositivo portapieza.
DE102010001218A1 (de) 2010-01-26 2011-07-28 Esser, Stefan, Dr.-Ing., 52072 Substratteller und Beschichtungsanlage zum Beschichten von Substraten
SG10201601693VA (en) * 2011-03-17 2016-04-28 Sulzer Metco Ag Component manipulator for the dynamic positioning of a substrate, coating method, as well as use of a component manipulator
WO2013086339A2 (en) * 2011-12-08 2013-06-13 Praxair S.T. Technology, Inc. Multifuntion tooling fixture assembly for use in a coating related operations
RU2625698C1 (ru) * 2016-08-29 2017-07-18 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" (ФГУП "ВИАМ") Способ нанесения защитных покрытий и устройство для его осуществления
CN107740063B (zh) * 2017-11-16 2024-07-23 东莞市赢心科技有限公司 真空镀铝设备用工件承载结构
KR101869401B1 (ko) * 2018-01-04 2018-07-20 홍성신 초정밀 선반의 공작물 자동 교환장치
RU2688353C1 (ru) * 2018-08-09 2019-05-21 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") Устройство перемещения и вращения подложкодержателя
DE102018126862A1 (de) 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung und Beschichtungsanordnung
DE102019110158A1 (de) * 2019-04-17 2020-10-22 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung
WO2020225385A1 (en) 2019-05-07 2020-11-12 Oerlikon Surface Solutions Ag, Pfäffikon Movable work piece carrier device for holding work pieces to be treated
US12447491B2 (en) 2019-07-26 2025-10-21 Oerlikon Surface Solutions Ag, Pfäffikon Fixture to be used in PVD processes for cylindrical, elongated substrates
CN114271649B (zh) * 2021-12-27 2022-11-25 西南民族大学 一种艺术作品展示设备

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU370279A1 (ru) * 1969-08-21 1973-02-15 УСТРОЙСТВО дл ТРАНСПОРТИРОВКИ и СМЕНЫ ПОДЛОЖЕК в ВАКУУМНЫХ УСТАНОВКАХ
JPH01288652A (ja) * 1988-05-17 1989-11-20 Komatsu Ltd 減速機
SU1828669A3 (ru) * 1990-11-13 1995-05-27 Владимир Васильевич Кульпинов Устройство для обработки изделий в вакууме
DE19803278C2 (de) 1998-01-29 2001-02-01 Bosch Gmbh Robert Werkstückträger und dessen Verwendung zur Behandlung und Beschichtung von Werkstücken
EP1153155B1 (de) 1998-12-15 2005-01-19 Balzers Aktiengesellschaft Planetensystem-werkstückträger und verfahren zur oberflächenbehandlung von werkstücken
US6749764B1 (en) * 2000-11-14 2004-06-15 Tru-Si Technologies, Inc. Plasma processing comprising three rotational motions of an article being processed
DE10308471B4 (de) 2003-02-20 2005-03-24 Hensoldt Ag Beschichtungsanlage zum Beschichten von Substraten für optische Komponenten
CN1865495A (zh) * 2005-05-20 2006-11-22 中国科学院半导体研究所 金属有机物化学气相淀积设备反应室中的公转自转机构
PL1917380T3 (pl) * 2005-08-29 2009-08-31 Oerlikon Trading Ag Urządzenie służące do chwytania przedmiotu poddawanego obróbce
US7988787B2 (en) * 2007-08-27 2011-08-02 Caterpillar Inc. Workpiece support system and method
ES2362016T3 (es) * 2007-10-08 2011-06-27 Oerlikon Trading Ag, Trübbach Dispositivo portapieza.

Also Published As

Publication number Publication date
JP2011502211A (ja) 2011-01-20
US20140008857A1 (en) 2014-01-09
TWI481448B (zh) 2015-04-21
EP2048263B1 (de) 2011-03-30
MX2010003727A (es) 2010-04-21
WO2009046928A1 (en) 2009-04-16
ES2362016T3 (es) 2011-06-27
US8783673B2 (en) 2014-07-22
PL2048263T3 (pl) 2011-09-30
CN101827955B (zh) 2012-11-07
US8596626B2 (en) 2013-12-03
ATE503858T1 (de) 2011-04-15
EP2048263A1 (de) 2009-04-15
PL2336387T3 (pl) 2014-01-31
DE502007006849D1 (de) 2011-05-12
EP2336387A1 (de) 2011-06-22
TW200936249A (en) 2009-09-01
EP2336387B1 (de) 2013-09-04
RU2010113596A (ru) 2011-11-20
RU2485211C2 (ru) 2013-06-20
BRPI0818592A2 (pt) 2017-06-13
CN101827955A (zh) 2010-09-08
KR20100071057A (ko) 2010-06-28
US20100270722A1 (en) 2010-10-28

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