PL2336387T3 - Urządzenie nośne do przedmiotów obrabianych - Google Patents

Urządzenie nośne do przedmiotów obrabianych

Info

Publication number
PL2336387T3
PL2336387T3 PL11405237T PL11405237T PL2336387T3 PL 2336387 T3 PL2336387 T3 PL 2336387T3 PL 11405237 T PL11405237 T PL 11405237T PL 11405237 T PL11405237 T PL 11405237T PL 2336387 T3 PL2336387 T3 PL 2336387T3
Authority
PL
Poland
Prior art keywords
toothing
transmission
mount device
workpiece mount
mount
Prior art date
Application number
PL11405237T
Other languages
English (en)
Polish (pl)
Inventor
Stefan Esser
Martin Zäch
Original Assignee
Oerlikon Trading Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oerlikon Trading Ag filed Critical Oerlikon Trading Ag
Publication of PL2336387T3 publication Critical patent/PL2336387T3/pl

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/64Movable or adjustable work or tool supports characterised by the purpose of the movement
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16HGEARING
    • F16H21/00Gearings comprising primarily only links or levers, with or without slides
    • F16H21/10Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane
    • F16H21/12Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion
    • F16H21/14Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion by means of cranks, eccentrics, or like members fixed to one rotary member and guided along tracks on the other
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Retarders (AREA)
  • Gear Transmission (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Specific Conveyance Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Agricultural Machines (AREA)
  • Soil Working Implements (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
PL11405237T 2007-10-08 2007-10-08 Urządzenie nośne do przedmiotów obrabianych PL2336387T3 (pl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07405302A EP2048263B1 (de) 2007-10-08 2007-10-08 Werkstückträgereinrichtung
EP11405237.6A EP2336387B1 (de) 2007-10-08 2007-10-08 Werkstückträgereinrichtung

Publications (1)

Publication Number Publication Date
PL2336387T3 true PL2336387T3 (pl) 2014-01-31

Family

ID=38982780

Family Applications (2)

Application Number Title Priority Date Filing Date
PL11405237T PL2336387T3 (pl) 2007-10-08 2007-10-08 Urządzenie nośne do przedmiotów obrabianych
PL07405302T PL2048263T3 (pl) 2007-10-08 2007-10-08 Urządzenie nośne do przedmiotów obrabianych

Family Applications After (1)

Application Number Title Priority Date Filing Date
PL07405302T PL2048263T3 (pl) 2007-10-08 2007-10-08 Urządzenie nośne do przedmiotów obrabianych

Country Status (14)

Country Link
US (2) US8596626B2 (enExample)
EP (2) EP2336387B1 (enExample)
JP (1) JP5497647B2 (enExample)
KR (1) KR20100071057A (enExample)
CN (1) CN101827955B (enExample)
AT (1) ATE503858T1 (enExample)
BR (1) BRPI0818592A2 (enExample)
DE (1) DE502007006849D1 (enExample)
ES (1) ES2362016T3 (enExample)
MX (1) MX2010003727A (enExample)
PL (2) PL2336387T3 (enExample)
RU (1) RU2485211C2 (enExample)
TW (1) TWI481448B (enExample)
WO (1) WO2009046928A1 (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2336387B1 (de) * 2007-10-08 2013-09-04 Oerlikon Trading AG, Trübbach Werkstückträgereinrichtung
DE102010001218A1 (de) 2010-01-26 2011-07-28 Esser, Stefan, Dr.-Ing., 52072 Substratteller und Beschichtungsanlage zum Beschichten von Substraten
SG184626A1 (en) * 2011-03-17 2012-10-30 Sulzer Metco Ag Component manipulator for the dynamic positioning of a substrate, coating method, as well as use of a component manipulator
CA2858188C (en) * 2011-12-08 2018-03-06 Praxair S.T. Technology, Inc. Multifunction tooling fixture assembly for use in a coating related operations
RU2625698C1 (ru) * 2016-08-29 2017-07-18 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" (ФГУП "ВИАМ") Способ нанесения защитных покрытий и устройство для его осуществления
CN107740063B (zh) * 2017-11-16 2024-07-23 东莞市赢心科技有限公司 真空镀铝设备用工件承载结构
KR101869401B1 (ko) * 2018-01-04 2018-07-20 홍성신 초정밀 선반의 공작물 자동 교환장치
RU2688353C1 (ru) * 2018-08-09 2019-05-21 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") Устройство перемещения и вращения подложкодержателя
DE102018126862A1 (de) 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung und Beschichtungsanordnung
DE102019110158A1 (de) * 2019-04-17 2020-10-22 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung
MX2021013562A (es) 2019-05-07 2021-12-10 Oerlikon Surface Solutions Ag Pfaeffikon Dispositivo portador de piezas de trabajo movil para sujetar piezas de trabajo que se van a tratar.
US12447491B2 (en) 2019-07-26 2025-10-21 Oerlikon Surface Solutions Ag, Pfäffikon Fixture to be used in PVD processes for cylindrical, elongated substrates
CN114271649B (zh) * 2021-12-27 2022-11-25 西南民族大学 一种艺术作品展示设备

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU370279A1 (ru) * 1969-08-21 1973-02-15 УСТРОЙСТВО дл ТРАНСПОРТИРОВКИ и СМЕНЫ ПОДЛОЖЕК в ВАКУУМНЫХ УСТАНОВКАХ
JPH01288652A (ja) * 1988-05-17 1989-11-20 Komatsu Ltd 減速機
SU1828669A3 (ru) * 1990-11-13 1995-05-27 Владимир Васильевич Кульпинов Устройство для обработки изделий в вакууме
DE19803278C2 (de) 1998-01-29 2001-02-01 Bosch Gmbh Robert Werkstückträger und dessen Verwendung zur Behandlung und Beschichtung von Werkstücken
JP4614538B2 (ja) * 1998-12-15 2011-01-19 エリコン・トレーディング・アクチェンゲゼルシャフト,トリュープバッハ 真空処理遊星システム工作物キャリヤ
US6749764B1 (en) * 2000-11-14 2004-06-15 Tru-Si Technologies, Inc. Plasma processing comprising three rotational motions of an article being processed
DE10308471B4 (de) 2003-02-20 2005-03-24 Hensoldt Ag Beschichtungsanlage zum Beschichten von Substraten für optische Komponenten
CN1865495A (zh) * 2005-05-20 2006-11-22 中国科学院半导体研究所 金属有机物化学气相淀积设备反应室中的公转自转机构
BRPI0615301B1 (pt) * 2005-08-29 2019-06-25 Oerlikon Trading Ag, Trübbach Dispositivo transportador de peça de trabalho
US7988787B2 (en) * 2007-08-27 2011-08-02 Caterpillar Inc. Workpiece support system and method
EP2336387B1 (de) * 2007-10-08 2013-09-04 Oerlikon Trading AG, Trübbach Werkstückträgereinrichtung

Also Published As

Publication number Publication date
JP5497647B2 (ja) 2014-05-21
US8596626B2 (en) 2013-12-03
TWI481448B (zh) 2015-04-21
EP2336387B1 (de) 2013-09-04
DE502007006849D1 (de) 2011-05-12
EP2336387A1 (de) 2011-06-22
BRPI0818592A2 (pt) 2017-06-13
EP2048263A1 (de) 2009-04-15
WO2009046928A1 (en) 2009-04-16
KR20100071057A (ko) 2010-06-28
US20140008857A1 (en) 2014-01-09
US8783673B2 (en) 2014-07-22
CN101827955B (zh) 2012-11-07
MX2010003727A (es) 2010-04-21
JP2011502211A (ja) 2011-01-20
RU2010113596A (ru) 2011-11-20
ATE503858T1 (de) 2011-04-15
RU2485211C2 (ru) 2013-06-20
ES2362016T3 (es) 2011-06-27
CN101827955A (zh) 2010-09-08
PL2048263T3 (pl) 2011-09-30
US20100270722A1 (en) 2010-10-28
TW200936249A (en) 2009-09-01
EP2048263B1 (de) 2011-03-30

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