KR20100071057A - 작업편 이송장치 - Google Patents

작업편 이송장치 Download PDF

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Publication number
KR20100071057A
KR20100071057A KR1020107007588A KR20107007588A KR20100071057A KR 20100071057 A KR20100071057 A KR 20100071057A KR 1020107007588 A KR1020107007588 A KR 1020107007588A KR 20107007588 A KR20107007588 A KR 20107007588A KR 20100071057 A KR20100071057 A KR 20100071057A
Authority
KR
South Korea
Prior art keywords
workpiece
drive shaft
drive
transmission
rotary frame
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR1020107007588A
Other languages
English (en)
Korean (ko)
Inventor
슈테판 엣세르
마르틴 차크
Original Assignee
오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐 filed Critical 오를리콘 트레이딩 아크티엔게젤샤프트, 트뤼프바흐
Publication of KR20100071057A publication Critical patent/KR20100071057A/ko
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/64—Movable or adjustable work or tool supports characterised by the purpose of the movement
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16H—GEARING
    • F16H21/00—Gearings comprising primarily only links or levers, with or without slides
    • F16H21/10—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane
    • F16H21/12—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion
    • F16H21/14—Gearings comprising primarily only links or levers, with or without slides all movement being in, or parallel to, a single plane for conveying rotary motion by means of cranks, eccentrics, or like members fixed to one rotary member and guided along tracks on the other
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67721—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrates to be conveyed not being semiconductor wafers or large planar substrates, e.g. chips, lead frames

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Retarders (AREA)
  • Gear Transmission (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Grinding Of Cylindrical And Plane Surfaces (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Specific Conveyance Elements (AREA)
  • Physical Vapour Deposition (AREA)
  • Agricultural Machines (AREA)
  • Soil Working Implements (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
KR1020107007588A 2007-10-08 2008-10-02 작업편 이송장치 Ceased KR20100071057A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07405302A EP2048263B1 (de) 2007-10-08 2007-10-08 Werkstückträgereinrichtung
EP07405302.6 2007-10-08

Publications (1)

Publication Number Publication Date
KR20100071057A true KR20100071057A (ko) 2010-06-28

Family

ID=38982780

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107007588A Ceased KR20100071057A (ko) 2007-10-08 2008-10-02 작업편 이송장치

Country Status (14)

Country Link
US (2) US8596626B2 (enExample)
EP (2) EP2048263B1 (enExample)
JP (1) JP5497647B2 (enExample)
KR (1) KR20100071057A (enExample)
CN (1) CN101827955B (enExample)
AT (1) ATE503858T1 (enExample)
BR (1) BRPI0818592A2 (enExample)
DE (1) DE502007006849D1 (enExample)
ES (1) ES2362016T3 (enExample)
MX (1) MX2010003727A (enExample)
PL (2) PL2048263T3 (enExample)
RU (1) RU2485211C2 (enExample)
TW (1) TWI481448B (enExample)
WO (1) WO2009046928A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101869401B1 (ko) * 2018-01-04 2018-07-20 홍성신 초정밀 선반의 공작물 자동 교환장치

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2048263B1 (de) * 2007-10-08 2011-03-30 Oerlikon Trading AG, Trübbach Werkstückträgereinrichtung
DE102010001218A1 (de) 2010-01-26 2011-07-28 Esser, Stefan, Dr.-Ing., 52072 Substratteller und Beschichtungsanlage zum Beschichten von Substraten
SG10201601693VA (en) * 2011-03-17 2016-04-28 Sulzer Metco Ag Component manipulator for the dynamic positioning of a substrate, coating method, as well as use of a component manipulator
EP2788526A2 (en) * 2011-12-08 2014-10-15 Praxair S.T. Technology, Inc. Multifuntion tooling fixture assembly for use in a coating related operations
RU2625698C1 (ru) * 2016-08-29 2017-07-18 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт авиационных материалов" (ФГУП "ВИАМ") Способ нанесения защитных покрытий и устройство для его осуществления
CN107740063B (zh) * 2017-11-16 2024-07-23 东莞市赢心科技有限公司 真空镀铝设备用工件承载结构
RU2688353C1 (ru) * 2018-08-09 2019-05-21 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") Устройство перемещения и вращения подложкодержателя
DE102018126862A1 (de) * 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung und Beschichtungsanordnung
DE102019110158A1 (de) * 2019-04-17 2020-10-22 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung
JP7664853B2 (ja) 2019-05-07 2025-04-18 エリコン・サーフェス・ソリューションズ・アクチェンゲゼルシャフト，プフェフィコーン 処理対象となる被加工物を保持するための可動被加工物キャリア装置
WO2021018835A1 (en) 2019-07-26 2021-02-04 Oerlikon Surface Solutions Ag, Pfäffikon Fixture to be used in pvd processes for cylindrical, elongated substrates
CN114271649B (zh) * 2021-12-27 2022-11-25 西南民族大学 一种艺术作品展示设备

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU370279A1 (ru) * 1969-08-21 1973-02-15 УСТРОЙСТВО дл ТРАНСПОРТИРОВКИ и СМЕНЫ ПОДЛОЖЕК в ВАКУУМНЫХ УСТАНОВКАХ
JPH01288652A (ja) * 1988-05-17 1989-11-20 Komatsu Ltd 減速機
SU1828669A3 (ru) * 1990-11-13 1995-05-27 Владимир Васильевич Кульпинов Устройство для обработки изделий в вакууме
DE19803278C2 (de) 1998-01-29 2001-02-01 Bosch Gmbh Robert Werkstückträger und dessen Verwendung zur Behandlung und Beschichtung von Werkstücken
DE59911507D1 (de) * 1998-12-15 2005-02-24 Balzers Hochvakuum Planetensystem-werkstückträger und verfahren zur oberflächenbehandlung von werkstücken
US6749764B1 (en) * 2000-11-14 2004-06-15 Tru-Si Technologies, Inc. Plasma processing comprising three rotational motions of an article being processed
DE10308471B4 (de) 2003-02-20 2005-03-24 Hensoldt Ag Beschichtungsanlage zum Beschichten von Substraten für optische Komponenten
CN1865495A (zh) * 2005-05-20 2006-11-22 中国科学院半导体研究所 金属有机物化学气相淀积设备反应室中的公转自转机构
CA2620417C (en) 2005-08-29 2014-08-26 Oerlikon Trading Ag, Trubbach Workpiece carrier device
US7988787B2 (en) * 2007-08-27 2011-08-02 Caterpillar Inc. Workpiece support system and method
EP2048263B1 (de) * 2007-10-08 2011-03-30 Oerlikon Trading AG, Trübbach Werkstückträgereinrichtung

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101869401B1 (ko) * 2018-01-04 2018-07-20 홍성신 초정밀 선반의 공작물 자동 교환장치

Also Published As

Publication number Publication date
JP2011502211A (ja) 2011-01-20
US20140008857A1 (en) 2014-01-09
EP2048263B1 (de) 2011-03-30
ATE503858T1 (de) 2011-04-15
PL2048263T3 (pl) 2011-09-30
PL2336387T3 (pl) 2014-01-31
US20100270722A1 (en) 2010-10-28
EP2336387A1 (de) 2011-06-22
RU2485211C2 (ru) 2013-06-20
US8596626B2 (en) 2013-12-03
WO2009046928A1 (en) 2009-04-16
US8783673B2 (en) 2014-07-22
TWI481448B (zh) 2015-04-21
RU2010113596A (ru) 2011-11-20
MX2010003727A (es) 2010-04-21
CN101827955B (zh) 2012-11-07
EP2336387B1 (de) 2013-09-04
TW200936249A (en) 2009-09-01
EP2048263A1 (de) 2009-04-15
DE502007006849D1 (de) 2011-05-12
ES2362016T3 (es) 2011-06-27
BRPI0818592A2 (pt) 2017-06-13
JP5497647B2 (ja) 2014-05-21
CN101827955A (zh) 2010-09-08

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Patent event date: 20100407

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Patent event date: 20130930

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Patent event date: 20150701

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