JP5454971B2 - 移動ステージ - Google Patents

移動ステージ Download PDF

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Publication number
JP5454971B2
JP5454971B2 JP2012092360A JP2012092360A JP5454971B2 JP 5454971 B2 JP5454971 B2 JP 5454971B2 JP 2012092360 A JP2012092360 A JP 2012092360A JP 2012092360 A JP2012092360 A JP 2012092360A JP 5454971 B2 JP5454971 B2 JP 5454971B2
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JP
Japan
Prior art keywords
gas
pad
fine dust
moving stage
dust suction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012092360A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013222769A (ja
Inventor
大介 伊藤
祐貴 佐塚
美喜 澤井
純一 次田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Steel Works Ltd
Original Assignee
Japan Steel Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2012092360A priority Critical patent/JP5454971B2/ja
Application filed by Japan Steel Works Ltd filed Critical Japan Steel Works Ltd
Priority to CN201410710844.5A priority patent/CN104538329B/zh
Priority to CN201380019729.7A priority patent/CN104254912B/zh
Priority to KR1020147019755A priority patent/KR101630648B1/ko
Priority to PCT/JP2013/059855 priority patent/WO2013153979A1/ja
Priority to KR1020147025836A priority patent/KR101546395B1/ko
Priority to SG11201406398QA priority patent/SG11201406398QA/en
Publication of JP2013222769A publication Critical patent/JP2013222769A/ja
Application granted granted Critical
Publication of JP5454971B2 publication Critical patent/JP5454971B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning In General (AREA)
JP2012092360A 2012-04-13 2012-04-13 移動ステージ Active JP5454971B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2012092360A JP5454971B2 (ja) 2012-04-13 2012-04-13 移動ステージ
CN201380019729.7A CN104254912B (zh) 2012-04-13 2013-04-01 移动平台
KR1020147019755A KR101630648B1 (ko) 2012-04-13 2013-04-01 이동 스테이지
PCT/JP2013/059855 WO2013153979A1 (ja) 2012-04-13 2013-04-01 移動ステージ
CN201410710844.5A CN104538329B (zh) 2012-04-13 2013-04-01 移动平台
KR1020147025836A KR101546395B1 (ko) 2012-04-13 2013-04-01 이동 스테이지
SG11201406398QA SG11201406398QA (en) 2012-04-13 2013-04-01 Moving stage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012092360A JP5454971B2 (ja) 2012-04-13 2012-04-13 移動ステージ

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013248883A Division JP5527786B2 (ja) 2013-12-02 2013-12-02 移動ステージ

Publications (2)

Publication Number Publication Date
JP2013222769A JP2013222769A (ja) 2013-10-28
JP5454971B2 true JP5454971B2 (ja) 2014-03-26

Family

ID=49327547

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012092360A Active JP5454971B2 (ja) 2012-04-13 2012-04-13 移動ステージ

Country Status (5)

Country Link
JP (1) JP5454971B2 (ko)
KR (2) KR101546395B1 (ko)
CN (2) CN104254912B (ko)
SG (1) SG11201406398QA (ko)
WO (1) WO2013153979A1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101403458B1 (ko) * 2012-11-13 2014-06-30 삼성디스플레이 주식회사 기판 이송 장치 및 기판 처리 장치
JP6854605B2 (ja) * 2016-08-29 2021-04-07 株式会社日本製鋼所 レーザ照射装置、レーザ照射方法、及び半導体装置の製造方法
JP7184678B2 (ja) * 2019-03-08 2022-12-06 Ｊｓｗアクティナシステム株式会社 レーザ処理装置
JP7333749B2 (ja) * 2019-12-13 2023-08-25 株式会社ディスコ 吸引力の測定方法
KR102435306B1 (ko) * 2020-07-07 2022-08-24 디앤에이 주식회사 파티클 제거용 기판이송장치
CN112206110B (zh) * 2020-09-25 2022-02-22 泗县微腾知识产权运营有限公司 一种移动气垫
CN116198779A (zh) * 2023-03-31 2023-06-02 西安奕斯伟材料科技股份有限公司 一种用于包装硅片盒的设备及方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3123141B2 (ja) 1991-09-20 2001-01-09 日本電気株式会社 半導体装置のビアホール形成方法
JP2004345814A (ja) 2003-05-23 2004-12-09 Murata Mach Ltd 浮上搬送装置
JP4541824B2 (ja) * 2004-10-14 2010-09-08 リンテック株式会社 非接触型吸着保持装置
JP5178215B2 (ja) 2008-01-30 2013-04-10 京セラ株式会社 浮上用構造体、スライド部材およびステージ装置
JP2011133724A (ja) * 2009-12-25 2011-07-07 Nikon Corp 流体静圧軸受、移動体装置、露光装置、デバイス製造方法、及び清掃装置
JP5372824B2 (ja) 2010-03-30 2013-12-18 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP5399963B2 (ja) * 2010-03-30 2014-01-29 大日本スクリーン製造株式会社 基板搬送装置および基板処理装置

Also Published As

Publication number Publication date
KR20140099330A (ko) 2014-08-11
SG11201406398QA (en) 2014-11-27
KR20140115383A (ko) 2014-09-30
KR101630648B1 (ko) 2016-06-15
KR101546395B1 (ko) 2015-08-21
CN104538329A (zh) 2015-04-22
CN104254912B (zh) 2017-06-30
CN104254912A (zh) 2014-12-31
JP2013222769A (ja) 2013-10-28
WO2013153979A1 (ja) 2013-10-17
CN104538329B (zh) 2016-08-24

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