JP5270877B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
- Publication number
- JP5270877B2 JP5270877B2 JP2007215948A JP2007215948A JP5270877B2 JP 5270877 B2 JP5270877 B2 JP 5270877B2 JP 2007215948 A JP2007215948 A JP 2007215948A JP 2007215948 A JP2007215948 A JP 2007215948A JP 5270877 B2 JP5270877 B2 JP 5270877B2
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- JP
- Japan
- Prior art keywords
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- region
- type region
- semiconductor device
- mos transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000004065 semiconductor Substances 0.000 title claims description 20
- 238000002955 isolation Methods 0.000 claims description 13
- 230000006378 damage Effects 0.000 claims description 3
- 230000005611 electricity Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0642—Isolation within the component, i.e. internal isolation
- H01L29/0646—PN junctions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0266—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using field effect transistors as protective elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823418—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the source or drain structures, e.g. specific source or drain implants or silicided source or drain structures or raised source or drain structures
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Semiconductor Integrated Circuits (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Description
502 ゲート電極
503 ドレイン領域
504 シャロートレンチ分離領域
601 外部接続端子からの信号を受けるN型の領域
602 P型の領域
Claims (3)
- 外部接続端子と内部回路領域との間に、前記内部回路領域に形成された内部素子をESDによる破壊から保護するために形成された、素子分離にシャロートレンチ構造を用いたESD保護用のN型MOSトランジスタを有する半導体装置であって、
ドレイン領域と、ともにグランドの電位に接続されたソース領域およびゲート電極とを有する前記N型MOSトランジスタと、
前記ドレイン領域の前記ゲート電極とは反対の側に隣接して配置されたP型の領域と、
前記P型の領域の前記ゲート電極とは反対の側に隣接して配置されており、前記ドレイン領域とは前記P型の領域により分離され、前記外部接続端子と前記内部素子とを結ぶ配線の間に接続されたN型の領域と、
前記N型MOSトランジスタ、前記P型の領域および前記N型の領域の周囲を取り囲んでいるシャロートレンチ分離領域と、
を有し、
前記P型の領域は、前記N型の領域に所定の電圧が印加された際に、前記N型の領域と、前記ドレイン領域とがパンチスルーして導通する幅で設けられており、前記ESD保護用のN型MOSトランジスタがバイポーラ動作することを特徴とする半導体装置。 - 前記N型MOSトランジスタは、前記N型の領域を中心に対称に形成されていることを特徴とする請求項1記載の半導体装置。
- 前記N型の領域は、前記P型の領域により囲まれていることを特徴とする請求項2記載の半導体装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007215948A JP5270877B2 (ja) | 2007-08-22 | 2007-08-22 | 半導体装置 |
TW097130993A TWI450380B (zh) | 2007-08-22 | 2008-08-14 | 半導體裝置 |
US12/191,674 US8283725B2 (en) | 2007-08-22 | 2008-08-14 | Semiconductor device |
CN2008101611628A CN101373769B (zh) | 2007-08-22 | 2008-08-22 | 半导体器件 |
KR1020080082595A KR101566024B1 (ko) | 2007-08-22 | 2008-08-22 | 반도체 디바이스 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007215948A JP5270877B2 (ja) | 2007-08-22 | 2007-08-22 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009049296A JP2009049296A (ja) | 2009-03-05 |
JP5270877B2 true JP5270877B2 (ja) | 2013-08-21 |
Family
ID=40381365
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007215948A Expired - Fee Related JP5270877B2 (ja) | 2007-08-22 | 2007-08-22 | 半導体装置 |
Country Status (5)
Country | Link |
---|---|
US (1) | US8283725B2 (ja) |
JP (1) | JP5270877B2 (ja) |
KR (1) | KR101566024B1 (ja) |
CN (1) | CN101373769B (ja) |
TW (1) | TWI450380B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5546191B2 (ja) * | 2009-09-25 | 2014-07-09 | セイコーインスツル株式会社 | 半導体装置 |
JP2011071325A (ja) * | 2009-09-25 | 2011-04-07 | Seiko Instruments Inc | 半導体装置 |
JP2011071329A (ja) * | 2009-09-25 | 2011-04-07 | Seiko Instruments Inc | 半導体装置 |
JP5511353B2 (ja) * | 2009-12-14 | 2014-06-04 | セイコーインスツル株式会社 | 半導体装置 |
JP6656968B2 (ja) | 2016-03-18 | 2020-03-04 | エイブリック株式会社 | Esd保護素子を有する半導体装置 |
JP7193053B2 (ja) * | 2018-07-18 | 2022-12-20 | 株式会社東海理化電機製作所 | 半導体装置及びその製造方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01243586A (ja) * | 1988-03-25 | 1989-09-28 | Hitachi Ltd | 半導体装置 |
JPH1168043A (ja) * | 1997-08-27 | 1999-03-09 | Kawasaki Steel Corp | Esd保護回路 |
JP3244065B2 (ja) * | 1998-10-23 | 2002-01-07 | 日本電気株式会社 | 半導体静電保護素子及びその製造方法 |
JP2001168204A (ja) * | 1999-12-13 | 2001-06-22 | Toshiba Corp | 半導体装置及びその製造方法 |
JP2002231886A (ja) | 2001-01-31 | 2002-08-16 | Matsushita Electric Ind Co Ltd | Esd保護回路および半導体集積回路装置 |
US7217984B2 (en) * | 2005-06-17 | 2007-05-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Divided drain implant for improved CMOS ESD performance |
JP5078312B2 (ja) * | 2005-10-19 | 2012-11-21 | セイコーインスツル株式会社 | 半導体集積回路装置およびその製造方法 |
-
2007
- 2007-08-22 JP JP2007215948A patent/JP5270877B2/ja not_active Expired - Fee Related
-
2008
- 2008-08-14 TW TW097130993A patent/TWI450380B/zh not_active IP Right Cessation
- 2008-08-14 US US12/191,674 patent/US8283725B2/en active Active
- 2008-08-22 KR KR1020080082595A patent/KR101566024B1/ko active IP Right Grant
- 2008-08-22 CN CN2008101611628A patent/CN101373769B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US8283725B2 (en) | 2012-10-09 |
CN101373769A (zh) | 2009-02-25 |
KR101566024B1 (ko) | 2015-11-04 |
JP2009049296A (ja) | 2009-03-05 |
KR20090020531A (ko) | 2009-02-26 |
US20090050967A1 (en) | 2009-02-26 |
TWI450380B (zh) | 2014-08-21 |
CN101373769B (zh) | 2012-07-04 |
TW200929522A (en) | 2009-07-01 |
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