JP5265099B2 - 基板検査装置 - Google Patents

基板検査装置 Download PDF

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Publication number
JP5265099B2
JP5265099B2 JP2006245739A JP2006245739A JP5265099B2 JP 5265099 B2 JP5265099 B2 JP 5265099B2 JP 2006245739 A JP2006245739 A JP 2006245739A JP 2006245739 A JP2006245739 A JP 2006245739A JP 5265099 B2 JP5265099 B2 JP 5265099B2
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JP
Japan
Prior art keywords
substrate
inspection
unit
suction
stage
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Expired - Fee Related
Application number
JP2006245739A
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English (en)
Japanese (ja)
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JP2008063130A (ja
JP2008063130A5 (enExample
Inventor
洋志 藤森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Priority to JP2006245739A priority Critical patent/JP5265099B2/ja
Priority to TW096133454A priority patent/TWI416095B/zh
Priority to CN2007101492516A priority patent/CN101144920B/zh
Priority to KR1020070091423A priority patent/KR101424017B1/ko
Publication of JP2008063130A publication Critical patent/JP2008063130A/ja
Publication of JP2008063130A5 publication Critical patent/JP2008063130A5/ja
Application granted granted Critical
Publication of JP5265099B2 publication Critical patent/JP5265099B2/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N2021/0106—General arrangement of respective parts

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Liquid Crystal (AREA)
JP2006245739A 2006-09-11 2006-09-11 基板検査装置 Expired - Fee Related JP5265099B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006245739A JP5265099B2 (ja) 2006-09-11 2006-09-11 基板検査装置
TW096133454A TWI416095B (zh) 2006-09-11 2007-09-07 基板檢查裝置
CN2007101492516A CN101144920B (zh) 2006-09-11 2007-09-07 基板检查装置
KR1020070091423A KR101424017B1 (ko) 2006-09-11 2007-09-10 기판 검사 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006245739A JP5265099B2 (ja) 2006-09-11 2006-09-11 基板検査装置

Publications (3)

Publication Number Publication Date
JP2008063130A JP2008063130A (ja) 2008-03-21
JP2008063130A5 JP2008063130A5 (enExample) 2009-10-15
JP5265099B2 true JP5265099B2 (ja) 2013-08-14

Family

ID=39207522

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006245739A Expired - Fee Related JP5265099B2 (ja) 2006-09-11 2006-09-11 基板検査装置

Country Status (4)

Country Link
JP (1) JP5265099B2 (enExample)
KR (1) KR101424017B1 (enExample)
CN (1) CN101144920B (enExample)
TW (1) TWI416095B (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5317618B2 (ja) * 2008-10-06 2013-10-16 株式会社日立ハイテクノロジーズ 表示パネルモジュール組立装置及び基板搬送装置
JP5380225B2 (ja) * 2009-09-24 2014-01-08 株式会社日立ハイテクノロジーズ ガラス基板の検査装置
JP5683333B2 (ja) * 2011-03-10 2015-03-11 東レエンジニアリング株式会社 基板検査装置及び方法
CN102320472B (zh) 2011-06-03 2013-07-10 深圳市华星光电技术有限公司 基板传送系统及传送方法
KR101773494B1 (ko) * 2013-02-26 2017-08-31 가부시키가이샤 아이에이치아이 반송 장치
TWI472767B (zh) * 2014-01-22 2015-02-11 Utechzone Co Ltd Detection device
US10289930B2 (en) * 2017-02-09 2019-05-14 Glasstech, Inc. System and associated for online measurement of the optical characteristics of a glass sheet
KR102140869B1 (ko) * 2018-09-14 2020-08-03 양승현 Pcb기판 이송장치
KR102649083B1 (ko) 2019-01-24 2024-03-20 주식회사 고영테크놀러지 검사 장치용 지그, 검사 장치, 검사 세트 및 이를 이용하는 대상물 검사 방법
CN109926792B (zh) * 2019-04-25 2021-04-06 大族激光科技产业集团股份有限公司 一种激光切割载台
CN112595722B (zh) * 2021-03-02 2021-06-08 苏州天准科技股份有限公司 一种分段式气浮平台、平台模组和检测设备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0527215A (ja) 1991-07-23 1993-02-05 Toshiba Corp 基板搬送装置
JP2000009661A (ja) * 1998-06-26 2000-01-14 Ntn Corp フラットパネル検査装置
IL131282A (en) * 1999-08-05 2009-02-11 Orbotech Ltd Apparatus and methods for inspection of objects
JP2005010221A (ja) * 2003-06-16 2005-01-13 Kowa:Kk ガラス基板熱処理装置
JP4426276B2 (ja) * 2003-10-06 2010-03-03 住友重機械工業株式会社 搬送装置、塗布システム、及び検査システム
KR101023729B1 (ko) * 2004-06-30 2011-03-25 엘지디스플레이 주식회사 대형 기판을 반송하는 셔틀 및 반송 방법
KR20060007187A (ko) * 2004-07-19 2006-01-24 삼성전자주식회사 기판의 처리방법과 처리장치
TW200614412A (en) * 2004-09-27 2006-05-01 Olympus Corp Macroscopic inspection apparatus and macroscopic inspection method
JP4579670B2 (ja) * 2004-12-16 2010-11-10 芝浦メカトロニクス株式会社 部品の圧着装置及び圧着方法
JP4378301B2 (ja) * 2005-02-28 2009-12-02 東京エレクトロン株式会社 基板処理装置及び基板処理方法及び基板処理プログラム

Also Published As

Publication number Publication date
KR101424017B1 (ko) 2014-07-28
CN101144920B (zh) 2011-11-09
KR20080023647A (ko) 2008-03-14
JP2008063130A (ja) 2008-03-21
TW200819734A (en) 2008-05-01
TWI416095B (zh) 2013-11-21
CN101144920A (zh) 2008-03-19

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