200819734 九、發明說明： 【發明所屬技術領域】 發明領域 本發明係有關於基板檢查裝置。有關於例如水平搬送 5 如液晶玻璃基板等薄板狀之基板以檢查表面缺陷之基板檢 查裝置。 本申請案對2006年9月11日所申請之日本專利申請第 2006-245739號主張優先權，且在此沿用其内容。 【ml 3 10 發明背景 近年來，隨著液晶顯示器的大型化，液晶玻璃基板也 跟著大型化。因此，用以檢查這種薄板狀基板之表面缺陷 的基板檢查裝置很多都是將製造步驟中之基板移載至氣體 浮起機台等搬送機台，且例如吸附保持基板之端部等而搬 15送至檢查部，並在檢查部中水平移動基板以檢查基板表 面。藉此，可減少移動基板的時間、能量流失及因搬送對 基板造成之損傷等。 例如，特開2004-279335號中記載有包含將氣體吹起使 基板浮起之浮起塊及吸附保持浮起至浮起塊上的基板兩端 20且朝一個方向搬送基板之基板搬送部之基板搬送裝置（參 照特開2004-279335號之第1圖)。 又，特開2000-9661號中s己載有在滾筒搬送部之其中一 侧沿著搬送方向設有Y機台且藉由固持機構朝厚度方向固 持基板的其中一侧以搬送它之平面面板檢查裝置（參照特 5 200819734 開2000-9661號之第1〜3圖）。 然而，上述習知基板檢查裝置有下列問題。 在特開2004-279335號所記載之技術中，藉由沿著美板 搬送路徑兩側平行配置之基板搬送部來吸附保持基板兩端 5以搬送之。因此，會由一對基板搬送部來限制基板兩侧， 如此，會因基板搬送部平行度的不安定等而從兩側擠壓薄 板上之玻璃基板，而容易變形，且因基板扭曲會影響檢查 精度。 又，在特開2004-279335號所記載之基板檢查裝置中， 10相對於浮起塊設有共通之基板搬送部。但，在平面面板之 製造線中，因搬送路徑之配置或檢查部的數量等會配列多 數浮起塊而形成長而大的搬送路徑。在該搬送路徑中配置 多數製造裝置或檢查裝置。此時，在設置多數浮起塊與各 裝置共通之兩端保持之基板搬送部時必須使互相之配置精 15度高精度，因此，基板檢查裝置設置要花的功夫或組裝成 本會增加。特別是為了隔斷來自外部之振動，基板檢查裝 置會載置於除振機台上。這種載置於除振機台上之裝置會 因為隨著基板的移動使載置於除振機台上之浮起塊的上面 傾斜或者因來自外部之振動而產生複雜的移動 ，而無法設 20置共通之基板搬送部。 · 為迴避後者的問題，也考慮過在每個浮起塊分別設置 基板搬送部’但需要從上游之基板搬送部改搬至下游之基 板搬送部的搬送機器人等，如此，裝置構造會變複雜。 又’在特開2000-9661號所記載之技術中，在將基板搬 6 200819734 _ 送至下游之搬送部時，必須暫時使基板脫離。此時，基板 在水平方向之受限會消失，因此，有損於已對準至基準位 置之基板的定位狀態。因此，會有在傳送後必需再進行對 準調整的問題。 - 5 本發明有鑑於上述問題，以提供即使搬送路徑很長基 • 板也不會變形且可以良好之精度搬送基板之基板檢查裝置 為目的。 【明内 發明概要 1〇 為解決上述問題，本發明之基板檢查裝置係包含用以 私送被檢查體之薄板狀基板之搬送機台及配置於與搬送機 台之搬送方向垂直之方向之其中一侧且保持基板端部且賦 與基板搬送力之多數單側搬送部，並在多數單側搬送部之 間依序傳送基板，藉此搬送基板。 ，· 15 根據本發明之基板檢查裝置，由於在多數單側搬送部 φ 之間傳送基板以進行搬送，故即使搬送長度很長，基板也 不會變形，且可以良好之精度搬送基板。 圖式簡單說明 " 第1圖係顯示本發明第1實施形態之基板檢查裝置之概 t 20 略構造之平面圖。 第2A圖係第1圖之A部的部份放大圖。 第2B圖係從第2A圖之_看之正視圖。 第3圖係針對本發明第1實施形態之基板檢查裝置之動 作來說明之平面圖。 7 200819734 第4圖係針對本發明第1實施形態之基板檢查裝置之動 作來説明之平面圖。 第5圖係本發明第1實施形態之變形例之基板檢查裝置 之概略構造之平面圖。 5 第6圖係顯示本發明第2實施形態之基板檢查裝置之概 略構造之平面圖。 第7圖係顯示本發明第3實施形態之基板檢查裝置之概 略構造之平面圖。 第8圖係顯示本發明第4實施形態之基板檢查裝置之概 10 略構造之平面圖。 【實施方式】 較佳實施例之詳細說明 以下針對本發明實施形態參照所附圖式來說明。在所 有圖式中’即使是不同的實施形態，同一或同等之構件皆 15賦與相同符號，且省去共通之說明。 [第1實施形態] 針對本發明第1實施形態之基板檢查裝置來說明。 第1圖係顯示本發明第1實施形態之基板檢查裝置之概 略構造之平面圖。第2A圖係第1圖之a部的部份放大圖。第 20 2B圖係從第2A圖之B觀看之正視圖。 本實施形態係適用於以例如液晶玻璃基板等所構成之 薄板狀基板4為被檢查體且朝水平方向一面使基板4浮起 面搬送之，以檢查基板4表面之基板檢查裝置1〇〇。 基板檢查裝置100之構略構造係如第丨圖所示，沿著義 8 200819734 =搬送方向依序配置有基板搬入部丨、檢查部2及基板搬 乂平面看的形狀為搬送方向之長度為L且與搬送 方向垂直之方向（以下，稱作搬送寬度方向）的寬度為歡矩200819734 IX. Description of the Invention: Field of the Invention The present invention relates to a substrate inspection apparatus. A substrate inspection apparatus for inspecting a surface defect, for example, a sheet-like substrate such as a liquid crystal glass substrate. The present application claims priority to Japanese Patent Application No. 2006-245739, filed on Sep. 11, 2006, the content of which is incorporated herein. [ml 3 10 Background of the Invention In recent years, with the increase in size of liquid crystal displays, liquid crystal glass substrates have also become larger. Therefore, many of the substrate inspection apparatuses for inspecting the surface defects of such a thin-plate-shaped substrate are carried out by transferring the substrate in the manufacturing step to a transfer table such as a gas floating machine, and for example, moving and holding the end portion of the substrate and the like. 15 is sent to the inspection unit, and the substrate is horizontally moved in the inspection portion to inspect the surface of the substrate. Thereby, the time for moving the substrate, the loss of energy, damage due to the transfer to the substrate, and the like can be reduced. For example, JP-A-2004-279335 discloses a substrate transfer unit that includes a floating block that floats a substrate to float a substrate, and a substrate transfer unit that adsorbs and holds the both ends 20 of the substrate on the floating block and transports the substrate in one direction. The substrate transfer device (refer to Fig. 1 of JP-A-2004-279335). Further, in Japanese Patent Laid-Open No. 2000-9661, a plane panel in which one side of the drum conveyance unit is provided along the conveyance direction and the one side of the substrate is held in the thickness direction by the holding mechanism to carry it is carried. Inspection device (refer to paragraphs 1 to 3 of No. 5 200819734, 2000-9661). However, the above conventional substrate inspection apparatus has the following problems. In the technique described in Japanese Laid-Open Patent Publication No. 2004-279335, both ends of the substrate 5 are sucked and held by the substrate transfer portions arranged in parallel along both sides of the US-plate transfer path. Therefore, the both sides of the substrate are restricted by the pair of substrate transfer portions, and the glass substrate on the thin plate is pressed from both sides due to the instability of the parallelism of the substrate transfer portion, and is easily deformed, and the substrate distortion is affected. Check the accuracy. In the substrate inspection apparatus described in Japanese Laid-Open Patent Publication No. 2004-279335, a common substrate transfer unit is provided with respect to the floating block. However, in the manufacturing line of the flat panel, a large and large transport path is formed by arranging a plurality of floating blocks due to the arrangement of the transport path or the number of inspection units. A plurality of manufacturing apparatuses or inspection apparatuses are disposed in the transport path. In this case, when the substrate transfer portions held by the both floating blocks and the respective devices are provided, it is necessary to make the arrangement of the substrates high by 15 degrees. Therefore, the work required for the substrate inspection device or the assembly cost increases. In particular, in order to block vibration from the outside, the substrate inspection device is placed on the vibration reduction machine. Such a device placed on the vibration removing machine cannot be set because the tilting of the floating block placed on the vibration removing machine is inclined with the movement of the substrate or complicated movement due to vibration from the outside. 20 common substrate transfer unit. In order to avoid the latter problem, it is also considered that the substrate transfer unit is provided for each floating block, but the transfer robot that needs to be moved from the upstream substrate transfer unit to the downstream substrate transfer unit is complicated. . In the technique described in Japanese Laid-Open Patent Publication No. 2000-9661, when the substrate is transported to the downstream transport unit, the substrate must be temporarily removed. At this time, the limitation of the substrate in the horizontal direction disappears, and thus the positioning state of the substrate aligned to the reference position is impaired. Therefore, there is a problem that alignment adjustment is necessary after transmission. In view of the above problems, the present invention has been made in an effort to provide a substrate inspecting apparatus which can transport a substrate with good precision even if the substrate is not deformed even when the substrate is long. SUMMARY OF THE INVENTION In order to solve the above problems, the substrate inspection apparatus of the present invention includes a transfer table for transporting a thin plate-shaped substrate of a test object and a direction perpendicular to a transport direction of the transfer table. One of the single-side conveying portions that hold the substrate end portion and is provided with the substrate conveying force, and sequentially transports the substrate between the plurality of single-side conveying portions, thereby conveying the substrate. According to the substrate inspection device of the present invention, since the substrate is transported between the plurality of single-side transport units φ for transport, the substrate is not deformed even if the transport length is long, and the substrate can be transported with good precision. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a first embodiment of the present invention. Fig. 2A is a partially enlarged view of a portion A of Fig. 1. Figure 2B is a front view from the 2A diagram. Fig. 3 is a plan view showing the operation of the substrate inspecting apparatus according to the first embodiment of the present invention. 7 200819734 Fig. 4 is a plan view showing the operation of the substrate inspecting apparatus according to the first embodiment of the present invention. Fig. 5 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a modification of the first embodiment of the present invention. Fig. 6 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a second embodiment of the present invention. Fig. 7 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a third embodiment of the present invention. Fig. 8 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a fourth embodiment of the present invention. BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, embodiments of the present invention will be described with reference to the accompanying drawings. In all the drawings, even if different embodiments, the same or equivalent components are assigned the same symbols, and the common description is omitted. [First Embodiment] A substrate inspection device according to a first embodiment of the present invention will be described. Fig. 1 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a first embodiment of the present invention. Fig. 2A is a partially enlarged view of a portion of Fig. 1; Figure 20B is a front view from the B of Figure 2A. The present embodiment is applied to a substrate inspection apparatus 1 for inspecting the surface of the substrate 4 by using the thin plate-like substrate 4 made of, for example, a liquid crystal glass substrate as the object to be inspected and transporting the substrate 4 on the floating surface in the horizontal direction. The structure of the substrate inspection apparatus 100 is as shown in the figure, and the shape of the substrate carrying unit 丨, the inspection unit 2, and the substrate transporting plane are sequentially arranged along the basis of the meaning of 2008-09-4=the transport direction is the length of the transport direction. The width of L and the direction perpendicular to the conveyance direction (hereinafter referred to as the conveyance width direction) is a joy
10 1510 15
土板搬入口 [Π具有藉由具有多數抬高桿之抬高構件接 收用例如搬送機$人等從裝置外雜送過來的基板4,且載 置於洋起機台1A上，並在水平面内將浮在浮起機台认上之 基板4友位於搬送額及搬送寬度方向之基準桿奶 與推塵桿8e、_構成之基板定位機構，更具有浮起機台 1A及吸附搬送部5(單側搬送部）。 浮起機台1A為用以朝水平方向載置基板4使其可朝水 平方向自由移動且以低負荷朝固定方向搬送基板4之搬送 機台。在本實卿態巾，由在勤表面設有多數氣體喷射 孔N，且從該等氣體噴射孔N喷出氣體以浮起支持基板4之 浮起機台構成。 浮起機台1A的大小係設定成搬送方向之長度較基板4 之搬达方向長度L長且搬送寬度方向之寬度較基板4之寬度 W窄一點點。 基準桿8a、8a為抵接於基板4之搬送寬度方向之端部以 進行搬送寬度方向之定位之卡止構件，且以向著浮起機台 1A之搬送方向為右側（第1圖之下側，以下，稱作搬送方向 右側）之固定配置設成可相對於基板4之載置面朝上下方向 出沒之狀態。 200819734 、，基準桿8b為抵接於基板4之搬送方向之端部以進行搬 L方向之&位之卡止構件，且在浮起機台认之搬送方向下 游設成可相對於基板4之载置面朝上下方向出沒之狀態。 另，第1圖為顯示模式圖誇大了大小等東西，結果，描 5繪成基準桿8b與滑動引導構件9互相干擾之位置關係。但， 基準捍8b設於與滑動引導構件9有一點距離的位置，且在不 與滑件10干擾之狀態下在基板4之定位後下降，並可退避至 不與後述吸附搬送部5干擾之位置。 推壓桿8c為用以推壓基板4且賦與勢能使基板4朝設於 10基準位置之基準桿8a、8a、此移動之推塵構件，且在向著 浮起機台1A之搬送方向為左側（第1圖之上側，以下，稱作 G方向左側）與浮起機台1A之搬送方向上游中，設成可朝 基板4移動之狀態。 另，基準桿8a、8b、推壓桿8e只要是可在不傷到基板4 15的端部之狀態下抵接之卡止騎，則不限於桿狀構件，例 如亦可為塊狀構件。又，推壓構件在表面蓋上緩衝材料等 亦可。 吸附搬送部5沿著浮起機台1A之搬送方向右側配置，且 吸附保持浮起支持於浮起機台1A之I板4的搬送方向右側 20裡面，以朝搬送方向賦與搬送力。 吸附搬送部5之概略構造係如第2A圖、第2B圖所示， 由滑動引導構件9、滑件1〇、升降機構11、升降台12、吸附 台13及吸附塊14構成。 滑動引導構件9及滑件1〇為以滑動引導構件9作為引導 10 200819734 構件且使滑件Η)在@定直線上往返移動之紐馬達 之移動機構。本實施形態中，採用線性馬達作為移動機構， 但亦可採用使用滾珠螺桿等之單軸驅動機構。 吸附搬送部5之滑動引導構件9係如第}圖所示，沿著浮 起機台1A之搬送方向右側配置，且從浮起機台^之二準: 位領域P,之巾間部延伸至浮起機台2A上游之基板傳送領域 P2之中間部。The earth-moving inlet [the substrate 4 is received by a lifting member having a plurality of raising rods, for example, by a conveyor, a person, or the like, and is placed on the board 4A, and is placed on the horizontal plane 1A, and is at a horizontal plane. The substrate 4 that is floated on the floating machine table is located in the transfer amount and the width direction of the reference rod milk and the dust rod 8e, the substrate positioning mechanism, and the floating machine 1A and the adsorption transport unit 5 (one-side transport unit). The floating machine 1A is a transfer table for placing the substrate 4 in the horizontal direction so as to be movable in the horizontal direction and transporting the substrate 4 in a fixed direction with a low load. In the present embodiment, a plurality of gas injection holes N are provided on the surface of the machine, and a floating machine is formed by ejecting gas from the gas injection holes N to float the support substrate 4. The size of the floating machine 1A is set such that the length in the transport direction is longer than the length L of the substrate 4 in the transport direction and the width in the transport width direction is narrower than the width W of the substrate 4. The reference rods 8a and 8a are locking members that are in contact with the end portions of the substrate 4 in the transport width direction to be positioned in the transport width direction, and are oriented to the right side in the transport direction toward the floating machine 1A (the lower side of Fig. 1) The fixed arrangement of the hereinafter, referred to as the right side of the transport direction, is set so as to be able to be in the vertical direction with respect to the mounting surface of the substrate 4. In 200819734, the reference rod 8b is a locking member that abuts the end portion of the substrate 4 in the transport direction to carry the position in the L direction, and is disposed downstream of the substrate 4 in the transport direction. The loading surface is in a state of being in the up and down direction. Further, Fig. 1 shows an enlarged view of the size of the display pattern, and as a result, the positional relationship between the reference rod 8b and the slide guiding member 9 is shown. However, the reference weave 8b is provided at a position slightly away from the slide guide member 9, and is lowered after the positioning of the substrate 4 without interfering with the slider 10, and can be retracted so as not to interfere with the adsorption transport portion 5 which will be described later. position. The pressing lever 8c is a dust pushing member for pressing the substrate 4 and biasing the substrate 4 toward the reference rods 8a and 8a provided at the reference position of 10, and moving in the direction toward the floating machine 1A. The left side (the upper side in the first drawing, hereinafter referred to as the left side in the G direction) and the upstream side in the conveying direction of the floating machine 1A are provided in a state of being movable toward the substrate 4. Further, the reference rods 8a and 8b and the pressing rod 8e are not limited to the rod-shaped members as long as they can abut against the end portion of the substrate 415, and may be, for example, a block member. Further, the pressing member may be covered with a cushioning material or the like on the surface. The adsorption transport unit 5 is disposed along the right side in the transport direction of the floating machine 1A, and is adsorbed and held by the right side 20 in the transport direction of the I-plate 4 of the floating machine 1A to impart a transporting force in the transport direction. The schematic structure of the adsorption transport unit 5 is constituted by the slide guide member 9, the slider 1A, the elevating mechanism 11, the elevating table 12, the adsorption stage 13, and the adsorption block 14, as shown in Figs. 2A and 2B. The slide guiding member 9 and the slider 1 are moving mechanisms of the button motor which uses the slide guiding member 9 as a guide 10 200819734 member and moves the slider 往返 on the @ straight line. In the present embodiment, a linear motor is used as the moving mechanism, but a single-axis driving mechanism using a ball screw or the like may be employed. The slide guide member 9 of the adsorption conveyance unit 5 is disposed on the right side in the conveyance direction of the floating machine 1A as shown in the first diagram, and extends from the floating machine table 2, the position field P, and the towel portion. It is to the middle of the substrate transfer area P2 upstream of the floating machine 2A.
升降機構11係固定於滑件10上，且在搬送基板4時使吸 附台13上升，且傳送練4，且在魏_來的位置時，在 10吸附台13不與基板4互相干擾之情況下使該吸附台13下降。 升降台12為用以保持設於升降機構丨i上端面之吸附台 13之保持構件。 吸附台13為用以將多數吸附塊14固定在上面而設且長 度較基板4之搬送方向長度L短一點點之矩形的支持構件。 15該吸附台丨3在長向與浮起機台1A之端面平行之狀態下固定 | 於升降台12上。 吸附塊14為以其上端面從裡面吸附基板4之搬送方向 右側之端部的吸附塾，且在各上端面整齊排列於平面上之 、狀態下’隔著適當間隔設置多數在吸附台13上。本實施形 ^ 20 態中，依附塊14在等分基板4之搬送方向寬度方向之端部的 全長L之位置設置6個，且基板4之其中一端部由吸附塊14 整個吸附。 可採用例如在從平面看為矩形之吸附面設有凹部14a 且在該凹部14a中央設有藉由吸引源進行真空吸引之吸引 11 200819734 孔14b的構造作為吸附塊14之構造。 ， 檢查部2係檢查從基板搬入部1搬送而至之基板4且傳 送至基板搬出部3。 檢查部2由固定於未圖示之機台上之門型作举台2a、可 5移動地設於該作業台2a之水平臂部之顯微鏡等檢查頭2b、 浮起機台2A及吸附搬送部6所構成。檢查部2在檢查時為了 不要受到外部振動的影響宜設置於除振台上。 浮起機台2A為朝水平方向載置基板4且朝固定方向搬 送之搬送機台，本實施形態中，採用與浮起機台1A同樣的 10空氣浮起機台。但，檢查部2之浮起機台1A的大小則設定為 搬送寬度方向之寬度與浮起機台1A等寬，而搬送方向之長 度則大於2 · L。因此，當欲在浮起機台2八之基板傳送領域 P2下游設置檢查領域P3時，只要確保在於浮起機台2A上之 基板傳送領域P2將基板4從吸附搬送部5傳送至吸附搬送部 15 6之狀態下，使基板4可相對於檢查頭2a之檢查線從搬送方 向前端移動至後端以藉由檢查頭2a檢查基板4全部之長度 即可。 檢查部2在從基板搬入部1搬入基板4時，宜啟動除振a 且使浮起機台2A與浮起機台ία等高。 2〇 吸附搬送部6與第2B圖所示之吸附搬送部5之構造具有 相同構造。吸附搬送部6如第丨圖所示沿著吸附搬送部5相反 側之浮起機台2A之搬送方向左側配置，且從吸附搬送部$ 接收已由基板搬入部1定位之基板4並浮起搬送之。 吸附搬送部6可藉由多數吸附塊14吸附基板4之搬送方 12 200819734 向左側裡面且賦與基板4搬送力。 檢查部2之滑動引導構件9係如第丨圖所示，沿著浮起機 台2A之搬送方向左側配置，且從浮起機台2八之基板傳送領 域P2之中間部延伸至基板傳送領域(檢查領域)p3之中間部。 5 該滑動引導構件9的長度只要是在相鄰之基板傳送領 域P2、Pa中滑件10可在浮起機台2八之搬送方向長度之範圍 中往返移動之長度即可，亦可與浮起機台2A之搬送方向長 度大致等長。 因此’從平面看，吸附搬送部5之滑動引導構件9與吸 10附搬送部6之滑動引導構件9係隔著浮起機台2A互相平行相 向。相向配置之吸附搬送部5、6只要可在基板傳送領域^ 中傳送基板4即可，滑件1〇不在基板傳送領域p2中間（L/2) 也沒關係，但為正確且穩定地搬送已定位之基板，仍可將 各滑件10移動至基板傳送領域p2中間（L/2)。 15 本實施形態中，設定成可在浮起機台2A上之基板傳送 領域P2將由吸附搬送部5吸附搬送之基板4傳送至吸附搬送 部6。如第2A圖及第2B圖所示，藉由吸附搬送部5之各吸附 塊14、吸附搬送部6之各吸附塊14吸附保持基板4之搬送寬 度方向之端部全部。吸附搬送部5之滑件1〇之移動範圍為了 20 使吸附搬送部5、6之移動中心在基板4之長度L的大致中 央，係設定在與基板4的長度相等之基準·定位領域Ρι與基板 傳送領域P2之中間位置。 同樣地，吸附搬送部6之滑件10之移動範圍則設定在基 板傳送領域h、p3之中間位置。 13 200819734 基板搬出部3藉由例如搬送機器人將在檢查部2之檢查 結束之基板4搬出至裝置外部，且包含浮起機台3A及吸附搬 送部7。 浮起機台3A、吸附搬送部7分別與浮起機台1A、吸附 5搬送部5具有同樣構造。吸附搬送部7沿著吸附搬送部6相反 側之浮起機台3A之搬送方向右側配置。該吸附搬送部7之滑 動引導構件9從浮起機台2A下游之基板傳送領域P3的中間 部延伸至浮起機台3a之基板搬出領域P4的中間部。 吸附搬送部6之滑動引導構件9與吸附搬送部7之滑動 1〇引導構件9之一部分係分別隔著浮起機台2A之基板傳送領 域P3互相平行相向。因此，由吸附搬送部6吸附搬送之基板 4可傳送至在與浮起機台2A上游之浮起機台3A相鄰接之基 板傳送領域I中相向之吸附搬送部7。 如此一來，本實施形態之基板檢查裝置100中，浮起機 口 ΙΑ、2A、3A朝搬送方向依序相鄰接且延伸，且吸附搬送 邛5、6、7在该搬送方向兩側交互地配置成千鳥格狀。因此， 可在基板傳送領域Pa、&將已定位之基板4分別從吸附搬送 45朝吸附搬送部6或從吸附搬送部6朝吸附搬送部7依序傳 送且搬送。 接著，針對本實施形態之基板檢查裝置1〇〇的動作，以 基板4之搬送動作為中心來做說明。 第3、4圖針對本發明第1實施形態之基板檢查裝置的動 作來說明之平面圖。 首先如第1圖之圖式左端所示，使吸附搬送部5之滑 14 200819734 件10移動至成為搬送開始侧之基準定位領域？1之中門位 ^此時，調整升降機_的高度，且先使吸附塊14的上 端面較基板4裡面之浮起高度低。 然後’將由未之搬送_人等搬人之基板4移载至 5較=起機台1A上突出之抬高構件之各抬高桿上。抬高構件 在從搬送機器人接收基板4之後，會下降且使基板4載置於 浮起機台1A上。耗於浮起機#1A上之基板惰由從浮起 枝σ 1A朝上方喷射之氣體浮起至預定高度。由於基板4浮起 於浮起機台1Α上，故平面方向之移動是自由的，且即使基 10板4的尺寸較大，也可以些微負荷移動。 接著，移動推壓桿8c、8c，且將浮起狀態之基板4推向 基準桿8a、8a、8b以在基準位置進行定位。 藉由該等動作’藉由基準桿8a、8a、8b推壓浮起於浮 起機台1A上之基板4的兩邊，以分別相對於搬送寬度方向、 15 搬送方向之基準位置來定位從平看之位置。 在此狀態下，驅動升降機構11，使吸附塊14上升至基 板4裡面之高度，且真空吸附已定位於基準位置之基板4。 在真空吸附結束後，使基準桿8b下降，同時使推壓桿8 朝遠離基板4之方向退避。 20 然後，吸附搬送部5之滑件10移動至基板傳送領域卩2之 中間位置，且將基板4搬送至檢查部2之基板傳送領域P2。 此時，吸附搬送部6之滑件10使升降機構11下降，且使 吸附塊14之上端面較基板4裡面的高度低，且移動至浮起機 台1A之基板傳送領域P2待機。 15 200819734 結果，如第3圖所示，吸附搬送部5、6之各滑件10在移 動於浮起機台2A之基板傳送領域P2之基板4下面配置於互 相相向之位置。在該狀態下，使升降機構U上升，使吸附 搬送部6之吸附塊Η之上端面抵接於基板4裡面。然後，在 5以吸附搬送部5之吸附塊14吸附保持基板4之狀態下，由吸 附搬送部6真空吸附。此時，與搬送寬度方向相向之基板4 的兩端部分別由吸附搬送部5、6之各吸附塊14吸附保持大 致全長的部份。 在吸附結束後，解除吸附搬送部5之吸附，且使吸附搬 1〇送部5之升降機構11下降。吸附搬送部5移動至基板搬入部1 之基板定位領域？1，且回到上述開始搬送時之狀態，並備 用於下一基板4之搬送。 藉此，由基板定位機構定位之基板4以已定位之狀態從 搬送方向右側之吸附搬送部5傳送至搬送方向左側之吸附 15 搬送部6。 如此一來，藉由在以吸附搬送部6吸附保持由吸附搬送 部5搬送而至之基板4的相反侧之狀態下解除吸附搬送部5 之吸附，藉此，基板4之平面方向之基準位置不會改變，且 基板4可以由基板定位機構維持基準位置之狀態傳送至相 20 向之吸附搬送部6。 接著，使吸附搬送部6之滑件10移動至檢查領域匕，且 在浮起機；σ 2A上，朝浮起機台3 A搬送基板4(參照第4圖)。 此時，因應檢查部2之檢查所需，以預先設定之固定速度搬 送，或以預定之速度變化搬送，或進行預定之位置移動來 16 200819734 搬送。在本實施形悲中’根據基板4上之各缺陷之座標資 料，搬送基板4且使其停止，使所指定之缺陷與檢查頭2b之 檢查線一致，同時使檢查頭2b沿著作業台2a移動，使檢查 頭2b之光軸與缺陷一致。如此一來，藉由使基板4與檢查頭 5 2b相對性地朝χγ移動，可檢查基板4之任意位置。 此時，吸附搬送部7之滑件10使升降機構η下降，且使 吸附塊14之上端面較基板4裡面之高度低，且移動至浮起機 台2Α之基板傳送領域ρ3待機。 然後’當基板4移動至浮起機台2Α之搬送方向之端告ρ 10時，吸附搬送部6、7之滑件10會相向地配置於基板4下面。 在該狀態下，驅動吸附搬送部7之升降機構11，且使其上升 至吸附搬送部7之吸附塊14的上端面抵接於基板4裏面。然 後，在以吸附搬送部6之吸附塊14吸附保持基板4之狀態 下，由吸附搬送部7真空吸附。此時，與搬送寬度方向相向 15 之基板4的兩端部分別由吸附搬送部6、7之各吸附塊Μ吸附 保持大致全長的部份。 在吸附搬送部7之吸附結束後，解除吸附搬送部6之吸 附，且使吸附搬送部6之升降機構11下降。吸附搬送部6移 動基板傳送領域Ρ2,且回到上述接收基板時之狀態，並備 20 用於下一基板4之接收。 接著’移動吸附搬送部7之滑件10，將基板4搬送至浮 起機台3Α上。然後，將基板4傳送至未圖示之搬送機器人 等，同時解除吸附搬送部7之吸附，且接收下一基板4，故 使吸附搬送部7之滑件1〇回到基板傳送領域ρ3。 17 200819734 如此一來，基板4之接收、檢查、搬出則結束。 如此一來，根據本實施形態之基板檢查裝置1〇〇，可藉 =吸附搬送部5、6、7交互地保持基板4之搬送寬度方向之 $端4，且在洋起機台1A、2A、从上依序搬送基板4。如此 來’藉由保縣板4之其巾_側來進行單她送，由吸附 处（6、7吸附支持之基板4的另一端部則成為自由狀 恶，因此，不會如過去保持兩侧來搬送時給基板4帶來壓 力。如此一來，藉由僅吸附保持基板4之其中一侧，可水平 地搬送基板4，並可防止對基板4之檢查精度下降。 1〇 —又，可緩和各單側搬送部之配置精度，且因應所需在 母個搬送機台皆改變搬送方向。 又，藉由在基板傳送領域P2、Ps由吸附搬送部5、6及 吸附搬送部6、7來吸附保持搬送寬度方向之兩端部，可維 持定位狀態一面傳送基板4來搬送。藉此，可省去在傳送時 15要進仃位置調整等的工夫，並簡化基板檢查裝置1〇〇之調整 機構，同時提高檢查效率。 又，由於一面維持基板4之定位狀態一面搬送至基板傳 送領域P4，故可將基板4正確地傳送至搬送機器人。因此， 搬送機器人在將基板4插入匣盒内時，在基板4不要碰到匣 20盒之側壁之狀況下，不用重新對準即可將基板4搬送至匣盒 内0 接著，針對本實施形態之變形例來說明。 第5圖係本發明第1實施形態之變形例之基板檢查裝置 之概略構造之平面圖。 18 200819734 本實施例之基板檢查裝置110係如第5圖所示，具有吸 附搬送部15(單側搬送部)來取代上述第丨實施形態之基板檢 查裳置100之吸附搬送部5、7。以下，以與上述第1實施形 態不同的點為中心來說明。 5 吸附搬送部15為將吸附搬送部5之滑動引導構件9替換 成延長至吸附搬送部7之滑動引導構件9之位置之滑動引導 構件16，同時，取代吸附搬送部5之滑件10，將由同樣構造 所構成之兩個滑件10A、10B可移動地設於滑動引導構件16 上。 10 另，在滑件l〇A、10B上部如第2B圖所示，具有升降機 構11、升降台12、吸附台13及吸附塊14。 即，相當於連接上述第1實施形態所示之吸附搬送部 5、7之各滑動引導構件9形成為一條之構造。 根據本變形例之基板檢查裝置110，藉由將上述第1實 15 施形態之吸附搬送部5、7之滑件1〇分別替換成吸附搬送部 15之滑件10A、10B，可進行完全同樣的動作。因此，具有 與前述第1實施形態同樣的作用效果。 再者，根據本變形例，由於吸附搬送部5、7與吸附搬 送部15—體化，故可減少零件數量。又，由於滑件i〇A、ιοΒ 2〇 可移動至浮起機台2A之任意位置，故即使基板4之長度1改 變，亦可輕易地對應，同時，可輕易地變更浮起機台2人之 基板傳送領域P2、P3之位置。 [第2實施形態] 針對本發明第2實施形態之基板檢查裝置做說明。 19 200819734 第6圖係顯示本發明第2實施形態之基板檢查裝置之概 略構造之平面圖。 本實施形態之基板檢查裝置12 0係如第6圖所示具有吸 附搬送部17、19(單侧搬送部）來取代上述第1實施形態之基 5 板檢查裝置100之吸附搬送部5、6，且去掉吸附搬送部7。 以下以與上述第1實施形態不同的點為中心來說明。 吸附搬送部17為取代使基板檢查裝置1〇〇之吸附搬送 部5之滑動引導構件9延長至浮起機台2A之基板傳送領域 P3 ’且使滑件10可在浮起機台2A之搬送方向的大致全長的 10範圍移動之滑動引導構件18。 吸附搬送部19使吸附搬送部6之滑動引導構件9延長至 浮起機台3A之基板搬出領域P4，且使基板4可在浮起機台 2A與浮起機台3A之間移動。 藉由上述構造，藉由吸附搬送部17在基板搬入部1與檢 15查部2之範圍或藉由吸附搬送部19在檢查部2與基板搬出部 3之範圍中分別搬送基板4。然後，在吸附搬送部17、19之 搬送範圍共有之浮起機台2A上任意位置，可將基板4從吸附 搬送部17傳送至吸附搬送部19。即，浮起機台2A上之傳送 位置在浮起機台2A之浮起機台1A側、浮起機台3A侧、或該 20等之中間位置等任何位置可因應所需選擇。 如此一來，本實施形態藉由將2個單側搬送部配置於3 個搬送機台，可實現在各單側搬送部之間傳送基板來搬送 之構造。此為本發明中相對於3個搬送機台具有最低限度之 單側搬送部之構造例。 20 200819734 根據本實施形態，相對於第丨實施形態可減少單側搬送 部的數量。 又，本實施形態中，由於吸附搬送部17、19共有浮起 機台2A之搬送方向之大致全長之搬送範圍，故在檢查部2 5内可使所吸附保持之端部左右對換。因此，例如，即使吸 附塊14成為檢查阻礙之檢查，例如，如第1圖所示，使檢查 頭2b朝基板4之搬送方向掃描時，當檢查頭2b與吸附保持基 板4之吸附塊14互相干擾時，亦可改由相反侧之吸附塊μ來 拿基板4 ’藉此可進行各端部之檢查。 10 [第3實施形態] 針對本發明第3實施形態之基板檢查裝置做說明。 第7圖係顯示本發明第3實施形態之基板檢查裝置之概 略構造之平面圖。 本實施形態之基板檢查裝置13〇係如第7圖所示具有多 15數檢查部2a、此來取代上述第1實施形態之基板檢查裝置 100之檢查部2，且因應於此具有多數吸附搬送部6a、6b(單 側搬送部）來取代吸附搬送部6，並在各檢查部2a、2b之間 追加吸附搬送部70(單側搬送部）。以下以與上述第1實施形 態不同的點為中心來說明。 檢查部2a、2b用以進行圖案檢查、再檢查、巨觀檢查 等檢查’雖未特別圖示，但具有因應各檢查而不同的檢查 部份。檢查部2a具有浮起機台2A與吸附搬送部6a，檢查部 2b具有浮起機台2A與吸附搬送部6b。 然後，在基板搬入部1與檢查部2a之間以與第1實施形 21 200819734 態同樣之位置關係配置有吸附搬送部5。 又，吸附搬送部70之滑動引導構件90係延伸至與檢查 部2a、2b相鄰接之檢查領域p3與基板傳送領域P2各自之中間 部。吸附搬送部70之構造只有滑動引導構件90的長度不 5同，其他構造皆與吸附搬送部7相同。 又，在檢查部2b與基板搬出部3之間以與第1實施形態 相同之位置關係配置有吸附搬送部7。 藉由該構造，與第1實施形態相同，可將以基板搬入部 1疋位之基板4傳送至吸附搬送部6a。然後，在檢查部2a之 10 檢查後，在吸附搬送部6a與吸附搬送部70之間搬送範圍共 有之浮起機台2A之檢查領域p3中將基板4傳送至吸附搬送 部70〇 吸附保持於吸附搬送部70之基板4同樣搬送至相鄰之 +双查部2b之基板傳送領域&，且將基板傳送至吸附搬送部 15 6b。 μ後，在私一部2b結東檢查之基板4藉由吸附搬送部如 搬送至下游之基板傳送領域p3，且在該基板傳送領域Μ 將基板4傳运至吸附搬送部7，並藉由基板搬出部3之吸附搬 20 如搬达至基板搬出領域P4，且藉由未圖示之搬送機器人 搬送至裝置外部。 本實施形態成為設有多數檢查部時的例子。如此一 A:本^月中在基板搬人部丨與基板搬出部$之間可增設 夕數檢查部2。 因此，即使各搬送機台、單侧搬送部之搬送距離較短， 22 200819734 — 藉由相鄰配置其等，亦可延長整體之搬送距離。 [第4實施形態] 針對本發明第4實施形態之基板檢查裝置做說明。 第8圖係顯示本發明第4實施形態之基板檢查裝置之概 、 5 略構造之平面圖。 ‘ 本實施形態之基板檢查裝置140如第8圖所示具有滾筒 機台IB、2B、3B(搬送機台）來取代上述第1實施形態之基板 φ 檢查裝置100之浮起機台ΙΑ、2A、3A。以下以與上述第1 實施形態不同的點為中心來說明。 10 滾筒機台1B、2B、3B為在從平面看分別與浮起機台 1A、2A、3A同樣大小之矩形的機台面上以適當間隔配列多 數用以以固定高度朝水平方向搬送基板4之搬送滾筒3〇。 搬送滾筒30可採用例如在滾筒機台1B、2b、3B之水平 面内支持成可自由地朝360度方向旋轉之圓筒滾筒或球狀 . 15滾筒等。 • 根據上述構造，除了基板4在搬送滾筒30上用滾筒搬送 這點以外，可進行與上述第丨實施形態同樣的動作，因此， 與上述第1實施形態具有同樣的作用效果。 . 另，在上述說明中，以相鄰接多數搬送機台而配置時 • 2〇的例子做說明，但亦可朝搬送方向延伸設置一個搬送^ 台，且在與搬送方向垂直之方向的其中一側配置多數單側 搬送部，且在該等多數單侧搬送部之間傳送基板來搬送 之。例如，在上述各實施形態、變形例中，亦可變形為八 別以浮起機台ΙΑ、2A、3A或滾筒機台IB、2B、3B等作為 23 200819734 一體之搬送機台。 此時，由於可在整個搬送方向將決定基板搬送精度之 單側搬送部分成多數，因此，例如，在每一個兩滞， 徊而要搬送精 度之檢查部份皆分割單側搬送部，藉此相較於整個搬、关路 5 徑全長僅設置一個進行高精度搬送之單側搬送部，w 、、 簡單且便宜的構造。 ° 又，在上述說明中，當搬送機台分割為多數時，美板 之傳送位置係位於相鄰之搬送機台之其中—者的# = 但，當搬送機台之段差非常小時，如第5圖、笼&θ 一 示〇圖所不， 10 亦可在基板跨越兩個相鄰之搬送基板之位置進行夷板傳 送。 、 又，在上述說明中，多數單侧搬送部係設於在基板之 傳送位置可隔著搬送機台相向之位置。但，只要可傳送其 板，亦可將多數單側搬送部設於在搬送機台之同一方向側 15邊可朝與搬送方向垂直之方向相向之位置。 又，在上述說明中，檢查部2宜保持於除振台，但因應 所需亦可將任一搬送機台、單側搬送部配置於除振台上。 根據本發明，該除振台亦可每個搬送機台與每個單側單送 部皆個別地設置，因此有裝置之設置更為容易之優點。 20 又，上述5兒明之各實施形態、變形例之各構成要素尸 要技術上可行，亦可在本發明之技術性思想之範圍内適當 地組合來實施。 以上已說明本發明之較佳實施例，但本發明並不限於 該等實施例。在不脫離本發明之旨趣之範圍内，可進行構 24 200819734 5 • ’ 10 造之附加、省略、替換及其他變更。本發明並非由前述之 說明來限定，而僅由所附之申請專利範圍來限定。 【圖式簡單說明3 第1圖係顯示本發明第1實施形態之基板檢查裝置之概 略構造之平面圖。 第2A圖係第1圖之A部的部份放大圖。 第2B圖係從第2A圖之B觀看之正視圖。 第3圖係針對本發明第1實施形態之基板檢查裝置之動 作來說明之平面圖。 第4圖係針對本發明第1實施形態之基板檢查裝置之動 作來說明之平面圖。 第5圖係本發明第1實施形態之變形例之基板檢查裝置 之概略構造之平面圖。 第6圖係顯示本發明第2實施形態之基板檢查裝置之概 15 • 略構造之平面圖。 第7圖係顯示本發明第3實施形態之基板檢查裝置之概 略構造之平面圖。 第8圖係顯示本發明第4實施形態之基板檢查裝置之概 略構造之平面圖。 20 【主要元件符號說明】 1…基板搬入部 2a...作業台 ΙΑ、2A、3A·.·浮起機台 2b...檢查頭 IB、2B、3B···滾筒機台 3…基板搬出部 2...檢查部 4…基板 25 200819734 5、6、6a、6b、7、70"·吸附搬 18...滑動引導構件 送部 30...搬送滾筒 8a、8b...基準桿 90…滑動引導構件 8c...推壓桿 100、110、120、130 、140…基 9...滑動引導構件 板檢查裝置 10、10A、10B··.滑件 N...氣體喷射孔 11...升降機構 L...搬送方向長度 12...升降台 W...寬度 B...吸附台 Pi...基準定位領域 14...吸附塊 p2…基板傳送領域 14a···凹部 P3...基板傳送領域、 檢查領域 14b...吸引孔 15、17、19…吸附搬送部 P4...基板搬出領域 26The elevating mechanism 11 is fixed to the slider 10, and when the substrate 4 is transported, the adsorption stage 13 is raised, and the transfer 4 is carried out, and in the position of the Wei_, the adsorption stage 13 does not interfere with the substrate 4 at the time of the position. The adsorption stage 13 is lowered. The lifting table 12 is a holding member for holding the suction table 13 provided on the upper end surface of the elevating mechanism 丨i. The adsorption stage 13 is a rectangular support member for fixing a plurality of adsorption blocks 14 to the upper surface and having a length shorter than the length L of the substrate 4 in the transport direction. 15 The adsorption stage 3 is fixed to the lifting table 12 in a state where the longitudinal direction is parallel to the end surface of the floating machine 1A. The adsorption block 14 is an adsorption port which adsorbs the end portion on the right side in the conveyance direction of the substrate 4 from the inside, and the upper end faces are aligned on the plane, and a plurality of the upper end faces are disposed on the adsorption stage 13 at appropriate intervals. . In the embodiment of the present invention, the attachment block 14 is provided at six positions of the entire length L of the end portion in the width direction of the transfer direction of the substrate 4, and one end portion of the substrate 4 is entirely adsorbed by the adsorption block 14. For example, a concave portion 14a may be provided on the adsorption surface which is rectangular in plan view, and a suction by vacuum suction may be provided in the center of the concave portion 14a. 11200719734 The structure of the hole 14b is configured as the adsorption block 14. The inspection unit 2 inspects the substrate 4 transported from the substrate loading unit 1 and transfers it to the substrate carry-out unit 3. The inspection unit 2 is an inspection head 2b such as a microscope that is fixed to a machine table (not shown), a microscope 4 that is movable in the horizontal arm portion of the work table 2a, a lifting machine 2A, and a suction conveyor. Part 6 is composed. The inspection unit 2 is preferably placed on the vibration isolation stage in order to prevent external vibration from being affected during inspection. The floating machine 2A is a transfer table that mounts the substrate 4 in the horizontal direction and is transported in the fixed direction. In the present embodiment, a 10 air floating machine similar to the floating machine 1A is used. However, the size of the floating machine 1A of the inspection unit 2 is set such that the width in the conveyance width direction is equal to the width of the floating machine 1A, and the length of the conveyance direction is more than 2 · L. Therefore, when the inspection area P3 is to be provided downstream of the substrate transfer area P2 of the floating machine 2, it is ensured that the substrate 4 is transferred from the adsorption transfer unit 5 to the adsorption transfer unit in the substrate transfer area P2 on the floating machine 2A. In the state of 15 6 , the substrate 4 can be moved from the front end to the rear end in the transport direction with respect to the inspection line of the inspection head 2 a to inspect the entire length of the substrate 4 by the inspection head 2 a. When the inspection unit 2 carries the substrate 4 from the substrate loading unit 1, it is preferable to start the vibration elimination a and to make the floating machine 2A and the floating machine ία equal. 2〇 The adsorption transport unit 6 has the same structure as the structure of the adsorption transport unit 5 shown in Fig. 2B. The adsorption transport unit 6 is disposed on the left side in the transport direction of the floating machine 2A on the opposite side of the adsorption transport unit 5 as shown in the figure, and receives the substrate 4 that has been positioned by the substrate loading unit 1 from the adsorption transport unit $ and floats. Transfer it. The adsorption transport unit 6 can adsorb the transfer force of the substrate 4 by a plurality of adsorption blocks 14 to the left side of the transport side 12 200819734. The slide guide member 9 of the inspection unit 2 is disposed on the left side in the conveyance direction of the floating machine 2A as shown in the figure, and extends from the intermediate portion of the substrate transfer area P2 of the floating machine 2 to the substrate transfer field. (inspection area) The middle part of p3. 5 The length of the sliding guide member 9 may be a length that can be reciprocated in the range of the length of the floating direction of the floating machine 2 in the adjacent substrate transfer fields P2 and Pa, and may be floated. The transport direction of the starting machine 2A is approximately the same length. Therefore, the sliding guide member 9 of the adsorption transport unit 5 and the slide guide member 9 of the suction/removal transport unit 6 are parallel to each other across the floating machine 2A. The adsorption transport units 5 and 6 that are disposed to face each other can transport the substrate 4 in the substrate transfer area, and the slider 1〇 does not have to be in the middle of the substrate transfer area p2 (L/2), but the carrier is correctly and stably transported. The substrate can still move each slider 10 to the middle (L/2) of the substrate transfer area p2. In the present embodiment, the substrate 4 that is adsorbed and transported by the adsorption transport unit 5 can be transported to the adsorption transport unit 6 in the substrate transport area P2 on the floating machine 2A. As shown in Figs. 2A and 2B, all of the adsorption blocks 14 of the adsorption transport unit 5 and the adsorption blocks 14 of the adsorption transport unit 6 adsorb and hold all of the end portions of the substrate 4 in the transport width direction. The movement range of the slider 1 of the adsorption transport unit 5 is set so that the movement center of the adsorption transport units 5 and 6 is substantially at the center of the length L of the substrate 4, and is set to be equal to the length of the substrate 4. The intermediate position of the substrate transfer area P2. Similarly, the moving range of the slider 10 of the adsorption transport unit 6 is set at the intermediate position between the substrate transport areas h and p3. 13 200819734 The substrate carrying-out unit 3 carries out the substrate 4 that has been inspected by the inspection unit 2 to the outside of the apparatus by, for example, a transport robot, and includes the floating machine table 3A and the adsorption transport unit 7. The floating machine 3A and the adsorption transport unit 7 have the same structure as the floating machine 1A and the adsorption 5 transport unit 5, respectively. The adsorption transport unit 7 is disposed on the right side in the transport direction of the floating machine 3A on the opposite side of the adsorption transport unit 6. The slide guiding member 9 of the adsorption transport unit 7 extends from the intermediate portion of the substrate transfer region P3 downstream of the floating machine 2A to the intermediate portion of the substrate carry-out area P4 of the floating machine 3a. The slide guide member 9 of the adsorption transport unit 6 and the slide of the adsorption transport unit 7 are partially parallel to each other via the substrate transfer region P3 of the floating machine 2A. Therefore, the substrate 4 adsorbed and transported by the adsorption transport unit 6 can be transported to the adsorption transport unit 7 facing the substrate transport area I adjacent to the floating machine table 3A upstream of the floating machine 2A. In the substrate inspection apparatus 100 of the present embodiment, the floating machine ports 2, 2A, and 3A are sequentially adjacent to each other in the transport direction, and the adsorption transport ports 5, 6, and 7 interact on both sides in the transport direction. The ground is arranged in a thousand bird shape. Therefore, the substrate 4 to be positioned can be sequentially transported and transported from the adsorption transport 45 to the adsorption transport unit 6 or the adsorption transport unit 6 to the adsorption transport unit 7 in the substrate transfer area Pa, & Next, the operation of the substrate inspection apparatus 1A of the present embodiment will be described focusing on the transfer operation of the substrate 4. Figs. 3 and 4 are plan views for explaining the operation of the substrate inspecting apparatus according to the first embodiment of the present invention. First, as shown in the left end of the drawing of Fig. 1, the slippery 14 200819734 piece 10 of the adsorption transport unit 5 is moved to the reference positioning field which is the transfer start side. 1 middle door position ^ At this time, the height of the elevator _ is adjusted, and the upper end surface of the adsorption block 14 is first made lower than the floating height inside the substrate 4. Then, the substrate 4, which has been moved by a person who has not been transferred, is transferred to each of the raising levers of the raising member which is protruded from the starting table 1A. The lifting member is lowered after receiving the substrate 4 from the transfer robot, and the substrate 4 is placed on the floating machine 1A. The substrate idler on the floater #1A is floated to a predetermined height by the gas ejected upward from the floating branch σ 1A. Since the substrate 4 floats on the floating table 1 , the movement in the plane direction is free, and even if the size of the base 10 plate 4 is large, it is possible to move with a slight load. Next, the push rods 8c, 8c are moved, and the substrate 4 in the floating state is pushed toward the reference rods 8a, 8a, 8b to be positioned at the reference position. By these operations, the two sides of the substrate 4 floating on the floating machine 1A are pressed by the reference rods 8a, 8a, and 8b, and positioned at a position relative to the transport width direction and the reference position of the 15 transport direction, respectively. Look at the location. In this state, the elevating mechanism 11 is driven to raise the adsorption block 14 to the height inside the substrate 4, and vacuum-adsorbs the substrate 4 which has been positioned at the reference position. After the vacuum adsorption is completed, the reference rod 8b is lowered, and the pressing rod 8 is retracted away from the substrate 4. Then, the slider 10 of the adsorption transport unit 5 is moved to the intermediate position of the substrate transfer area 卩2, and the substrate 4 is transported to the substrate transfer area P2 of the inspection unit 2. At this time, the slider 10 of the adsorption transport unit 6 lowers the elevating mechanism 11, and the upper end surface of the adsorption block 14 is lower than the height of the inside of the substrate 4, and moves to the substrate transfer area P2 of the floating machine 1A. 15 200819734 As a result, as shown in Fig. 3, the sliders 10 of the adsorption transport units 5 and 6 are disposed at positions facing each other under the substrate 4 which is moved to the substrate transport area P2 of the floating machine 2A. In this state, the elevating mechanism U is raised, and the end surface of the adsorption block 吸附 of the adsorption transport unit 6 is brought into contact with the inside of the substrate 4. Then, in the state where the substrate 4 is adsorbed and held by the adsorption block 14 of the adsorption transport unit 5, the adsorption/transport unit 6 vacuum-adsorbs. At this time, both end portions of the substrate 4 facing the transport width direction are adsorbed and held by the respective adsorption blocks 14 of the adsorption transporting portions 5 and 6 to a substantially full length portion. After the adsorption is completed, the adsorption by the adsorption transport unit 5 is released, and the elevating mechanism 11 of the adsorption/transport unit 5 is lowered. The adsorption transport unit 5 moves to the substrate positioning field of the substrate loading unit 1? 1, and returning to the state at the time of starting the transfer, and preparing for the transfer of the next substrate 4. Thereby, the substrate 4 positioned by the substrate positioning mechanism is transported from the adsorption transport unit 5 on the right side in the transport direction to the adsorption transport unit 6 on the left side in the transport direction. In this way, the adsorption of the adsorption transport unit 5 is released while the adsorption transport unit 6 adsorbs and holds the opposite side of the substrate 4 transported by the adsorption transport unit 5, whereby the reference position of the substrate 4 in the planar direction is achieved. The substrate 4 can be transported to the adsorption transport unit 6 in the phase 20 by the substrate positioning mechanism while maintaining the reference position. Next, the slider 10 of the adsorption transport unit 6 is moved to the inspection area 匕, and the substrate 4 is transported toward the floating machine 3 A on the hoisting machine σ 2A (see FIG. 4). At this time, in accordance with the inspection required by the inspection unit 2, the conveyance is carried out at a predetermined fixed speed, or at a predetermined speed, or at a predetermined position, 16 200819734. In the present embodiment, the substrate 4 is transported and stopped according to the coordinate data of each defect on the substrate 4, so that the specified defect coincides with the inspection line of the inspection head 2b, and the inspection head 2b is placed along the writing table 2a. Move so that the optical axis of the inspection head 2b coincides with the defect. In this way, by moving the substrate 4 and the inspection head 52b relatively toward the χγ, the arbitrary position of the substrate 4 can be inspected. At this time, the slider 10 of the adsorption transport unit 7 lowers the elevating mechanism η, and the upper end surface of the adsorption block 14 is lower than the height of the inside of the substrate 4, and moves to the substrate transfer area ρ3 of the floating machine 2 to stand by. Then, when the substrate 4 is moved to the end of the conveying direction of the floating machine 2, the slider 10 of the adsorption conveying units 6 and 7 is disposed opposite to the lower surface of the substrate 4. In this state, the elevating mechanism 11 of the adsorption transport unit 7 is driven to rise to the upper end surface of the adsorption block 14 of the adsorption transport unit 7 to abut against the inside of the substrate 4. Then, in the state in which the substrate 4 is adsorbed and held by the adsorption block 14 of the adsorption transport unit 6, the adsorption transport unit 7 vacuum-adsorbs. At this time, both end portions of the substrate 4 facing the transport width direction 15 are adsorbed and held by the respective adsorption blocks of the adsorption transport units 6 and 7 to substantially the entire length. After the adsorption by the adsorption transport unit 7 is completed, the adsorption of the adsorption transport unit 6 is released, and the elevating mechanism 11 of the adsorption transport unit 6 is lowered. The adsorption transport unit 6 moves the substrate transfer area Ρ2 and returns to the state when the substrate is received, and is used for receiving the next substrate 4. Next, the slider 10 of the adsorption transport unit 7 is moved to transport the substrate 4 onto the floating machine table 3A. Then, the substrate 4 is transported to a transfer robot or the like (not shown), and the adsorption of the adsorption transport unit 7 is released, and the next substrate 4 is received. Therefore, the slider 1 of the adsorption transport unit 7 is returned to the substrate transfer region ρ3. 17 200819734 As a result, the reception, inspection, and removal of the substrate 4 are completed. According to the substrate inspection apparatus 1 of the present embodiment, the suction end portions 5, 6, and 7 can alternately hold the end 4 of the transfer width direction of the substrate 4, and the riser tables 1A, 2A can be held. The substrate 4 is sequentially transferred from above. In this way, 'the side of the board of the Baoxian board 4 is sent by her, and the other end of the substrate 4 supported by the adsorption (6, 7 is free), so it will not remain as in the past. When the side is transported, pressure is applied to the substrate 4. Thus, by merely adsorbing one side of the substrate 4, the substrate 4 can be horizontally transported, and the inspection accuracy of the substrate 4 can be prevented from being lowered. The arrangement accuracy of each of the single-side conveyance units is alleviated, and the conveyance direction is changed in the mother conveyance machine as required. Further, the adsorption conveyance units 5 and 6 and the adsorption conveyance units 6 and 7 are provided in the substrate conveyance areas P2 and Ps. By adsorbing and holding both end portions in the transport width direction, the substrate 4 can be transported while maintaining the positioning state. This eliminates the need to adjust the position of the feed during the transfer, and simplifies the substrate inspection apparatus. The adjustment mechanism improves the inspection efficiency. Further, since the substrate 4 is transported to the substrate transfer region P4 while maintaining the positioning state of the substrate 4, the substrate 4 can be accurately transferred to the transfer robot. Therefore, the transfer robot inserts the substrate 4. In the case of the inside of the case, the substrate 4 can be transported to the inside of the cassette without realigning the substrate 4 without being realigned. Next, a modification of the embodiment will be described. A plan view of a schematic structure of a substrate inspection apparatus according to a modification of the first embodiment of the present invention. 18 200819734 The substrate inspection apparatus 110 of the present embodiment has an adsorption transport unit 15 (single-side transport unit) instead of the fifth embodiment. In the substrate of the first embodiment, the adsorption transport units 5 and 7 of the shoe 100 are placed. The following description focuses on points different from the above-described first embodiment. The adsorption transport unit 15 guides the sliding of the adsorption transport unit 5. The member 9 is replaced with a slide guide member 16 that is extended to the position of the slide guide member 9 of the suction transport portion 7, and at the same time, the two sliders 10A, 10B composed of the same structure are movable instead of the slider 10 of the adsorption transport portion 5. The slide guide member 16 is provided on the slide guide member 16. Further, as shown in Fig. 2B, the upper portion of the sliders 10A, 10B has a lift mechanism 11, a lift table 12, a suction table 13, and an adsorption block 14. The first one above Each of the slide guide members 9 of the adsorption transport units 5 and 7 is formed in a single structure. The substrate inspection device 110 according to the present modification is configured by the adsorption transport units 5 and 7 of the first embodiment. The sliders 1A are replaced with the sliders 10A and 10B of the adsorption transport unit 15 and can perform the same operation. Therefore, the same effects as those of the first embodiment are obtained. Further, according to the present modification, the adsorption is performed. Since the conveying units 5 and 7 are integrated with the adsorption conveying unit 15, the number of parts can be reduced. Further, since the sliders i〇A and ιοΒ 2〇 can be moved to any position of the floating machine 2A, even the length of the substrate 4 1 change can also be easily matched, and at the same time, the position of the substrate transfer fields P2 and P3 of the floating machine can be easily changed. [Second Embodiment] A substrate inspection apparatus according to a second embodiment of the present invention will be described. 19 200819734 Fig. 6 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a second embodiment of the present invention. The substrate inspection device 120 of the present embodiment has the adsorption transport units 17 and 19 (single-side transport unit) as shown in Fig. 6, instead of the adsorption transport units 5 and 6 of the base 5-plate inspection apparatus 100 of the first embodiment. And the adsorption transport unit 7 is removed. Hereinafter, a point different from the above-described first embodiment will be mainly described. The adsorption transport unit 17 is configured to extend the slide guide member 9 of the adsorption transport unit 5 of the substrate inspection apparatus 1 to the substrate transfer area P3 ′ of the floating machine 2A and to transport the slider 10 to the floating machine 2A. The sliding guide member 18 is moved over a substantially full range of 10 directions. The adsorption transport unit 19 extends the slide guide member 9 of the adsorption transport unit 6 to the substrate carry-out area P4 of the floating machine 3A, and moves the substrate 4 between the floating machine 2A and the floating machine 3A. According to the above configuration, the substrate 4 is transported by the adsorption transport unit 17 in the range of the substrate loading unit 1 and the inspection unit 2 or by the adsorption transport unit 19 in the range of the inspection unit 2 and the substrate unloading unit 3, respectively. Then, the substrate 4 can be transported from the adsorption transport unit 17 to the adsorption transport unit 19 at any position on the floating machine 2A shared by the transport ranges of the adsorption transport units 17 and 19. Namely, the transfer position on the floating machine 2A can be selected at any position such as the floating machine 1A side of the floating machine 2A, the floating machine 3A side, or the intermediate position of the 20 or the like. In this way, in the present embodiment, by arranging the two single-side conveying units on the three conveyor tables, it is possible to realize a structure in which the substrates are transported between the single-side conveying units. This is an example of the structure of the single-side conveying unit having the smallest limit with respect to the three conveying machines in the present invention. 20 200819734 According to the present embodiment, the number of single-side conveying units can be reduced with respect to the second embodiment. Further, in the present embodiment, since the adsorption transporting sections 17 and 19 share the transport range of substantially the entire length of the transporting direction of the floating machine 2A, the end portion to be adsorbed and held can be swapped right and left in the inspection unit 25. Therefore, for example, even if the adsorption block 14 is inspected for inspection, for example, as shown in Fig. 1, when the inspection head 2b is scanned in the conveyance direction of the substrate 4, the inspection head 2b and the adsorption block 14 of the adsorption holding substrate 4 are mutually In the case of interference, the substrate 4' may be taken by the adsorption block μ on the opposite side, whereby the inspection of each end portion can be performed. [Third Embodiment] A substrate inspection apparatus according to a third embodiment of the present invention will be described. Fig. 7 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a third embodiment of the present invention. The substrate inspection device 13 of the present embodiment has a plurality of 15 inspection portions 2a as shown in Fig. 7, and replaces the inspection portion 2 of the substrate inspection device 100 of the first embodiment, and has a plurality of adsorption transports. In place of the adsorption transport unit 6 , the adsorption transport unit 70 (one-side transport unit) is added between the inspection units 2 a and 2 b. Hereinafter, a description will be given focusing on a point different from the above-described first embodiment. The inspection units 2a and 2b perform inspections such as pattern inspection, re-inspection, and giant inspection. Although not specifically illustrated, the inspection portions 2a and 2b have inspection portions that are different depending on the inspection. The inspection unit 2a includes a floating machine 2A and an adsorption transport unit 6a, and the inspection unit 2b includes a floating machine 2A and an adsorption transport unit 6b. Then, the adsorption transport unit 5 is disposed between the substrate loading unit 1 and the inspection unit 2a in the same positional relationship as the first embodiment 21 200819734. Further, the slide guide member 90 of the adsorption transport unit 70 extends to an intermediate portion between the inspection region p3 and the substrate transfer region P2 adjacent to the inspection portions 2a and 2b. The structure of the adsorption transport unit 70 is the same as the length of the slide guide member 90, and the other structures are the same as those of the adsorption transport unit 7. Further, the adsorption transport unit 7 is disposed between the inspection unit 2b and the substrate carry-out unit 3 in the same positional relationship as in the first embodiment. With this configuration, the substrate 4 that is placed in the substrate loading unit 1 can be transported to the adsorption transport unit 6a in the same manner as in the first embodiment. After the inspection of the inspection unit 2a, the substrate 4 is transported to the adsorption transport unit 70 in the inspection area p3 of the floating machine 2A having the transfer range between the adsorption transport unit 6a and the adsorption transport unit 70. The substrate 4 of the adsorption transport unit 70 is also transported to the substrate transfer area & of the adjacent + double check unit 2b, and the substrate is transported to the adsorption transport unit 15 6b. After the μ, the substrate 4 inspected by the private 2b junction is transported to the downstream substrate transfer area p3 by the adsorption transfer unit, and the substrate 4 is transported to the adsorption transfer unit 7 in the substrate transfer area. The adsorption transfer 20 of the substrate carry-out unit 3 is carried to the substrate carry-out area P4, and is transported to the outside of the apparatus by a transfer robot (not shown). This embodiment is an example in which a large number of inspection units are provided. In the case of the above-mentioned month, the vacancy inspection unit 2 can be added between the substrate carrying unit 丨 and the substrate carrying-out unit $. Therefore, even if the transport distances of the transport units and the single-side transport units are short, 22 200819734 - The entire transport distance can be extended by arranging them adjacently. [Fourth embodiment] A substrate inspection device according to a fourth embodiment of the present invention will be described. Fig. 8 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a fourth embodiment of the present invention. As shown in Fig. 8, the substrate inspection device 140 of the present embodiment includes the roller tables IB, 2B, and 3B (transporting table) instead of the floating machine table 2A of the substrate φ inspection device 100 of the first embodiment. 3A. Hereinafter, a point different from the above-described first embodiment will be mainly described. 10 Roller tables 1B, 2B, and 3B are arranged on a machine table surface having a rectangular shape of the same size as that of the floating machines 1A, 2A, and 3A in a plan view, and are arranged at an appropriate interval for transporting the substrate 4 in a horizontal direction at a fixed height. Transfer roller 3〇. The transport drum 30 can be supported, for example, in a horizontal plane supported by the drum machines 1B, 2b, and 3B so as to be rotatable in a 360-degree direction. According to the above configuration, the same operation as in the above-described third embodiment can be performed except that the substrate 4 is transported by the drum on the transport drum 30. Therefore, the same operational effects as those of the first embodiment described above are obtained. In the above description, an example in which two or more transport units are arranged adjacent to each other is described. However, one transport unit may be extended in the transport direction and in a direction perpendicular to the transport direction. A plurality of single-side conveying units are disposed on one side, and a substrate is conveyed between the plurality of single-side conveying units to be conveyed. For example, in each of the above-described embodiments and modifications, it is also possible to use a floating machine table, 2A, 3A, or a roller table IB, 2B, 3B or the like as the 23 200819734 integrated transfer table. In this case, since the one-side conveyance portion that determines the substrate conveyance accuracy is large in the entire conveyance direction, for example, the inspection portion for the conveyance accuracy is divided into the one-side conveyance portion for each of the two stagnations. Compared with the entire 5-way diameter of the entire moving and closing path, only one single-side conveying unit for high-precision conveying is provided, w, and a simple and inexpensive structure. ° In the above description, when the conveyor table is divided into a plurality of sections, the transfer position of the US board is located in the adjacent conveyor table. # = However, when the section of the conveyor table is very small, as in the first 5, cage & θ show the map, 10 can also be carried out at the position where the substrate spans two adjacent substrates. Further, in the above description, the plurality of single-side conveying units are disposed at positions where the transfer position of the substrate can be opposed to each other via the transfer table. However, as long as the plate can be conveyed, a plurality of single-side conveying portions may be provided at positions on the same direction side 15 of the conveying table in a direction perpendicular to the conveying direction. Further, in the above description, the inspection unit 2 is preferably held by the vibration isolation stage, but any of the conveyance machines and the one-side conveyance unit may be disposed on the vibration isolation stage as needed. According to the present invention, the vibration removing table can be separately provided for each of the conveying table and each of the single-side single conveying portions, so that the arrangement of the device is easier. Further, the constituent elements of the respective embodiments and modifications described above are technically feasible, and may be appropriately combined and implemented within the scope of the technical idea of the present invention. The preferred embodiments of the invention have been described above, but the invention is not limited to the embodiments. Additions, omissions, substitutions, and other modifications can be made without departing from the scope of the invention. The invention is not limited by the foregoing description, but only by the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a first embodiment of the present invention. Fig. 2A is a partially enlarged view of a portion A of Fig. 1. Fig. 2B is a front view as seen from B of Fig. 2A. Fig. 3 is a plan view showing the operation of the substrate inspecting apparatus according to the first embodiment of the present invention. Fig. 4 is a plan view showing the operation of the substrate inspecting apparatus according to the first embodiment of the present invention. Fig. 5 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a modification of the first embodiment of the present invention. Fig. 6 is a plan view showing a schematic structure of a substrate inspecting apparatus according to a second embodiment of the present invention. Fig. 7 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a third embodiment of the present invention. Fig. 8 is a plan view showing a schematic configuration of a substrate inspecting apparatus according to a fourth embodiment of the present invention. 20 [Description of main component symbols] 1...Substrate loading unit 2a...Working table ΙΑ, 2A, 3A···Floating machine 2b...Inspection head IB, 2B, 3B···Roller table 3...Substrate Carry-out unit 2...Inspection unit 4...Substrate 25 200819734 5,6,6a,6b,7,70"Adsorption transfer 18...Sliding guide member feed unit 30...Transport roller 8a, 8b...reference Rod 90...sliding guide member 8c...pushing bar 100,110,120,130,140...base 9...sliding guide member plate inspection device 10, 10A, 10B···slider N...gas injection Hole 11... Lifting mechanism L... Transport direction length 12... Lifting table W... Width B... Adsorption station Pi... Reference positioning area 14: Adsorption block p2... Substrate transfer area 14a ··· recessed part P3...substrate transfer area, inspection area 14b...suction holes 15,17,19...adsorption transfer unit P4...substrate carry-out area 26