TW200614412A - Macroscopic inspection apparatus and macroscopic inspection method - Google Patents

Macroscopic inspection apparatus and macroscopic inspection method

Info

Publication number
TW200614412A
TW200614412A TW094133013A TW94133013A TW200614412A TW 200614412 A TW200614412 A TW 200614412A TW 094133013 A TW094133013 A TW 094133013A TW 94133013 A TW94133013 A TW 94133013A TW 200614412 A TW200614412 A TW 200614412A
Authority
TW
Taiwan
Prior art keywords
substrate
holder
macroscopic inspection
macroscopic
floating
Prior art date
Application number
TW094133013A
Other languages
Chinese (zh)
Inventor
Hiroyuki Okahira
Nobuo Fujisaki
Hiroshi Kato
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200614412A publication Critical patent/TW200614412A/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Liquid Crystal (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

This macroscopic inspection apparatus includes: a substrate holder for holding a substrate to be inspected; a macroscopic lightening optical system for irradiating an irradiation light onto the substrate; a substrate driving device for supporting the substrate, and for controlling a posture of the substrate while the substrate is irradiated by the irradiation light; a substrate transferring device for transferring the substrate to the substrate holder and for receiving the substrate from the substrate holder; a substrate floating device for floating the substrate by blowing air towards the substrate; a substrate positioning device for positioning the substrate to a reference position on the substrate holder while the substrate is floated by the substrate floating device; a substrate fixation device for fixing the substrate positioned by the substrate positioning device, onto the substrate holder.
TW094133013A 2004-09-27 2005-09-23 Macroscopic inspection apparatus and macroscopic inspection method TW200614412A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004279991 2004-09-27
JP2004279990 2004-09-27
JP2004279992 2004-09-27

Publications (1)

Publication Number Publication Date
TW200614412A true TW200614412A (en) 2006-05-01

Family

ID=36118849

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094133013A TW200614412A (en) 2004-09-27 2005-09-23 Macroscopic inspection apparatus and macroscopic inspection method

Country Status (5)

Country Link
JP (1) JP4729499B2 (en)
KR (1) KR100791132B1 (en)
CN (1) CN1906476B (en)
TW (1) TW200614412A (en)
WO (1) WO2006035703A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI416095B (en) * 2006-09-11 2013-11-21 Olympus Corp Substrate inspection apparatus

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5553532B2 (en) * 2009-06-04 2014-07-16 パナソニック株式会社 Optical inspection device
JP2011141127A (en) * 2010-01-05 2011-07-21 Avanstrate Taiwan Inc Visual inspection method and visual inspection device for defect part of glass plate
KR101367910B1 (en) * 2011-12-30 2014-02-28 엘아이지에이디피 주식회사 Substrate Aligner and Substrate Inspecting System With the Same
CN102591044A (en) * 2012-01-12 2012-07-18 北京凌云光视数字图像技术有限公司 TFT (thin film transistor) liquid crystal screen quality detection method
CN102540515B (en) * 2012-01-12 2015-07-08 北京凌云光视数字图像技术有限公司 Quality detection system for thin film transistor (TFT) liquid crystal display screen
KR102177156B1 (en) 2014-03-10 2020-11-10 삼성전자주식회사 robot and substrate processing apparatus including the same
CN106198570B (en) * 2016-08-15 2019-02-22 武汉华星光电技术有限公司 A kind of substrate detection apparatus
CN106770364A (en) * 2017-01-26 2017-05-31 江苏东旭亿泰智能装备有限公司 Substrate positioning mechanism, macro inspection apparatus and macro inspection method
CN106918934A (en) * 2017-03-27 2017-07-04 武汉华星光电技术有限公司 Substrate macro -graph machine
KR102475075B1 (en) * 2017-04-20 2022-12-07 니폰 덴키 가라스 가부시키가이샤 Glass plate manufacturing method and manufacturing apparatus
CN108613990A (en) * 2018-07-13 2018-10-02 江苏东旭亿泰智能装备有限公司 A kind of microcosmic and compound check machine of macroscopic view
CN109192673B (en) * 2018-08-27 2021-09-17 苏州精濑光电有限公司 Wafer detection method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2807905B2 (en) * 1989-09-14 1998-10-08 日立電子エンジニアリング株式会社 Substrate chuck mechanism
JP3264276B2 (en) * 1991-05-09 2002-03-11 株式会社日立製作所 Method for detecting nucleic acid fragment molecular weight separation pattern
JP2001194312A (en) * 1999-10-25 2001-07-19 Olympus Optical Co Ltd Holder mechanism for macro-inspection
CN1645115A (en) * 2000-08-24 2005-07-27 奥林巴斯光学工业株式会社 Flood light for appearance inspection
JP2003302346A (en) * 2002-04-12 2003-10-24 Hitachi Electronics Eng Co Ltd Surface inspection device for sheet work

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI416095B (en) * 2006-09-11 2013-11-21 Olympus Corp Substrate inspection apparatus

Also Published As

Publication number Publication date
KR100791132B1 (en) 2008-01-03
KR20070037563A (en) 2007-04-05
JP4729499B2 (en) 2011-07-20
CN1906476B (en) 2010-10-06
JPWO2006035703A1 (en) 2008-05-15
WO2006035703A1 (en) 2006-04-06
CN1906476A (en) 2007-01-31

Similar Documents

Publication Publication Date Title
TW200614412A (en) Macroscopic inspection apparatus and macroscopic inspection method
EP3093873A3 (en) Exposure apparatus, exposure method, and method for producing device
HK1105243A1 (en) Exposure equipment and device manufacturing method
HK1139745A1 (en) Illumination optical system, exposure apparatus, and device manufacturing method
HK1139746A1 (en) Illumination optical system, exposure apparatus, and device manufacturing method
HK1126035A1 (en) Exposure apparatus, exposure method and device manufacturing method
WO2011065589A3 (en) Substrate carrier device, substrate carrying method, substrate supporting member, substrate holding device, exposure apparatus, exposure method and device manufacturing method
DE69813065D1 (en) X-ray source using laser-generated plasma, and device for semiconductor lithography and method using the same
WO2009155117A3 (en) Method and apparatus for detecting the substrate temperature in a laser anneal system
HK1090174A1 (en) Exposure apparatus, substrate carrying method, exposure method, and method for producing device
SG148994A1 (en) Exposure apparatus, exposure method, method for producing device, and optical part
BR0001565B1 (en) process of positioning plate elements in the introduction station of a treatment machine, and device for applying the process.
TW200636316A (en) Method of fixing optical member and optical unit
TW200615706A (en) Substrate for exposure, exposure method and method for manufacturing a device
TW200641556A (en) A new immersion lithography apparatus and method
EP1569033A3 (en) Exposure apparatus and method
JP2009297636A (en) Light irradiation apparatus and light irradiation method
KR102134961B1 (en) Substrate processing apparatus, alignment device, substrate processing method and alignment method
TW200634451A (en) Proximity type exposure apparatus
ATE423382T1 (en) DEVICE AND METHOD FOR POSITIONING AN X-RAY LENS AND X-RAY DEVICE HAVING SUCH A DEVICE
TW200705117A (en) Measuring apparatus, exposure apparatus, and device manufacturing method
DE602004012789D1 (en) Method and apparatus for irradiation with ultraviolet light
TW200607008A (en) Light irradiation apparatus, crystallization apparatus, crystallization method and device
DE60116445D1 (en) Method and device for removing coatings on glass panes and glass processing equipment provided with a station equipped with this device
JP2008151657A (en) Apparatus and method for preparing thin sliced specimen