JP5241241B2 - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物 Download PDF

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Publication number
JP5241241B2
JP5241241B2 JP2007555914A JP2007555914A JP5241241B2 JP 5241241 B2 JP5241241 B2 JP 5241241B2 JP 2007555914 A JP2007555914 A JP 2007555914A JP 2007555914 A JP2007555914 A JP 2007555914A JP 5241241 B2 JP5241241 B2 JP 5241241B2
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group
photosensitive resin
resin composition
mol
weight
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Japanese (ja)
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JPWO2007086323A1 (ja
Inventor
隆昭 小林
正志 木村
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Asahi Kasei Corp
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Asahi Kasei E Materials Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/08—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C08K5/5425—Silicon-containing compounds containing oxygen containing at least one C=C bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C08K5/5435—Silicon-containing compounds containing oxygen containing oxygen in a ring

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Epoxy Resins (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2007555914A 2006-01-24 2007-01-19 感光性樹脂組成物 Active JP5241241B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007555914A JP5241241B2 (ja) 2006-01-24 2007-01-19 感光性樹脂組成物

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2006015218 2006-01-24
JP2006015218 2006-01-24
JP2006016539 2006-01-25
JP2006016539 2006-01-25
JP2007555914A JP5241241B2 (ja) 2006-01-24 2007-01-19 感光性樹脂組成物
PCT/JP2007/050793 WO2007086323A1 (ja) 2006-01-24 2007-01-19 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPWO2007086323A1 JPWO2007086323A1 (ja) 2009-06-18
JP5241241B2 true JP5241241B2 (ja) 2013-07-17

Family

ID=38309118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007555914A Active JP5241241B2 (ja) 2006-01-24 2007-01-19 感光性樹脂組成物

Country Status (5)

Country Link
US (1) US20090029287A1 (enExample)
JP (1) JP5241241B2 (enExample)
KR (1) KR100963111B1 (enExample)
TW (1) TW200801816A (enExample)
WO (1) WO2007086323A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4987521B2 (ja) * 2007-03-14 2012-07-25 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
WO2008123224A1 (ja) * 2007-04-04 2008-10-16 Asahi Kasei E-Materials Corporation 感光性樹脂組成物
WO2008123210A1 (ja) * 2007-04-04 2008-10-16 Asahi Kasei E-Materials Corporation 感光性樹脂組成物
JP4938571B2 (ja) * 2007-07-11 2012-05-23 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
CN101802033B (zh) * 2007-12-14 2013-03-13 旭化成电子材料株式会社 感光性树脂组合物
CN101965542B (zh) * 2008-03-10 2013-03-27 旭化成电子材料株式会社 感光性聚有机硅氧烷组合物
KR102232349B1 (ko) 2013-05-31 2021-03-26 롬엔드하스전자재료코리아유한회사 고내열성 네거티브형 감광성 수지 조성물 및 이로부터 제조된 경화막
EP3157984A1 (en) 2014-06-19 2017-04-26 Inkron Oy Transparent siloxane encapsulant and adhesive
KR20250001148A (ko) 2023-06-28 2025-01-06 주식회사 창발켐텍 새로운 글리시딜옥시프로필 유기 실록산 공중합체 및 이의 제조방법

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120619A (en) * 1979-03-12 1980-09-17 Shin Etsu Chem Co Ltd Photosetting organopolysiloxane composition
JPS63117024A (ja) * 1986-11-05 1988-05-21 Toshiba Silicone Co Ltd 紫外線硬化性シリコ−ン組成物
JPS63251407A (ja) * 1987-04-07 1988-10-18 Shin Etsu Chem Co Ltd 紫外線硬化性ハードコーティング剤
JPH0436353A (ja) * 1990-06-01 1992-02-06 Shin Etsu Chem Co Ltd 光硬化性オルガノポリシロキサン組成物およびその硬化物
JPH04198270A (ja) * 1990-11-27 1992-07-17 Toshiba Silicone Co Ltd 光硬化型シリコーン組成物及びその接着剤組成物
JPH0632903A (ja) * 1992-05-19 1994-02-08 Nippon Shokubai Co Ltd ポリシロキサン系マクロモノマーの製造方法
JPH08311139A (ja) * 1995-03-16 1996-11-26 Shin Etsu Chem Co Ltd 光硬化性オルガノポリシロキサン組成物
JPH1010741A (ja) * 1996-06-27 1998-01-16 Dow Corning Asia Kk 紫外線硬化性ポリシロキサン組成物およびこれを用いた硬化物パターンの製造方法
JPH10298254A (ja) * 1997-04-23 1998-11-10 Mitsubishi Rayon Co Ltd 硬化性組成物およびその製造方法、並びに歯科用修復材料
JP2000105457A (ja) * 1998-09-30 2000-04-11 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JP2005004052A (ja) * 2003-06-13 2005-01-06 Shin Etsu Chem Co Ltd 感光性シリコーン樹脂組成物及びその硬化物並びにネガ型微細パターンの形成方法
JP2005298800A (ja) * 2004-04-12 2005-10-27 Korea Advanced Inst Of Sci Technol 無機／有機混成オリゴマー、ナノ混成高分子及びこれらの製造方法
US6984483B1 (en) * 1999-07-13 2006-01-10 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Organically modified silicic acid polycondensates, production and use thereof

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JPS6039095B2 (ja) * 1978-11-06 1985-09-04 信越化学工業株式会社 光硬化性オルガノポリシロキサン組成物
JP2752070B2 (ja) * 1987-12-05 1998-05-18 鐘淵化学工業株式会社 硬化性密封剤組成物
US5738976A (en) * 1995-03-16 1998-04-14 Shin-Etsu Chemical Co., Ltd. Photo-curable organopolysiloxane composition and a method for producing a (meth) acryloyloxyl group-containing organopolysiloxane used therein
US6191247B1 (en) * 1996-04-10 2001-02-20 The Yokohama Rubber Co., Ltd. Polysiloxane composition having superior storage stability and rubber composition containing same
US6103811A (en) * 1996-09-11 2000-08-15 The Yokohama Rubber Co., Ltd. Polysiloxane-containing tire rubber composition
US7176269B2 (en) * 2000-07-25 2007-02-13 Mitsui Chemicals, Inc. Curable composition and its use
US20040219443A1 (en) * 2003-05-01 2004-11-04 Spears Kurt E. Method for wafer dicing

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120619A (en) * 1979-03-12 1980-09-17 Shin Etsu Chem Co Ltd Photosetting organopolysiloxane composition
JPS63117024A (ja) * 1986-11-05 1988-05-21 Toshiba Silicone Co Ltd 紫外線硬化性シリコ−ン組成物
JPS63251407A (ja) * 1987-04-07 1988-10-18 Shin Etsu Chem Co Ltd 紫外線硬化性ハードコーティング剤
JPH0436353A (ja) * 1990-06-01 1992-02-06 Shin Etsu Chem Co Ltd 光硬化性オルガノポリシロキサン組成物およびその硬化物
JPH04198270A (ja) * 1990-11-27 1992-07-17 Toshiba Silicone Co Ltd 光硬化型シリコーン組成物及びその接着剤組成物
JPH0632903A (ja) * 1992-05-19 1994-02-08 Nippon Shokubai Co Ltd ポリシロキサン系マクロモノマーの製造方法
JPH08311139A (ja) * 1995-03-16 1996-11-26 Shin Etsu Chem Co Ltd 光硬化性オルガノポリシロキサン組成物
JPH1010741A (ja) * 1996-06-27 1998-01-16 Dow Corning Asia Kk 紫外線硬化性ポリシロキサン組成物およびこれを用いた硬化物パターンの製造方法
JPH10298254A (ja) * 1997-04-23 1998-11-10 Mitsubishi Rayon Co Ltd 硬化性組成物およびその製造方法、並びに歯科用修復材料
JP2000105457A (ja) * 1998-09-30 2000-04-11 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
US6984483B1 (en) * 1999-07-13 2006-01-10 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V. Organically modified silicic acid polycondensates, production and use thereof
JP2005004052A (ja) * 2003-06-13 2005-01-06 Shin Etsu Chem Co Ltd 感光性シリコーン樹脂組成物及びその硬化物並びにネガ型微細パターンの形成方法
JP2005298800A (ja) * 2004-04-12 2005-10-27 Korea Advanced Inst Of Sci Technol 無機／有機混成オリゴマー、ナノ混成高分子及びこれらの製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JPN6008035895; ＨＯＵＢＥＲＴＺ，　Ｒ．　ｅｔ　ａｌ．: 'Ｉｎｏｒｇａｎｉｃ-ｏｒｇａｎｉｃ　ｈｙｂｒｉｄ　ｍａｔｅｒｉａｌｓ　ｆｏｒ　ａｐｐｌｉｃａｔｉｏｎ　ｉｎ　ｏｐｔｉｃａｌ　ｄｅｖｉｃｅｓ' Ｔｈｉｎ　Ｓｏｌｉｄ　Ｆｉｌｍｓ ４４２（１，２）, 2003, １９４-２００, Ｅｌｓｅｖｉｅｒ　Ｓｃｉｅｎｃｅ　Ｂ．Ｖ． *

Also Published As

Publication number Publication date
WO2007086323A1 (ja) 2007-08-02
KR100963111B1 (ko) 2010-06-15
US20090029287A1 (en) 2009-01-29
JPWO2007086323A1 (ja) 2009-06-18
TWI375123B (enExample) 2012-10-21
TW200801816A (en) 2008-01-01
KR20080055989A (ko) 2008-06-19

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