JP5235214B2 - プラズマディスプレイパネルの製造方法、成膜装置 - Google Patents

プラズマディスプレイパネルの製造方法、成膜装置 Download PDF

Info

Publication number
JP5235214B2
JP5235214B2 JP2010517878A JP2010517878A JP5235214B2 JP 5235214 B2 JP5235214 B2 JP 5235214B2 JP 2010517878 A JP2010517878 A JP 2010517878A JP 2010517878 A JP2010517878 A JP 2010517878A JP 5235214 B2 JP5235214 B2 JP 5235214B2
Authority
JP
Japan
Prior art keywords
metal oxide
film
vacuum chamber
panel
protective film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010517878A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2009154130A1 (ja
Inventor
栄一 飯島
宗人 箱守
倉内  利春
礼寛 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP2010517878A priority Critical patent/JP5235214B2/ja
Publication of JPWO2009154130A1 publication Critical patent/JPWO2009154130A1/ja
Application granted granted Critical
Publication of JP5235214B2 publication Critical patent/JP5235214B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/081Oxides of aluminium, magnesium or beryllium
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Physical Vapour Deposition (AREA)
JP2010517878A 2008-06-16 2009-06-11 プラズマディスプレイパネルの製造方法、成膜装置 Active JP5235214B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2010517878A JP5235214B2 (ja) 2008-06-16 2009-06-11 プラズマディスプレイパネルの製造方法、成膜装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2008157119 2008-06-16
JP2008157119 2008-06-16
PCT/JP2009/060680 WO2009154130A1 (ja) 2008-06-16 2009-06-11 プラズマディスプレイパネルの製造方法、成膜装置
JP2010517878A JP5235214B2 (ja) 2008-06-16 2009-06-11 プラズマディスプレイパネルの製造方法、成膜装置

Publications (2)

Publication Number Publication Date
JPWO2009154130A1 JPWO2009154130A1 (ja) 2011-12-01
JP5235214B2 true JP5235214B2 (ja) 2013-07-10

Family

ID=41434045

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010517878A Active JP5235214B2 (ja) 2008-06-16 2009-06-11 プラズマディスプレイパネルの製造方法、成膜装置

Country Status (4)

Country Link
JP (1) JP5235214B2 (ko)
KR (1) KR101128744B1 (ko)
CN (1) CN102067266B (ko)
WO (1) WO2009154130A1 (ko)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62107060A (ja) * 1985-10-31 1987-05-18 Shimadzu Corp 電子ビ−ム蒸着装置
JP2000260750A (ja) * 1999-03-08 2000-09-22 Denshi Kagaku Kk 昇温脱離ガス分析装置
JP2000290062A (ja) * 1999-04-05 2000-10-17 Mitsubishi Materials Corp MgO蒸着材及びその製造方法
JP2000297367A (ja) * 1999-04-12 2000-10-24 Canon Inc 金属酸化物薄膜の成膜方法
JP2001026867A (ja) * 1999-07-16 2001-01-30 Teijin Ltd 透明導電積層体の製造方法
JP2002194539A (ja) * 2000-12-26 2002-07-10 Matsushita Electric Ind Co Ltd 薄膜形成方法及び装置
JP2006172859A (ja) * 2004-12-15 2006-06-29 Matsushita Electric Ind Co Ltd プラズマディスプレイパネルおよびその製造方法
JP2007051326A (ja) * 2005-08-17 2007-03-01 Ulvac Japan Ltd 電子ビーム蒸着装置、当該装置を用いて行う基板の表面への蒸着被膜の形成方法、ピアス式電子銃、および、ピアス式電子銃のビーム状態のモニタ方法
JP2007107092A (ja) * 2005-09-13 2007-04-26 Matsushita Electric Ind Co Ltd 保護膜形成方法および保護膜形成装置
JP2007119831A (ja) * 2005-10-27 2007-05-17 Ulvac Japan Ltd 成膜装置、パネルの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2663909B2 (ja) * 1995-04-11 1997-10-15 日本電気株式会社 プラズマディスプレイパネルの製造方法
JP3836184B2 (ja) * 1996-05-01 2006-10-18 中外炉工業株式会社 酸化マグネシウム膜の製造方法
JPH10106441A (ja) * 1996-10-02 1998-04-24 Fujitsu Ltd プラズマディスプレイパネル

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62107060A (ja) * 1985-10-31 1987-05-18 Shimadzu Corp 電子ビ−ム蒸着装置
JP2000260750A (ja) * 1999-03-08 2000-09-22 Denshi Kagaku Kk 昇温脱離ガス分析装置
JP2000290062A (ja) * 1999-04-05 2000-10-17 Mitsubishi Materials Corp MgO蒸着材及びその製造方法
JP2000297367A (ja) * 1999-04-12 2000-10-24 Canon Inc 金属酸化物薄膜の成膜方法
JP2001026867A (ja) * 1999-07-16 2001-01-30 Teijin Ltd 透明導電積層体の製造方法
JP2002194539A (ja) * 2000-12-26 2002-07-10 Matsushita Electric Ind Co Ltd 薄膜形成方法及び装置
JP2006172859A (ja) * 2004-12-15 2006-06-29 Matsushita Electric Ind Co Ltd プラズマディスプレイパネルおよびその製造方法
JP2007051326A (ja) * 2005-08-17 2007-03-01 Ulvac Japan Ltd 電子ビーム蒸着装置、当該装置を用いて行う基板の表面への蒸着被膜の形成方法、ピアス式電子銃、および、ピアス式電子銃のビーム状態のモニタ方法
JP2007107092A (ja) * 2005-09-13 2007-04-26 Matsushita Electric Ind Co Ltd 保護膜形成方法および保護膜形成装置
JP2007119831A (ja) * 2005-10-27 2007-05-17 Ulvac Japan Ltd 成膜装置、パネルの製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JPN7009003198; Sung Hee Hong, et al.: 'Characteristics of MgO Protective Layer with Deposition Rate in AC-PDPs' Proceedings of The 14th International Display Workshops Volume 1, 20071205, Page 195-198, Society for Information Display *

Also Published As

Publication number Publication date
CN102067266A (zh) 2011-05-18
JPWO2009154130A1 (ja) 2011-12-01
KR101128744B1 (ko) 2012-03-27
KR20110009240A (ko) 2011-01-27
CN102067266B (zh) 2013-02-06
WO2009154130A1 (ja) 2009-12-23

Similar Documents

Publication Publication Date Title
JP4569933B2 (ja) プラズマディスプレイパネル
JP4153983B2 (ja) 保護膜、その成膜方法、プラズマディスプレイパネル及びその製造方法
RU2398306C1 (ru) Плазменная индикаторная панель и способ ее изготовления
US7713639B2 (en) Protective layer, composite for forming the protective layer, method of forming the protective layer, and plasma display panel including the protective layer
JP2006318826A (ja) プラズマディスプレイパネル
JP4596005B2 (ja) プラズマディスプレイパネルの製造方法
JP2005050804A (ja) プラズマディスプレイパネルの製造方法およびその製造装置
JP4321593B2 (ja) プラズマディスプレイパネル
KR20000068762A (ko) 가스 방전 패널 및 가스 발광 디바이스
KR20060082174A (ko) 보호막, 상기 보호막 형성용 복합체, 상기 보호막 제조방법 및 상기 보호막을 구비한 플라즈마 디스플레이디바이스
JP5235214B2 (ja) プラズマディスプレイパネルの製造方法、成膜装置
JPH03281594A (ja) 発光材料及び表示装置
US20060003087A1 (en) Process for producing plasma display panel and apparatus therefor
JP5114310B2 (ja) 成膜方法、成膜装置
JPH11135023A (ja) プラズマディスプレイパネルおよびその製造方法
JP2011198733A (ja) 交流型プラズマディスプレイ素子
Takeda et al. Shrinkage and expansion of discharge areas in plasma discharge devices having complex oxide protective layers
KR101176602B1 (ko) 피디피용 저전압 보호막 재료 및 그 제조방법
JP2013008583A (ja) プラズマディスプレイパネルの保護層及びプラズマディスプレイパネル
WO2010084968A1 (ja) プラズマディスプレイパネル及びその製造方法、並びにプラズマディスプレイ装置及びその製造方法
WO2013018355A1 (ja) プラズマディスプレイパネルおよびその製造方法
Xing et al. 13.3: CaMgO (CMO) Film Properties Study
WO2013018335A1 (ja) プラズマディスプレイパネルおよびその製造方法
JP2012248448A (ja) プラズマディスプレイパネルの製造方法
JP2012248447A (ja) プラズマディスプレイパネルの製造方法

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120731

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20120913

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120913

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121106

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A821

Effective date: 20121220

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20121220

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130319

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130325

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

Ref document number: 5235214

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160405

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250