JP5215556B2 - 電子部品製造用の個片化装置 - Google Patents
電子部品製造用の個片化装置 Download PDFInfo
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- JP5215556B2 JP5215556B2 JP2006342180A JP2006342180A JP5215556B2 JP 5215556 B2 JP5215556 B2 JP 5215556B2 JP 2006342180 A JP2006342180 A JP 2006342180A JP 2006342180 A JP2006342180 A JP 2006342180A JP 5215556 B2 JP5215556 B2 JP 5215556B2
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- Prior art keywords
- singulation
- unit
- components
- manufacturing
- cleaning
- Prior art date
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- 238000004519 manufacturing process Methods 0.000 title claims description 39
- 238000000926 separation method Methods 0.000 title description 4
- 239000000758 substrate Substances 0.000 claims description 69
- 238000007689 inspection Methods 0.000 claims description 58
- 238000004140 cleaning Methods 0.000 claims description 54
- 238000005520 cutting process Methods 0.000 claims description 45
- 230000007246 mechanism Effects 0.000 claims description 42
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 20
- 230000007723 transport mechanism Effects 0.000 claims description 18
- 238000007789 sealing Methods 0.000 claims description 16
- 239000000470 constituent Substances 0.000 claims description 7
- 230000032258 transport Effects 0.000 claims description 2
- 239000011347 resin Substances 0.000 description 15
- 229920005989 resin Polymers 0.000 description 15
- 238000000034 method Methods 0.000 description 10
- 230000004048 modification Effects 0.000 description 8
- 238000012986 modification Methods 0.000 description 8
- 230000002950 deficient Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012858 packaging process Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/53—Means to assemble or disassemble
- Y10T29/53087—Means to assemble or disassemble with signal, scale, illuminator, or optical viewer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/364—By fluid blast and/or suction
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Dicing (AREA)
Description
B 個片化部
C 払い出し部
D 洗浄部
E 検査部
F オプション部
S1,S2,S3 個片化装置
1 基本ユニット
2 プレステージ
3 封止済基板
4 切断用テーブル
5 切断用ステージ
6 スピンドル
7 回転刃
8 トレイ
9 集合体
10 洗浄機構
11 洗浄ローラ
12 検査用テーブル
13 検査用ステージ
14 カメラ
Claims (4)
- 基板に設けられた複数の領域に各々装着されたチップ状部品を樹脂封止することによって封止済基板を形成し、該封止済基板を前記領域毎に個片化することによって複数の電子部品を製造する際に使用される電子部品製造用の個片化装置であって、
前記封止済基板を受け入れる受け入れ部と、
前記封止済基板を個片化する個片化部と、
個片化された前記複数の電子部品を払い出す払い出し部とを少なくとも含む構成要素を備えるとともに、
少なくとも前記受け入れ部と前記個片化部と前記払い出し部とのそれぞれは、予想される要求仕様に応じた異なる複数の仕様を有するようにして予め用意されており、
予め用意された前記受け入れ部のそれぞれと予め用意された前記個片化部のそれぞれと予め用意された前記払い出し部のそれぞれとは、他の前記構成要素に対して各々着脱可能かつ交換可能であり、
前記構成要素のそれぞれに対するユーザーの要求仕様に応じて最適な前記受け入れ部と最適な前記個片化部と最適な前記払い出し部とが組み合わされることによって基本ユニットが構成され、
前記個片化装置は少なくとも前記基本ユニットが有する構成要素のそれぞれを含み、
前記個片化装置が有する前記構成要素のうち少なくとも前記受け入れ部と前記個片化部と前記払い出し部とに対して共通に適用される位置に設けられ前記封止済基板又は個片化された前記複数の電子部品からなる集合体を直線的に順次搬送する主搬送機構を備えることを特徴とする電子部品製造用の個片化装置。 - 請求項1記載の電子部品製造用の個片化装置において、
前記集合体を洗浄する洗浄部を前記構成要素として備えるとともに、
前記洗浄部は他の前記構成要素に対して着脱可能かつ交換可能であることを特徴とする電子部品製造用の個片化装置。 - 請求項1又は2に記載の電子部品製造用の個片化装置において、
個片化された前記複数の電子部品を各々検査する検査部を前記構成要素として備えるとともに、
前記検査部は他の前記構成要素に対して着脱可能かつ交換可能であることを特徴とする電子部品製造用の個片化装置。 - 請求項1〜3のいずれかに記載の電子部品製造用の個片化装置において、
前記個片化部は、回転刃、レーザ光、ウォータージェット、ワイヤソー、又はバンドソーのうちのいずれかを使用する切断機構を有するとともに、
前記個片化部は1又は複数設けられていることを特徴とする電子部品製造用の個片化装置。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006342180A JP5215556B2 (ja) | 2006-12-20 | 2006-12-20 | 電子部品製造用の個片化装置 |
CN2007800239538A CN101479838B (zh) | 2006-12-20 | 2007-11-07 | 电子部件制造用单片化装置 |
PCT/JP2007/001222 WO2008075446A1 (ja) | 2006-12-20 | 2007-11-07 | 電子部品製造用の個片化装置 |
US12/438,196 US20090242524A1 (en) | 2006-12-20 | 2007-11-07 | Singulation apparatus for manufacturing electronic component |
EP07828000A EP2077578A4 (en) | 2006-12-20 | 2007-11-07 | Device for the separation of electronic components |
KR1020087028995A KR101034487B1 (ko) | 2006-12-20 | 2007-11-07 | 전자부품 제조용 개편화장치 |
TW96144249A TWI415200B (zh) | 2006-12-20 | 2007-11-22 | Slicing devices for the manufacture of electronic components |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006342180A JP5215556B2 (ja) | 2006-12-20 | 2006-12-20 | 電子部品製造用の個片化装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008153565A JP2008153565A (ja) | 2008-07-03 |
JP5215556B2 true JP5215556B2 (ja) | 2013-06-19 |
Family
ID=39536085
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006342180A Active JP5215556B2 (ja) | 2006-12-20 | 2006-12-20 | 電子部品製造用の個片化装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20090242524A1 (ja) |
EP (1) | EP2077578A4 (ja) |
JP (1) | JP5215556B2 (ja) |
KR (1) | KR101034487B1 (ja) |
CN (1) | CN101479838B (ja) |
TW (1) | TWI415200B (ja) |
WO (1) | WO2008075446A1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5399690B2 (ja) * | 2008-11-28 | 2014-01-29 | アピックヤマダ株式会社 | 切断装置 |
JP6000902B2 (ja) * | 2013-06-24 | 2016-10-05 | Towa株式会社 | 電子部品用の収容治具、その製造方法及び個片化装置 |
JP6235391B2 (ja) * | 2014-03-27 | 2017-11-22 | Towa株式会社 | 検査用治具、切断装置及び切断方法 |
CN105225988A (zh) * | 2015-09-25 | 2016-01-06 | 江苏中科晶元信息材料有限公司 | 晶片清洗检查一体机 |
KR102541489B1 (ko) | 2016-02-26 | 2023-06-08 | 삼성전자주식회사 | 기판 세정 장치 및 이를 이용한 기판 세정 설비 |
CN106057711B (zh) * | 2016-08-04 | 2018-10-02 | 中山德华芯片技术有限公司 | 一种应用于晶圆片涂胶清洗设备的除水雾装置 |
JP6845038B2 (ja) * | 2017-02-27 | 2021-03-17 | 株式会社ディスコ | パッケージ基板の分割方法 |
JP2020001504A (ja) | 2018-06-27 | 2020-01-09 | トヨタ自動車株式会社 | 駐車支援装置 |
JP7377092B2 (ja) * | 2019-12-16 | 2023-11-09 | Towa株式会社 | 統計データ生成方法、切断装置及びシステム |
US11700789B2 (en) * | 2020-05-28 | 2023-07-18 | Automated Harvesting Solutions, LLC | De-leafing apparatus for removing leaves of harvestable crops |
US11768187B2 (en) | 2020-05-28 | 2023-09-26 | Automated Harvesting Solutions, LLC | Harvester for selectively and robotically harvesting crops |
KR102163813B1 (ko) * | 2020-07-16 | 2020-10-08 | 지용남 | 피씨비 자동검사방법 및 장치 |
KR102617780B1 (ko) * | 2020-11-19 | 2023-12-26 | 세메스 주식회사 | 반도체 스트립 절단 및 분류 설비에서 공기 분사 장치 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3562058A (en) * | 1967-05-16 | 1971-02-09 | Texas Instruments Inc | Method for breaking and separating substrate material |
US5776796A (en) * | 1994-05-19 | 1998-07-07 | Tessera, Inc. | Method of encapsulating a semiconductor package |
JP3085278B2 (ja) * | 1998-05-01 | 2000-09-04 | 日本電気株式会社 | 半導体装置の製造方法および半導体製造装置 |
US6426303B1 (en) * | 1999-07-16 | 2002-07-30 | Tokyo Electron Limited | Processing system |
JP4326788B2 (ja) * | 2002-11-27 | 2009-09-09 | Towa株式会社 | 半導体製造装置 |
JP2004349483A (ja) * | 2003-05-22 | 2004-12-09 | Towa Corp | 成形体の分割装置及び分割方法 |
JP4426799B2 (ja) * | 2003-09-04 | 2010-03-03 | Towa株式会社 | 基板の切断方法及び装置 |
JP4315788B2 (ja) * | 2003-11-26 | 2009-08-19 | アピックヤマダ株式会社 | 半導体装置の製造方法及び製造装置 |
JP2005190077A (ja) * | 2003-12-25 | 2005-07-14 | Towa Corp | 処理装置及び処理装置用プログラム供給方法 |
JP2006245098A (ja) * | 2005-03-01 | 2006-09-14 | Seiko Epson Corp | 電子部品及びその製造方法、並びに電子機器 |
-
2006
- 2006-12-20 JP JP2006342180A patent/JP5215556B2/ja active Active
-
2007
- 2007-11-07 CN CN2007800239538A patent/CN101479838B/zh not_active Expired - Fee Related
- 2007-11-07 EP EP07828000A patent/EP2077578A4/en not_active Withdrawn
- 2007-11-07 KR KR1020087028995A patent/KR101034487B1/ko active IP Right Grant
- 2007-11-07 WO PCT/JP2007/001222 patent/WO2008075446A1/ja active Application Filing
- 2007-11-07 US US12/438,196 patent/US20090242524A1/en not_active Abandoned
- 2007-11-22 TW TW96144249A patent/TWI415200B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR101034487B1 (ko) | 2011-05-17 |
CN101479838A (zh) | 2009-07-08 |
JP2008153565A (ja) | 2008-07-03 |
US20090242524A1 (en) | 2009-10-01 |
CN101479838B (zh) | 2010-12-08 |
WO2008075446A1 (ja) | 2008-06-26 |
TWI415200B (zh) | 2013-11-11 |
KR20090018925A (ko) | 2009-02-24 |
TW200845239A (en) | 2008-11-16 |
EP2077578A1 (en) | 2009-07-08 |
EP2077578A4 (en) | 2009-09-30 |
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