JP5112257B2 - 蒸着用基板 - Google Patents
蒸着用基板 Download PDFInfo
- Publication number
- JP5112257B2 JP5112257B2 JP2008271536A JP2008271536A JP5112257B2 JP 5112257 B2 JP5112257 B2 JP 5112257B2 JP 2008271536 A JP2008271536 A JP 2008271536A JP 2008271536 A JP2008271536 A JP 2008271536A JP 5112257 B2 JP5112257 B2 JP 5112257B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- substrate
- light
- deposition
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/048—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/382—Contact thermal transfer or sublimation processes
- B41M5/38242—Contact thermal transfer or sublimation processes characterised by the use of different kinds of energy to effect transfer, e.g. heat and light
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/18—Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/14—Carrier transporting layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
- H10K50/17—Carrier injection layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
- H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/311—Phthalocyanine
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/60—Organic compounds having low molecular weight
- H10K85/649—Aromatic compounds comprising a hetero atom
- H10K85/656—Aromatic compounds comprising a hetero atom comprising two or more different heteroatoms per ring
- H10K85/6565—Oxadiazole compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24273—Structurally defined web or sheet [e.g., overall dimension, etc.] including aperture
- Y10T428/24322—Composite web or sheet
- Y10T428/24331—Composite web or sheet including nonapertured component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008271536A JP5112257B2 (ja) | 2007-10-23 | 2008-10-22 | 蒸着用基板 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007275066 | 2007-10-23 | ||
| JP2007275066 | 2007-10-23 | ||
| JP2008271536A JP5112257B2 (ja) | 2007-10-23 | 2008-10-22 | 蒸着用基板 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012224673A Division JP5433758B2 (ja) | 2007-10-23 | 2012-10-10 | 成膜方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009123692A JP2009123692A (ja) | 2009-06-04 |
| JP2009123692A5 JP2009123692A5 (enExample) | 2011-12-15 |
| JP5112257B2 true JP5112257B2 (ja) | 2013-01-09 |
Family
ID=40563927
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008271536A Expired - Fee Related JP5112257B2 (ja) | 2007-10-23 | 2008-10-22 | 蒸着用基板 |
| JP2012224673A Expired - Fee Related JP5433758B2 (ja) | 2007-10-23 | 2012-10-10 | 成膜方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012224673A Expired - Fee Related JP5433758B2 (ja) | 2007-10-23 | 2012-10-10 | 成膜方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US8153201B2 (enExample) |
| JP (2) | JP5112257B2 (enExample) |
| KR (1) | KR101547168B1 (enExample) |
Families Citing this family (51)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20090041314A (ko) * | 2007-10-23 | 2009-04-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판 및 발광장치의 제조방법 |
| US8425974B2 (en) * | 2007-11-29 | 2013-04-23 | Semiconductor Energy Laboratory Co., Ltd. | Evaporation donor substrate and method for manufacturing light-emitting device |
| KR101689519B1 (ko) * | 2007-12-26 | 2016-12-26 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판, 증착용 기판의 제조방법, 및 발광장치의 제조방법 |
| US8080811B2 (en) | 2007-12-28 | 2011-12-20 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing evaporation donor substrate and light-emitting device |
| WO2009099002A1 (en) | 2008-02-04 | 2009-08-13 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and method for manufacturing light-emitting device |
| JP5416987B2 (ja) * | 2008-02-29 | 2014-02-12 | 株式会社半導体エネルギー研究所 | 成膜方法及び発光装置の作製方法 |
| WO2009107548A1 (en) * | 2008-02-29 | 2009-09-03 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and manufacturing method of light-emitting device |
| JP5079722B2 (ja) * | 2008-03-07 | 2012-11-21 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| US8182863B2 (en) * | 2008-03-17 | 2012-05-22 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and manufacturing method of light-emitting device |
| US7932112B2 (en) * | 2008-04-14 | 2011-04-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
| JP5159689B2 (ja) * | 2008-04-25 | 2013-03-06 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| KR101629637B1 (ko) * | 2008-05-29 | 2016-06-13 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 성막방법 및 발광장치의 제조방법 |
| WO2009154156A1 (ja) * | 2008-06-16 | 2009-12-23 | 東レ株式会社 | パターニング方法およびこれを用いたデバイスの製造方法ならびにデバイス |
| JP5469950B2 (ja) * | 2008-08-08 | 2014-04-16 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| US8486736B2 (en) * | 2008-10-20 | 2013-07-16 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
| JP5291607B2 (ja) * | 2008-12-15 | 2013-09-18 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法 |
| US20120025182A1 (en) * | 2009-04-03 | 2012-02-02 | Sharp Kabushiki Kaisha | Donor substrate, process for production of transfer film, and process for production of organic electroluminescent element |
| JP5258666B2 (ja) * | 2009-04-22 | 2013-08-07 | 株式会社半導体エネルギー研究所 | 発光装置の作製方法および成膜用基板 |
| JP5137917B2 (ja) * | 2009-08-07 | 2013-02-06 | 株式会社半導体エネルギー研究所 | 成膜用基板、成膜方法及び発光素子の作製方法 |
| JP5323784B2 (ja) * | 2009-09-15 | 2013-10-23 | フオン・アルデンネ・アンラーゲンテヒニク・ゲゼルシヤフト・ミト・ベシユレンクテル・ハフツング | 微細構造を製造するための方法及び装置 |
| CN102326448B (zh) * | 2010-03-01 | 2015-03-25 | 松下电器产业株式会社 | 有机el装置及其制造方法 |
| DE102010043204A1 (de) * | 2010-08-10 | 2012-02-16 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Verwendung einer Vorrichtung zur Erzeugung einer Schicht eines organischen Materials auf einem Substrat |
| KR101239808B1 (ko) * | 2011-04-07 | 2013-03-06 | 순천향대학교 산학협력단 | 유기 발광 표시 장치의 제조 방법 |
| KR101233629B1 (ko) * | 2011-04-13 | 2013-02-15 | 에스엔유 프리시젼 주식회사 | 대용량 박막형성용 증착장치 |
| KR102081209B1 (ko) * | 2013-03-26 | 2020-02-26 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 및 그 제조 방법, 및 그 유기 발광 표시 장치의 제조에 사용되는 도너 기판 및 도너 기판 세트 |
| US9494792B2 (en) | 2013-07-30 | 2016-11-15 | Global Oled Technology Llc | Local seal for encapsulation of electro-optical element on a flexible substrate |
| US9385342B2 (en) | 2013-07-30 | 2016-07-05 | Global Oled Technology Llc | Local seal for encapsulation of electro-optical element on a flexible substrate |
| US9287522B2 (en) * | 2013-07-30 | 2016-03-15 | Global Oled Technology Llc | Local seal for encapsulation of electro-optical element on a flexible substrate |
| EP3038443B1 (en) | 2013-08-21 | 2020-10-21 | FUJI Corporation | Feeder component type determination method and feeder component type determination device |
| KR20150109013A (ko) * | 2014-03-18 | 2015-10-01 | 삼성디스플레이 주식회사 | 유기막 패턴 형성용 마스크, 이를 이용한 유기막 패턴 형성 방법 및 유기 발광 표시 장치의 제조 방법 |
| KR20150135720A (ko) | 2014-05-23 | 2015-12-03 | 삼성디스플레이 주식회사 | 도너마스크 및 이를 이용한 유기발광 디스플레이 장치 제조방법 |
| KR20160003363A (ko) * | 2014-06-30 | 2016-01-11 | 삼성디스플레이 주식회사 | 도너마스크 및 유기발광 디스플레이 장치 제조방법 |
| KR20160017366A (ko) | 2014-08-05 | 2016-02-16 | 삼성디스플레이 주식회사 | 광학 패터닝 마스크 및 이를 이용한 표시 장치의 제조 방법 |
| KR102162798B1 (ko) | 2014-08-12 | 2020-10-08 | 삼성디스플레이 주식회사 | 증착장치 및 이를 이용한 유기발광 디스플레이 장치 제조방법 |
| KR102325208B1 (ko) | 2014-08-12 | 2021-11-12 | 삼성디스플레이 주식회사 | 도너마스크, 이를 이용한 유기발광 디스플레이 장치 제조방법 및 유기발광 디스플레이 장치 |
| KR102181239B1 (ko) * | 2014-09-03 | 2020-11-23 | 삼성디스플레이 주식회사 | 박막 형성 장치 및 그를 이용한 박막 형성 방법 |
| KR102144855B1 (ko) | 2014-09-03 | 2020-08-18 | 삼성디스플레이 주식회사 | 광학 마스크 |
| KR20160030002A (ko) * | 2014-09-05 | 2016-03-16 | 삼성디스플레이 주식회사 | 도너마스크 및 이를 이용한 유기발광 디스플레이 장치 제조방법 |
| KR20160034529A (ko) | 2014-09-19 | 2016-03-30 | 삼성디스플레이 주식회사 | 광학적 패턴 전사 마스크 및 그의 제조 방법 |
| KR102303994B1 (ko) * | 2014-10-20 | 2021-09-23 | 삼성디스플레이 주식회사 | 유기발광 표시기판의 제조방법 |
| KR20160049610A (ko) | 2014-10-27 | 2016-05-10 | 삼성디스플레이 주식회사 | 광학 패터닝 마스크 및 이를 이용한 표시 장치의 제조 방법 |
| KR102427936B1 (ko) * | 2015-02-11 | 2022-08-03 | 삼성디스플레이 주식회사 | 유기발광 표시장치 및 도너 기판 |
| CN104762599A (zh) * | 2015-04-15 | 2015-07-08 | 京东方科技集团股份有限公司 | 蒸镀方法和蒸镀装置 |
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| US20180171468A1 (en) * | 2016-12-21 | 2018-06-21 | Ncc Nano, Llc | Method for deposting a functional material on a substrate |
| CA3019902C (en) * | 2016-03-16 | 2022-06-21 | Ncc Nano, Llc | Method for depositing a functional material on a substrate |
| US11089690B2 (en) * | 2016-03-16 | 2021-08-10 | Ncc Nano, Llc | Method for depositing a functional material on a substrate |
| CN105655504B (zh) * | 2016-04-11 | 2017-06-16 | 京东方科技集团股份有限公司 | 一种有机电致发光器件及其制备方法和显示面板 |
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| TWI701160B (zh) * | 2019-05-14 | 2020-08-11 | 謙華科技股份有限公司 | 熱印頭模組及其製造方法 |
| EP4340552A1 (en) * | 2022-09-13 | 2024-03-20 | Mycronic Ab | Laser-induced forward transfer method and device |
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| JP2004103406A (ja) | 2002-09-10 | 2004-04-02 | Sony Corp | 薄膜パターン形成方法および装置並びに有機el表示装置の製造方法 |
| JP4493926B2 (ja) * | 2003-04-25 | 2010-06-30 | 株式会社半導体エネルギー研究所 | 製造装置 |
| US20050145326A1 (en) * | 2004-01-05 | 2005-07-07 | Eastman Kodak Company | Method of making an OLED device |
| KR100667069B1 (ko) | 2004-10-19 | 2007-01-10 | 삼성에스디아이 주식회사 | 도너 기판 및 그를 사용한 유기전계발광표시장치의 제조방법 |
| JP2006309995A (ja) * | 2005-04-27 | 2006-11-09 | Sony Corp | 転写用基板および表示装置の製造方法ならびに表示装置 |
| TWI307612B (en) * | 2005-04-27 | 2009-03-11 | Sony Corp | Transfer method and transfer apparatus |
| JP2006344459A (ja) | 2005-06-08 | 2006-12-21 | Sony Corp | 転写方法および転写装置 |
| JP2008066147A (ja) * | 2006-09-07 | 2008-03-21 | Fuji Electric Holdings Co Ltd | 蒸着によるパターン形成方法、該方法を含む色変換フィルタ基板およびカラー有機el素子の製造方法 |
| KR20090028413A (ko) * | 2007-09-13 | 2009-03-18 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광장치 제작방법 및 증착용 기판 |
| KR20090041314A (ko) * | 2007-10-23 | 2009-04-28 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 증착용 기판 및 발광장치의 제조방법 |
| WO2009099002A1 (en) * | 2008-02-04 | 2009-08-13 | Semiconductor Energy Laboratory Co., Ltd. | Deposition method and method for manufacturing light-emitting device |
| US7993945B2 (en) * | 2008-04-11 | 2011-08-09 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
| US7932112B2 (en) * | 2008-04-14 | 2011-04-26 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing light-emitting device |
-
2008
- 2008-10-21 US US12/254,966 patent/US8153201B2/en not_active Expired - Fee Related
- 2008-10-22 JP JP2008271536A patent/JP5112257B2/ja not_active Expired - Fee Related
- 2008-10-23 KR KR1020080104043A patent/KR101547168B1/ko not_active Expired - Fee Related
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2012
- 2012-04-09 US US13/442,133 patent/US9444051B2/en not_active Expired - Fee Related
- 2012-10-10 JP JP2012224673A patent/JP5433758B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US20120251772A1 (en) | 2012-10-04 |
| US9444051B2 (en) | 2016-09-13 |
| KR20090041347A (ko) | 2009-04-28 |
| JP2009123692A (ja) | 2009-06-04 |
| US20090104835A1 (en) | 2009-04-23 |
| JP2013033752A (ja) | 2013-02-14 |
| US8153201B2 (en) | 2012-04-10 |
| JP5433758B2 (ja) | 2014-03-05 |
| KR101547168B1 (ko) | 2015-09-04 |
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