JP5099688B2 - 液状材料塗布装置およびそれを用いた欠陥修正装置 - Google Patents

液状材料塗布装置およびそれを用いた欠陥修正装置 Download PDF

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Publication number
JP5099688B2
JP5099688B2 JP2007294383A JP2007294383A JP5099688B2 JP 5099688 B2 JP5099688 B2 JP 5099688B2 JP 2007294383 A JP2007294383 A JP 2007294383A JP 2007294383 A JP2007294383 A JP 2007294383A JP 5099688 B2 JP5099688 B2 JP 5099688B2
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JP
Japan
Prior art keywords
movable plate
observation
liquid material
application
fine region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007294383A
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English (en)
Japanese (ja)
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JP2009122259A (ja
Inventor
昭浩 山中
昌良 松島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTN Corp
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NTN Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by NTN Corp filed Critical NTN Corp
Priority to JP2007294383A priority Critical patent/JP5099688B2/ja
Priority to TW097134663A priority patent/TWI508789B/zh
Priority to KR1020080092021A priority patent/KR101525621B1/ko
Publication of JP2009122259A publication Critical patent/JP2009122259A/ja
Application granted granted Critical
Publication of JP5099688B2 publication Critical patent/JP5099688B2/ja
Expired - Fee Related legal-status Critical Current
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Coating Apparatus (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
JP2007294383A 2007-11-13 2007-11-13 液状材料塗布装置およびそれを用いた欠陥修正装置 Expired - Fee Related JP5099688B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007294383A JP5099688B2 (ja) 2007-11-13 2007-11-13 液状材料塗布装置およびそれを用いた欠陥修正装置
TW097134663A TWI508789B (zh) 2007-11-13 2008-09-10 A liquid material applying means, and a defect correcting means using the coating means
KR1020080092021A KR101525621B1 (ko) 2007-11-13 2008-09-19 액상 재료 도포 장치 및 그것을 이용한 결함 수정 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007294383A JP5099688B2 (ja) 2007-11-13 2007-11-13 液状材料塗布装置およびそれを用いた欠陥修正装置

Publications (2)

Publication Number Publication Date
JP2009122259A JP2009122259A (ja) 2009-06-04
JP5099688B2 true JP5099688B2 (ja) 2012-12-19

Family

ID=40814514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007294383A Expired - Fee Related JP5099688B2 (ja) 2007-11-13 2007-11-13 液状材料塗布装置およびそれを用いた欠陥修正装置

Country Status (3)

Country Link
JP (1) JP5099688B2 (zh)
KR (1) KR101525621B1 (zh)
TW (1) TWI508789B (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5615621B2 (ja) * 2009-11-06 2014-10-29 Ntn株式会社 塗布ユニットおよびそれを用いたパターン修正装置
JP2011133617A (ja) * 2009-12-24 2011-07-07 Toppan Printing Co Ltd カラーフィルタ基板修正装置
JP6189102B2 (ja) * 2013-06-25 2017-08-30 Ntn株式会社 塗布装置および高さ検出方法
JP6737693B2 (ja) 2016-01-13 2020-08-12 Ntn株式会社 微小突起の体積測定方法および液状材料の塗布方法
CN105457838A (zh) * 2016-01-13 2016-04-06 威海世椿自动化设备有限公司 多通道涂胶装置
JP6333351B1 (ja) 2016-12-27 2018-05-30 Ntn株式会社 測定装置、塗布装置、および膜厚測定方法
JP7164458B2 (ja) * 2019-02-08 2022-11-01 Ntn株式会社 液体塗布ユニットおよび液体塗布装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4807979A (en) * 1986-01-24 1989-02-28 Geno Saccomanno Microscope slide marking device
US5574594A (en) * 1993-11-05 1996-11-12 Nikon Inc. Automated microscope slide marking device
JP2004022241A (ja) * 2002-06-13 2004-01-22 Dainippon Printing Co Ltd エマルジョンマスクパターン欠陥修正方法及び装置
JP2005310396A (ja) * 2004-04-16 2005-11-04 Ntn Corp パターン修正装置およびパターン修正方法
JP4542380B2 (ja) * 2004-06-29 2010-09-15 株式会社ブイ・テクノロジー パターン修正装置
JP2006153944A (ja) * 2004-11-25 2006-06-15 Ntn Corp クリック機構およびそれを用いた電動レボルバ
JP4925644B2 (ja) * 2005-03-28 2012-05-09 Ｎｔｎ株式会社 塗布機構、欠陥修正装置、塗布方法、および液晶表示パネル用カラーフィルタの欠陥修正方法
JP4767708B2 (ja) * 2005-03-28 2011-09-07 Ｎｔｎ株式会社 塗布ユニットおよびパターン修正装置
JP4802027B2 (ja) * 2006-03-30 2011-10-26 Ｎｔｎ株式会社 パターン修正装置およびその塗布ユニット
JP4822914B2 (ja) * 2006-04-10 2011-11-24 株式会社ブイ・テクノロジー 欠陥修正方法

Also Published As

Publication number Publication date
KR101525621B1 (ko) 2015-06-03
TW200932375A (en) 2009-08-01
JP2009122259A (ja) 2009-06-04
KR20090049527A (ko) 2009-05-18
TWI508789B (zh) 2015-11-21

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