JP5069232B2 - マイクロリソグラフィ投影露光装置の投影対物レンズ - Google Patents

マイクロリソグラフィ投影露光装置の投影対物レンズ Download PDF

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JP5069232B2
JP5069232B2 JP2008523209A JP2008523209A JP5069232B2 JP 5069232 B2 JP5069232 B2 JP 5069232B2 JP 2008523209 A JP2008523209 A JP 2008523209A JP 2008523209 A JP2008523209 A JP 2008523209A JP 5069232 B2 JP5069232 B2 JP 5069232B2
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Japan
Prior art keywords
optical element
projection objective
manipulator
actuators
projection
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Expired - Fee Related
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JP2008523209A
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Japanese (ja)
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JP2009503826A (ja
JP2009503826A5 (enExample
Inventor
コンラディ，オラルフ
ビットナー，ボリス
ブライジイステル，サシャ
ハウフ，マルクス
フメル，ヴォルフガング
カツィ，アリフ
トロスバッハ，ベアベル
ウェーバー，ヨッヘン
ホルデーラー，フーベルト
タエバチ，パヤン
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/12—Fluid-filled or evacuated lenses
    • G02B3/14—Fluid-filled or evacuated lenses of variable focal length
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G03F7/70266—Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
JP2008523209A 2005-07-25 2006-07-24 マイクロリソグラフィ投影露光装置の投影対物レンズ Expired - Fee Related JP5069232B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70213705P 2005-07-25 2005-07-25
US60/702,137 2005-07-25
PCT/EP2006/007273 WO2007017089A1 (en) 2005-07-25 2006-07-24 Projection objective of a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2009503826A JP2009503826A (ja) 2009-01-29
JP2009503826A5 JP2009503826A5 (enExample) 2009-07-02
JP5069232B2 true JP5069232B2 (ja) 2012-11-07

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JP2008523209A Expired - Fee Related JP5069232B2 (ja) 2005-07-25 2006-07-24 マイクロリソグラフィ投影露光装置の投影対物レンズ

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Country Link
US (2) US7830611B2 (enExample)
JP (1) JP5069232B2 (enExample)
WO (1) WO2007017089A1 (enExample)

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US7830611B2 (en) 2010-11-09
JP2009503826A (ja) 2009-01-29
US20080239503A1 (en) 2008-10-02
WO2007017089A1 (en) 2007-02-15
US20110019169A1 (en) 2011-01-27

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