JP5045833B1 - ランプ位置調整方法、ランプ位置調整用具、及び照射装置 - Google Patents

ランプ位置調整方法、ランプ位置調整用具、及び照射装置 Download PDF

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Publication number
JP5045833B1
JP5045833B1 JP2011063968A JP2011063968A JP5045833B1 JP 5045833 B1 JP5045833 B1 JP 5045833B1 JP 2011063968 A JP2011063968 A JP 2011063968A JP 2011063968 A JP2011063968 A JP 2011063968A JP 5045833 B1 JP5045833 B1 JP 5045833B1
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JP
Japan
Prior art keywords
lamp
plate
light
mirror
neutral density
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011063968A
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English (en)
Japanese (ja)
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JP2012199488A (ja
Inventor
大輔 小川
哲国 森川
一吉 山田
克巳 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Iwasaki Denki KK
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Iwasaki Denki KK
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Publication date
Application filed by Iwasaki Denki KK filed Critical Iwasaki Denki KK
Priority to JP2011063968A priority Critical patent/JP5045833B1/ja
Priority to PCT/JP2012/054184 priority patent/WO2012127966A1/ja
Priority to TW101109653A priority patent/TWI545289B/zh
Application granted granted Critical
Publication of JP5045833B1 publication Critical patent/JP5045833B1/ja
Publication of JP2012199488A publication Critical patent/JP2012199488A/ja
Expired - Fee Related legal-status Critical Current
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011063968A 2011-03-23 2011-03-23 ランプ位置調整方法、ランプ位置調整用具、及び照射装置 Expired - Fee Related JP5045833B1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2011063968A JP5045833B1 (ja) 2011-03-23 2011-03-23 ランプ位置調整方法、ランプ位置調整用具、及び照射装置
PCT/JP2012/054184 WO2012127966A1 (ja) 2011-03-23 2012-02-22 ランプ位置調整方法、ランプ位置調整用具、及び照射装置
TW101109653A TWI545289B (zh) 2011-03-23 2012-03-21 Lamp position adjustment method, lamp position adjustment tool and irradiation device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011063968A JP5045833B1 (ja) 2011-03-23 2011-03-23 ランプ位置調整方法、ランプ位置調整用具、及び照射装置

Publications (2)

Publication Number Publication Date
JP5045833B1 true JP5045833B1 (ja) 2012-10-10
JP2012199488A JP2012199488A (ja) 2012-10-18

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ID=46879129

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011063968A Expired - Fee Related JP5045833B1 (ja) 2011-03-23 2011-03-23 ランプ位置調整方法、ランプ位置調整用具、及び照射装置

Country Status (3)

Country Link
JP (1) JP5045833B1 (zh)
TW (1) TWI545289B (zh)
WO (1) WO2012127966A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112068607A (zh) * 2020-09-11 2020-12-11 广州彩熠灯光股份有限公司 一种灯具调整方法、介质及电子设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0669015B2 (ja) * 1986-09-11 1994-08-31 キヤノン株式会社 投影露光装置
JPH11295819A (ja) * 1998-04-08 1999-10-29 Asahi Optical Co Ltd レーザー露光装置の光軸調整装置
JP2000299270A (ja) * 1999-04-13 2000-10-24 Canon Inc 露光用ランプ、その製造誤差測定装置および露光装置
JP2000349003A (ja) * 1999-06-03 2000-12-15 Canon Inc 露光用ランプ、これを用いた露光装置、ランプ適正位置測定および刻印装置、ならびにランプ適正位置設定装置
JP2003272408A (ja) * 2002-03-19 2003-09-26 Toto Ltd 放電ランプの光軸調整装置および光軸調整方法
JP4086582B2 (ja) * 2002-08-06 2008-05-14 キヤノン株式会社 照明装置及び露光装置
JP2004079254A (ja) * 2002-08-13 2004-03-11 Canon Inc 光源装置及び露光装置
JP2010262141A (ja) * 2009-05-07 2010-11-18 Hitachi High-Technologies Corp 露光装置及び露光装置のランプ位置調整方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112068607A (zh) * 2020-09-11 2020-12-11 广州彩熠灯光股份有限公司 一种灯具调整方法、介质及电子设备
CN112068607B (zh) * 2020-09-11 2024-03-29 广州彩熠灯光股份有限公司 一种灯具调整方法、介质及电子设备

Also Published As

Publication number Publication date
TWI545289B (zh) 2016-08-11
TW201305489A (zh) 2013-02-01
JP2012199488A (ja) 2012-10-18
WO2012127966A1 (ja) 2012-09-27

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