JP5040646B2 - 露光装置及び露光方法、並びにデバイス製造方法 - Google Patents

露光装置及び露光方法、並びにデバイス製造方法 Download PDF

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Publication number
JP5040646B2
JP5040646B2 JP2007509296A JP2007509296A JP5040646B2 JP 5040646 B2 JP5040646 B2 JP 5040646B2 JP 2007509296 A JP2007509296 A JP 2007509296A JP 2007509296 A JP2007509296 A JP 2007509296A JP 5040646 B2 JP5040646 B2 JP 5040646B2
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substrate
temperature
liquid
gas
exposure apparatus
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JPWO2006101120A1 (ja
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徹 木内
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2007509296A 2005-03-23 2006-03-22 露光装置及び露光方法、並びにデバイス製造方法 Expired - Fee Related JP5040646B2 (ja)

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JP2007509296A JP5040646B2 (ja) 2005-03-23 2006-03-22 露光装置及び露光方法、並びにデバイス製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2005083756 2005-03-23
JP2005083756 2005-03-23
PCT/JP2006/305695 WO2006101120A1 (ja) 2005-03-23 2006-03-22 露光装置及び露光方法、並びにデバイス製造方法
JP2007509296A JP5040646B2 (ja) 2005-03-23 2006-03-22 露光装置及び露光方法、並びにデバイス製造方法

Related Child Applications (1)

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JP2011273400A Division JP2012064974A (ja) 2005-03-23 2011-12-14 露光装置及び露光方法、並びにデバイス製造方法

Publications (2)

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JPWO2006101120A1 JPWO2006101120A1 (ja) 2008-09-04
JP5040646B2 true JP5040646B2 (ja) 2012-10-03

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JP2007509296A Expired - Fee Related JP5040646B2 (ja) 2005-03-23 2006-03-22 露光装置及び露光方法、並びにデバイス製造方法
JP2011273400A Pending JP2012064974A (ja) 2005-03-23 2011-12-14 露光装置及び露光方法、並びにデバイス製造方法
JP2014103745A Expired - Fee Related JP5962704B2 (ja) 2005-03-23 2014-05-19 露光装置及び露光方法、並びにデバイス製造方法
JP2015111587A Active JP6119798B2 (ja) 2005-03-23 2015-06-01 露光装置及び露光方法、並びにデバイス製造方法
JP2016107452A Expired - Fee Related JP6330853B2 (ja) 2005-03-23 2016-05-30 露光装置及び露光方法、並びにデバイス製造方法
JP2017127246A Ceased JP2017199020A (ja) 2005-03-23 2017-06-29 露光装置及び露光方法、並びにデバイス製造方法
JP2018188172A Ceased JP2018205781A (ja) 2005-03-23 2018-10-03 露光装置及び露光方法、並びにデバイス製造方法

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JP2011273400A Pending JP2012064974A (ja) 2005-03-23 2011-12-14 露光装置及び露光方法、並びにデバイス製造方法
JP2014103745A Expired - Fee Related JP5962704B2 (ja) 2005-03-23 2014-05-19 露光装置及び露光方法、並びにデバイス製造方法
JP2015111587A Active JP6119798B2 (ja) 2005-03-23 2015-06-01 露光装置及び露光方法、並びにデバイス製造方法
JP2016107452A Expired - Fee Related JP6330853B2 (ja) 2005-03-23 2016-05-30 露光装置及び露光方法、並びにデバイス製造方法
JP2017127246A Ceased JP2017199020A (ja) 2005-03-23 2017-06-29 露光装置及び露光方法、並びにデバイス製造方法
JP2018188172A Ceased JP2018205781A (ja) 2005-03-23 2018-10-03 露光装置及び露光方法、並びにデバイス製造方法

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JP (7) JP5040646B2 (enrdf_load_stackoverflow)
WO (1) WO2006101120A1 (enrdf_load_stackoverflow)

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JP2015212827A (ja) * 2005-03-23 2015-11-26 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

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US7533068B2 (en) 2004-12-23 2009-05-12 D-Wave Systems, Inc. Analog processor comprising quantum devices
US7652746B2 (en) * 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) * 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007142366A (ja) * 2005-10-18 2007-06-07 Canon Inc 露光装置及びデバイス製造方法
KR20180091963A (ko) * 2006-01-19 2018-08-16 가부시키가이샤 니콘 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
US8144305B2 (en) * 2006-05-18 2012-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4758977B2 (ja) * 2006-12-07 2011-08-31 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ投影装置、デバイス製造方法
US9632425B2 (en) 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US20080137055A1 (en) * 2006-12-08 2008-06-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008147577A (ja) * 2006-12-13 2008-06-26 Canon Inc 露光装置及びデバイス製造方法
WO2008122128A1 (en) 2007-04-05 2008-10-16 D-Wave Systems Inc. Physical realizations of a universal adiabatic quantum computer
US9025126B2 (en) 2007-07-31 2015-05-05 Nikon Corporation Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
EP2131241B1 (en) 2008-05-08 2019-07-31 ASML Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
EP2249205B1 (en) * 2008-05-08 2012-03-07 ASML Netherlands BV Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method
US8421993B2 (en) 2008-05-08 2013-04-16 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP5157637B2 (ja) * 2008-05-21 2013-03-06 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP5195022B2 (ja) * 2008-05-23 2013-05-08 株式会社ニコン 位置計測装置及び位置計測方法、パターン形成装置及びパターン形成方法、露光装置及び露光方法、並びにデバイス製造方法
EP2136250A1 (en) 2008-06-18 2009-12-23 ASML Netherlands B.V. Lithographic apparatus and method
NL2003225A1 (nl) 2008-07-25 2010-01-26 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
JP2010080861A (ja) * 2008-09-29 2010-04-08 Nikon Corp 転写装置及びデバイス製造方法
NL2004808A (en) 2009-06-30 2011-01-12 Asml Netherlands Bv Fluid handling structure, lithographic apparatus and device manufacturing method.
NL2005207A (en) 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
NL2009139A (en) * 2011-08-05 2013-02-06 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
CN102621818B (zh) * 2012-04-10 2013-12-04 中国科学院光电技术研究所 一种用于光刻机的浸没控制装置
US10002107B2 (en) 2014-03-12 2018-06-19 D-Wave Systems Inc. Systems and methods for removing unwanted interactions in quantum devices
JP6384252B2 (ja) * 2014-10-07 2018-09-05 株式会社ニコン パターン露光装置
KR102288916B1 (ko) * 2014-12-19 2021-08-12 에이에스엠엘 네델란즈 비.브이. 유체 핸들링 구조체, 리소그래피 장치 및 디바이스 제조 방법
JP6384372B2 (ja) * 2015-03-20 2018-09-05 株式会社ニコン 湿式処理装置
WO2016169758A1 (en) 2015-04-21 2016-10-27 Asml Netherlands B.V. Lithographic apparatus
JP6707964B2 (ja) * 2016-04-12 2020-06-10 日本精工株式会社 位置決め装置及び回転機構
US11494683B2 (en) 2017-12-20 2022-11-08 D-Wave Systems Inc. Systems and methods for coupling qubits in a quantum processor

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JP2005252247A (ja) * 2004-02-04 2005-09-15 Nikon Corp 露光装置、露光方法及びデバイス製造方法
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JP2006156974A (ja) * 2004-10-26 2006-06-15 Nikon Corp 基板処理方法、露光装置及びデバイス製造方法

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Publication number Priority date Publication date Assignee Title
JP2015212827A (ja) * 2005-03-23 2015-11-26 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
JP2017199020A (ja) * 2005-03-23 2017-11-02 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
JP2018205781A (ja) * 2005-03-23 2018-12-27 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法

Also Published As

Publication number Publication date
JP2017199020A (ja) 2017-11-02
JP2012064974A (ja) 2012-03-29
WO2006101120A1 (ja) 2006-09-28
JP2014170962A (ja) 2014-09-18
JP6119798B2 (ja) 2017-04-26
JP5962704B2 (ja) 2016-08-03
JPWO2006101120A1 (ja) 2008-09-04
JP6330853B2 (ja) 2018-05-30
JP2016186641A (ja) 2016-10-27
JP2015212827A (ja) 2015-11-26
JP2018205781A (ja) 2018-12-27

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