JP4965052B2 - ３次元光学素子の加工方法 - Google Patents

３次元光学素子の加工方法 Download PDF

Info

Publication number
JP4965052B2
JP4965052B2 JP2002510984A JP2002510984A JP4965052B2 JP 4965052 B2 JP4965052 B2 JP 4965052B2 JP 2002510984 A JP2002510984 A JP 2002510984A JP 2002510984 A JP2002510984 A JP 2002510984A JP 4965052 B2 JP4965052 B2 JP 4965052B2
Authority
JP
Japan
Prior art keywords
optical element
light
multiphoton
photosensitizer
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002510984A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004503413A5 (US20040126694A1-20040701-C00002.png
JP2004503413A (ja
Inventor
ジェイ． デボー，ロバート
アン レザーデール，キャサリン
マオ，グオピン
アール． フレミング，パトリック
ダブリュ． カルウェイト，ハーベイ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
3M Innovative Properties Co
Original Assignee
3M Innovative Properties Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 3M Innovative Properties Co filed Critical 3M Innovative Properties Co
Publication of JP2004503413A publication Critical patent/JP2004503413A/ja
Publication of JP2004503413A5 publication Critical patent/JP2004503413A5/ja
Application granted granted Critical
Publication of JP4965052B2 publication Critical patent/JP4965052B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/188—Processes of additive manufacturing involving additional operations performed on the added layers, e.g. smoothing, grinding or thickness control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29L—INDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2011/00—Optical elements, e.g. lenses, prisms
    • B29L2011/0075—Light guides, optical cables
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
JP2002510984A 2000-06-15 2001-06-14 ３次元光学素子の加工方法 Expired - Fee Related JP4965052B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US21170100P 2000-06-15 2000-06-15
US60/211,701 2000-06-15
PCT/US2001/019038 WO2001096915A2 (en) 2000-06-15 2001-06-14 Microfabrication of organic optical elements

Publications (3)

Publication Number Publication Date
JP2004503413A JP2004503413A (ja) 2004-02-05
JP2004503413A5 JP2004503413A5 (US20040126694A1-20040701-C00002.png) 2008-07-31
JP4965052B2 true JP4965052B2 (ja) 2012-07-04

Family

ID=22787995

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002510984A Expired - Fee Related JP4965052B2 (ja) 2000-06-15 2001-06-14 ３次元光学素子の加工方法

Country Status (8)

Country Link
US (1) US6855478B2 (US20040126694A1-20040701-C00002.png)
EP (1) EP1292852B1 (US20040126694A1-20040701-C00002.png)
JP (1) JP4965052B2 (US20040126694A1-20040701-C00002.png)
KR (1) KR100810546B1 (US20040126694A1-20040701-C00002.png)
AT (2) ATE309553T1 (US20040126694A1-20040701-C00002.png)
AU (1) AU2001266905A1 (US20040126694A1-20040701-C00002.png)
DE (2) DE60138930D1 (US20040126694A1-20040701-C00002.png)
WO (1) WO2001096915A2 (US20040126694A1-20040701-C00002.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011514556A (ja) * 2008-02-26 2011-05-06 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム

Families Citing this family (79)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7005229B2 (en) 2002-10-02 2006-02-28 3M Innovative Properties Company Multiphoton photosensitization method
EP1295181A2 (en) * 2000-06-15 2003-03-26 3M Innovative Properties Company Method for making or adding structures to an article
EP1292862B1 (en) * 2000-06-15 2009-08-19 3M Innovative Properties Company Multipass multiphoton absorption method and apparatus
AU2001268465A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multiphoton curing to provide encapsulated optical elements
AU2001266918A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multidirectional photoreactive absorption method
US7118845B2 (en) 2000-06-15 2006-10-10 3M Innovative Properties Company Multiphoton photochemical process and articles preparable thereby
US7265161B2 (en) 2002-10-02 2007-09-04 3M Innovative Properties Company Multi-photon reactive compositions with inorganic particles and method for fabricating structures
US7381516B2 (en) 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
JP2002316363A (ja) * 2001-02-16 2002-10-29 Fuji Photo Film Co Ltd 光造形装置及び露光ユニット
JP4284889B2 (ja) * 2001-05-28 2009-06-24 パナソニック電工株式会社 光導波路、光配線板、電気・光混載回路基板及び光導波路の製造方法
US20040012872A1 (en) * 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US6750266B2 (en) 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US7237893B2 (en) * 2001-12-28 2007-07-03 Chang Shiao H Light adjustable lenses capable of post-fabrication power modification via multi-photon processes
DE10252563A1 (de) * 2002-06-27 2004-01-29 Atotech Deutschland Gmbh Verfahren zur Herstellung von integrierten Wellenleitern, Polymersysteme zur Herstellung solcher Wellenleiter sowie Verfahren zur Erzeugung von planaren Wellenleiterkanälen
US7235195B2 (en) 2002-09-06 2007-06-26 Novartis Ag Method for making opthalmic devices
AU2002951841A0 (en) * 2002-09-30 2002-10-24 Swinburne University Of Technology Apparatus
US7232650B2 (en) 2002-10-02 2007-06-19 3M Innovative Properties Company Planar inorganic device
JP4814522B2 (ja) * 2002-10-16 2011-11-16 ジョージア・テック・リサーチ・コーポレーション ポリマーの使用方法
JP3987787B2 (ja) * 2002-11-25 2007-10-10 日東電工株式会社 三次元ポリイミド光導波路の製造方法
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
FR2859543B1 (fr) * 2003-09-08 2005-12-09 Pascal Joffre Systeme de fabrication d'un objet a trois dimensions dans un materiau photo polymerisable
JP2005092177A (ja) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc 光学部品形成方法
US20050124712A1 (en) * 2003-12-05 2005-06-09 3M Innovative Properties Company Process for producing photonic crystals
EP1723455B1 (en) * 2003-12-05 2009-08-12 3M Innovative Properties Company Process for producing photonic crystals
AT413891B (de) 2003-12-29 2006-07-15 Austria Tech & System Tech Leiterplattenelement mit wenigstens einem licht-wellenleiter sowie verfahren zur herstellung eines solchen leiterplattenelements
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
ATE403708T1 (de) * 2004-12-29 2008-08-15 3M Innovative Properties Co Multiphoton-polymerisierbare vorkeramische polymerzusammensetzungen
US20060228386A1 (en) * 2005-02-22 2006-10-12 University Of Tennessee Research Foundation Polymeric microstructures
US20090173889A1 (en) * 2005-06-10 2009-07-09 Santiago Costantino Fluorescent photopolymerizable resins and uses thereof
US9069256B2 (en) * 2005-10-03 2015-06-30 Carnegie Mellon University Method of optical fabrication of three-dimensional polymeric structures with out of plane profile control
US7799885B2 (en) 2005-11-30 2010-09-21 Corning Incorporated Photo or electron beam curable compositions
JP4880701B2 (ja) * 2005-12-21 2012-02-22 スリーエム イノベイティブ プロパティズ カンパニー 多光子硬化反応性組成物を処理するための方法及び装置
US7583444B1 (en) * 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
KR100741110B1 (ko) * 2006-02-15 2007-07-19 삼성에스디아이 주식회사 광 파이버 및 플라즈마 디스플레이 패널의 전극 형성 방법
US7728955B2 (en) * 2006-03-21 2010-06-01 Asml Netherlands B.V. Lithographic apparatus, radiation supply and device manufacturing method
WO2007112309A2 (en) * 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
AT503585B1 (de) 2006-05-08 2007-11-15 Austria Tech & System Tech Leiterplattenelement sowie verfahren zu dessen herstellung
CN101448632B (zh) * 2006-05-18 2012-12-12 3M创新有限公司 用于制备具有提取结构的光导的方法以及由此方法生产的光导
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US20080083886A1 (en) 2006-09-14 2008-04-10 3M Innovative Properties Company Optical system suitable for processing multiphoton curable photoreactive compositions
CN101795838B (zh) 2007-09-06 2014-02-12 3M创新有限公司 形成模具的方法以及使用所述模具形成制品的方法
US8322874B2 (en) 2007-09-06 2012-12-04 3M Innovative Properties Company Lightguides having light extraction structures providing regional control of light output
WO2009032815A1 (en) * 2007-09-06 2009-03-12 3M Innovative Properties Company Tool for making microstructured articles
CN101821659B (zh) 2007-10-11 2014-09-24 3M创新有限公司 色差共聚焦传感器
US8455846B2 (en) 2007-12-12 2013-06-04 3M Innovative Properties Company Method for making structures with improved edge definition
CA2728400C (en) 2008-05-21 2014-03-25 Theraject, Inc. Method of manufacturing solid solution peforator patches and uses thereof
WO2009143482A2 (en) * 2008-05-22 2009-11-26 Georgia Tech Research Corporation Negative tone molecular glass resists and methods of making and using same
IL196690A0 (en) * 2008-05-29 2011-08-01 Plasan Sasa Ltd Interchangeable door
US20110021653A1 (en) * 2009-07-22 2011-01-27 Lixin Zheng Hydrogel compatible two-photon initiation system
JP6377906B2 (ja) * 2010-03-19 2018-08-22 アヴェドロ・インコーポレーテッドＡｖｅｄｒｏ，Ｉｎｃ． 眼治療を適用およびモニターするためのシステム
DE102010020158A1 (de) * 2010-05-11 2011-11-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung sowie Verfahren zur Erzeugung dreidimensionaler Strukturen
DE202011111072U1 (de) * 2011-02-25 2019-03-27 Nanoscribe Gmbh Vorrichtung zum ortsaufgelösten Einbringen eines Intensitätsmusters aus elektromagnetischer Strahlung in eine photosensitive Substanz
US20140030655A1 (en) 2011-04-22 2014-01-30 3M Innovative Properties Company Enhanced Multi-Photon Imaging Resolution Method
DE102011050894A1 (de) * 2011-06-07 2012-12-13 Freie Universität Berlin Verfahren zur Polymerisierung von Monomer- und/oder Oligomereinheiten durch Infrarotlichtimpulse
US9104100B2 (en) 2011-06-08 2015-08-11 3M Innovative Properties Company Photoresists containing polymer-tethered nanoparticles
US8903205B2 (en) 2012-02-23 2014-12-02 Karlsruhe Institute of Technology (KIT) Three-dimensional freeform waveguides for chip-chip connections
US9034222B2 (en) 2012-02-23 2015-05-19 Karlsruhe Institut Fuer Technologie Method for producing photonic wire bonds
DE102013005565A1 (de) * 2013-03-28 2014-10-02 Karlsruher Institut für Technologie Herstellung von 3D-Freiform-Wellenleiterstrukturen
JP6566952B2 (ja) 2013-12-06 2019-08-28 スリーエム イノベイティブ プロパティズ カンパニー 光反応性液体組成物及び構造体の作製方法
EP3089861B1 (en) 2013-12-31 2020-01-22 3M Innovative Properties Company Volume based gradient index lens by additive manufacturing
MX2016016630A (es) 2014-06-23 2017-06-06 Carbon Inc Metodos para producir objetos tridimensionales de poliuretano a partir de materiales que tienen multiples mecanismos de endurecimiento.
US10688770B2 (en) * 2015-03-03 2020-06-23 Ricoh Co., Ltd. Methods for solid freeform fabrication
US9695280B2 (en) 2015-03-03 2017-07-04 Ricoh Co., Ltd. Methods for solid freeform fabrication
US10066119B2 (en) 2015-03-03 2018-09-04 Ricoh Co., Ltd. Method for solid freeform fabrication
US9808993B2 (en) 2015-03-03 2017-11-07 Ricoh Co., Ltd. Method for solid freeform fabrication
EP3182184A1 (en) * 2015-12-17 2017-06-21 Universite De Haute Alsace Method of making a self-aligned optical guide between an optical source and an optical fiber, and related kit
FR3056593B1 (fr) * 2016-09-28 2020-06-26 Ecole Centrale De Marseille Procede pour la realisation d’un objet tridimensionnel par un processus de photo-polymerisation multi-photonique et dispositif associe
US11085018B2 (en) 2017-03-10 2021-08-10 Prellis Biologics, Inc. Three-dimensional printed organs, devices, and matrices
US10933579B2 (en) * 2017-03-10 2021-03-02 Prellis Biologics, Inc. Methods and systems for printing biological material
US10316213B1 (en) 2017-05-01 2019-06-11 Formlabs, Inc. Dual-cure resins and related methods
EP3635105A4 (en) 2017-05-25 2021-03-31 Prellis Biologics, Inc. ORGANS, DEVICES AND DIES PRINTED IN THREE DIMENSIONS
DE102017128824A1 (de) * 2017-12-05 2019-06-06 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung eines strahlungsemittierenden Bauteils und strahlungsemittierendes Bauteil
US11616302B2 (en) 2018-01-15 2023-03-28 Rogers Corporation Dielectric resonator antenna having first and second dielectric portions
US11552390B2 (en) 2018-09-11 2023-01-10 Rogers Corporation Dielectric resonator antenna system
TWI820237B (zh) 2018-10-18 2023-11-01 美商羅傑斯公司 聚合物結構、其立體光刻製造方法以及包含該聚合物結構之電子裝置
US11637377B2 (en) 2018-12-04 2023-04-25 Rogers Corporation Dielectric electromagnetic structure and method of making the same
KR20220016812A (ko) 2019-05-30 2022-02-10 로저스코포레이션 스테레오리소그래피용 광경화성 조성물, 조성물을 사용한 스테레오리소그래피 방법, 스테레오리소그래피 방법에 의해 형성된 폴리머 성분, 및 폴리머 성분을 포함하는 장치
CN110927873B (zh) * 2019-12-25 2020-12-25 青岛五维智造科技有限公司 一种批量化生产ar衍射光波导的方法和设备
US11482790B2 (en) 2020-04-08 2022-10-25 Rogers Corporation Dielectric lens and electromagnetic device with same

Family Cites Families (107)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
GB1051391A (US20040126694A1-20040701-C00002.png) 1959-12-24
US3758186A (en) 1966-11-30 1973-09-11 Battelle Development Corp Method of copying holograms
US3635545A (en) * 1967-04-14 1972-01-18 Eastman Kodak Co Multiple beam generation
US4041476A (en) 1971-07-23 1977-08-09 Wyn Kelly Swainson Method, medium and apparatus for producing three-dimensional figure product
US4238840A (en) 1967-07-12 1980-12-09 Formigraphic Engine Corporation Method, medium and apparatus for producing three dimensional figure product
US3677634A (en) * 1968-12-23 1972-07-18 Ibm Contactless mask pattern exposure process and apparatus system having virtual extended depth of focus
US3806221A (en) * 1969-11-26 1974-04-23 Siemens Ag Holographic method of recording and reproducing etching masks
US3720921A (en) * 1970-07-14 1973-03-13 Ibm Recording in reversible, photochromic medium
US3987037A (en) 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3954475A (en) 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3808006A (en) 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3729313A (en) 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3779778A (en) 1972-02-09 1973-12-18 Minnesota Mining & Mfg Photosolubilizable compositions and elements
US3741769A (en) 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4466080A (en) 1975-01-27 1984-08-14 Formigraphic Engine Corporation Three-dimensional patterned media
US4333165A (en) 1975-01-27 1982-06-01 Formigraphic Engine Corporation Three-dimensional pattern making methods
US4078229A (en) 1975-01-27 1978-03-07 Swanson Wyn K Three dimensional systems
US4471470A (en) 1977-12-01 1984-09-11 Formigraphic Engine Corporation Method and media for accessing data in three dimensions
US4288861A (en) 1977-12-01 1981-09-08 Formigraphic Engine Corporation Three-dimensional systems
US4250053A (en) 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4228861A (en) 1979-08-02 1980-10-21 Hart Thomas E Folding track removing implement
US4279717A (en) 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4394433A (en) 1979-12-07 1983-07-19 Minnesota Mining And Manufacturing Company Diazonium imaging system
US4547037A (en) 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
DE3204686A1 (de) * 1982-02-11 1983-08-18 Fa. Carl Zeiss, 7920 Heidenheim Optisches system zur durchlichtmikroskopie bei auflichtbeleuchtung
US4458345A (en) * 1982-03-31 1984-07-03 International Business Machines Corporation Process for optical information storage
US4666236A (en) 1982-08-10 1987-05-19 Omron Tateisi Electronics Co. Optical coupling device and method of producing same
US4491628A (en) 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4496216A (en) * 1982-12-30 1985-01-29 Polaroid Corporation Method and apparatus for exposing photosensitive material
US4588664A (en) 1983-08-24 1986-05-13 Polaroid Corporation Photopolymerizable compositions used in holograms
US4614705A (en) * 1984-02-17 1986-09-30 Ricoh Co., Ltd. Optical information recording medium
US4642126A (en) 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
CA1294470C (en) * 1986-07-26 1992-01-21 Toshihiro Suzuki Process for the production of optical elements
CA1323949C (en) 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4775754A (en) 1987-10-07 1988-10-04 Minnesota Mining And Manufacturing Company Preparation of leuco dyes
CN1035213A (zh) 1987-12-29 1989-08-30 精工电子工业株式会社 行波电机
JPH0826121B2 (ja) * 1988-02-19 1996-03-13 旭電化工業株式会社 光学的造形用樹脂組成物
US4859572A (en) 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
GB8911454D0 (en) * 1989-05-18 1989-07-05 Pilkington Plc Hologram construction
US5159037A (en) 1989-06-09 1992-10-27 The Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US5037917A (en) 1989-06-09 1991-08-06 The Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US5159038A (en) 1989-06-09 1992-10-27 Dow Chemical Company Perfluorocyclobutane ring-containing polymers
US4963471A (en) 1989-07-14 1990-10-16 E. I. Du Pont De Nemours And Company Holographic photopolymer compositions and elements for refractive index imaging
US5034613A (en) 1989-11-14 1991-07-23 Cornell Research Foundation, Inc. Two-photon laser microscopy
CA2034400A1 (en) 1990-04-30 1991-10-31 James Vincent Crivello Method for making triarylsulfonium hexafluorometal or metalloid salts
US5035476A (en) * 1990-06-15 1991-07-30 Hamamatsu Photonics K.K. Confocal laser scanning transmission microscope
WO1992000185A1 (en) * 1990-06-22 1992-01-09 Martin Russell Harris Optical waveguides
US5225918A (en) 1990-07-18 1993-07-06 Sony Magnescale, Inc. Hologram scale, apparatus for making hologram scale, moving member having hologram scale assembled hologram scale and apparatus for making assembled hologram scale
US5145942A (en) 1990-09-28 1992-09-08 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Methyl substituted polyimides containing carbonyl and ether connecting groups
US5633735A (en) * 1990-11-09 1997-05-27 Litel Instruments Use of fresnel zone plates for material processing
US5235015A (en) 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
JP2769393B2 (ja) * 1991-04-26 1998-06-25 直弘 丹野 立体光記録装置
US5289407A (en) * 1991-07-22 1994-02-22 Cornell Research Foundation, Inc. Method for three dimensional optical data storage and retrieval
DE69213647T2 (de) 1991-10-24 1997-02-06 Tosoh Corp Schutzüberzugsmaterial
EP0542656A1 (en) * 1991-10-31 1993-05-19 International Business Machines Corporation Pattern propagation by blanket illumination of patterned thermal conductors and patterned thermal insulator on a thermal conductor
DE4142327A1 (de) 1991-12-20 1993-06-24 Wacker Chemie Gmbh Jodoniumsalze und verfahren zu deren herstellung
US5405733A (en) * 1992-05-12 1995-04-11 Apple Computer, Inc. Multiple beam laser exposure system for liquid crystal shutters
US5466845A (en) 1992-06-12 1995-11-14 Wacker-Chemie Gmbh Sulfonium salts and process for their preparation
EP0656082B1 (en) * 1992-08-20 1996-10-23 E.I. Du Pont De Nemours And Company Process for microstructuring surfaces of oriented polymeric substrates using laser radiation
US5415835A (en) * 1992-09-16 1995-05-16 University Of New Mexico Method for fine-line interferometric lithography
TW268969B (US20040126694A1-20040701-C00002.png) 1992-10-02 1996-01-21 Minnesota Mining & Mfg
JPH07100938A (ja) * 1993-10-04 1995-04-18 C Met Kk 面粗度が向上する光硬化造形法
US5422753A (en) 1993-12-23 1995-06-06 Xerox Corporation Binary diffraction optical element for controlling scanning beam intensity in a raster output scanning (ROS) optical system
US5850300A (en) 1994-02-28 1998-12-15 Digital Optics Corporation Diffractive beam homogenizer having free-form fringes
US5854868A (en) 1994-06-22 1998-12-29 Fujitsu Limited Optical device and light waveguide integrated circuit
US5856373A (en) 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
JPH08184718A (ja) * 1994-12-28 1996-07-16 Hoechst Japan Ltd 光導波路素子およびその製造方法
JP3498869B2 (ja) * 1995-01-30 2004-02-23 富士写真フイルム株式会社 光重合性組成物を有する画像形成材料
US5665522A (en) 1995-05-02 1997-09-09 Minnesota Mining And Manufacturing Company Visible image dyes for positive-acting no-process printing plates
US5747550A (en) 1995-06-05 1998-05-05 Kimberly-Clark Worldwide, Inc. Method of generating a reactive species and polymerizing an unsaturated polymerizable material
US5699175A (en) 1995-09-08 1997-12-16 Quinta Corporation Multiphoton photorefractive holographic recording media
JP3604700B2 (ja) 1995-10-06 2004-12-22 ポラロイド コーポレイション ホログラフィ媒体およびプロセス
US5750641A (en) 1996-05-23 1998-05-12 Minnesota Mining And Manufacturing Company Polyimide angularity enhancement layer
US5847812A (en) 1996-06-14 1998-12-08 Nikon Corporation Projection exposure system and method
US5832931A (en) * 1996-10-30 1998-11-10 Photogen, Inc. Method for improved selectivity in photo-activation and detection of molecular diagnostic agents
US6608228B1 (en) 1997-11-07 2003-08-19 California Institute Of Technology Two-photon or higher-order absorbing optical materials for generation of reactive species
WO1998021521A1 (en) 1996-11-12 1998-05-22 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
US6267913B1 (en) 1996-11-12 2001-07-31 California Institute Of Technology Two-photon or higher-order absorbing optical materials and methods of use
CA2761346A1 (en) * 1996-11-15 1998-05-22 Marsupial Holdings, Inc. In-line holographic mask for micromachining
US5998495A (en) 1997-04-11 1999-12-07 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy/polyol resin compositions
US6025406A (en) 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US6001297A (en) 1997-04-28 1999-12-14 3D Systems, Inc. Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography
US6005137A (en) 1997-06-10 1999-12-21 3M Innovative Properties Company Halogenated acrylates and polymers derived therefrom
US6020591A (en) * 1997-07-11 2000-02-01 Imra America, Inc. Two-photon microscopy with plane wave illumination
JPH1135684A (ja) * 1997-07-24 1999-02-09 Hitachi Chem Co Ltd ポリイミド前駆体、ポリイミド及びその製造法
US5859251A (en) 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
US5770737A (en) 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
WO1999023650A1 (en) 1997-10-31 1999-05-14 Omd Devices Llc Multi-layered photochromic optical data disk
US6048911A (en) 1997-12-12 2000-04-11 Borden Chemical, Inc. Coated optical fibers
US6103454A (en) 1998-03-24 2000-08-15 Lucent Technologies Inc. Recording medium and process for forming medium
CA2326322C (en) 1998-04-21 2011-03-01 University Of Connecticut Free-form nanofabrication using multi-photon excitation
KR100450542B1 (ko) * 1998-10-29 2004-10-01 가부시키가이샤 히타치세이사쿠쇼 조명 장치 및 이를 이용한 액정 표시 장치
US6327074B1 (en) * 1998-11-25 2001-12-04 University Of Central Florida Display medium using emitting particles dispersed in a transparent host
US6749814B1 (en) * 1999-03-03 2004-06-15 Symyx Technologies, Inc. Chemical processing microsystems comprising parallel flow microreactors and methods for using same
US6703188B1 (en) * 1999-03-29 2004-03-09 Kabushiki Kaisha Toyota Chuo Kenkyusho Method of fabricating optical waveguide structure
US6100405A (en) 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US6322931B1 (en) 1999-07-29 2001-11-27 Siros Technologies, Inc. Method and apparatus for optical data storage using non-linear heating by excited state absorption for the alteration of pre-formatted holographic gratings
US6624915B1 (en) * 2000-03-16 2003-09-23 Science Applications International Corporation Holographic recording and micro/nanofabrication via ultrafast holographic two-photon induced photopolymerization (H-TPIP)
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
JP3876281B2 (ja) * 2000-08-31 2007-01-31 独立行政法人産業技術総合研究所 情報記録方法
US6541591B2 (en) 2000-12-21 2003-04-01 3M Innovative Properties Company High refractive index microreplication resin from naphthyloxyalkylmethacrylates or naphthyloxyacrylates polymers
US7459106B2 (en) 2001-03-30 2008-12-02 The Arizona Board Of Regents On Behalf Of The University Of Arizona Materials, methods, and uses for photochemical generation of acids and/or radical species
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011514556A (ja) * 2008-02-26 2011-05-06 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム

Also Published As

Publication number Publication date
AU2001266905A1 (en) 2001-12-24
KR100810546B1 (ko) 2008-03-18
US6855478B2 (en) 2005-02-15
US20040126694A1 (en) 2004-07-01
DE60114820D1 (de) 2005-12-15
KR20030008219A (ko) 2003-01-24
DE60114820T2 (de) 2006-09-14
EP1292852B1 (en) 2005-11-09
DE60138930D1 (de) 2009-07-16
EP1292852A2 (en) 2003-03-19
ATE433129T1 (de) 2009-06-15
ATE309553T1 (de) 2005-11-15
WO2001096915A3 (en) 2002-04-25
WO2001096915A2 (en) 2001-12-20
JP2004503413A (ja) 2004-02-05

Similar Documents

Publication Publication Date Title
JP4965052B2 (ja) ３次元光学素子の加工方法
JP5491651B2 (ja) 封入光学素子を提供するための光デバイスの連結方法
JP2763078B2 (ja) ポリマー光導波路およびその形成方法
CN101124520B (zh) 单光子和多光子可聚合的陶瓷前体聚合组合物
US6274288B1 (en) Self-trapping and self-focusing of optical beams in photopolymers
Spangenberg et al. Recent advances in two-photon stereolithography
Geisler et al. 3D printing of optical materials by processes based on photopolymerization: materials, technologies, and recent advances
KR20050027021A (ko) 광 소자 형성방법
EP1635202B1 (en) Microfabrication of organic optical elements
WO2020080945A1 (en) High speed photochemistry for 3d lithography
JP2003029404A (ja) 多光子励起感光性フォトポリマー組成物およびその露光方法
DE102004022137B3 (de) π-verzweigte Sensibilisatoren enthaltende strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
Ligon et al. Fabrication of waveguides and other optical elements by multiphoton lithography
KR100426959B1 (ko) 평판형 광도파로의 제조방법
JP6941758B2 (ja) 光学式シャッター装置及びその製造方法、光学装置、並びに画像形成方法。
Wildman et al. Combining Two-Photon Polymerisation and Photoreduction to Enable the Manufacture of Metamaterials at the Nanosale
Islam STED-inspired sub 100 nm cationic photoinhibition lithography/Author Sourav Islam
Kim et al. Two-Photon-Initiated Photopolymerization: Aspects of Materials and 3D Microfabrication.
NGUYEN Novel Photostructurable Polymer for On-Board Optical Interconnects Enabled by Femtosecond Direct Laser Writing
Hu et al. Nanoscale manufacturing by combining two-photon polymerisation and photoreduction
Houbertz et al. Bottom-Up meets Top-Down–A Novel Approach towards 3-D Optical Devices
Koo et al. UV written waveguides using crosslinkable PMMA-based copolymers
JP2016038549A (ja) 二光子吸収露光によるパターン状硬化物の形成方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080612

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080612

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20110221

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110301

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110527

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120228

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120329

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150406

Year of fee payment: 3

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees