JP4901898B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP4901898B2 JP4901898B2 JP2009082060A JP2009082060A JP4901898B2 JP 4901898 B2 JP4901898 B2 JP 4901898B2 JP 2009082060 A JP2009082060 A JP 2009082060A JP 2009082060 A JP2009082060 A JP 2009082060A JP 4901898 B2 JP4901898 B2 JP 4901898B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/49—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions wire-like arrangements or pins or rods
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76804—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics by forming tapered via holes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76816—Aspects relating to the layout of the pattern or to the size of vias or trenches
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/42—Wire connectors; Manufacturing methods related thereto
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B41/00—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates
- H10B41/30—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region
- H10B41/35—Electrically erasable-and-programmable ROM [EEPROM] devices comprising floating gates characterised by the memory core region with a cell select transistor, e.g. NAND
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
Description
NAND型フラッシュメモリ装置のメモリセルアレイは、NANDセルユニット(メモリユニット)Suがマトリクス状に配置された状態で構成されている。NANDセルユニットSuは、2個の選択ゲートトランジスタTrs1、Trs2と、当該選択ゲートトランジスタTrs1、Trs2間に対して直列接続された複数個(例えば8個:2のn乗個(nは正数))のメモリセルトランジスタTrmとから構成される。NANDセルユニットSu内において、複数個のメモリセルトランジスタTrmは隣接するもの同士でソース/ドレイン領域を共用する構成である。
また、第2の埋め込み配線10bの幅寸法については、底面部の幅寸法をDaよりも小さくし、上面部の幅寸法をDaより大きくするように形成できる。これにより、第1の埋め込み配線10aと第2の埋め込み配線10bとの断面積をほぼ同じとなるように設定することができ、両者の配線抵抗をほぼ同じ程度に形成することもできる。
図4は、図3と同じ部分で切断した場合の製造工程の一段階を示す模式的な断面図である。また、簡単のため、図4以降では、第1および第2の埋め込み配線10a、10bを形成する部分に関係した構成部分を中心に示し、シリコン基板1に係る部分の表示を省略している。
側壁転写技術を用いて微細なL/Sパターンを形成する場合の配線溝パターン7aとして、隣接部Ajでの溝の幅寸法がペア部Paの幅寸法より上部で実質的に大きくなる構成とした。これにより、スパッタ法によるバリアメタル層8の形成時に丸みを帯びた形状部分などにいわゆるオーバーハングが形成されても、その後の銅層9の形成に悪影響を与えるのを抑制でき、銅層9をめっき法などにより形成する場合に、隣接部Aj内への埋め込み性を向上できる。
本発明は、上記実施形態にのみ限定されるものではなく、次のように変形または拡張できる。
埋め込み用絶縁膜、芯材用膜、マスク用膜は、RIE法によるエッチング処理で互いに選択的にエッチング可能な膜として機能するものであればよい。例えば、実施形態に示したシリコン酸化膜、シリコン窒化膜、非晶質シリコン膜からそれぞれにいずれかを割り当てて使用することができる。
コンタクトプラグ5に接続する埋め込み配線10a、10bに適用したが、他の配線層にも適用できる。
対象となるデバイスは、NAND型フラッシュメモリ装置以外に、NOR型フラッシュメモリあるいはSRAM、RAMなど各種のメモリデバイスのように微細化が要求される配線層を有する構成の半導体装置全般に適用できる。
Claims (3)
- 半導体基板上に埋め込み用絶縁膜、芯材用膜を順次積層形成する工程と、
前記芯材用膜を加工して芯材パターンを形成する工程と、
前記芯材パターンの上面および側面並びに前記芯材パターン間に露出している前記埋め込み用絶縁膜の上面に沿うように所定膜厚のマスク用膜を形成する工程と、
前記マスク用膜を異方性エッチングにより前記芯材パターンの上面が露出するまで加工してマスクパターンを形成する工程と、
前記マスクパターン間に上面が露出した前記芯材パターンを除去する工程と、
前記芯材パターンを除去した後前記マスクパターンをマスクとして前記埋め込み用絶縁膜をエッチングして配線溝パターンを形成する工程と、
前記配線溝パターン内に導体膜を埋め込み形成して埋め込み配線を形成する工程とを備え、
前記マスクパターンを形成する工程では、前記芯材パターンを挟んで対向する一対のマスクパターン部分に相当するペア部のマスクパターン底面部での間隔に対して、前記芯材パターンが形成されていない部分を挟んで対向する一対のマスクパターン部分に相当する隣接部のマスクパターン底面部での間隔が大きくなるように前記マスクパターンを形成し、
前記配線溝パターンを形成する工程では、
前記ペア部と隣接部のうち隣接部で溝幅の寸法が上部から下部にかけて小さくなるように前記埋め込み用絶縁膜をエッチングして、前記隣接部における配線溝パターンの側面が上部から底面部にかけて傾斜するテーパ面となる前記配線溝パターンを形成することを特徴とする半導体装置の製造方法。 - 請求項1に記載の半導体装置の製造方法において、
前記配線溝パターンを形成する工程では、
前記隣接部における配線溝パターンを、前記テーパ面下部の傾斜角度が前記マスクとしてのマスクパターンの下部側面の傾斜角度よりも小さくなるように形成することを特徴とする半導体装置の製造方法。 - 請求項1または2に記載の半導体装置の製造方法において、
前記埋め込み配線を形成する工程では、
前記ペア部に形成する第1の埋め込み配線の底面の幅寸法に対して前記隣接部に形成する第2の埋め込み配線の底面の幅寸法が同じもしくは小さくなるように前記埋め込み配線を形成することを特徴とする半導体装置の製造方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009082060A JP4901898B2 (ja) | 2009-03-30 | 2009-03-30 | 半導体装置の製造方法 |
US12/729,804 US8592978B2 (en) | 2009-03-30 | 2010-03-23 | Method of fabricating semiconductor device and the semiconductor device |
US14/059,124 US20140042626A1 (en) | 2009-03-30 | 2013-10-21 | Method of fabricating semiconductor device and the semiconductor device |
Applications Claiming Priority (1)
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JP2009082060A JP4901898B2 (ja) | 2009-03-30 | 2009-03-30 | 半導体装置の製造方法 |
Publications (2)
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JP2010238719A JP2010238719A (ja) | 2010-10-21 |
JP4901898B2 true JP4901898B2 (ja) | 2012-03-21 |
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Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JP4901898B2 (ja) * | 2009-03-30 | 2012-03-21 | 株式会社東芝 | 半導体装置の製造方法 |
FR2960700B1 (fr) * | 2010-06-01 | 2012-05-18 | Commissariat Energie Atomique | Procede de lithographie pour la realisation de reseaux de conducteurs relies par des vias |
US8598032B2 (en) * | 2011-01-19 | 2013-12-03 | Macronix International Co., Ltd | Reduced number of masks for IC device with stacked contact levels |
US9977855B2 (en) | 2011-09-14 | 2018-05-22 | Toshiba Memory Corporation | Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device |
US9953126B2 (en) | 2011-09-14 | 2018-04-24 | Toshiba Memory Corporation | Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor device |
US8778794B1 (en) * | 2012-12-21 | 2014-07-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Interconnection wires of semiconductor devices |
JP6366412B2 (ja) * | 2014-08-01 | 2018-08-01 | キヤノン株式会社 | パターン形成方法 |
KR102339781B1 (ko) | 2014-12-19 | 2021-12-15 | 삼성전자주식회사 | 반도체 소자 및 그 제조 방법 |
CN111341725B (zh) * | 2018-12-19 | 2022-09-13 | 联华电子股份有限公司 | 半导体图案的制作方法 |
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US6297084B1 (en) * | 1998-09-03 | 2001-10-02 | Hyundai Electronics Industries Co., Ltd. | Method for fabricating semiconductor memory |
US6071789A (en) * | 1998-11-10 | 2000-06-06 | Vanguard International Semiconductor Corporation | Method for simultaneously fabricating a DRAM capacitor and metal interconnections |
JP4335490B2 (ja) * | 2000-04-14 | 2009-09-30 | 富士通マイクロエレクトロニクス株式会社 | 半導体装置及びその製造方法 |
JP2001319928A (ja) * | 2000-05-08 | 2001-11-16 | Hitachi Ltd | 半導体集積回路装置およびその製造方法 |
JP3805603B2 (ja) * | 2000-05-29 | 2006-08-02 | 富士通株式会社 | 半導体装置及びその製造方法 |
US7611944B2 (en) * | 2005-03-28 | 2009-11-03 | Micron Technology, Inc. | Integrated circuit fabrication |
US7262053B2 (en) * | 2005-06-21 | 2007-08-28 | Micron Technology, Inc. | Terraced film stack |
US7291560B2 (en) | 2005-08-01 | 2007-11-06 | Infineon Technologies Ag | Method of production pitch fractionizations in semiconductor technology |
KR100752674B1 (ko) | 2006-10-17 | 2007-08-29 | 삼성전자주식회사 | 미세 피치의 하드마스크 패턴 형성 방법 및 이를 이용한반도체 소자의 미세 패턴 형성 방법 |
KR100812239B1 (ko) * | 2006-10-19 | 2008-03-10 | 삼성전자주식회사 | 반도체 소자 및 그 제조 방법 |
JP4621718B2 (ja) | 2007-09-10 | 2011-01-26 | 株式会社東芝 | 半導体装置の製造方法 |
JP2009177069A (ja) * | 2008-01-28 | 2009-08-06 | Toshiba Corp | 半導体装置の製造方法 |
US8222159B2 (en) * | 2008-08-25 | 2012-07-17 | Elpida Memory, Inc. | Manufacturing method of semiconductor device |
JP4901898B2 (ja) * | 2009-03-30 | 2012-03-21 | 株式会社東芝 | 半導体装置の製造方法 |
-
2009
- 2009-03-30 JP JP2009082060A patent/JP4901898B2/ja active Active
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2010
- 2010-03-23 US US12/729,804 patent/US8592978B2/en active Active
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2013
- 2013-10-21 US US14/059,124 patent/US20140042626A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
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US20100244257A1 (en) | 2010-09-30 |
JP2010238719A (ja) | 2010-10-21 |
US20140042626A1 (en) | 2014-02-13 |
US8592978B2 (en) | 2013-11-26 |
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