JP4896236B2 - 基板搬送装置及び基板搬送方法 - Google Patents

基板搬送装置及び基板搬送方法 Download PDF

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Publication number
JP4896236B2
JP4896236B2 JP2010011078A JP2010011078A JP4896236B2 JP 4896236 B2 JP4896236 B2 JP 4896236B2 JP 2010011078 A JP2010011078 A JP 2010011078A JP 2010011078 A JP2010011078 A JP 2010011078A JP 4896236 B2 JP4896236 B2 JP 4896236B2
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JP
Japan
Prior art keywords
substrate
alignment
stage
support
support pins
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010011078A
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English (en)
Japanese (ja)
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JP2011148593A (ja
Inventor
慶崇 大塚
文宏 宮▲さき▼
孝志 中満
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP2010011078A priority Critical patent/JP4896236B2/ja
Priority to KR1020110001813A priority patent/KR101577481B1/ko
Priority to TW100101444A priority patent/TWI479592B/zh
Priority to CN201110025022.XA priority patent/CN102157424B/zh
Publication of JP2011148593A publication Critical patent/JP2011148593A/ja
Application granted granted Critical
Publication of JP4896236B2 publication Critical patent/JP4896236B2/ja
Expired - Fee Related legal-status Critical Current
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67784Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations using air tracks
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/061Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/067Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2010011078A 2010-01-21 2010-01-21 基板搬送装置及び基板搬送方法 Expired - Fee Related JP4896236B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010011078A JP4896236B2 (ja) 2010-01-21 2010-01-21 基板搬送装置及び基板搬送方法
KR1020110001813A KR101577481B1 (ko) 2010-01-21 2011-01-07 기판 반송장치 및 기판 반송방법
TW100101444A TWI479592B (zh) 2010-01-21 2011-01-14 基板運送裝置及基板運送方法
CN201110025022.XA CN102157424B (zh) 2010-01-21 2011-01-21 基板输送装置及基板输送方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010011078A JP4896236B2 (ja) 2010-01-21 2010-01-21 基板搬送装置及び基板搬送方法

Publications (2)

Publication Number Publication Date
JP2011148593A JP2011148593A (ja) 2011-08-04
JP4896236B2 true JP4896236B2 (ja) 2012-03-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010011078A Expired - Fee Related JP4896236B2 (ja) 2010-01-21 2010-01-21 基板搬送装置及び基板搬送方法

Country Status (4)

Country Link
JP (1) JP4896236B2 (ko)
KR (1) KR101577481B1 (ko)
CN (1) CN102157424B (ko)
TW (1) TWI479592B (ko)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5861365B2 (ja) * 2011-10-05 2016-02-16 大日本印刷株式会社 基板のアラインメント方法及び装置
JP5851271B2 (ja) * 2012-02-15 2016-02-03 株式会社エヌ・ピー・シー アライメント装置及び方法、並びに太陽電池モジュールの製造装置及び製造方法
JP5978937B2 (ja) * 2012-11-13 2016-08-24 旭硝子株式会社 基板搬送用ハンド及び基板搬送方法
CN102942062B (zh) * 2012-11-21 2016-01-06 深圳市华星光电技术有限公司 用于玻璃基板的传输装置和传输方法
JP6045376B2 (ja) * 2013-02-06 2016-12-14 Juki株式会社 基板搬送装置、基板の搬送方法
KR102218382B1 (ko) * 2014-08-21 2021-02-23 세메스 주식회사 반송 유닛, 이를 포함하는 기판 처리 장치 및 방법
TWI699582B (zh) * 2015-07-01 2020-07-21 日商信越工程股份有限公司 貼合器件的製造裝置及製造方法
CN106409738A (zh) * 2015-07-28 2017-02-15 细美事有限公司 基板移送装置及基板移送方法
JP6651392B2 (ja) * 2016-03-22 2020-02-19 東レエンジニアリング株式会社 基板浮上搬送装置
KR102063322B1 (ko) 2016-05-27 2020-01-08 세메스 주식회사 기판 처리 장치 및 방법
CN106081483A (zh) * 2016-06-01 2016-11-09 中国建材国际工程集团有限公司 用于玻璃定位的装置
CN106044225B (zh) * 2016-06-28 2019-05-31 江苏东旭亿泰智能装备有限公司 气浮平台、气浮装置及玻璃基板传送装置
CN106516740B (zh) * 2016-10-27 2018-10-19 信义玻璃(天津)有限公司 一种自调节双边自动磨边系统
JP6786162B2 (ja) * 2016-12-20 2020-11-18 東京応化工業株式会社 塗布装置、及び塗布方法
CN108345136B (zh) * 2018-04-16 2023-09-29 苏州富强科技有限公司 一种lcd吸附上料装置
JP7154687B2 (ja) * 2018-06-19 2022-10-18 株式会社ディスコ テープ拡張装置
CN108861595A (zh) * 2018-07-02 2018-11-23 君泰创新(北京)科技有限公司 定位装置
CN110718492B (zh) * 2019-09-23 2022-11-29 苏州均华精密机械有限公司 盘体收集模块及其方法
US11903302B2 (en) * 2020-12-16 2024-02-13 Universal Display Corporation Organic vapor jet printing system
CN115818207B (zh) * 2023-02-10 2023-06-02 季华实验室 一种基板传送装置、控制方法及相关设备

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4305918B2 (ja) * 2004-01-30 2009-07-29 東京エレクトロン株式会社 浮上式基板搬送処理装置
JP4378301B2 (ja) * 2005-02-28 2009-12-02 東京エレクトロン株式会社 基板処理装置及び基板処理方法及び基板処理プログラム
JP4895518B2 (ja) * 2005-03-22 2012-03-14 オリンパス株式会社 基板保持装置及び基板の保持方法
JP2007107945A (ja) * 2005-10-12 2007-04-26 Olympus Corp 基板検査装置
JP4884871B2 (ja) * 2006-07-27 2012-02-29 東京エレクトロン株式会社 塗布方法及び塗布装置
JP4842746B2 (ja) * 2006-09-20 2011-12-21 オリンパス株式会社 基板搬送装置
JP5315013B2 (ja) * 2008-02-05 2013-10-16 オリンパス株式会社 基板搬送装置、及び、基板搬送方法

Also Published As

Publication number Publication date
KR101577481B1 (ko) 2015-12-14
CN102157424A (zh) 2011-08-17
TWI479592B (zh) 2015-04-01
KR20110085883A (ko) 2011-07-27
JP2011148593A (ja) 2011-08-04
TW201145432A (en) 2011-12-16
CN102157424B (zh) 2014-09-24

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