JP4886146B2 - アミノプラスト重合物を含む改良された反射防止コーティング組成物 - Google Patents
アミノプラスト重合物を含む改良された反射防止コーティング組成物 Download PDFInfo
- Publication number
- JP4886146B2 JP4886146B2 JP2001578095A JP2001578095A JP4886146B2 JP 4886146 B2 JP4886146 B2 JP 4886146B2 JP 2001578095 A JP2001578095 A JP 2001578095A JP 2001578095 A JP2001578095 A JP 2001578095A JP 4886146 B2 JP4886146 B2 JP 4886146B2
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- Prior art keywords
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- composition
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- compound
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000000203 mixture Substances 0.000 title claims description 57
- 229920000642 polymer Polymers 0.000 title claims description 32
- 239000006117 anti-reflective coating Substances 0.000 title claims description 30
- 229920003180 amino resin Polymers 0.000 title description 2
- 150000001875 compounds Chemical class 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 32
- 239000010410 layer Substances 0.000 claims description 30
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 claims description 24
- 239000006185 dispersion Substances 0.000 claims description 21
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 claims description 21
- 239000000178 monomer Substances 0.000 claims description 17
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 16
- -1 methoxymethylol groups Chemical group 0.000 claims description 15
- 238000010438 heat treatment Methods 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 12
- 229940116333 ethyl lactate Drugs 0.000 claims description 12
- WSWCOQWTEOXDQX-UHFFFAOYSA-N 2,4-Hexadienoic acid Chemical compound CC=CC=CC(O)=O WSWCOQWTEOXDQX-UHFFFAOYSA-N 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 claims description 9
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 9
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000004132 cross linking Methods 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 9
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims description 8
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 claims description 8
- 239000002491 polymer binding agent Substances 0.000 claims description 8
- 238000004448 titration Methods 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 7
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 7
- 229920005596 polymer binder Polymers 0.000 claims description 7
- 238000002360 preparation method Methods 0.000 claims description 7
- ALKYHXVLJMQRLQ-UHFFFAOYSA-N 3-Hydroxy-2-naphthoate Chemical compound C1=CC=C2C=C(O)C(C(=O)O)=CC2=C1 ALKYHXVLJMQRLQ-UHFFFAOYSA-N 0.000 claims description 6
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 claims description 6
- 229920000877 Melamine resin Polymers 0.000 claims description 6
- GAMPNQJDUFQVQO-UHFFFAOYSA-N acetic acid;phthalic acid Chemical compound CC(O)=O.OC(=O)C1=CC=CC=C1C(O)=O GAMPNQJDUFQVQO-UHFFFAOYSA-N 0.000 claims description 6
- 229920002301 cellulose acetate Polymers 0.000 claims description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 6
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 6
- 239000001856 Ethyl cellulose Substances 0.000 claims description 5
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 claims description 5
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 claims description 5
- 229920001249 ethyl cellulose Polymers 0.000 claims description 5
- 235000019325 ethyl cellulose Nutrition 0.000 claims description 5
- 239000001863 hydroxypropyl cellulose Substances 0.000 claims description 5
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 claims description 5
- 238000002156 mixing Methods 0.000 claims description 5
- 229920000728 polyester Polymers 0.000 claims description 5
- 235000010199 sorbic acid Nutrition 0.000 claims description 5
- GNSFRPWPOGYVLO-UHFFFAOYSA-N 3-hydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCO GNSFRPWPOGYVLO-UHFFFAOYSA-N 0.000 claims description 4
- 229920002125 Sokalan® Polymers 0.000 claims description 4
- 229920006217 cellulose acetate butyrate Polymers 0.000 claims description 4
- 239000004584 polyacrylic acid Substances 0.000 claims description 4
- 239000011230 binding agent Substances 0.000 claims description 2
- 230000003247 decreasing effect Effects 0.000 claims description 2
- 238000004528 spin coating Methods 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 6
- 150000002431 hydrogen Chemical class 0.000 claims 6
- 239000011247 coating layer Substances 0.000 claims 3
- 230000003667 anti-reflective effect Effects 0.000 claims 2
- 238000010304 firing Methods 0.000 claims 1
- 230000003449 preventive effect Effects 0.000 claims 1
- 239000000243 solution Substances 0.000 description 27
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 18
- 229920002120 photoresistant polymer Polymers 0.000 description 12
- 229920003270 Cymel® Polymers 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 8
- 229910052710 silicon Inorganic materials 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- 239000006096 absorbing agent Substances 0.000 description 5
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000010828 elution Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 4
- 238000010306 acid treatment Methods 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000004971 Cross linker Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 239000002612 dispersion medium Substances 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 150000007974 melamines Chemical class 0.000 description 2
- VYMDGNCVAMGZFE-UHFFFAOYSA-N phenylbutazonum Chemical compound O=C1C(CCCC)C(=O)N(C=2C=CC=CC=2)N1C1=CC=CC=C1 VYMDGNCVAMGZFE-UHFFFAOYSA-N 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 125000003277 amino group Chemical class 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/20—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
- C08L61/26—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
- C08L61/28—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31859—Next to an aldehyde or ketone condensation product
- Y10T428/31862—Melamine-aldehyde
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31942—Of aldehyde or ketone condensation product
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/552,236 | 2000-04-19 | ||
| US09/552,236 US6323310B1 (en) | 2000-04-19 | 2000-04-19 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| PCT/US2000/024595 WO2001081010A1 (en) | 2000-04-19 | 2000-09-06 | Improved anti-reflective coating compositions comprising polymerized aminoplasts |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003531252A JP2003531252A (ja) | 2003-10-21 |
| JP2003531252A5 JP2003531252A5 (https=) | 2011-10-13 |
| JP4886146B2 true JP4886146B2 (ja) | 2012-02-29 |
Family
ID=24204467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001578095A Expired - Lifetime JP4886146B2 (ja) | 2000-04-19 | 2000-09-06 | アミノプラスト重合物を含む改良された反射防止コーティング組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (7) | US6323310B1 (https=) |
| EP (1) | EP1284829A4 (https=) |
| JP (1) | JP4886146B2 (https=) |
| CN (1) | CN1248787C (https=) |
| AU (1) | AU2000273568A1 (https=) |
| MY (1) | MY133726A (https=) |
| TW (1) | TWI247968B (https=) |
| WO (1) | WO2001081010A1 (https=) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW556047B (en) | 2000-07-31 | 2003-10-01 | Shipley Co Llc | Coated substrate, method for forming photoresist relief image, and antireflective composition |
| JP4117871B2 (ja) * | 2000-11-09 | 2008-07-16 | 東京応化工業株式会社 | 反射防止膜形成用組成物 |
| TW576859B (en) | 2001-05-11 | 2004-02-21 | Shipley Co Llc | Antireflective coating compositions |
| US6893684B2 (en) * | 2001-06-05 | 2005-05-17 | Brewer Science Inc. | Anti-reflective coating compositions for use with low k dielectric materials |
| TW591341B (en) * | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
| US7070914B2 (en) * | 2002-01-09 | 2006-07-04 | Az Electronic Materials Usa Corp. | Process for producing an image using a first minimum bottom antireflective coating composition |
| US20030215736A1 (en) * | 2002-01-09 | 2003-11-20 | Oberlander Joseph E. | Negative-working photoimageable bottom antireflective coating |
| US8012670B2 (en) | 2002-04-11 | 2011-09-06 | Rohm And Haas Electronic Materials Llc | Photoresist systems |
| US20040067437A1 (en) * | 2002-10-06 | 2004-04-08 | Shipley Company, L.L.C. | Coating compositions for use with an overcoated photoresist |
| EP1560070B1 (en) * | 2002-10-09 | 2009-12-30 | Nissan Chemical Industries, Ltd. | Composition for forming antireflection film for lithography |
| US7038328B2 (en) * | 2002-10-15 | 2006-05-02 | Brewer Science Inc. | Anti-reflective compositions comprising triazine compounds |
| KR20040044368A (ko) * | 2002-11-20 | 2004-05-28 | 쉬플리 캄파니, 엘.엘.씨. | 다층 포토레지스트 시스템 |
| EP1422565A3 (en) * | 2002-11-20 | 2005-01-05 | Shipley Company LLC | Multilayer photoresist systems |
| US7018779B2 (en) * | 2003-01-07 | 2006-03-28 | International Business Machines Corporation | Apparatus and method to improve resist line roughness in semiconductor wafer processing |
| US7291293B2 (en) * | 2003-02-28 | 2007-11-06 | Northwestern University | Vapor deposited electro-optic films self-assembled through hydrogen bonding |
| US8461234B2 (en) * | 2003-03-14 | 2013-06-11 | Eastman Chemical Company | Refinish coating compositions comprising low molecular weight cellulose mixed esters |
| US8039531B2 (en) * | 2003-03-14 | 2011-10-18 | Eastman Chemical Company | Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions |
| US7893138B2 (en) * | 2003-03-14 | 2011-02-22 | Eastman Chemical Company | Low molecular weight carboxyalkylcellulose esters and their use as low viscosity binders and modifiers in coating compositions |
| US8124676B2 (en) * | 2003-03-14 | 2012-02-28 | Eastman Chemical Company | Basecoat coating compositions comprising low molecular weight cellulose mixed esters |
| US20050074688A1 (en) * | 2003-10-03 | 2005-04-07 | Toukhy Medhat A. | Bottom antireflective coatings |
| US7795369B2 (en) * | 2004-10-12 | 2010-09-14 | Nissan Chemical Industries, Ltd. | Sulfur atom-containing anti-reflective coating forming composition for lithography |
| KR101248826B1 (ko) * | 2004-11-01 | 2013-03-29 | 닛산 가가쿠 고교 가부시키 가이샤 | 시클로덱스트린 화합물을 함유하는 리소그라피용 하층막 형성 조성물 |
| US8137895B2 (en) * | 2005-08-09 | 2012-03-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for improving photoresist pattern adhesion |
| US20080085953A1 (en) * | 2006-06-05 | 2008-04-10 | Deepanjan Bhattacharya | Coating compositions comprising low molecular weight cellulose mixed esters and their use to improve anti-sag, leveling, and 20 degree gloss |
| US20070282038A1 (en) * | 2006-06-05 | 2007-12-06 | Deepanjan Bhattacharya | Methods for improving the anti-sag, leveling, and gloss of coating compositions comprising low molecular weight cellulose mixed esters |
| WO2008026468A1 (fr) * | 2006-08-28 | 2008-03-06 | Nissan Chemical Industries, Ltd. | Composition servant à créer une sous-couche de réserve et contenant un additif liquide |
| US20090042133A1 (en) * | 2007-08-10 | 2009-02-12 | Zhong Xiang | Antireflective Coating Composition |
| US8361695B2 (en) | 2007-12-13 | 2013-01-29 | Nissan Chemical Industries, Ltd. | Resist underlayer film forming composition and method for forming resist pattern |
| US8221965B2 (en) * | 2008-07-08 | 2012-07-17 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US8329387B2 (en) | 2008-07-08 | 2012-12-11 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US20100092894A1 (en) * | 2008-10-14 | 2010-04-15 | Weihong Liu | Bottom Antireflective Coating Compositions |
| CN102203951A (zh) | 2008-10-31 | 2011-09-28 | 日产化学工业株式会社 | 形成光电转换装置用波长转换膜的组合物、光电转换装置用波长转换膜以及光电转换装置 |
| WO2010150748A1 (ja) | 2009-06-23 | 2010-12-29 | 日産化学工業株式会社 | 光配向性を有する熱硬化膜形成組成物 |
| CN102471629B (zh) * | 2009-07-21 | 2015-09-09 | 日产化学工业株式会社 | 形成具有光取向性的热固化膜的组合物 |
| US8507192B2 (en) * | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
| EP2557119B1 (en) | 2010-04-08 | 2015-12-09 | Nissan Chemical Industries, Ltd. | Composition forming heat-cured film having photo-alignment properties |
| CN103261273B (zh) * | 2010-11-01 | 2015-09-16 | 日产化学工业株式会社 | 含三嗪环的聚合物和含有该聚合物的成膜用组合物 |
| EP2753662B1 (en) | 2011-09-07 | 2020-06-24 | MicroChem Corp. | Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates |
| US9244199B2 (en) | 2011-10-11 | 2016-01-26 | Nissan Chemical Industries, Ltd. | Cured film formation composition, orientation material, and retardation material |
| US9962430B2 (en) | 2012-02-15 | 2018-05-08 | Chirhoclin, Inc. | Methods for treating pain associated with chronic pancreatitis |
| US11635688B2 (en) | 2012-03-08 | 2023-04-25 | Kayaku Advanced Materials, Inc. | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates |
| US11406718B2 (en) | 2012-05-29 | 2022-08-09 | Chirhoclin, Inc. | Methods of detecting pancreobiliary ductal leaks |
| KR102641678B1 (ko) * | 2016-02-09 | 2024-02-28 | 닛산 가가쿠 가부시키가이샤 | 트라이아진환 함유 중합체 및 그것을 포함하는 조성물 |
| US11744878B2 (en) | 2020-08-19 | 2023-09-05 | Chirhoclin, Inc. | Methods for treatment of COVID-19 syndrome |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4197392A (en) * | 1978-08-21 | 1980-04-08 | General Electric Company | Melamine coatings |
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-
2000
- 2000-04-19 US US09/552,236 patent/US6323310B1/en not_active Expired - Lifetime
- 2000-08-29 MY MYPI20003965 patent/MY133726A/en unknown
- 2000-09-06 CN CNB008194416A patent/CN1248787C/zh not_active Expired - Lifetime
- 2000-09-06 EP EP00961646A patent/EP1284829A4/en not_active Withdrawn
- 2000-09-06 AU AU2000273568A patent/AU2000273568A1/en not_active Abandoned
- 2000-09-06 JP JP2001578095A patent/JP4886146B2/ja not_active Expired - Lifetime
- 2000-09-06 WO PCT/US2000/024595 patent/WO2001081010A1/en not_active Ceased
- 2000-09-14 TW TW089118827A patent/TWI247968B/zh not_active IP Right Cessation
- 2000-10-18 US US09/691,780 patent/US6432611B1/en not_active Expired - Lifetime
- 2000-10-18 US US09/691,771 patent/US6403152B1/en not_active Expired - Lifetime
- 2000-10-18 US US09/691,774 patent/US6399686B1/en not_active Expired - Lifetime
-
2001
- 2001-05-30 US US09/870,171 patent/US20020007038A1/en not_active Abandoned
- 2001-10-10 US US09/975,837 patent/US6524708B2/en not_active Expired - Lifetime
-
2002
- 2002-04-12 US US10/122,069 patent/US6512084B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20020007038A1 (en) | 2002-01-17 |
| AU2000273568A1 (en) | 2001-11-07 |
| US6403152B1 (en) | 2002-06-11 |
| TWI247968B (en) | 2006-01-21 |
| CN1452521A (zh) | 2003-10-29 |
| US20020061408A1 (en) | 2002-05-23 |
| MY133726A (en) | 2007-11-30 |
| US6399686B1 (en) | 2002-06-04 |
| JP2003531252A (ja) | 2003-10-21 |
| US20020161175A1 (en) | 2002-10-31 |
| CN1248787C (zh) | 2006-04-05 |
| US6524708B2 (en) | 2003-02-25 |
| WO2001081010A1 (en) | 2001-11-01 |
| EP1284829A1 (en) | 2003-02-26 |
| US6323310B1 (en) | 2001-11-27 |
| EP1284829A4 (en) | 2003-07-02 |
| US6512084B2 (en) | 2003-01-28 |
| US6432611B1 (en) | 2002-08-13 |
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