AU2000273568A1 - Improved anti-reflective coating compositions comprising polymerized aminoplasts - Google Patents

Improved anti-reflective coating compositions comprising polymerized aminoplasts

Info

Publication number
AU2000273568A1
AU2000273568A1 AU2000273568A AU7356800A AU2000273568A1 AU 2000273568 A1 AU2000273568 A1 AU 2000273568A1 AU 2000273568 A AU2000273568 A AU 2000273568A AU 7356800 A AU7356800 A AU 7356800A AU 2000273568 A1 AU2000273568 A1 AU 2000273568A1
Authority
AU
Australia
Prior art keywords
coating compositions
reflective coating
improved anti
aminoplasts
polymerized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2000273568A
Other languages
English (en)
Inventor
Runhui Huang
Rama Puligadda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Brewer Science Inc
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Publication of AU2000273568A1 publication Critical patent/AU2000273568A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/20—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08L61/26—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
    • C08L61/28—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31859—Next to an aldehyde or ketone condensation product
    • Y10T428/31862—Melamine-aldehyde
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31942—Of aldehyde or ketone condensation product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AU2000273568A 2000-04-19 2000-09-06 Improved anti-reflective coating compositions comprising polymerized aminoplasts Abandoned AU2000273568A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/552,236 US6323310B1 (en) 2000-04-19 2000-04-19 Anti-reflective coating compositions comprising polymerized aminoplasts
US09552236 2000-04-19
PCT/US2000/024595 WO2001081010A1 (en) 2000-04-19 2000-09-06 Improved anti-reflective coating compositions comprising polymerized aminoplasts

Publications (1)

Publication Number Publication Date
AU2000273568A1 true AU2000273568A1 (en) 2001-11-07

Family

ID=24204467

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2000273568A Abandoned AU2000273568A1 (en) 2000-04-19 2000-09-06 Improved anti-reflective coating compositions comprising polymerized aminoplasts

Country Status (8)

Country Link
US (7) US6323310B1 (https=)
EP (1) EP1284829A4 (https=)
JP (1) JP4886146B2 (https=)
CN (1) CN1248787C (https=)
AU (1) AU2000273568A1 (https=)
MY (1) MY133726A (https=)
TW (1) TWI247968B (https=)
WO (1) WO2001081010A1 (https=)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW556047B (en) 2000-07-31 2003-10-01 Shipley Co Llc Coated substrate, method for forming photoresist relief image, and antireflective composition
JP4117871B2 (ja) * 2000-11-09 2008-07-16 東京応化工業株式会社 反射防止膜形成用組成物
TW576859B (en) 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
US6893684B2 (en) * 2001-06-05 2005-05-17 Brewer Science Inc. Anti-reflective coating compositions for use with low k dielectric materials
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
US7070914B2 (en) * 2002-01-09 2006-07-04 Az Electronic Materials Usa Corp. Process for producing an image using a first minimum bottom antireflective coating composition
US20030215736A1 (en) * 2002-01-09 2003-11-20 Oberlander Joseph E. Negative-working photoimageable bottom antireflective coating
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
EP1560070B1 (en) * 2002-10-09 2009-12-30 Nissan Chemical Industries, Ltd. Composition for forming antireflection film for lithography
US7038328B2 (en) * 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
US7018779B2 (en) * 2003-01-07 2006-03-28 International Business Machines Corporation Apparatus and method to improve resist line roughness in semiconductor wafer processing
US7291293B2 (en) * 2003-02-28 2007-11-06 Northwestern University Vapor deposited electro-optic films self-assembled through hydrogen bonding
US8461234B2 (en) * 2003-03-14 2013-06-11 Eastman Chemical Company Refinish coating compositions comprising low molecular weight cellulose mixed esters
US8039531B2 (en) * 2003-03-14 2011-10-18 Eastman Chemical Company Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions
US7893138B2 (en) * 2003-03-14 2011-02-22 Eastman Chemical Company Low molecular weight carboxyalkylcellulose esters and their use as low viscosity binders and modifiers in coating compositions
US8124676B2 (en) * 2003-03-14 2012-02-28 Eastman Chemical Company Basecoat coating compositions comprising low molecular weight cellulose mixed esters
US20050074688A1 (en) * 2003-10-03 2005-04-07 Toukhy Medhat A. Bottom antireflective coatings
US7795369B2 (en) * 2004-10-12 2010-09-14 Nissan Chemical Industries, Ltd. Sulfur atom-containing anti-reflective coating forming composition for lithography
KR101248826B1 (ko) * 2004-11-01 2013-03-29 닛산 가가쿠 고교 가부시키 가이샤 시클로덱스트린 화합물을 함유하는 리소그라피용 하층막 형성 조성물
US8137895B2 (en) * 2005-08-09 2012-03-20 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for improving photoresist pattern adhesion
US20080085953A1 (en) * 2006-06-05 2008-04-10 Deepanjan Bhattacharya Coating compositions comprising low molecular weight cellulose mixed esters and their use to improve anti-sag, leveling, and 20 degree gloss
US20070282038A1 (en) * 2006-06-05 2007-12-06 Deepanjan Bhattacharya Methods for improving the anti-sag, leveling, and gloss of coating compositions comprising low molecular weight cellulose mixed esters
WO2008026468A1 (fr) * 2006-08-28 2008-03-06 Nissan Chemical Industries, Ltd. Composition servant à créer une sous-couche de réserve et contenant un additif liquide
US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
US8361695B2 (en) 2007-12-13 2013-01-29 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and method for forming resist pattern
US8221965B2 (en) * 2008-07-08 2012-07-17 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8329387B2 (en) 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
CN102203951A (zh) 2008-10-31 2011-09-28 日产化学工业株式会社 形成光电转换装置用波长转换膜的组合物、光电转换装置用波长转换膜以及光电转换装置
WO2010150748A1 (ja) 2009-06-23 2010-12-29 日産化学工業株式会社 光配向性を有する熱硬化膜形成組成物
CN102471629B (zh) * 2009-07-21 2015-09-09 日产化学工业株式会社 形成具有光取向性的热固化膜的组合物
US8507192B2 (en) * 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same
EP2557119B1 (en) 2010-04-08 2015-12-09 Nissan Chemical Industries, Ltd. Composition forming heat-cured film having photo-alignment properties
CN103261273B (zh) * 2010-11-01 2015-09-16 日产化学工业株式会社 含三嗪环的聚合物和含有该聚合物的成膜用组合物
EP2753662B1 (en) 2011-09-07 2020-06-24 MicroChem Corp. Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates
US9244199B2 (en) 2011-10-11 2016-01-26 Nissan Chemical Industries, Ltd. Cured film formation composition, orientation material, and retardation material
US9962430B2 (en) 2012-02-15 2018-05-08 Chirhoclin, Inc. Methods for treating pain associated with chronic pancreatitis
US11635688B2 (en) 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
US11406718B2 (en) 2012-05-29 2022-08-09 Chirhoclin, Inc. Methods of detecting pancreobiliary ductal leaks
KR102641678B1 (ko) * 2016-02-09 2024-02-28 닛산 가가쿠 가부시키가이샤 트라이아진환 함유 중합체 및 그것을 포함하는 조성물
US11744878B2 (en) 2020-08-19 2023-09-05 Chirhoclin, Inc. Methods for treatment of COVID-19 syndrome

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197392A (en) * 1978-08-21 1980-04-08 General Electric Company Melamine coatings
CA1264880A (en) 1984-07-06 1990-01-23 John Brooke Gardiner Viscosity index improver - dispersant additive useful in oil compositions
JPH0713127B2 (ja) * 1986-01-22 1995-02-15 大日精化工業株式会社 紫外線反射材料
US5094765A (en) 1990-04-30 1992-03-10 Texaco Inc. Lubricating oil composition
US5536835A (en) * 1993-11-26 1996-07-16 Ppg Industries, Inc. Etherified alkyl or arylcarbamylmethylated aminotriazines and curable compositions containing the same
US5731385A (en) * 1993-12-16 1998-03-24 International Business Machines Corporation Polymeric dyes for antireflective coatings
JP2953562B2 (ja) * 1994-07-18 1999-09-27 東京応化工業株式会社 リソグラフィー用下地材及びそれを用いた多層レジスト材料
US5693691A (en) 1995-08-21 1997-12-02 Brewer Science, Inc. Thermosetting anti-reflective coatings compositions
JP3436843B2 (ja) 1996-04-25 2003-08-18 東京応化工業株式会社 リソグラフィー用下地材及びそれを用いたリソグラフィー用レジスト材料
TW406215B (en) * 1996-08-07 2000-09-21 Fuji Photo Film Co Ltd Composition for anti-reflective coating material in lithographic process, and process for forming resist pattern
JPH1090908A (ja) * 1996-09-17 1998-04-10 Fuji Photo Film Co Ltd 反射防止膜材料用組成物
JPH10120940A (ja) * 1996-10-18 1998-05-12 Fuji Photo Film Co Ltd 反射防止膜用組成物
JP3506357B2 (ja) * 1996-12-13 2004-03-15 東京応化工業株式会社 リソグラフィー用下地材
US5948847A (en) * 1996-12-13 1999-09-07 Tokyo Ohka Kogyo Co., Ltd. Undercoating composition for photolithographic patterning
JP3851414B2 (ja) * 1997-06-04 2006-11-29 富士写真フイルム株式会社 反射防止膜材料組成物及びこれを用いたレジストパターン形成方法
JPH1165125A (ja) 1997-08-21 1999-03-05 Tokyo Ohka Kogyo Co Ltd パターン形成方法
US6156479A (en) * 1997-09-30 2000-12-05 Brewer Science, Inc. Thermosetting anti-refective coatings
US5919599A (en) 1997-09-30 1999-07-06 Brewer Science, Inc. Thermosetting anti-reflective coatings at deep ultraviolet
US5935760A (en) * 1997-10-20 1999-08-10 Brewer Science Inc. Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
KR20010042973A (ko) 1998-04-29 2001-05-25 테리 브레우어 셀룰로식 결합제로부터 유도된 급속 에칭, 열경화성 반사방지 코팅
TW476865B (en) 1999-01-28 2002-02-21 Tokyo Ohka Kogyo Co Ltd Undercoating composition for photolithographic resist
JP3456937B2 (ja) * 1999-01-28 2003-10-14 東京応化工業株式会社 リソグラフィー用下地材組成物
JP4117871B2 (ja) * 2000-11-09 2008-07-16 東京応化工業株式会社 反射防止膜形成用組成物

Also Published As

Publication number Publication date
US20020007038A1 (en) 2002-01-17
US6403152B1 (en) 2002-06-11
TWI247968B (en) 2006-01-21
CN1452521A (zh) 2003-10-29
US20020061408A1 (en) 2002-05-23
MY133726A (en) 2007-11-30
US6399686B1 (en) 2002-06-04
JP2003531252A (ja) 2003-10-21
JP4886146B2 (ja) 2012-02-29
US20020161175A1 (en) 2002-10-31
CN1248787C (zh) 2006-04-05
US6524708B2 (en) 2003-02-25
WO2001081010A1 (en) 2001-11-01
EP1284829A1 (en) 2003-02-26
US6323310B1 (en) 2001-11-27
EP1284829A4 (en) 2003-07-02
US6512084B2 (en) 2003-01-28
US6432611B1 (en) 2002-08-13

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