MY133726A - Anti-reflective coating compositions comprising polymerized aminoplasts - Google Patents

Anti-reflective coating compositions comprising polymerized aminoplasts

Info

Publication number
MY133726A
MY133726A MYPI20003965A MY133726A MY 133726 A MY133726 A MY 133726A MY PI20003965 A MYPI20003965 A MY PI20003965A MY 133726 A MY133726 A MY 133726A
Authority
MY
Malaysia
Prior art keywords
compositions
reflective coating
coating compositions
alkoxy alkyl
monomers
Prior art date
Application number
Other languages
English (en)
Inventor
Puligadda Rama
Original Assignee
Brewer Science Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Brewer Science Inc filed Critical Brewer Science Inc
Publication of MY133726A publication Critical patent/MY133726A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/20—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08L61/26—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
    • C08L61/28—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31859—Next to an aldehyde or ketone condensation product
    • Y10T428/31862—Melamine-aldehyde
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31942—Of aldehyde or ketone condensation product

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Paints Or Removers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
MYPI20003965 2000-04-19 2000-08-29 Anti-reflective coating compositions comprising polymerized aminoplasts MY133726A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/552,236 US6323310B1 (en) 2000-04-19 2000-04-19 Anti-reflective coating compositions comprising polymerized aminoplasts

Publications (1)

Publication Number Publication Date
MY133726A true MY133726A (en) 2007-11-30

Family

ID=24204467

Family Applications (1)

Application Number Title Priority Date Filing Date
MYPI20003965 MY133726A (en) 2000-04-19 2000-08-29 Anti-reflective coating compositions comprising polymerized aminoplasts

Country Status (8)

Country Link
US (7) US6323310B1 (https=)
EP (1) EP1284829A4 (https=)
JP (1) JP4886146B2 (https=)
CN (1) CN1248787C (https=)
AU (1) AU2000273568A1 (https=)
MY (1) MY133726A (https=)
TW (1) TWI247968B (https=)
WO (1) WO2001081010A1 (https=)

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TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
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US7070914B2 (en) * 2002-01-09 2006-07-04 Az Electronic Materials Usa Corp. Process for producing an image using a first minimum bottom antireflective coating composition
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
AU2003271123A1 (en) * 2002-10-09 2004-05-04 Nissan Chemical Industries, Ltd. Composition for forming antireflection film for lithography
US7038328B2 (en) * 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
US7018779B2 (en) * 2003-01-07 2006-03-28 International Business Machines Corporation Apparatus and method to improve resist line roughness in semiconductor wafer processing
WO2004079434A2 (en) * 2003-02-28 2004-09-16 Northwestern University Vapor deposited electro-optic films self-assembled through hydrogen bonding
US8124676B2 (en) * 2003-03-14 2012-02-28 Eastman Chemical Company Basecoat coating compositions comprising low molecular weight cellulose mixed esters
US7585905B2 (en) 2003-03-14 2009-09-08 Eastman Chemical Company Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions
US8039531B2 (en) * 2003-03-14 2011-10-18 Eastman Chemical Company Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions
US8461234B2 (en) * 2003-03-14 2013-06-11 Eastman Chemical Company Refinish coating compositions comprising low molecular weight cellulose mixed esters
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US8137895B2 (en) * 2005-08-09 2012-03-20 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for improving photoresist pattern adhesion
US20070282038A1 (en) * 2006-06-05 2007-12-06 Deepanjan Bhattacharya Methods for improving the anti-sag, leveling, and gloss of coating compositions comprising low molecular weight cellulose mixed esters
US20080085953A1 (en) * 2006-06-05 2008-04-10 Deepanjan Bhattacharya Coating compositions comprising low molecular weight cellulose mixed esters and their use to improve anti-sag, leveling, and 20 degree gloss
CN101506736B (zh) * 2006-08-28 2013-07-10 日产化学工业株式会社 含有液体添加剂的形成抗蚀剂下层膜的组合物及下层膜形成方法、半导体装置制造方法
US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
JP4984098B2 (ja) 2007-12-13 2012-07-25 日産化学工業株式会社 レジスト下層膜形成組成物及びレジストパターンの形成方法
US8329387B2 (en) 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8221965B2 (en) * 2008-07-08 2012-07-17 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
US20110204292A1 (en) 2008-10-31 2011-08-25 Nissan Chemical Industries, Ltd. Compositions for forming wavelength conversion films for photovoltaic devices, wavelength conversion films for photovoltaic devices, and photovoltaic devices
EP2447769B1 (en) 2009-06-23 2015-03-25 Nissan Chemical Industries, Ltd. Composition for forming thermoset film having photo alignment properties
JP5748061B2 (ja) * 2009-07-21 2015-07-15 日産化学工業株式会社 光配向性を有する熱硬化膜形成組成物
US8507192B2 (en) * 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same
WO2011126022A1 (ja) 2010-04-08 2011-10-13 日産化学工業株式会社 光配向性を有する熱硬化膜形成組成物
EP2636697B1 (en) * 2010-11-01 2018-08-15 Nissan Chemical Industries, Ltd. Triazine ring-containing polymer and film-forming composition containing same
CN103874731B (zh) 2011-09-07 2017-02-15 微量化学公司 用于在低表面能基底上制造浮雕图案的环氧制剂和方法
CN107463066B (zh) 2011-10-11 2020-10-30 日产化学工业株式会社 形成固化膜的组合物、取向材及相位差材
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US11635688B2 (en) 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
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WO2017138547A1 (ja) * 2016-02-09 2017-08-17 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
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Also Published As

Publication number Publication date
US6432611B1 (en) 2002-08-13
EP1284829A4 (en) 2003-07-02
US6403152B1 (en) 2002-06-11
US6524708B2 (en) 2003-02-25
US20020007038A1 (en) 2002-01-17
US6323310B1 (en) 2001-11-27
JP4886146B2 (ja) 2012-02-29
US20020161175A1 (en) 2002-10-31
JP2003531252A (ja) 2003-10-21
AU2000273568A1 (en) 2001-11-07
US6399686B1 (en) 2002-06-04
CN1452521A (zh) 2003-10-29
TWI247968B (en) 2006-01-21
WO2001081010A1 (en) 2001-11-01
EP1284829A1 (en) 2003-02-26
CN1248787C (zh) 2006-04-05
US6512084B2 (en) 2003-01-28
US20020061408A1 (en) 2002-05-23

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