CN1248787C - 包含聚合氨基塑料的改进减反射涂料组合物 - Google Patents

包含聚合氨基塑料的改进减反射涂料组合物 Download PDF

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Publication number
CN1248787C
CN1248787C CNB008194416A CN00819441A CN1248787C CN 1248787 C CN1248787 C CN 1248787C CN B008194416 A CNB008194416 A CN B008194416A CN 00819441 A CN00819441 A CN 00819441A CN 1248787 C CN1248787 C CN 1248787C
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composition
polymer
preparation
compound
acid
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Expired - Lifetime
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CNB008194416A
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Chinese (zh)
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CN1452521A (zh
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R·普利吉达
R·黄
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Brewer Science Inc
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Brewer Science Inc
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/111Anti-reflection coatings using layers comprising organic materials
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/20Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08L61/26Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
    • C08L61/28Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31652Of asbestos
    • Y10T428/31667Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31855Of addition polymer from unsaturated monomers
    • Y10T428/31859Next to an aldehyde or ketone condensation product
    • Y10T428/31862Melamine-aldehyde
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/31504Composite [nonstructural laminate]
    • Y10T428/31942Of aldehyde or ketone condensation product

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CNB008194416A 2000-04-19 2000-09-06 包含聚合氨基塑料的改进减反射涂料组合物 Expired - Lifetime CN1248787C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/552,236 2000-04-19
US09/552,236 US6323310B1 (en) 2000-04-19 2000-04-19 Anti-reflective coating compositions comprising polymerized aminoplasts

Publications (2)

Publication Number Publication Date
CN1452521A CN1452521A (zh) 2003-10-29
CN1248787C true CN1248787C (zh) 2006-04-05

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNB008194416A Expired - Lifetime CN1248787C (zh) 2000-04-19 2000-09-06 包含聚合氨基塑料的改进减反射涂料组合物

Country Status (8)

Country Link
US (7) US6323310B1 (https=)
EP (1) EP1284829A4 (https=)
JP (1) JP4886146B2 (https=)
CN (1) CN1248787C (https=)
AU (1) AU2000273568A1 (https=)
MY (1) MY133726A (https=)
TW (1) TWI247968B (https=)
WO (1) WO2001081010A1 (https=)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW556047B (en) 2000-07-31 2003-10-01 Shipley Co Llc Coated substrate, method for forming photoresist relief image, and antireflective composition
JP4117871B2 (ja) * 2000-11-09 2008-07-16 東京応化工業株式会社 反射防止膜形成用組成物
TW576859B (en) 2001-05-11 2004-02-21 Shipley Co Llc Antireflective coating compositions
US6893684B2 (en) * 2001-06-05 2005-05-17 Brewer Science Inc. Anti-reflective coating compositions for use with low k dielectric materials
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
US7070914B2 (en) * 2002-01-09 2006-07-04 Az Electronic Materials Usa Corp. Process for producing an image using a first minimum bottom antireflective coating composition
US20030215736A1 (en) * 2002-01-09 2003-11-20 Oberlander Joseph E. Negative-working photoimageable bottom antireflective coating
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
EP1560070B1 (en) * 2002-10-09 2009-12-30 Nissan Chemical Industries, Ltd. Composition for forming antireflection film for lithography
US7038328B2 (en) * 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
US7018779B2 (en) * 2003-01-07 2006-03-28 International Business Machines Corporation Apparatus and method to improve resist line roughness in semiconductor wafer processing
US7291293B2 (en) * 2003-02-28 2007-11-06 Northwestern University Vapor deposited electro-optic films self-assembled through hydrogen bonding
US8461234B2 (en) * 2003-03-14 2013-06-11 Eastman Chemical Company Refinish coating compositions comprising low molecular weight cellulose mixed esters
US8039531B2 (en) * 2003-03-14 2011-10-18 Eastman Chemical Company Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions
US7893138B2 (en) * 2003-03-14 2011-02-22 Eastman Chemical Company Low molecular weight carboxyalkylcellulose esters and their use as low viscosity binders and modifiers in coating compositions
US8124676B2 (en) * 2003-03-14 2012-02-28 Eastman Chemical Company Basecoat coating compositions comprising low molecular weight cellulose mixed esters
US20050074688A1 (en) * 2003-10-03 2005-04-07 Toukhy Medhat A. Bottom antireflective coatings
US7795369B2 (en) * 2004-10-12 2010-09-14 Nissan Chemical Industries, Ltd. Sulfur atom-containing anti-reflective coating forming composition for lithography
KR101248826B1 (ko) * 2004-11-01 2013-03-29 닛산 가가쿠 고교 가부시키 가이샤 시클로덱스트린 화합물을 함유하는 리소그라피용 하층막 형성 조성물
US8137895B2 (en) * 2005-08-09 2012-03-20 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for improving photoresist pattern adhesion
US20080085953A1 (en) * 2006-06-05 2008-04-10 Deepanjan Bhattacharya Coating compositions comprising low molecular weight cellulose mixed esters and their use to improve anti-sag, leveling, and 20 degree gloss
US20070282038A1 (en) * 2006-06-05 2007-12-06 Deepanjan Bhattacharya Methods for improving the anti-sag, leveling, and gloss of coating compositions comprising low molecular weight cellulose mixed esters
WO2008026468A1 (fr) * 2006-08-28 2008-03-06 Nissan Chemical Industries, Ltd. Composition servant à créer une sous-couche de réserve et contenant un additif liquide
US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
US8361695B2 (en) 2007-12-13 2013-01-29 Nissan Chemical Industries, Ltd. Resist underlayer film forming composition and method for forming resist pattern
US8221965B2 (en) * 2008-07-08 2012-07-17 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8329387B2 (en) 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
CN102203951A (zh) 2008-10-31 2011-09-28 日产化学工业株式会社 形成光电转换装置用波长转换膜的组合物、光电转换装置用波长转换膜以及光电转换装置
WO2010150748A1 (ja) 2009-06-23 2010-12-29 日産化学工業株式会社 光配向性を有する熱硬化膜形成組成物
CN102471629B (zh) * 2009-07-21 2015-09-09 日产化学工业株式会社 形成具有光取向性的热固化膜的组合物
US8507192B2 (en) * 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same
EP2557119B1 (en) 2010-04-08 2015-12-09 Nissan Chemical Industries, Ltd. Composition forming heat-cured film having photo-alignment properties
CN103261273B (zh) * 2010-11-01 2015-09-16 日产化学工业株式会社 含三嗪环的聚合物和含有该聚合物的成膜用组合物
EP2753662B1 (en) 2011-09-07 2020-06-24 MicroChem Corp. Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates
US9244199B2 (en) 2011-10-11 2016-01-26 Nissan Chemical Industries, Ltd. Cured film formation composition, orientation material, and retardation material
US9962430B2 (en) 2012-02-15 2018-05-08 Chirhoclin, Inc. Methods for treating pain associated with chronic pancreatitis
US11635688B2 (en) 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
US11406718B2 (en) 2012-05-29 2022-08-09 Chirhoclin, Inc. Methods of detecting pancreobiliary ductal leaks
KR102641678B1 (ko) * 2016-02-09 2024-02-28 닛산 가가쿠 가부시키가이샤 트라이아진환 함유 중합체 및 그것을 포함하는 조성물
US11744878B2 (en) 2020-08-19 2023-09-05 Chirhoclin, Inc. Methods for treatment of COVID-19 syndrome

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4197392A (en) * 1978-08-21 1980-04-08 General Electric Company Melamine coatings
CA1264880A (en) 1984-07-06 1990-01-23 John Brooke Gardiner Viscosity index improver - dispersant additive useful in oil compositions
JPH0713127B2 (ja) * 1986-01-22 1995-02-15 大日精化工業株式会社 紫外線反射材料
US5094765A (en) 1990-04-30 1992-03-10 Texaco Inc. Lubricating oil composition
US5536835A (en) * 1993-11-26 1996-07-16 Ppg Industries, Inc. Etherified alkyl or arylcarbamylmethylated aminotriazines and curable compositions containing the same
US5731385A (en) * 1993-12-16 1998-03-24 International Business Machines Corporation Polymeric dyes for antireflective coatings
JP2953562B2 (ja) * 1994-07-18 1999-09-27 東京応化工業株式会社 リソグラフィー用下地材及びそれを用いた多層レジスト材料
US5693691A (en) 1995-08-21 1997-12-02 Brewer Science, Inc. Thermosetting anti-reflective coatings compositions
JP3436843B2 (ja) 1996-04-25 2003-08-18 東京応化工業株式会社 リソグラフィー用下地材及びそれを用いたリソグラフィー用レジスト材料
TW406215B (en) * 1996-08-07 2000-09-21 Fuji Photo Film Co Ltd Composition for anti-reflective coating material in lithographic process, and process for forming resist pattern
JPH1090908A (ja) * 1996-09-17 1998-04-10 Fuji Photo Film Co Ltd 反射防止膜材料用組成物
JPH10120940A (ja) * 1996-10-18 1998-05-12 Fuji Photo Film Co Ltd 反射防止膜用組成物
JP3506357B2 (ja) * 1996-12-13 2004-03-15 東京応化工業株式会社 リソグラフィー用下地材
US5948847A (en) * 1996-12-13 1999-09-07 Tokyo Ohka Kogyo Co., Ltd. Undercoating composition for photolithographic patterning
JP3851414B2 (ja) * 1997-06-04 2006-11-29 富士写真フイルム株式会社 反射防止膜材料組成物及びこれを用いたレジストパターン形成方法
JPH1165125A (ja) 1997-08-21 1999-03-05 Tokyo Ohka Kogyo Co Ltd パターン形成方法
US6156479A (en) * 1997-09-30 2000-12-05 Brewer Science, Inc. Thermosetting anti-refective coatings
US5919599A (en) 1997-09-30 1999-07-06 Brewer Science, Inc. Thermosetting anti-reflective coatings at deep ultraviolet
US5935760A (en) * 1997-10-20 1999-08-10 Brewer Science Inc. Thermosetting polyester anti-reflective coatings for multilayer photoresist processes
KR20010042973A (ko) 1998-04-29 2001-05-25 테리 브레우어 셀룰로식 결합제로부터 유도된 급속 에칭, 열경화성 반사방지 코팅
TW476865B (en) 1999-01-28 2002-02-21 Tokyo Ohka Kogyo Co Ltd Undercoating composition for photolithographic resist
JP3456937B2 (ja) * 1999-01-28 2003-10-14 東京応化工業株式会社 リソグラフィー用下地材組成物
JP4117871B2 (ja) * 2000-11-09 2008-07-16 東京応化工業株式会社 反射防止膜形成用組成物

Also Published As

Publication number Publication date
US20020007038A1 (en) 2002-01-17
AU2000273568A1 (en) 2001-11-07
US6403152B1 (en) 2002-06-11
TWI247968B (en) 2006-01-21
CN1452521A (zh) 2003-10-29
US20020061408A1 (en) 2002-05-23
MY133726A (en) 2007-11-30
US6399686B1 (en) 2002-06-04
JP2003531252A (ja) 2003-10-21
JP4886146B2 (ja) 2012-02-29
US20020161175A1 (en) 2002-10-31
US6524708B2 (en) 2003-02-25
WO2001081010A1 (en) 2001-11-01
EP1284829A1 (en) 2003-02-26
US6323310B1 (en) 2001-11-27
EP1284829A4 (en) 2003-07-02
US6512084B2 (en) 2003-01-28
US6432611B1 (en) 2002-08-13

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Granted publication date: 20060405