CN1248787C - 包含聚合氨基塑料的改进减反射涂料组合物 - Google Patents

包含聚合氨基塑料的改进减反射涂料组合物 Download PDF

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Publication number
CN1248787C
CN1248787C CNB008194416A CN00819441A CN1248787C CN 1248787 C CN1248787 C CN 1248787C CN B008194416 A CNB008194416 A CN B008194416A CN 00819441 A CN00819441 A CN 00819441A CN 1248787 C CN1248787 C CN 1248787C
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composition
polymer
preparation
compound
acid
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Expired - Lifetime
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CNB008194416A
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English (en)
Chinese (zh)
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CN1452521A (zh
Inventor
R·普利吉达
R·黄
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Brewer Science Inc
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Brewer Science Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/20—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen
    • C08L61/26—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds
    • C08L61/28—Condensation polymers of aldehydes or ketones with only compounds containing hydrogen attached to nitrogen of aldehydes with heterocyclic compounds with melamine
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31667—Next to addition polymer from unsaturated monomers, or aldehyde or ketone condensation product
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31859—Next to an aldehyde or ketone condensation product
    • Y10T428/31862—Melamine-aldehyde
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31942—Of aldehyde or ketone condensation product

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Paints Or Removers (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CNB008194416A 2000-04-19 2000-09-06 包含聚合氨基塑料的改进减反射涂料组合物 Expired - Lifetime CN1248787C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/552,236 US6323310B1 (en) 2000-04-19 2000-04-19 Anti-reflective coating compositions comprising polymerized aminoplasts
US09/552,236 2000-04-19

Publications (2)

Publication Number Publication Date
CN1452521A CN1452521A (zh) 2003-10-29
CN1248787C true CN1248787C (zh) 2006-04-05

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNB008194416A Expired - Lifetime CN1248787C (zh) 2000-04-19 2000-09-06 包含聚合氨基塑料的改进减反射涂料组合物

Country Status (8)

Country Link
US (7) US6323310B1 (https=)
EP (1) EP1284829A4 (https=)
JP (1) JP4886146B2 (https=)
CN (1) CN1248787C (https=)
AU (1) AU2000273568A1 (https=)
MY (1) MY133726A (https=)
TW (1) TWI247968B (https=)
WO (1) WO2001081010A1 (https=)

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US7070914B2 (en) * 2002-01-09 2006-07-04 Az Electronic Materials Usa Corp. Process for producing an image using a first minimum bottom antireflective coating composition
US8012670B2 (en) 2002-04-11 2011-09-06 Rohm And Haas Electronic Materials Llc Photoresist systems
US20040067437A1 (en) * 2002-10-06 2004-04-08 Shipley Company, L.L.C. Coating compositions for use with an overcoated photoresist
AU2003271123A1 (en) * 2002-10-09 2004-05-04 Nissan Chemical Industries, Ltd. Composition for forming antireflection film for lithography
US7038328B2 (en) * 2002-10-15 2006-05-02 Brewer Science Inc. Anti-reflective compositions comprising triazine compounds
KR20040044368A (ko) * 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
US7018779B2 (en) * 2003-01-07 2006-03-28 International Business Machines Corporation Apparatus and method to improve resist line roughness in semiconductor wafer processing
WO2004079434A2 (en) * 2003-02-28 2004-09-16 Northwestern University Vapor deposited electro-optic films self-assembled through hydrogen bonding
US8124676B2 (en) * 2003-03-14 2012-02-28 Eastman Chemical Company Basecoat coating compositions comprising low molecular weight cellulose mixed esters
US7585905B2 (en) 2003-03-14 2009-09-08 Eastman Chemical Company Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions
US8039531B2 (en) * 2003-03-14 2011-10-18 Eastman Chemical Company Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions
US8461234B2 (en) * 2003-03-14 2013-06-11 Eastman Chemical Company Refinish coating compositions comprising low molecular weight cellulose mixed esters
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US8137895B2 (en) * 2005-08-09 2012-03-20 Taiwan Semiconductor Manufacturing Company, Ltd. Structure and method for improving photoresist pattern adhesion
US20070282038A1 (en) * 2006-06-05 2007-12-06 Deepanjan Bhattacharya Methods for improving the anti-sag, leveling, and gloss of coating compositions comprising low molecular weight cellulose mixed esters
US20080085953A1 (en) * 2006-06-05 2008-04-10 Deepanjan Bhattacharya Coating compositions comprising low molecular weight cellulose mixed esters and their use to improve anti-sag, leveling, and 20 degree gloss
CN101506736B (zh) * 2006-08-28 2013-07-10 日产化学工业株式会社 含有液体添加剂的形成抗蚀剂下层膜的组合物及下层膜形成方法、半导体装置制造方法
US20090042133A1 (en) * 2007-08-10 2009-02-12 Zhong Xiang Antireflective Coating Composition
JP4984098B2 (ja) 2007-12-13 2012-07-25 日産化学工業株式会社 レジスト下層膜形成組成物及びレジストパターンの形成方法
US8329387B2 (en) 2008-07-08 2012-12-11 Az Electronic Materials Usa Corp. Antireflective coating compositions
US8221965B2 (en) * 2008-07-08 2012-07-17 Az Electronic Materials Usa Corp. Antireflective coating compositions
US20100092894A1 (en) * 2008-10-14 2010-04-15 Weihong Liu Bottom Antireflective Coating Compositions
US20110204292A1 (en) 2008-10-31 2011-08-25 Nissan Chemical Industries, Ltd. Compositions for forming wavelength conversion films for photovoltaic devices, wavelength conversion films for photovoltaic devices, and photovoltaic devices
EP2447769B1 (en) 2009-06-23 2015-03-25 Nissan Chemical Industries, Ltd. Composition for forming thermoset film having photo alignment properties
JP5748061B2 (ja) * 2009-07-21 2015-07-15 日産化学工業株式会社 光配向性を有する熱硬化膜形成組成物
US8507192B2 (en) * 2010-02-18 2013-08-13 Az Electronic Materials Usa Corp. Antireflective compositions and methods of using same
WO2011126022A1 (ja) 2010-04-08 2011-10-13 日産化学工業株式会社 光配向性を有する熱硬化膜形成組成物
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CN103874731B (zh) 2011-09-07 2017-02-15 微量化学公司 用于在低表面能基底上制造浮雕图案的环氧制剂和方法
CN107463066B (zh) 2011-10-11 2020-10-30 日产化学工业株式会社 形成固化膜的组合物、取向材及相位差材
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US11635688B2 (en) 2012-03-08 2023-04-25 Kayaku Advanced Materials, Inc. Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates
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WO2017138547A1 (ja) * 2016-02-09 2017-08-17 日産化学工業株式会社 トリアジン環含有重合体およびそれを含む組成物
US11744878B2 (en) 2020-08-19 2023-09-05 Chirhoclin, Inc. Methods for treatment of COVID-19 syndrome

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Also Published As

Publication number Publication date
US6432611B1 (en) 2002-08-13
EP1284829A4 (en) 2003-07-02
US6403152B1 (en) 2002-06-11
MY133726A (en) 2007-11-30
US6524708B2 (en) 2003-02-25
US20020007038A1 (en) 2002-01-17
US6323310B1 (en) 2001-11-27
JP4886146B2 (ja) 2012-02-29
US20020161175A1 (en) 2002-10-31
JP2003531252A (ja) 2003-10-21
AU2000273568A1 (en) 2001-11-07
US6399686B1 (en) 2002-06-04
CN1452521A (zh) 2003-10-29
TWI247968B (en) 2006-01-21
WO2001081010A1 (en) 2001-11-01
EP1284829A1 (en) 2003-02-26
US6512084B2 (en) 2003-01-28
US20020061408A1 (en) 2002-05-23

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Granted publication date: 20060405