JP2003531252A5 - - Google Patents
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- Publication number
- JP2003531252A5 JP2003531252A5 JP2001578095A JP2001578095A JP2003531252A5 JP 2003531252 A5 JP2003531252 A5 JP 2003531252A5 JP 2001578095 A JP2001578095 A JP 2001578095A JP 2001578095 A JP2001578095 A JP 2001578095A JP 2003531252 A5 JP2003531252 A5 JP 2003531252A5
- Authority
- JP
- Japan
- Prior art keywords
- hours
- cymel
- molecular weight
- polymer
- ptsa
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920003270 Cymel® Polymers 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 6
- -1 methoxymethylol groups Chemical group 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 4
- 229940116333 ethyl lactate Drugs 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- ALKYHXVLJMQRLQ-UHFFFAOYSA-N 3-Hydroxy-2-naphthoate Chemical compound C1=CC=C2C=C(O)C(C(=O)O)=CC2=C1 ALKYHXVLJMQRLQ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- GAMPNQJDUFQVQO-UHFFFAOYSA-N acetic acid;phthalic acid Chemical compound CC(O)=O.OC(=O)C1=CC=CC=C1C(O)=O GAMPNQJDUFQVQO-UHFFFAOYSA-N 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000002491 polymer binding agent Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/552,236 | 2000-04-19 | ||
| US09/552,236 US6323310B1 (en) | 2000-04-19 | 2000-04-19 | Anti-reflective coating compositions comprising polymerized aminoplasts |
| PCT/US2000/024595 WO2001081010A1 (en) | 2000-04-19 | 2000-09-06 | Improved anti-reflective coating compositions comprising polymerized aminoplasts |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003531252A JP2003531252A (ja) | 2003-10-21 |
| JP2003531252A5 true JP2003531252A5 (https=) | 2011-10-13 |
| JP4886146B2 JP4886146B2 (ja) | 2012-02-29 |
Family
ID=24204467
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001578095A Expired - Lifetime JP4886146B2 (ja) | 2000-04-19 | 2000-09-06 | アミノプラスト重合物を含む改良された反射防止コーティング組成物 |
Country Status (8)
| Country | Link |
|---|---|
| US (7) | US6323310B1 (https=) |
| EP (1) | EP1284829A4 (https=) |
| JP (1) | JP4886146B2 (https=) |
| CN (1) | CN1248787C (https=) |
| AU (1) | AU2000273568A1 (https=) |
| MY (1) | MY133726A (https=) |
| TW (1) | TWI247968B (https=) |
| WO (1) | WO2001081010A1 (https=) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW556047B (en) | 2000-07-31 | 2003-10-01 | Shipley Co Llc | Coated substrate, method for forming photoresist relief image, and antireflective composition |
| JP4117871B2 (ja) * | 2000-11-09 | 2008-07-16 | 東京応化工業株式会社 | 反射防止膜形成用組成物 |
| TW576859B (en) | 2001-05-11 | 2004-02-21 | Shipley Co Llc | Antireflective coating compositions |
| US6893684B2 (en) * | 2001-06-05 | 2005-05-17 | Brewer Science Inc. | Anti-reflective coating compositions for use with low k dielectric materials |
| TW591341B (en) * | 2001-09-26 | 2004-06-11 | Shipley Co Llc | Coating compositions for use with an overcoated photoresist |
| US7070914B2 (en) * | 2002-01-09 | 2006-07-04 | Az Electronic Materials Usa Corp. | Process for producing an image using a first minimum bottom antireflective coating composition |
| US20030215736A1 (en) * | 2002-01-09 | 2003-11-20 | Oberlander Joseph E. | Negative-working photoimageable bottom antireflective coating |
| US8012670B2 (en) | 2002-04-11 | 2011-09-06 | Rohm And Haas Electronic Materials Llc | Photoresist systems |
| US20040067437A1 (en) * | 2002-10-06 | 2004-04-08 | Shipley Company, L.L.C. | Coating compositions for use with an overcoated photoresist |
| EP1560070B1 (en) * | 2002-10-09 | 2009-12-30 | Nissan Chemical Industries, Ltd. | Composition for forming antireflection film for lithography |
| US7038328B2 (en) * | 2002-10-15 | 2006-05-02 | Brewer Science Inc. | Anti-reflective compositions comprising triazine compounds |
| KR20040044368A (ko) * | 2002-11-20 | 2004-05-28 | 쉬플리 캄파니, 엘.엘.씨. | 다층 포토레지스트 시스템 |
| EP1422565A3 (en) * | 2002-11-20 | 2005-01-05 | Shipley Company LLC | Multilayer photoresist systems |
| US7018779B2 (en) * | 2003-01-07 | 2006-03-28 | International Business Machines Corporation | Apparatus and method to improve resist line roughness in semiconductor wafer processing |
| US7291293B2 (en) * | 2003-02-28 | 2007-11-06 | Northwestern University | Vapor deposited electro-optic films self-assembled through hydrogen bonding |
| US8461234B2 (en) * | 2003-03-14 | 2013-06-11 | Eastman Chemical Company | Refinish coating compositions comprising low molecular weight cellulose mixed esters |
| US8039531B2 (en) * | 2003-03-14 | 2011-10-18 | Eastman Chemical Company | Low molecular weight cellulose mixed esters and their use as low viscosity binders and modifiers in coating compositions |
| US7893138B2 (en) * | 2003-03-14 | 2011-02-22 | Eastman Chemical Company | Low molecular weight carboxyalkylcellulose esters and their use as low viscosity binders and modifiers in coating compositions |
| US8124676B2 (en) * | 2003-03-14 | 2012-02-28 | Eastman Chemical Company | Basecoat coating compositions comprising low molecular weight cellulose mixed esters |
| US20050074688A1 (en) * | 2003-10-03 | 2005-04-07 | Toukhy Medhat A. | Bottom antireflective coatings |
| US7795369B2 (en) * | 2004-10-12 | 2010-09-14 | Nissan Chemical Industries, Ltd. | Sulfur atom-containing anti-reflective coating forming composition for lithography |
| KR101248826B1 (ko) * | 2004-11-01 | 2013-03-29 | 닛산 가가쿠 고교 가부시키 가이샤 | 시클로덱스트린 화합물을 함유하는 리소그라피용 하층막 형성 조성물 |
| US8137895B2 (en) * | 2005-08-09 | 2012-03-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for improving photoresist pattern adhesion |
| US20080085953A1 (en) * | 2006-06-05 | 2008-04-10 | Deepanjan Bhattacharya | Coating compositions comprising low molecular weight cellulose mixed esters and their use to improve anti-sag, leveling, and 20 degree gloss |
| US20070282038A1 (en) * | 2006-06-05 | 2007-12-06 | Deepanjan Bhattacharya | Methods for improving the anti-sag, leveling, and gloss of coating compositions comprising low molecular weight cellulose mixed esters |
| WO2008026468A1 (fr) * | 2006-08-28 | 2008-03-06 | Nissan Chemical Industries, Ltd. | Composition servant à créer une sous-couche de réserve et contenant un additif liquide |
| US20090042133A1 (en) * | 2007-08-10 | 2009-02-12 | Zhong Xiang | Antireflective Coating Composition |
| US8361695B2 (en) | 2007-12-13 | 2013-01-29 | Nissan Chemical Industries, Ltd. | Resist underlayer film forming composition and method for forming resist pattern |
| US8221965B2 (en) * | 2008-07-08 | 2012-07-17 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US8329387B2 (en) | 2008-07-08 | 2012-12-11 | Az Electronic Materials Usa Corp. | Antireflective coating compositions |
| US20100092894A1 (en) * | 2008-10-14 | 2010-04-15 | Weihong Liu | Bottom Antireflective Coating Compositions |
| CN102203951A (zh) | 2008-10-31 | 2011-09-28 | 日产化学工业株式会社 | 形成光电转换装置用波长转换膜的组合物、光电转换装置用波长转换膜以及光电转换装置 |
| WO2010150748A1 (ja) | 2009-06-23 | 2010-12-29 | 日産化学工業株式会社 | 光配向性を有する熱硬化膜形成組成物 |
| CN102471629B (zh) * | 2009-07-21 | 2015-09-09 | 日产化学工业株式会社 | 形成具有光取向性的热固化膜的组合物 |
| US8507192B2 (en) * | 2010-02-18 | 2013-08-13 | Az Electronic Materials Usa Corp. | Antireflective compositions and methods of using same |
| EP2557119B1 (en) | 2010-04-08 | 2015-12-09 | Nissan Chemical Industries, Ltd. | Composition forming heat-cured film having photo-alignment properties |
| CN103261273B (zh) * | 2010-11-01 | 2015-09-16 | 日产化学工业株式会社 | 含三嗪环的聚合物和含有该聚合物的成膜用组合物 |
| EP2753662B1 (en) | 2011-09-07 | 2020-06-24 | MicroChem Corp. | Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates |
| US9244199B2 (en) | 2011-10-11 | 2016-01-26 | Nissan Chemical Industries, Ltd. | Cured film formation composition, orientation material, and retardation material |
| US9962430B2 (en) | 2012-02-15 | 2018-05-08 | Chirhoclin, Inc. | Methods for treating pain associated with chronic pancreatitis |
| US11635688B2 (en) | 2012-03-08 | 2023-04-25 | Kayaku Advanced Materials, Inc. | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates |
| US11406718B2 (en) | 2012-05-29 | 2022-08-09 | Chirhoclin, Inc. | Methods of detecting pancreobiliary ductal leaks |
| KR102641678B1 (ko) * | 2016-02-09 | 2024-02-28 | 닛산 가가쿠 가부시키가이샤 | 트라이아진환 함유 중합체 및 그것을 포함하는 조성물 |
| US11744878B2 (en) | 2020-08-19 | 2023-09-05 | Chirhoclin, Inc. | Methods for treatment of COVID-19 syndrome |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4197392A (en) * | 1978-08-21 | 1980-04-08 | General Electric Company | Melamine coatings |
| CA1264880A (en) | 1984-07-06 | 1990-01-23 | John Brooke Gardiner | Viscosity index improver - dispersant additive useful in oil compositions |
| JPH0713127B2 (ja) * | 1986-01-22 | 1995-02-15 | 大日精化工業株式会社 | 紫外線反射材料 |
| US5094765A (en) | 1990-04-30 | 1992-03-10 | Texaco Inc. | Lubricating oil composition |
| US5536835A (en) * | 1993-11-26 | 1996-07-16 | Ppg Industries, Inc. | Etherified alkyl or arylcarbamylmethylated aminotriazines and curable compositions containing the same |
| US5731385A (en) * | 1993-12-16 | 1998-03-24 | International Business Machines Corporation | Polymeric dyes for antireflective coatings |
| JP2953562B2 (ja) * | 1994-07-18 | 1999-09-27 | 東京応化工業株式会社 | リソグラフィー用下地材及びそれを用いた多層レジスト材料 |
| US5693691A (en) | 1995-08-21 | 1997-12-02 | Brewer Science, Inc. | Thermosetting anti-reflective coatings compositions |
| JP3436843B2 (ja) | 1996-04-25 | 2003-08-18 | 東京応化工業株式会社 | リソグラフィー用下地材及びそれを用いたリソグラフィー用レジスト材料 |
| TW406215B (en) * | 1996-08-07 | 2000-09-21 | Fuji Photo Film Co Ltd | Composition for anti-reflective coating material in lithographic process, and process for forming resist pattern |
| JPH1090908A (ja) * | 1996-09-17 | 1998-04-10 | Fuji Photo Film Co Ltd | 反射防止膜材料用組成物 |
| JPH10120940A (ja) * | 1996-10-18 | 1998-05-12 | Fuji Photo Film Co Ltd | 反射防止膜用組成物 |
| JP3506357B2 (ja) * | 1996-12-13 | 2004-03-15 | 東京応化工業株式会社 | リソグラフィー用下地材 |
| US5948847A (en) * | 1996-12-13 | 1999-09-07 | Tokyo Ohka Kogyo Co., Ltd. | Undercoating composition for photolithographic patterning |
| JP3851414B2 (ja) * | 1997-06-04 | 2006-11-29 | 富士写真フイルム株式会社 | 反射防止膜材料組成物及びこれを用いたレジストパターン形成方法 |
| JPH1165125A (ja) | 1997-08-21 | 1999-03-05 | Tokyo Ohka Kogyo Co Ltd | パターン形成方法 |
| US6156479A (en) * | 1997-09-30 | 2000-12-05 | Brewer Science, Inc. | Thermosetting anti-refective coatings |
| US5919599A (en) | 1997-09-30 | 1999-07-06 | Brewer Science, Inc. | Thermosetting anti-reflective coatings at deep ultraviolet |
| US5935760A (en) * | 1997-10-20 | 1999-08-10 | Brewer Science Inc. | Thermosetting polyester anti-reflective coatings for multilayer photoresist processes |
| KR20010042973A (ko) | 1998-04-29 | 2001-05-25 | 테리 브레우어 | 셀룰로식 결합제로부터 유도된 급속 에칭, 열경화성 반사방지 코팅 |
| TW476865B (en) | 1999-01-28 | 2002-02-21 | Tokyo Ohka Kogyo Co Ltd | Undercoating composition for photolithographic resist |
| JP3456937B2 (ja) * | 1999-01-28 | 2003-10-14 | 東京応化工業株式会社 | リソグラフィー用下地材組成物 |
| JP4117871B2 (ja) * | 2000-11-09 | 2008-07-16 | 東京応化工業株式会社 | 反射防止膜形成用組成物 |
-
2000
- 2000-04-19 US US09/552,236 patent/US6323310B1/en not_active Expired - Lifetime
- 2000-08-29 MY MYPI20003965 patent/MY133726A/en unknown
- 2000-09-06 CN CNB008194416A patent/CN1248787C/zh not_active Expired - Lifetime
- 2000-09-06 EP EP00961646A patent/EP1284829A4/en not_active Withdrawn
- 2000-09-06 AU AU2000273568A patent/AU2000273568A1/en not_active Abandoned
- 2000-09-06 JP JP2001578095A patent/JP4886146B2/ja not_active Expired - Lifetime
- 2000-09-06 WO PCT/US2000/024595 patent/WO2001081010A1/en not_active Ceased
- 2000-09-14 TW TW089118827A patent/TWI247968B/zh not_active IP Right Cessation
- 2000-10-18 US US09/691,780 patent/US6432611B1/en not_active Expired - Lifetime
- 2000-10-18 US US09/691,771 patent/US6403152B1/en not_active Expired - Lifetime
- 2000-10-18 US US09/691,774 patent/US6399686B1/en not_active Expired - Lifetime
-
2001
- 2001-05-30 US US09/870,171 patent/US20020007038A1/en not_active Abandoned
- 2001-10-10 US US09/975,837 patent/US6524708B2/en not_active Expired - Lifetime
-
2002
- 2002-04-12 US US10/122,069 patent/US6512084B2/en not_active Expired - Lifetime
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