JP4883178B2 - 新規ジウレタン化合物、その製造法およびそれを含有するアクリルゴム組成物 - Google Patents
新規ジウレタン化合物、その製造法およびそれを含有するアクリルゴム組成物 Download PDFInfo
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- JP4883178B2 JP4883178B2 JP2009520723A JP2009520723A JP4883178B2 JP 4883178 B2 JP4883178 B2 JP 4883178B2 JP 2009520723 A JP2009520723 A JP 2009520723A JP 2009520723 A JP2009520723 A JP 2009520723A JP 4883178 B2 JP4883178 B2 JP 4883178B2
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- acrylic rubber
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- rubber composition
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- 229920000800 acrylic rubber Polymers 0.000 title claims description 63
- 229920000058 polyacrylate Polymers 0.000 title claims description 63
- 150000001875 compounds Chemical class 0.000 title claims description 41
- 239000000203 mixture Substances 0.000 title claims description 29
- 238000000034 method Methods 0.000 title description 5
- 238000004073 vulcanization Methods 0.000 claims description 83
- -1 diamine compound Chemical class 0.000 claims description 41
- 239000003795 chemical substances by application Substances 0.000 claims description 28
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 24
- ZRALSGWEFCBTJO-UHFFFAOYSA-N anhydrous guanidine Natural products NC(N)=N ZRALSGWEFCBTJO-UHFFFAOYSA-N 0.000 claims description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 150000001412 amines Chemical class 0.000 claims description 8
- CHJJGSNFBQVOTG-UHFFFAOYSA-N N-methyl-guanidine Natural products CNC(N)=N CHJJGSNFBQVOTG-UHFFFAOYSA-N 0.000 claims description 7
- 125000002947 alkylene group Chemical group 0.000 claims description 7
- SWSQBOPZIKWTGO-UHFFFAOYSA-N dimethylaminoamidine Natural products CN(C)C(N)=N SWSQBOPZIKWTGO-UHFFFAOYSA-N 0.000 claims description 7
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 claims description 5
- 125000002723 alicyclic group Chemical group 0.000 claims description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 125000002993 cycloalkylene group Chemical group 0.000 claims description 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 238000004132 cross linking Methods 0.000 claims 1
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 16
- 230000000052 comparative effect Effects 0.000 description 14
- 238000000465 moulding Methods 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 12
- 238000007906 compression Methods 0.000 description 11
- 230000006835 compression Effects 0.000 description 11
- OPNUROKCUBTKLF-UHFFFAOYSA-N 1,2-bis(2-methylphenyl)guanidine Chemical compound CC1=CC=CC=C1N\C(N)=N\C1=CC=CC=C1C OPNUROKCUBTKLF-UHFFFAOYSA-N 0.000 description 9
- 238000001125 extrusion Methods 0.000 description 8
- 125000001309 chloro group Chemical group Cl* 0.000 description 7
- 238000007334 copolymerization reaction Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 5
- 150000004984 aromatic diamines Chemical class 0.000 description 5
- 238000001746 injection moulding Methods 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000011541 reaction mixture Substances 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- XSQHUYDRSDBCHN-UHFFFAOYSA-N 2,3-dimethyl-2-propan-2-ylbutanenitrile Chemical compound CC(C)C(C)(C#N)C(C)C XSQHUYDRSDBCHN-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 241001441571 Hiodontidae Species 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000005250 alkyl acrylate group Chemical group 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- FWWXYLGCHHIKNY-UHFFFAOYSA-N 2-ethoxyethyl prop-2-enoate Chemical compound CCOCCOC(=O)C=C FWWXYLGCHHIKNY-UHFFFAOYSA-N 0.000 description 2
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- 238000006114 decarboxylation reaction Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- XJELOQYISYPGDX-UHFFFAOYSA-N ethenyl 2-chloroacetate Chemical compound ClCC(=O)OC=C XJELOQYISYPGDX-UHFFFAOYSA-N 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 2
- 238000000197 pyrolysis Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- UTOVMEACOLCUCK-SNAWJCMRSA-N (e)-4-butoxy-4-oxobut-2-enoic acid Chemical compound CCCCOC(=O)\C=C\C(O)=O UTOVMEACOLCUCK-SNAWJCMRSA-N 0.000 description 1
- XLYMOEINVGRTEX-ONEGZZNKSA-N (e)-4-ethoxy-4-oxobut-2-enoic acid Chemical compound CCOC(=O)\C=C\C(O)=O XLYMOEINVGRTEX-ONEGZZNKSA-N 0.000 description 1
- KYVBNYUBXIEUFW-UHFFFAOYSA-N 1,1,3,3-tetramethylguanidine Chemical compound CN(C)C(=N)N(C)C KYVBNYUBXIEUFW-UHFFFAOYSA-N 0.000 description 1
- FUPAJKKAHDLPAZ-UHFFFAOYSA-N 1,2,3-triphenylguanidine Chemical compound C=1C=CC=CC=1NC(=NC=1C=CC=CC=1)NC1=CC=CC=C1 FUPAJKKAHDLPAZ-UHFFFAOYSA-N 0.000 description 1
- TUPIWWRTTIRPDS-UHFFFAOYSA-N 1,2-bis(hydroxymethyl)guanidine Chemical compound OCNC(=N)NCO TUPIWWRTTIRPDS-UHFFFAOYSA-N 0.000 description 1
- OWRCNXZUPFZXOS-UHFFFAOYSA-N 1,3-diphenylguanidine Chemical compound C=1C=CC=CC=1NC(=N)NC1=CC=CC=C1 OWRCNXZUPFZXOS-UHFFFAOYSA-N 0.000 description 1
- ILWJAOPQHOZXAN-UHFFFAOYSA-N 1,3-dithianyl Chemical group [CH]1SCCCS1 ILWJAOPQHOZXAN-UHFFFAOYSA-N 0.000 description 1
- ALVZNPYWJMLXKV-UHFFFAOYSA-N 1,9-Nonanediol Chemical compound OCCCCCCCCCO ALVZNPYWJMLXKV-UHFFFAOYSA-N 0.000 description 1
- SQZCAOHYQSOZCE-UHFFFAOYSA-N 1-(diaminomethylidene)-2-(2-methylphenyl)guanidine Chemical compound CC1=CC=CC=C1N=C(N)N=C(N)N SQZCAOHYQSOZCE-UHFFFAOYSA-N 0.000 description 1
- DNJRKFKAFWSXSE-UHFFFAOYSA-N 1-chloro-2-ethenoxyethane Chemical compound ClCCOC=C DNJRKFKAFWSXSE-UHFFFAOYSA-N 0.000 description 1
- SLBOQBILGNEPEB-UHFFFAOYSA-N 1-chloroprop-2-enylbenzene Chemical compound C=CC(Cl)C1=CC=CC=C1 SLBOQBILGNEPEB-UHFFFAOYSA-N 0.000 description 1
- HILAYQUKKYWPJW-UHFFFAOYSA-N 1-dodecylguanidine Chemical compound CCCCCCCCCCCCN=C(N)N HILAYQUKKYWPJW-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- QJFIXBNLKARINT-UHFFFAOYSA-N 2-(4-methylphenyl)sulfonylethanol Chemical compound CC1=CC=C(S(=O)(=O)CCO)C=C1 QJFIXBNLKARINT-UHFFFAOYSA-N 0.000 description 1
- JJRUAPNVLBABCN-UHFFFAOYSA-N 2-(ethenoxymethyl)oxirane Chemical compound C=COCC1CO1 JJRUAPNVLBABCN-UHFFFAOYSA-N 0.000 description 1
- MBEVSMZJMIQVBG-UHFFFAOYSA-N 2-(hydroxymethyl)guanidine Chemical compound NC(N)=NCO MBEVSMZJMIQVBG-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 1
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 description 1
- WHBAYNMEIXUTJV-UHFFFAOYSA-N 2-chloroethyl prop-2-enoate Chemical compound ClCCOC(=O)C=C WHBAYNMEIXUTJV-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- NWIIFBPIDORBCY-UHFFFAOYSA-N 2-methylprop-2-enoic acid;propane-1,2,3-triol;prop-2-enoic acid Chemical compound OC(=O)C=C.CC(=C)C(O)=O.OCC(O)CO NWIIFBPIDORBCY-UHFFFAOYSA-N 0.000 description 1
- QRJZGVVKGFIGLI-UHFFFAOYSA-N 2-phenylguanidine Chemical compound NC(=N)NC1=CC=CC=C1 QRJZGVVKGFIGLI-UHFFFAOYSA-N 0.000 description 1
- UACBZRBYLSMNGV-UHFFFAOYSA-N 3-ethoxypropyl prop-2-enoate Chemical compound CCOCCCOC(=O)C=C UACBZRBYLSMNGV-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- UJAWGGOCYUPCPS-UHFFFAOYSA-N 4-(2-phenylpropan-2-yl)-n-[4-(2-phenylpropan-2-yl)phenyl]aniline Chemical compound C=1C=C(NC=2C=CC(=CC=2)C(C)(C)C=2C=CC=CC=2)C=CC=1C(C)(C)C1=CC=CC=C1 UJAWGGOCYUPCPS-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- CBNJYSMAGBOTFG-UHFFFAOYSA-N 6-aminohexylcarbamic acid;carbamic acid;hexane-1,6-diamine Chemical compound NC(O)=O.NCCCCCCN.NCCCCCCNC(O)=O CBNJYSMAGBOTFG-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- XNCOSPRUTUOJCJ-UHFFFAOYSA-N Biguanide Chemical compound NC(N)=NC(N)=N XNCOSPRUTUOJCJ-UHFFFAOYSA-N 0.000 description 1
- 229940123208 Biguanide Drugs 0.000 description 1
- BSEJAXFWLOHIBL-UHFFFAOYSA-N C(C(=C)C)(=O)O.C(C=C)(=O)OC(O)C(O)CO Chemical compound C(C(=C)C)(=O)O.C(C=C)(=O)OC(O)C(O)CO BSEJAXFWLOHIBL-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- SQSPRWMERUQXNE-UHFFFAOYSA-N Guanylurea Chemical compound NC(=N)NC(N)=O SQSPRWMERUQXNE-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- BZLVMXJERCGZMT-UHFFFAOYSA-N Methyl tert-butyl ether Chemical compound COC(C)(C)C BZLVMXJERCGZMT-UHFFFAOYSA-N 0.000 description 1
- 102100030090 Probable ATP-dependent RNA helicase DHX58 Human genes 0.000 description 1
- 101710144666 Probable ATP-dependent RNA helicase DHX58 Proteins 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- LINDOXZENKYESA-UHFFFAOYSA-N TMG Natural products CNC(N)=NC LINDOXZENKYESA-UHFFFAOYSA-N 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N Tetraethylene glycol, Natural products OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- HAMNKKUPIHEESI-UHFFFAOYSA-N aminoguanidine Chemical compound NNC(N)=N HAMNKKUPIHEESI-UHFFFAOYSA-N 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- NIVZHWNOUVJHKV-UHFFFAOYSA-N bethanidine Chemical compound CN\C(=N/C)NCC1=CC=CC=C1 NIVZHWNOUVJHKV-UHFFFAOYSA-N 0.000 description 1
- 239000012267 brine Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- UTOVMEACOLCUCK-PLNGDYQASA-N butyl maleate Chemical compound CCCCOC(=O)\C=C/C(O)=O UTOVMEACOLCUCK-PLNGDYQASA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 1
- 229940018557 citraconic acid Drugs 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000012043 crude product Substances 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000010511 deprotection reaction Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- ANEDZEVDORCLPM-UHFFFAOYSA-N ethyl 1,3-dithiane-2-carboxylate Chemical compound CCOC(=O)C1SCCCS1 ANEDZEVDORCLPM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229920006229 ethylene acrylic elastomer Polymers 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- XLYMOEINVGRTEX-UHFFFAOYSA-N fumaric acid monoethyl ester Natural products CCOC(=O)C=CC(O)=O XLYMOEINVGRTEX-UHFFFAOYSA-N 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- ZHDTXTDHBRADLM-UHFFFAOYSA-N hydron;2,3,4,5-tetrahydropyridin-6-amine;chloride Chemical compound Cl.NC1=NCCCC1 ZHDTXTDHBRADLM-UHFFFAOYSA-N 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- SINFYWWJOCXYFD-UHFFFAOYSA-N methoxymethyl prop-2-enoate Chemical compound COCOC(=O)C=C SINFYWWJOCXYFD-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- ANISOHQJBAQUQP-UHFFFAOYSA-N octyl prop-2-enoate Chemical compound CCCCCCCCOC(=O)C=C ANISOHQJBAQUQP-UHFFFAOYSA-N 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- VMBJJCDVORDOCF-UHFFFAOYSA-N prop-2-enyl 2-chloroacetate Chemical compound ClCC(=O)OCC=C VMBJJCDVORDOCF-UHFFFAOYSA-N 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000010058 rubber compounding Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/12—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to hydrogen atoms or to carbon atoms of unsubstituted hydrocarbon radicals
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C317/00—Sulfones; Sulfoxides
- C07C317/16—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton
- C07C317/18—Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to acyclic carbon atoms of the carbon skeleton
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C39/00—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor
- B29C39/003—Shaping by casting, i.e. introducing the moulding material into a mould or between confining surfaces without significant moulding pressure; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C48/00—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
- B29C48/022—Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the choice of material
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C271/00—Derivatives of carbamic acids, i.e. compounds containing any of the groups, the nitrogen atom not being part of nitro or nitroso groups
- C07C271/06—Esters of carbamic acids
- C07C271/08—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms
- C07C271/10—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms
- C07C271/20—Esters of carbamic acids having oxygen atoms of carbamate groups bound to acyclic carbon atoms with the nitrogen atoms of the carbamate groups bound to hydrogen atoms or to acyclic carbon atoms to carbon atoms of hydrocarbon radicals substituted by nitrogen atoms not being part of nitro or nitroso groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D339/00—Heterocyclic compounds containing rings having two sulfur atoms as the only ring hetero atoms
- C07D339/08—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/205—Compounds containing groups, e.g. carbamates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L75/00—Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
- C08L75/04—Polyurethanes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Oral & Maxillofacial Surgery (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Extrusion Moulding Of Plastics Or The Like (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Heterocyclic Compounds Containing Sulfur Atoms (AREA)
Description
(1) 脂肪族ジアミン(加硫剤)/グアニジン(加硫促進剤)
(2) 芳香族ジアミン(加硫剤)/グアニジン(加硫促進剤)
R2(SO2)m(CH2)nOCONH-R1-NHCOO(CH2)n(SO2)mR2
(ここで、R1はC1〜C20の直鎖状または分岐状の2価脂肪族アルキレン基、2価脂環式シクロアルキレン基または2価芳香族基であり、R2は式
または式
で表わされる基であり、nは0、1または2であり、mは0または1である)で表わされるジウレタン化合物が提供される。
R2(SO2)m(CH2)nOCONHR1NHCOO(CH2)n(SO2)mR2
で表わされるジウレタン化合物は、次のような反応によって合成することができる。
(1) H2NR1NH2+2ClCOO(CH2)n(SO2)mR2 (クロロホーメート化合物)
(2) OCNR1NCO+2R2(SO2)m(CH2)nOH (水酸基含有化合物)
等が挙げられ、2価芳香族基としては例えば
等が挙げられるが、好ましくはC4〜C10の直鎖状アルキレン基が用いられる。
したがって、塩基性加硫促進剤の配合量を適宜調節することにより、所望の加硫物物性を維持したまま、高速加硫、耐スコーチ性を実現させることが可能となる。
温度計、環流冷却管および攪拌機を備えた内容量200mlの三口フラスコ中に、2-(p-トルエンスルホニル)エタノール HOCH2CH2SO2(p-C6H4)CH3 11.91g(59.7ミリモル)、ヘキサメチレンジイソシアネート5.00g(29.4ミリモル)およびトルエン100mlを仕込み、反応器を80℃に加温し、8時間攪拌した。
1H NMR:(a)2.45ppm (s 6H)
(b),(c)7.2-7.8ppm (m 8H)
(d)3.4ppm (t 4H)
(e)4.4ppm (t 4H)
(f)3.1ppm (q 4H)
(g)1.6ppm (m 4H)
(h)1.3ppm (m 4H)
FT-IR:3339cm-1:第2級アミンのN-H伸縮振動
1693cm-1:ウレタン結合由来のC=O伸縮振動
1322,1142cm-1:スルホン結合(-SO2-)
(1)内容量5Lの丸底フラスコ中に、第3ブチルメチルエーテル2Lおよび既知の方法により合成した2-(エトキシカルボニル)-1,3-ジチアンの粗生成物253.3g(1.2モル)を仕込み、さらにNaBH4 148.2g(3.9モル)を仕込んだ。この丸底フラスコに滴下ロートを取り付け、ここにメタノール650mlを仕込み、室温条件下で3時間以上かけて滴下を行い、滴下終了後40〜45℃で5時間攪拌した。
1H NMR:
(a)2.0ppm (m 2H)
(b)2.8ppm (m 4H)
(c)3.9ppm (t 1H)
(d)3.8ppm (d 2H)
(e)3.0ppm (br 1H)
1H NMR:
(a)2.0ppm (m 4H)
(b)2.8ppm (m 8H)
(c)4.1ppm (t 2H)
(d)4.4ppm (d 4H)
(e)4.9ppm (br 2H)
(f)3.2ppm (m 4H)
(g)1.5ppm (m 4H)
(h)1.3ppm (m 4H)
脂肪族ジアミン加硫タイプカルボキシル基含有アクリルゴム 100重量部
(ユニマテック製品ノックスタイトPA-522HF)
FEFカーボンブラック(N550) 60 〃
ステアリン酸 1 〃
4,4′-(α,α-ジメチルベンジル)ジフェニルアミン 2 〃
(大内新興化学製品ノクラックCD)
HMDA-Tsec 1.75 〃
1,3-ジ-o-トリルグアニジン(大内新興化学製品ノクセラーDT) 2 〃
ムーニー・スコーチ試験:JIS K6300-1準拠(125℃)
t5の値(単位:分)は長い程成形時の生地ヤケの懸念が
少なく、ヤケに起因する不良が少ない
一般には、t5の値が10分以上であれば、射出成形、圧縮
成形、押出成形でのヤケに起因する不良が少なくなる
加硫試験:JIS K6300-2準拠(180℃、12分間)
東洋精機製ロータレスレオメーターRLR-3使用
加硫速度の評価は、加硫試験のtc10、tc90およびME(MH-ML)で判断
でき、tc10およびtc90が短くかつMEが大きい程加硫速度は速い
常態値:JIS K6251、JIS K6253準拠
圧縮永久歪:JIS K6262準拠(150℃または175℃、70時間)
実施例3において、1,3-ジ-o-トリルグアニジン量が4重量部に変更された。
実施例3において、HMDA-Tsecの代りに、0.5重量部のヘキサメチレンジアミンカーバメート(ユニマテック製品ケミノックスAC-6)が用いられた。
実施例3において、HMDA-Tsecの代りに、0.5重量部の4,4-ジアミノジフェニルエーテルが用いられた。
比較例1において、1,3-ジ-o-トリルグアニジンが用いられなかった。
実施例3において、1,3-ジ-o-トリルグアニジンが用いられなかった。
表1
測定項目 実施例3 実施例4 比較例1 比較例2 比較例3 比較例4
ムーニー・スコーチ試験
MLmin (pts) 36 35 42 38 43 42
t5 (分) >60 25.4 4.8 8.7 5.2 >60
加硫試験
tc10 (分) 1.78 1.68 0.51 1.29 0.67 1.31
tc90 (分) 9.18 8.56 3.69 8.19 6.76 9.43
ML (N・m) 0.15 0.14 0.17 0.16 0.18 0.15
MH (N・m) 0.29 0.59 0.81 0.66 0.54 0.15
ME(MH-ML) (N・m) 0.14 0.45 0.64 0.5 0.36 0
常態値
硬さ (デュロA) 62 66 64 68 61 成形
不可
100%引張応力(MPa) 2.4 3.5 3.8 4.2 2.4 成形
不可
引張強さ (MPa) 8.4 9.2 10.4 11.1 9.2
破断伸び (%) 380 310 240 270 320
圧縮永久歪
150℃、70時間 (%) 21 12 8 11 22
175℃、70時間 (%) 29 20 12 15 37
脂肪族ジアミン加硫タイプカルボキシル基含有アクリルゴム 100重量部
(ノックスタイトPA-522HF)
FEFカーボンブラック(N550) 60 〃
ステアリン酸 1 〃
4,4′-ビス(α,α-ジメチルベンジル)ジフェニルアミン 2 〃
(ノクラックCD)
HMDA-Dmoc 1.5 〃
1,3-ジ-o-トリルグアニジン(ノクセラーDT) 2 〃
以上の各成分を用い、実施例3と同様にアクリルゴム組成物の調製および加硫が行われた。
実施例5において、1,3-ジ-o-トリルグアニジン量が4重量部に変更された。
実施例5において、1,3-ジ-o-トリルグアニジンが用いられなかった。
表2
測定項目 実施例5 実施例6 比較例5
ムーニー・スコーチ試験
MLmin (pts) 36 36
t5 (分) >60 22.3 >60
加硫試験
tc10 (分) 1.65 1.61
tc90 (分) 8.92 8.10
ML (N・m) 0.15 0.16
MH (N・m) 0.32 0.69
ME(MH-ML) (N・m) 0.17 0.53
常態値
硬さ (デュロA) 62 64 成形不可
100%引張応力(MPa) 2.8 3.6
引張強さ (MPa) 8.9 9.2
破断伸び (%) 340 280
圧縮永久歪
150℃、70時間 (%) 18 14
175℃、70時間 (%) 26 20
(1)比較例5では、180℃でレオメーターの測定を行ったが加硫トルクは上がらず、加硫は進行しなかった。このことから、実施例2(2)で得られた生成物は180℃では熱分解しないことが分かる。
(2)また、実施例5〜6は、1,3-ジ-o-トリルグアニジンのような塩基性化合物が存在する場合、ビスカーバメート構造が分解し、ヘキサメチレンジアミンが発生することを証明している。
Claims (12)
- 多価アミン架橋性基含有アクリルゴム、加硫剤としての請求項1、2または3記載のジウレタン化合物および塩基性加硫促進剤を含有してなるアクリルゴム組成物。
- 多価アミン架橋性基含有アクリルゴムが脂肪族ジアミン加硫タイプカルボキシル基含有アクリルゴムである請求項6記載のアクリルゴム組成物。
- 多価アミン架橋性基含有アクリルゴム100重量部当り、加硫剤としてのジウレタン化合物が0.1〜10重量部、塩基性加硫促進剤としてのグアニジン化合物が0.1〜10重量部の割合で用いられた請求項6記載のアクリルゴム組成物。
- 多価アミン架橋性基含有アクリルゴム100重量部当り、加硫剤としてのジウレタン化合物が0.1〜10重量部、塩基性加硫促進剤としての1,8-ジアザビシクロ〔5.4.0〕ウンデセン-7または1,5-ジアザビシクロ〔4.3.0〕ノネン-5が0.01〜1重量部の割合で用いられた請求項6記載のアクリルゴム組成物。
- 多価アミン架橋性基含有アクリルゴム100重量部当り、加硫剤としてのジウレタン化合物が0.1〜10重量部、塩基性加硫促進剤としての1,8-ジアザビシクロ〔5.4.0〕ウンデセン-7とシリカとの混合物が0.1〜10重量部の割合で用いられた請求項6記載のアクリルゴム組成物。
- 請求項6乃至10のいずれかに記載のアクリルゴム組成物から型成形された加硫成形品。
- 請求項6乃至10のいずれかに記載のアクリルゴム組成物から押出成形された加硫成形品。
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JP (2) | JP4883178B2 (ja) |
KR (1) | KR101269895B1 (ja) |
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DE102008055525A1 (de) * | 2008-12-15 | 2010-06-17 | Contitech Schlauch Gmbh | Vulkanisierbare Kautschukmischung, insbesondere auf Basis ACM oder AEM, und Vulkanisat, insbesondere ein Schlauchmaterial |
EP2568011B1 (en) * | 2011-02-28 | 2014-11-26 | NOK Corporation | Acrylic rubber composition |
CN103224678B (zh) * | 2013-03-29 | 2015-09-02 | 浙江固耐橡塑科技有限公司 | 一种丙烯酸酯橡胶复合材料 |
EP3202839B1 (en) * | 2014-09-29 | 2019-07-24 | Zeon Corporation | Crosslinked rubber |
EP3240817B1 (en) * | 2014-12-31 | 2021-07-07 | Huntsman Petrochemical LLC | Reduction of aldehydes in amine catalysts |
JP6757421B2 (ja) | 2016-12-15 | 2020-09-16 | ユニマテック株式会社 | カルボキシル基含有アクリルゴム組成物およびそれを用いたゴム積層体 |
WO2019003917A1 (ja) * | 2017-06-29 | 2019-01-03 | Nok株式会社 | 架橋アクリルゴム成形体の製造方法、アクリルゴム組成物およびシール材 |
WO2019087876A1 (ja) * | 2017-10-31 | 2019-05-09 | ユニマテック株式会社 | アクリルゴム |
US11795251B2 (en) | 2018-05-24 | 2023-10-24 | Unimatec Co., Ltd. | Acrylic rubber and crosslinkable composition thereof |
US11932644B2 (en) | 2018-11-20 | 2024-03-19 | Unimatec Co., Ltd. | Carbamate ester compound and acrylic rubber composition containing the same |
CN110467789A (zh) * | 2019-08-16 | 2019-11-19 | 广东亿达汽车密封件股份有限公司 | 一种高性能丙烯酸酯橡胶及其制备方法 |
WO2022049958A1 (ja) * | 2020-09-02 | 2022-03-10 | ユニマテック株式会社 | アクリルエラストマー共重合体およびその架橋性組成物 |
EP4209487A1 (en) | 2020-09-03 | 2023-07-12 | Unimatec Co., Ltd. | Phenothiazine derivative and acrylic rubber composition |
JPWO2022059290A1 (ja) * | 2020-09-15 | 2022-03-24 | ||
JP2022145654A (ja) | 2021-03-19 | 2022-10-04 | ユニマテック株式会社 | エチレン-(メタ)アクリレート系エラストマーおよびその製造法 |
WO2022196794A1 (ja) | 2021-03-19 | 2022-09-22 | ユニマテック株式会社 | エチレン-(メタ)アクリレート系エラストマーおよびその製造法 |
JP7490899B2 (ja) | 2021-08-18 | 2024-05-27 | ユニマテック株式会社 | 架橋性アクリルゴム組成物 |
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JPS5814671B2 (ja) * | 1977-05-02 | 1983-03-22 | 富士写真フイルム株式会社 | カラ−写真感光材料 |
WO1998029376A1 (en) * | 1996-12-19 | 1998-07-09 | Rhone-Poulenc Rorer Pharmaceuticals Inc. | Process for the solid phase synthesis of aldehydes, ketones, oximes, amines and hydroxamic acid compounds |
JPH1180488A (ja) * | 1997-09-05 | 1999-03-26 | Nippon Mektron Ltd | アクリル系エラストマー組成物 |
US6015860A (en) * | 1997-09-26 | 2000-01-18 | Nippon Mektron, Limited | Acrylic elastomer composition |
JPH11100478A (ja) | 1997-09-26 | 1999-04-13 | Nippon Mektron Ltd | アクリル系エラストマー組成物 |
JP3837900B2 (ja) | 1998-03-13 | 2006-10-25 | ユニマテック株式会社 | アクリル系エラストマー組成物 |
JP3663859B2 (ja) | 1997-10-31 | 2005-06-22 | ユニマテック株式会社 | アクリル系エラストマー組成物 |
JP3717302B2 (ja) * | 1998-03-19 | 2005-11-16 | ユニマテック株式会社 | アクリル系エラストマー組成物 |
JP4345170B2 (ja) | 1999-12-24 | 2009-10-14 | ユニマテック株式会社 | 耐熱性エアー系ホース加硫成形用組成物 |
JP2001316554A (ja) | 2000-02-29 | 2001-11-16 | Nippon Zeon Co Ltd | アクリルゴム組成物および架橋物 |
JP4273671B2 (ja) * | 2001-03-06 | 2009-06-03 | 日本ゼオン株式会社 | アクリルゴム組成物および加硫物 |
JP4634637B2 (ja) | 2001-04-20 | 2011-02-16 | 電気化学工業株式会社 | アクリル系エラストマー組成物 |
JP4862228B2 (ja) | 2001-06-21 | 2012-01-25 | トヨタ自動車株式会社 | 基準値決定装置 |
WO2003004563A1 (fr) | 2001-07-05 | 2003-01-16 | Zeon Corporation | Elastomere acrylique comportant un groupe carboxylique dans la molecule, composition elastomere acrylique contenant un agent de vulcanisation et un accelerateur de vulcanisation, et utilisation associee |
JP4022736B2 (ja) | 2002-05-27 | 2007-12-19 | 日本ゼオン株式会社 | アクリルゴム組成物及び架橋物 |
JP4090843B2 (ja) * | 2002-09-30 | 2008-05-28 | 富士フイルム株式会社 | 赤外線感光性組成物 |
JP4024219B2 (ja) | 2003-02-21 | 2007-12-19 | 電気化学工業株式会社 | カルボキシル基含有アクリル系ゴム組成物 |
JP2005017354A (ja) * | 2003-06-23 | 2005-01-20 | Fuji Photo Film Co Ltd | ホログラム記録材料用組成物、ホログラム記録材料及びホログラム記録方法。 |
JP4729887B2 (ja) * | 2004-04-21 | 2011-07-20 | ユニマテック株式会社 | アクリル系エラストマー組成物 |
JP3884758B2 (ja) * | 2005-03-11 | 2007-02-21 | 積水化学工業株式会社 | 塩基増殖剤及び塩基反応性硬化性組成物 |
RU2451701C2 (ru) * | 2006-12-05 | 2012-05-27 | Денки Кагаку Когио Кабусики Кайся | Композиция акрилового каучука и продукт его вулканизации |
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EP2243770B1 (en) | 2015-02-25 |
CN101932556B (zh) | 2013-08-14 |
JPWO2009096545A1 (ja) | 2011-05-26 |
JP2010235955A (ja) | 2010-10-21 |
EP2243770A4 (en) | 2012-01-18 |
EP2243770A1 (en) | 2010-10-27 |
US8288483B2 (en) | 2012-10-16 |
JP5240238B2 (ja) | 2013-07-17 |
CN101932556A (zh) | 2010-12-29 |
KR20100120666A (ko) | 2010-11-16 |
KR101269895B1 (ko) | 2013-05-31 |
US20110040043A1 (en) | 2011-02-17 |
WO2009096545A1 (ja) | 2009-08-06 |
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