JP4878379B2 - グレートーンマスクの製造方法 - Google Patents
グレートーンマスクの製造方法 Download PDFInfo
- Publication number
- JP4878379B2 JP4878379B2 JP2009027526A JP2009027526A JP4878379B2 JP 4878379 B2 JP4878379 B2 JP 4878379B2 JP 2009027526 A JP2009027526 A JP 2009027526A JP 2009027526 A JP2009027526 A JP 2009027526A JP 4878379 B2 JP4878379 B2 JP 4878379B2
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- JP
- Japan
- Prior art keywords
- film
- light
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- transparent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004519 manufacturing process Methods 0.000 title claims description 22
- 238000005530 etching Methods 0.000 claims description 61
- 239000011651 chromium Substances 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 17
- 150000001845 chromium compounds Chemical class 0.000 claims description 16
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 14
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 14
- 229910052804 chromium Inorganic materials 0.000 claims description 14
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 5
- 229910000423 chromium oxide Inorganic materials 0.000 claims description 5
- 238000004380 ashing Methods 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910016006 MoSi Inorganic materials 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 229910021563 chromium fluoride Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 claims description 2
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 description 180
- 238000002834 transmittance Methods 0.000 description 15
- 239000010410 layer Substances 0.000 description 12
- 238000001312 dry etching Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 238000001039 wet etching Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 239000002356 single layer Substances 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910019966 CrOxNy Inorganic materials 0.000 description 2
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
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- Liquid Crystal (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009027526A JP4878379B2 (ja) | 2009-02-09 | 2009-02-09 | グレートーンマスクの製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009027526A JP4878379B2 (ja) | 2009-02-09 | 2009-02-09 | グレートーンマスクの製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007166437A Division JP4700657B2 (ja) | 2007-06-25 | 2007-06-25 | グレートーンマスク及びその製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010245051A Division JP4840834B2 (ja) | 2010-11-01 | 2010-11-01 | グレートーンマスク及びその製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009139975A JP2009139975A (ja) | 2009-06-25 |
| JP2009139975A5 JP2009139975A5 (https=) | 2009-10-22 |
| JP4878379B2 true JP4878379B2 (ja) | 2012-02-15 |
Family
ID=40870555
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009027526A Expired - Lifetime JP4878379B2 (ja) | 2009-02-09 | 2009-02-09 | グレートーンマスクの製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4878379B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6157832B2 (ja) * | 2012-10-12 | 2017-07-05 | Hoya株式会社 | 電子デバイスの製造方法、表示装置の製造方法、フォトマスクの製造方法、及びフォトマスク |
| JP6302502B2 (ja) * | 2016-04-15 | 2018-03-28 | Hoya株式会社 | 電子デバイスの製造方法、表示装置の製造方法、フォトマスクの製造方法、及びフォトマスク |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6318351A (ja) * | 1986-07-11 | 1988-01-26 | Hitachi Micro Comput Eng Ltd | パタ−ン形成用マスク |
| US4770947A (en) * | 1987-01-02 | 1988-09-13 | International Business Machines Corporation | Multiple density mask and fabrication thereof |
| US5213916A (en) * | 1990-10-30 | 1993-05-25 | International Business Machines Corporation | Method of making a gray level mask |
| JP2814847B2 (ja) * | 1992-07-30 | 1998-10-27 | 日本電気株式会社 | 多段位相シフトレチクルの製造方法 |
| JPH0749410A (ja) * | 1993-08-06 | 1995-02-21 | Dainippon Printing Co Ltd | 階調マスク及びその製造方法 |
| JP3438426B2 (ja) * | 1995-08-22 | 2003-08-18 | ソニー株式会社 | 位相シフト露光マスク |
| JPH0980740A (ja) * | 1995-09-14 | 1997-03-28 | Ricoh Co Ltd | 露光マスクおよび半導体装置の製造方法 |
| US5914202A (en) * | 1996-06-10 | 1999-06-22 | Sharp Microeletronics Technology, Inc. | Method for forming a multi-level reticle |
| JP3080023B2 (ja) * | 1997-02-20 | 2000-08-21 | 日本電気株式会社 | 露光用フォトマスク |
| JP3064962B2 (ja) * | 1997-06-19 | 2000-07-12 | 日本電気株式会社 | ハーフトーン位相シフトマスクおよびそのマスクブランクスならびにハーフトーン位相シフトマスクの製造方法および欠陥修正方法 |
| JP3253590B2 (ja) * | 1998-08-31 | 2002-02-04 | シャープ株式会社 | ハーフトーンマスクの製造方法 |
| JP2000181048A (ja) * | 1998-12-16 | 2000-06-30 | Sharp Corp | フォトマスクおよびその製造方法、並びにそれを用いた露光方法 |
| JP4292350B2 (ja) * | 1999-04-22 | 2009-07-08 | 栄 田中 | 液晶表示装置とその製造方法 |
-
2009
- 2009-02-09 JP JP2009027526A patent/JP4878379B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009139975A (ja) | 2009-06-25 |
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