JP4800778B2 - ダイシング用粘着シート及びそれを用いた被加工物の加工方法 - Google Patents
ダイシング用粘着シート及びそれを用いた被加工物の加工方法 Download PDFInfo
- Publication number
- JP4800778B2 JP4800778B2 JP2006021027A JP2006021027A JP4800778B2 JP 4800778 B2 JP4800778 B2 JP 4800778B2 JP 2006021027 A JP2006021027 A JP 2006021027A JP 2006021027 A JP2006021027 A JP 2006021027A JP 4800778 B2 JP4800778 B2 JP 4800778B2
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- sensitive adhesive
- dicing
- adhesive sheet
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000004820 Pressure-sensitive adhesive Substances 0.000 title claims abstract description 155
- 238000003672 processing method Methods 0.000 title claims description 8
- 239000010410 layer Substances 0.000 claims abstract description 83
- 239000000178 monomer Substances 0.000 claims abstract description 42
- 229920000058 polyacrylate Polymers 0.000 claims abstract description 38
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 8
- 230000001070 adhesive effect Effects 0.000 claims description 85
- 239000000853 adhesive Substances 0.000 claims description 84
- 238000000034 method Methods 0.000 claims description 47
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 24
- 239000011203 carbon fibre reinforced carbon Substances 0.000 claims description 24
- 229910052710 silicon Inorganic materials 0.000 claims description 23
- 239000010703 silicon Substances 0.000 claims description 23
- 238000000227 grinding Methods 0.000 claims description 21
- 239000012790 adhesive layer Substances 0.000 claims description 16
- 238000011109 contamination Methods 0.000 claims description 16
- 238000005259 measurement Methods 0.000 claims description 15
- 238000012545 processing Methods 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 description 60
- 235000012431 wafers Nutrition 0.000 description 50
- -1 for example Polymers 0.000 description 31
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 29
- 230000005855 radiation Effects 0.000 description 23
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 21
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 17
- 230000000052 comparative effect Effects 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 15
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 14
- 239000000126 substance Substances 0.000 description 14
- 238000011282 treatment Methods 0.000 description 13
- 206010040844 Skin exfoliation Diseases 0.000 description 11
- 229920006243 acrylic copolymer Polymers 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 125000000524 functional group Chemical group 0.000 description 9
- 239000003999 initiator Substances 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 229920001228 polyisocyanate Polymers 0.000 description 8
- 239000005056 polyisocyanate Substances 0.000 description 8
- 239000004814 polyurethane Substances 0.000 description 8
- 229920002635 polyurethane Polymers 0.000 description 8
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 7
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 7
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 7
- 125000005442 diisocyanate group Chemical group 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- 238000007259 addition reaction Methods 0.000 description 6
- 229920005601 base polymer Polymers 0.000 description 6
- 238000007796 conventional method Methods 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000005416 organic matter Substances 0.000 description 6
- 230000002950 deficient Effects 0.000 description 5
- GDYAJWCMJNEDAP-UHFFFAOYSA-N 1,2-diisocyanatoethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(N=C=O)CN=C=O GDYAJWCMJNEDAP-UHFFFAOYSA-N 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 239000010419 fine particle Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 3
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N desyl alcohol Natural products C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- XLPJNCYCZORXHG-UHFFFAOYSA-N 1-morpholin-4-ylprop-2-en-1-one Chemical compound C=CC(=O)N1CCOCC1 XLPJNCYCZORXHG-UHFFFAOYSA-N 0.000 description 2
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 241001050985 Disco Species 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 125000002843 carboxylic acid group Chemical group 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000006482 condensation reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 229910052732 germanium Inorganic materials 0.000 description 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 238000003847 radiation curing Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 125000000542 sulfonic acid group Chemical group 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- GJZFGDYLJLCGHT-UHFFFAOYSA-N 1,2-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(CC)C(CC)=CC=C3SC2=C1 GJZFGDYLJLCGHT-UHFFFAOYSA-N 0.000 description 1
- UYEDESPZQLZMCL-UHFFFAOYSA-N 1,2-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=C(C)C(C)=CC=C3SC2=C1 UYEDESPZQLZMCL-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- ZVEMLYIXBCTVOF-UHFFFAOYSA-N 1-(2-isocyanatopropan-2-yl)-3-prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC(C(C)(C)N=C=O)=C1 ZVEMLYIXBCTVOF-UHFFFAOYSA-N 0.000 description 1
- YNSNJGRCQCDRDM-UHFFFAOYSA-N 1-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl YNSNJGRCQCDRDM-UHFFFAOYSA-N 0.000 description 1
- CTOHEPRICOKHIV-UHFFFAOYSA-N 1-dodecylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CCCCCCCCCCCC CTOHEPRICOKHIV-UHFFFAOYSA-N 0.000 description 1
- WULAHPYSGCVQHM-UHFFFAOYSA-N 2-(2-ethenoxyethoxy)ethanol Chemical compound OCCOCCOC=C WULAHPYSGCVQHM-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- BEWCNXNIQCLWHP-UHFFFAOYSA-N 2-(tert-butylamino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNC(C)(C)C BEWCNXNIQCLWHP-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- NPSJHQMIVNJLNN-UHFFFAOYSA-N 2-ethylhexyl 4-nitrobenzoate Chemical compound CCCCC(CC)COC(=O)C1=CC=C([N+]([O-])=O)C=C1 NPSJHQMIVNJLNN-UHFFFAOYSA-N 0.000 description 1
- 239000004808 2-ethylhexylester Substances 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- JEHFRMABGJJCPF-UHFFFAOYSA-N 2-methylprop-2-enoyl isocyanate Chemical compound CC(=C)C(=O)N=C=O JEHFRMABGJJCPF-UHFFFAOYSA-N 0.000 description 1
- AUZRCMMVHXRSGT-UHFFFAOYSA-N 2-methylpropane-1-sulfonic acid;prop-2-enamide Chemical compound NC(=O)C=C.CC(C)CS(O)(=O)=O AUZRCMMVHXRSGT-UHFFFAOYSA-N 0.000 description 1
- YYIOIHBNJMVSBH-UHFFFAOYSA-N 2-prop-2-enoyloxynaphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=C(OC(=O)C=C)C=CC2=C1 YYIOIHBNJMVSBH-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 description 1
- SXIFAEWFOJETOA-UHFFFAOYSA-N 4-hydroxy-butyl Chemical group [CH2]CCCO SXIFAEWFOJETOA-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 229920000103 Expandable microsphere Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- KJVBXWVJBJIKCU-UHFFFAOYSA-N [hydroxy(2-hydroxyethoxy)phosphoryl] prop-2-enoate Chemical compound OCCOP(O)(=O)OC(=O)C=C KJVBXWVJBJIKCU-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229920005603 alternating copolymer Polymers 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000009820 dry lamination Methods 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004494 ethyl ester group Chemical group 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 230000005865 ionizing radiation Effects 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 230000009191 jumping Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229920000092 linear low density polyethylene Polymers 0.000 description 1
- 239000004707 linear low-density polyethylene Substances 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229920001179 medium density polyethylene Polymers 0.000 description 1
- 239000004701 medium-density polyethylene Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 1
- 150000004702 methyl esters Chemical class 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 229920001643 poly(ether ketone) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920001083 polybutene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005629 polypropylene homopolymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- UIIIBRHUICCMAI-UHFFFAOYSA-N prop-2-ene-1-sulfonic acid Chemical group OS(=O)(=O)CC=C UIIIBRHUICCMAI-UHFFFAOYSA-N 0.000 description 1
- 229920005604 random copolymer Polymers 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- UWHCKJMYHZGTIT-UHFFFAOYSA-N tetraethylene glycol Chemical compound OCCOCCOCCOCCO UWHCKJMYHZGTIT-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229920001862 ultra low molecular weight polyethylene Polymers 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J133/00—Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
- C09J133/04—Homopolymers or copolymers of esters
- C09J133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09J133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
- C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/385—Acrylic polymers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2809—Web or sheet containing structurally defined element or component and having an adhesive outermost layer including irradiated or wave energy treated component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
- Y10T428/2852—Adhesive compositions
- Y10T428/2878—Adhesive compositions including addition polymer from unsaturated monomer
- Y10T428/2891—Adhesive compositions including addition polymer from unsaturated monomer including addition polymer from alpha-beta unsaturated carboxylic acid [e.g., acrylic acid, methacrylic acid, etc.] Or derivative thereof
Description
即ち、本発明に於けるダイシング用粘着シートの粘着剤層は、側鎖にアルコキシル基を有するモノマーを5重量%以上含むアクリルポリマーを含み構成されるので、長期間にわたり被加工物に貼り付けられた状態であっても粘着剤層の粘着力が増大し過ぎるのを防止し、ピックアップ性を良好な状態に維持する。これにより、歩留まりの向上を図ることが可能なダイシング用粘着シート及びそれを用いた被加工物の加工方法を提供することができる。
基材フィルムとして、厚み70μmの直鎖状低密度ポリエチレンからなるフィルムを使用した。このフィルムの片面にはコロナ処理を施した。
アクリル酸メチル75重量部、アクリル酸メトキシエチル10重量部、N−ビニルピロリドン5重量部、及びアクリル酸2−ヒドロキシエチル10重量部を酢酸エチル中で常法により共重合させた。これにより、アクリル酸2−ヒドロキシエチルの側鎖末端OH基の90%に2−メタクリロイルオキシエチレンイソシアネートのNCO基を付加反応させ末端に炭素−炭素二重結合を付与した重量平均分子量60万のアクリル系共重合体を含有する溶液を得た。
アクリル酸メチル40重量部、アクリル酸メトキシエチル30重量部、アクリロイルモルフォリン20重量部、及び2−ヒドロキシエチル10重量部を酢酸エチル中で常法により共重合させた。これにより、アクリル酸2−ヒドロキシエチルの側鎖末端OH基の90%に2−メタクリロイルオキシエチレンイソシアネートのNCO基を付加反応させ末端に炭素−炭素二重結合を付与した重量平均分子量50万のアクリル系共重合体を含有する溶液を得た。
アクリル酸メチル95重量部、アクリル酸5重量部を酢酸エチル中で常法により共重合させた。これにより、重量平均分子量80万のアクリル系共重合体を含有する溶液を得た。
アクリル酸メチル60重量部、アクリル酸2−エチルヘキシル35重量部、アクリル酸5重量部を酢酸エチル中で常法により共重合させた。これにより、重量平均分子量70万のアクリル系共重合体を含有する溶液を得た。
アクリル酸メチル87重量部、N−ビニルピロリドン3重量部、アクリル酸2−ヒドロキシエチル10重量部を酢酸エチル中で常法により共重合させた。これにより、アクリル酸2−ヒドロキシエチルの側鎖末端OH基の90%に2−メタクリロイルオキシエチレンイソシアネートのNCO基を付加反応させ末端に炭素−炭素二重結合を付与した重量平均分子量50万のアクリル系共重合体を含有する溶液を得た。
アクリル酸メチル95重量部、アクリル酸5重量部を酢酸エチル中で常法により共重合させた。これにより、重量平均分子量80万のアクリル系共重合体を含有する溶液を得た。
実施例及び比較例で得られたダイシング用粘着シートを、25mm幅に切断し、裏面研削を施した6インチの半導体ウェハ(厚み400μm)の研削面に貼り付けた。貼り付けは、研削終了から5分以内に23±3℃の温度条件で行った。その後、室温雰囲気下で30分静置した。更に、ダイシング用粘着シートの裏面側から紫外線を照射(照射時間20秒、照射強度500mJ/cm2)した。その後、粘着剤層表面と研削面とのなす角θが90度となる様にし、又このときの引張り速度を300mm/分とした。測定の結果、粘着力の値が0.05N/25mmテープ幅以上1.0N/25mmテープ幅以下のものを良とし、当該数値範囲外のものを不良とした。結果を下記表2に示す。尚、裏面研削の条件は下記の通りとした。
グラインダー:DISCO社製、DFG−840
1軸:#600砥石(回転数:4800rpm、ダウンスピード:P1:3.0μm/sec、P2:2.0μm/sec、P3:1.0μm/sec)
2軸:#2000砥石(回転数:5500rpm、ダウンスピード:P1:0.8μm/sec、P2:0.6μm/sec、P3:0.5μm/sec)
裏面研削は、先ず2軸にて30μmの厚み分を研削した後、1軸にて最終厚みが400μmとなるように半導体ウェハを研削した。
実施例及び比較例で得られたダイシング用粘着シートを、研削を施した6インチの半導体ウェハ(厚み100μm)の研削面に、研削直後(研削終了から5分以内)に23℃でマウントした。次に、下記条件で半導体ウェハをダイシングし、半導体チップを形成した。
ダイサー:DISCO社製、DFD−651
ブレード:DISCO社製、27HECC
ブレード回転数:40000rpm
ダイシング速度:120mm/sec
ダイシング深さ:25μm
カットモード:ダウンカット
ダイシングサイズ:5.0×5.0mm
ダイボンダー:NEC Machinery CPS−100
ピン数:4本
ピンの間隔:3.5×3.5mm
ピン先端曲率:0.250mm
ピン突き上げ量:0.50mm
吸着保持時間:0.2秒
エキスバンド量:3mm
実施例及び比較例で得られたダイシング用粘着シートを、25mmテープ幅で短冊状に切断し、23℃(室温)で鏡面処理したミラーシリコンウェハ(商品名「CZN<100>2.5−3.5(4インチ)」、信越半導体(株)製)に貼り合わせた。その後、室温雰囲気下で30分静置した。更に、ダイシング用粘着シート裏面側から紫外線を照射(照射時間20秒、照射強度500mJ/cm2)した。
実施例及び比較例で得られたダイシング用粘着シートを、それぞれ前記のミラーシリコンウェハに貼り合わせて1時間放置した。その後、前記の接着力測定試験に準じ、剥離したシリコンウェハ面について、ESCA装置を用いて表面炭素元素比率C1(%)を測定した。また、オリジナルのミラーシリコンウェハ面について、ESCA装置を用いて表面炭素元素比率C2(%)を測定した。測定条件は下記の通りである。
装置:アルバック・ファイ社製 Quantum2000
X−ray Setting:200μmφ[30W(15kV)]のポイント分析
X線源:モノクロAIKα
光電子取り出し角:45°
測定サンプルの作成は以下の方法に従い行った。即ち、各実施例及び比較例で調製したアクリル系の紫外線硬化型粘着剤溶液をセパレーター上に塗布した後、100℃で3分間乾燥させて、乾燥後の厚みが50μmの粘着剤層を形成した。次に、2kgハンドローラーを用いて面内を均一に押圧することにより、セパレーター及び粘着剤層の総厚みが3mmとなる様にした。続いて、サンプル内の脱泡を目的として温度50℃、圧力5kg/cm2の条件でオートクレーブを実施し、各サンプルを作製した。
画像処理式接触角計(商品名;FACE、接触角計、CA−X型)を用い、実施例及び比較例で得られたダイシング用粘着シートの粘着剤層側を上にして、該粘着剤層表面にシリンジを用いて水を滴下した。滴下1分経過後の接触角を測定した。測定の結果、接触角が90°以下の場合を良とし、90°より大きい場合を不良とした。
総合評価は、ピックアップ、損失正接tanδ、水に対する接触角、粘着力、表面有機物汚染量ΔCの全ての評価項目で良である場合を良とし、何れか一つでも評価項目に不良がある場合は不良とした。下記表1から明らかな様に、実施例1〜3のダイシング用粘着シートについては、マウント後6時間及び1週間経過した場合も、全ての半導体チップを良好にピックアップすることができピックアップ性に優れていることが確認された。また、表面有機物汚染量ΔCも微量であり、糊残りの発生を低減することができ汚染性に優れていることが確認された。その一方、比較例1〜4のダイシング用粘着シートについては、ピックアップ性、及び汚染性の両方の特性を満足するものは無かった。
11 基材フィルム
12 粘着剤層
13 セパレーター
14 シリコンミラーウェハ
Claims (9)
- 基材フィルム上に少なくとも粘着剤層が設けられており、被加工物のダイシングに用いるダイシング用粘着シートであって、
前記粘着剤層には、アルコキシル基を側鎖に有するモノマーを5重量%以上含み構成されるアクリルポリマーが含有されており、
前記アクリルポリマーは、側鎖に窒素を含むモノマーを5重量%以上含み、
前記アクリルポリマーは、分子内の全側鎖の内3.6/100以上の側鎖それぞれに炭素−炭素二重結合を1個有することを特徴とするダイシング用粘着シート。 - 請求項1に記載のダイシング用粘着シートであって、
前記被加工物の活性面に対する前記粘着剤層の粘着力であって、測定温度23±3℃、引張り速度150mm/分の条件で引き剥がしを行なったときの90度ピール粘着力が、0.35〜0.81N/25mmテープ幅であることを特徴とするダイシング用粘着シート。 - 請求項1又は2に記載のダイシング用粘着シートであって、
前記粘着剤層表面の水に対する接触角は、90度以下であることを特徴とするダイシング用粘着シート。 - 請求項1〜3の何れか1項に記載のダイシング用粘着シートであって、
前記粘着剤層の25℃に於ける損失正接tanδが0.45以下であり、かつ50℃に於ける損失正接tanδが0.10以下であることを特徴とするダイシング用粘着シート。 - 請求項1〜4の何れか1項に記載のダイシング用粘着シートであって、
前記粘着剤層は、炭素−炭素の二重結合を有する放射線硬化型粘着剤を含み構成され、
かつ、ダイシング用粘着シートをシリコンミラーウェハに貼り付けた後、測定温度23±3℃、粘着剤層の表面とシリコンミラーウェハの表面とのなす角15°、引張り速度150mm/分の条件で引き剥がしを行なったときの粘着力が1.8N/25mmテープ幅以下であることを特徴とするダイシング用粘着シート。 - 請求項1〜5の何れか1項に記載のダイシング用粘着シートであって、
前記アクリルポリマーの重量平均分子量が50万以上であることを特徴とするダイシング用粘着シート。 - 請求項1〜6の何れか1項に記載のダイシング用粘着シートであって、
前記粘着剤層は、前記被加工物から剥離した後の該被加工物に於ける貼着面での表面有機物汚染増加量ΔCが4.6%以下となる剥離性を有することを特徴とするダイシング用粘着シート。 - 請求項1〜7の何れか1項に記載のダイシング用粘着シートを用いて被加工物の加工を行う被加工物の加工方法であって、
前記被加工物に前記ダイシング用粘着シートを貼り合わせる工程と、
前記被加工物をダイシングする工程と、
ダイシング後の前記被加工物を該ダイシング用粘着シートからピックアップする工程とを有することを特徴とする被加工物の加工方法。 - 請求項8に記載の被加工物の加工方法であって、
更に、前記被加工物を裏面研削する工程を有し、
前記ダイシング用粘着シートの被加工物への貼り合わせは、該被加工物に於ける裏面研削を施した活性面に対して行うことを特徴とする被加工物の加工方法。
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006021027A JP4800778B2 (ja) | 2005-05-16 | 2006-01-30 | ダイシング用粘着シート及びそれを用いた被加工物の加工方法 |
TW095110014A TWI398501B (zh) | 2005-05-16 | 2006-03-23 | 切割用黏著片以及使用此黏著片的被加工物的加工方法 |
AT06006556T ATE486715T1 (de) | 2005-05-16 | 2006-03-29 | Psa-folie zum zerschneiden und verarbeitungsverfahren von daraus hergestellten produkten |
DE602006017920T DE602006017920D1 (de) | 2005-05-16 | 2006-03-29 | PSA-Folie zum zerschneiden und verarbeitungsverfahren von daraus hergestellten produkten |
EP07016590.7A EP1880843B1 (en) | 2005-05-16 | 2006-03-29 | Pressure-sensitive adhesive sheet for use in dicing |
EP06006556A EP1724106B1 (en) | 2005-05-16 | 2006-03-29 | Pressure-sensitive adhesive sheet for use in dicing and method of processing products worked with it |
KR1020060038445A KR101350045B1 (ko) | 2005-05-16 | 2006-04-28 | 다이싱용 점착 시트 및 그것을 이용한 피가공물의 가공방법 |
US11/383,371 US20060257651A1 (en) | 2005-05-16 | 2006-05-15 | Pressure-sensitive adhesive sheet for use in dicing and method of processing products worked with it |
CN2006100792006A CN1865376B (zh) | 2005-05-16 | 2006-05-16 | 用于切割的压敏粘合片以及使用其的工件的加工方法 |
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005142417 | 2005-05-16 | ||
JP2005142417 | 2005-05-16 | ||
JP2006008484 | 2006-01-17 | ||
JP2006008484 | 2006-01-17 | ||
JP2006021027A JP4800778B2 (ja) | 2005-05-16 | 2006-01-30 | ダイシング用粘着シート及びそれを用いた被加工物の加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007220694A JP2007220694A (ja) | 2007-08-30 |
JP4800778B2 true JP4800778B2 (ja) | 2011-10-26 |
Family
ID=36840915
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006021027A Active JP4800778B2 (ja) | 2005-05-16 | 2006-01-30 | ダイシング用粘着シート及びそれを用いた被加工物の加工方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US20060257651A1 (ja) |
EP (2) | EP1880843B1 (ja) |
JP (1) | JP4800778B2 (ja) |
KR (1) | KR101350045B1 (ja) |
CN (1) | CN1865376B (ja) |
AT (1) | ATE486715T1 (ja) |
DE (1) | DE602006017920D1 (ja) |
TW (1) | TWI398501B (ja) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4107417B2 (ja) * | 2002-10-15 | 2008-06-25 | 日東電工株式会社 | チップ状ワークの固定方法 |
JP4283596B2 (ja) * | 2003-05-29 | 2009-06-24 | 日東電工株式会社 | チップ状ワークの固定方法 |
JP4275522B2 (ja) * | 2003-12-26 | 2009-06-10 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP4443962B2 (ja) * | 2004-03-17 | 2010-03-31 | 日東電工株式会社 | ダイシング・ダイボンドフィルム |
JP4799205B2 (ja) * | 2006-02-16 | 2011-10-26 | 日東電工株式会社 | 活性面貼付ダイシング用粘着テープ又はシートおよび被加工物の切断片のピックアップ方法 |
US7935424B2 (en) * | 2006-04-06 | 2011-05-03 | Lintec Corporation | Adhesive sheet |
JP4991348B2 (ja) * | 2006-04-06 | 2012-08-01 | リンテック株式会社 | 粘着シート |
JP5049612B2 (ja) * | 2007-02-28 | 2012-10-17 | リンテック株式会社 | 粘着シート |
JP4970863B2 (ja) * | 2006-07-13 | 2012-07-11 | 日東電工株式会社 | 被加工物の加工方法 |
JP4781185B2 (ja) * | 2006-07-18 | 2011-09-28 | 日東電工株式会社 | 耐熱ダイシングテープ又はシート |
JP4837490B2 (ja) * | 2006-08-22 | 2011-12-14 | 日東電工株式会社 | 加工用粘着シート |
JP4931519B2 (ja) * | 2006-09-01 | 2012-05-16 | 日東電工株式会社 | 活性面貼付ダイシング用粘着テープ又はシートおよび被加工物の切断片のピックアップ方法 |
JP5408640B2 (ja) * | 2006-09-04 | 2014-02-05 | 日東電工株式会社 | 紫外線硬化型粘着剤組成物、紫外線硬化型粘着シート及びその製造方法 |
EP2063460A4 (en) * | 2006-09-12 | 2011-08-03 | Nitto Denko Corp | Dicing / CHIP BOND FILM |
KR100867183B1 (ko) | 2006-12-05 | 2008-11-06 | 주식회사 엘지화학 | 다이싱·다이 본딩용 접착 필름, 이를 사용한 반도체 장치및 그의 제조 방법 |
JP4493643B2 (ja) * | 2006-12-06 | 2010-06-30 | 日東電工株式会社 | 再剥離型粘着剤組成物、及び粘着テープ又はシート |
JP2008163276A (ja) * | 2007-01-05 | 2008-07-17 | Nitto Denko Corp | 半導体基板加工用粘着シート |
JP5101111B2 (ja) * | 2007-01-05 | 2012-12-19 | 日東電工株式会社 | 半導体基板加工用粘着シート |
JP5000370B2 (ja) * | 2007-04-20 | 2012-08-15 | 日東電工株式会社 | ウォータージェットレーザダイシング用粘着シート |
KR101454183B1 (ko) * | 2007-11-12 | 2014-10-27 | 린텍 코포레이션 | 점착 시트 |
JP5087414B2 (ja) * | 2008-01-22 | 2012-12-05 | 日東電工株式会社 | 光硬化型アクリル系粘弾性体組成物、アクリル系粘弾性体、アクリル系粘弾性体層テープ又はシート、及びそれらの製造方法 |
EP2151860A2 (en) * | 2008-08-04 | 2010-02-10 | Nitto Denko Corporation | Dicing die-bonding film |
JP5153597B2 (ja) * | 2008-12-05 | 2013-02-27 | リンテック株式会社 | チップ用保護膜形成用シートおよび保護膜付半導体チップ |
KR101353331B1 (ko) * | 2009-03-03 | 2014-01-17 | 히다치 막셀 가부시키가이샤 | 방사선 경화성 점착제 조성물, 그것을 사용한 다이싱용 점착 필름 및 절단편의 제조방법 |
CN102695765B (zh) * | 2009-12-24 | 2014-08-06 | 三键有限公司 | 临时固定组合物 |
JP2011216734A (ja) * | 2010-03-31 | 2011-10-27 | Furukawa Electric Co Ltd:The | 半導体ウエハ加工用粘着シート |
CN102714151A (zh) * | 2010-03-31 | 2012-10-03 | 古河电气工业株式会社 | 半导体晶片加工用粘合片 |
JP5461292B2 (ja) * | 2010-04-28 | 2014-04-02 | 日立マクセル株式会社 | ダイシング用粘着フィルム、及び切断片の製造方法 |
EP2412739A1 (en) * | 2010-07-27 | 2012-02-01 | Cytec Surface Specialties, S.A. | Radiation curable aqueous compositions |
JP5653675B2 (ja) * | 2010-07-30 | 2015-01-14 | 古河電気工業株式会社 | ウエハ加工用テープ |
JP5687897B2 (ja) | 2010-12-28 | 2015-03-25 | 日東電工株式会社 | 放射線硬化型粘着剤組成物及び粘着シート |
JP5781302B2 (ja) | 2010-12-28 | 2015-09-16 | 日東電工株式会社 | 放射線硬化型粘着剤組成物及び粘着シート |
JP5907472B2 (ja) * | 2011-05-26 | 2016-04-26 | 住友ベークライト株式会社 | 半導体ウエハ加工用粘着テープ |
WO2013038967A1 (ja) * | 2011-09-16 | 2013-03-21 | リンテック株式会社 | ダイシングシート用基材フィルムおよびダイシングシート |
JP5361092B2 (ja) * | 2011-09-16 | 2013-12-04 | リンテック株式会社 | ダイシングシート用基材フィルムおよびダイシングシート |
WO2013089983A1 (en) * | 2011-12-15 | 2013-06-20 | Henkel Corporation | Dicing tape for rough surface die attach film |
JP5809685B2 (ja) * | 2013-12-12 | 2015-11-11 | リンテック株式会社 | 粘着シートおよび半導体装置の製造方法 |
KR102394517B1 (ko) * | 2014-03-03 | 2022-05-06 | 린텍 가부시키가이샤 | 반도체 관련 부재 가공용 시트 및 당해 시트를 사용하는 칩의 제조 방법 |
JP6545454B2 (ja) * | 2014-12-09 | 2019-07-17 | 日東電工株式会社 | 半導体の製造に用いられる粘着シート |
SG11201908493VA (en) * | 2017-03-17 | 2019-10-30 | Sumitomo Bakelite Co | Pressure-sensitive adhesive tape set and pressure-sensitive adhesive tape for semiconductor element transport |
CN111149191B (zh) * | 2017-12-07 | 2023-08-29 | 琳得科株式会社 | 工件加工用片及已加工工件的制造方法 |
CN111164737B (zh) * | 2017-12-07 | 2023-08-29 | 琳得科株式会社 | 工件加工用片及已加工工件的制造方法 |
JP7086102B2 (ja) * | 2017-12-07 | 2022-06-17 | リンテック株式会社 | ワーク加工用シートおよび加工済みワークの製造方法 |
JP7373268B2 (ja) | 2018-03-29 | 2023-11-02 | リンテック株式会社 | 個片体形成装置および個片体形成方法 |
WO2020053981A1 (ja) * | 2018-09-12 | 2020-03-19 | リンテック株式会社 | ワーク加工用シートおよび加工済みワークの製造方法 |
Family Cites Families (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5264533A (en) * | 1988-06-16 | 1993-11-23 | Basf Aktiengesellschaft | Benzophenone derivatives and their preparation |
ATE199737T1 (de) | 1989-12-06 | 2001-03-15 | Canon Kk | Druckempfindliches klebeband, tintenstrahlaufzeichnungskopf und speicherverfahren |
AU1441692A (en) * | 1991-02-12 | 1992-09-07 | Landec Corporation | Temperature zone specific pressure-sensitive adhesive compositions, and adhesive assemblies and methods of use associated therewith |
US5538771A (en) * | 1991-06-28 | 1996-07-23 | Furukawa Electric Co., Ltd. | Semiconductor wafer-securing adhesive tape |
US5448450A (en) * | 1991-08-15 | 1995-09-05 | Staktek Corporation | Lead-on-chip integrated circuit apparatus |
US5476566A (en) * | 1992-09-02 | 1995-12-19 | Motorola, Inc. | Method for thinning a semiconductor wafer |
IT1270356B (it) * | 1993-05-17 | 1997-05-05 | P & G Spa | Composizione adesiva, relativi procedimenti ed impiego |
US5741543A (en) * | 1995-02-10 | 1998-04-21 | Minnesota Mining And Manufacturing Company | Process for the production of an article coated with a crosslinked pressure sensitive adhesive |
JPH10176152A (ja) * | 1996-10-14 | 1998-06-30 | Nitto Denko Corp | 塗膜保護用シート |
JP4256481B2 (ja) * | 1997-02-14 | 2009-04-22 | リンテック株式会社 | 粘着剤組成物およびその利用方法 |
JP4053656B2 (ja) * | 1998-05-22 | 2008-02-27 | リンテック株式会社 | エネルギー線硬化型親水性粘着剤組成物およびその利用方法 |
JP4540150B2 (ja) * | 1998-09-30 | 2010-09-08 | 日東電工株式会社 | 熱剥離型粘着シート |
US6165563A (en) * | 1998-11-12 | 2000-12-26 | National Starch And Chemical Investment Holding Corporation | Radiation curable free radically polymerized star-branched polymers |
CN1137028C (zh) * | 1998-11-20 | 2004-02-04 | 琳得科株式会社 | 压敏粘合片及其使用方法 |
US6261675B1 (en) * | 1999-03-23 | 2001-07-17 | Hexcel Corporation | Core-crush resistant fabric and prepreg for fiber reinforced composite sandwich structures |
CN1073150C (zh) * | 1999-04-06 | 2001-10-17 | 覃桂军 | 一种机榨植物毛油消泡的方法 |
JP3340979B2 (ja) * | 1999-09-06 | 2002-11-05 | 日東電工株式会社 | ダイシング用粘着シート |
JP3862489B2 (ja) * | 1999-12-14 | 2006-12-27 | 日東電工株式会社 | 再剥離用粘着シート |
AU3104301A (en) * | 2000-01-20 | 2001-07-31 | Noven Pharmaceuticals, Inc. | Compositions and methods to effect the release profile in the transdermal administration of active agents |
JP2001226650A (ja) * | 2000-02-16 | 2001-08-21 | Nitto Denko Corp | 放射線硬化型熱剥離性粘着シート、及びこれを用いた切断片の製造方法 |
JP2001323228A (ja) * | 2000-05-15 | 2001-11-22 | Nitto Denko Corp | 加熱剥離型粘着シート |
JP4703833B2 (ja) * | 2000-10-18 | 2011-06-15 | 日東電工株式会社 | エネルギー線硬化型熱剥離性粘着シート、及びこれを用いた切断片の製造方法 |
JP4651799B2 (ja) * | 2000-10-18 | 2011-03-16 | 日東電工株式会社 | エネルギー線硬化型熱剥離性粘着シート、及びこれを用いた切断片の製造方法 |
EP1347475A4 (en) * | 2000-12-28 | 2009-07-15 | Tdk Corp | LAMINATED PCB AND METHOD FOR PRODUCING AN ELECTRONIC PART AND LAMINATED ELECTRONIC PART |
JP4247956B2 (ja) * | 2001-07-04 | 2009-04-02 | 古河電気工業株式会社 | 帯電防止ダイシングテープ |
US20030064579A1 (en) * | 2001-09-27 | 2003-04-03 | Masafumi Miyakawa | Surface protecting adhesive film for semiconductor wafer and protecting method for semiconductor wafer using said adhesive film |
KR20040105546A (ko) * | 2002-01-15 | 2004-12-16 | 세키스이가가쿠 고교가부시키가이샤 | Ic칩의 제조 방법 |
JP3853247B2 (ja) * | 2002-04-16 | 2006-12-06 | 日東電工株式会社 | 電子部品用加熱剥離型粘着シートおよび電子部品の加工方法並びに電子部品 |
DE10218570B4 (de) * | 2002-04-26 | 2007-10-18 | Lohmann Gmbh & Co Kg | Acrylatcopolymere und daraus erhältliche Haftklebemassen zum Verkleben von niederenergetischen Oberflächen sowie ihre Verwendung |
JP3884995B2 (ja) | 2002-05-29 | 2007-02-21 | 日東電工株式会社 | 皮膚貼着用粘着シート |
JP3838637B2 (ja) * | 2002-06-10 | 2006-10-25 | 日東電工株式会社 | ガラス基板ダイシング用粘着シートおよびガラス基板ダイシング方法 |
TWI288438B (en) * | 2002-06-12 | 2007-10-11 | Furukawa Electric Co Ltd | Method for producing wafer and adhesive tape |
KR101016081B1 (ko) * | 2002-07-26 | 2011-02-17 | 닛토덴코 가부시키가이샤 | 점착 시트와 그의 제조방법, 상기 점착 시트의 사용방법,및 상기 점착 시트에 사용되는 다층 시트와 그의 제조방법 |
JP2004253625A (ja) * | 2003-02-20 | 2004-09-09 | Mitsui Chemicals Inc | 半導体ウェハ表面保護用粘着フィルム及び該粘着フィルムを用いる半導体ウェハの保護方法 |
JP2004300231A (ja) * | 2003-03-31 | 2004-10-28 | Nitto Denko Corp | 熱剥離性両面粘着シート、被着体の加工方法および電子部品 |
JP4614416B2 (ja) * | 2003-05-29 | 2011-01-19 | 日東電工株式会社 | 半導体チップの製造方法およびダイシング用シート貼付け装置 |
JP4234630B2 (ja) * | 2003-05-29 | 2009-03-04 | 古河電気工業株式会社 | 貫通構造を有する薄膜化回路基板の製造方法と保護用粘着テープ |
JP4566527B2 (ja) * | 2003-08-08 | 2010-10-20 | 日東電工株式会社 | 再剥離型粘着シート |
JP2005072140A (ja) * | 2003-08-21 | 2005-03-17 | Lintec Corp | 半導体装置の製造方法および半導体ウエハ加工装置 |
JP4381860B2 (ja) * | 2004-03-24 | 2009-12-09 | 日東電工株式会社 | 補強半導体ウエハに固定された補強板の分離方法およびその装置 |
JP2005281510A (ja) * | 2004-03-30 | 2005-10-13 | Denki Kagaku Kogyo Kk | 粘着剤組成物及び粘着シート |
JP2005325180A (ja) * | 2004-05-12 | 2005-11-24 | Denki Kagaku Kogyo Kk | 粘着剤組成物及び粘着シート |
JP2005101628A (ja) * | 2004-10-25 | 2005-04-14 | Nitto Denko Corp | 電子部品用加熱剥離型粘着シートおよび電子部品の加工方法並びに電子部品 |
JP4592535B2 (ja) * | 2005-02-23 | 2010-12-01 | 日東電工株式会社 | 多層シートとその製造方法及びこの多層シートを用いた粘着シート |
JP4970863B2 (ja) * | 2006-07-13 | 2012-07-11 | 日東電工株式会社 | 被加工物の加工方法 |
JP4781185B2 (ja) * | 2006-07-18 | 2011-09-28 | 日東電工株式会社 | 耐熱ダイシングテープ又はシート |
-
2006
- 2006-01-30 JP JP2006021027A patent/JP4800778B2/ja active Active
- 2006-03-23 TW TW095110014A patent/TWI398501B/zh not_active IP Right Cessation
- 2006-03-29 DE DE602006017920T patent/DE602006017920D1/de active Active
- 2006-03-29 EP EP07016590.7A patent/EP1880843B1/en not_active Expired - Fee Related
- 2006-03-29 AT AT06006556T patent/ATE486715T1/de not_active IP Right Cessation
- 2006-03-29 EP EP06006556A patent/EP1724106B1/en not_active Not-in-force
- 2006-04-28 KR KR1020060038445A patent/KR101350045B1/ko active IP Right Grant
- 2006-05-15 US US11/383,371 patent/US20060257651A1/en not_active Abandoned
- 2006-05-16 CN CN2006100792006A patent/CN1865376B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR20060118329A (ko) | 2006-11-23 |
KR101350045B1 (ko) | 2014-01-13 |
DE602006017920D1 (de) | 2010-12-16 |
JP2007220694A (ja) | 2007-08-30 |
TWI398501B (zh) | 2013-06-11 |
EP1724106B1 (en) | 2010-11-03 |
TW200641085A (en) | 2006-12-01 |
CN1865376B (zh) | 2013-08-21 |
US20060257651A1 (en) | 2006-11-16 |
EP1880843A1 (en) | 2008-01-23 |
EP1880843B1 (en) | 2014-11-19 |
ATE486715T1 (de) | 2010-11-15 |
EP1724106A1 (en) | 2006-11-22 |
CN1865376A (zh) | 2006-11-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4800778B2 (ja) | ダイシング用粘着シート及びそれを用いた被加工物の加工方法 | |
JP4970863B2 (ja) | 被加工物の加工方法 | |
JP4799205B2 (ja) | 活性面貼付ダイシング用粘着テープ又はシートおよび被加工物の切断片のピックアップ方法 | |
KR101172933B1 (ko) | 반도체 웨이퍼 후면 가공 방법, 기판 후면 가공 방법 및방사선 경화성 감압 접착 시트 | |
JP5781302B2 (ja) | 放射線硬化型粘着剤組成物及び粘着シート | |
US7183007B2 (en) | Dicing adhesive sheet and dicing method | |
JP2009064975A (ja) | ダイシング用粘着シート及びダイシング方法 | |
JP5656379B2 (ja) | ダイシング用粘着フィルム、及び半導体素子の製造方法 | |
JP4531355B2 (ja) | ダイシング用粘着シートおよび半導体素子の製造方法 | |
KR102494629B1 (ko) | 다이싱용 점착 테이프, 다이싱용 점착 테이프의 제조 방법, 및 반도체 칩의 제조 방법 | |
JP2002235055A (ja) | ダイシング用粘着シート | |
TWI518161B (zh) | 放射線硬化型黏著劑組合物及黏著片 | |
JP4623694B2 (ja) | ダイシング用粘着シート | |
JP2003142433A (ja) | ダイシング用粘着シートおよびダイシング方法 | |
JP2003096412A (ja) | 半導体部品ダイシング用粘着シートおよび半導体部品の製造方法 | |
WO2022202653A1 (ja) | ウエハの処理方法 | |
JP2011077235A (ja) | 素子保持用粘着シートおよび素子の製造方法 | |
JP5424941B2 (ja) | 放射線硬化性粘着剤組成物、それを用いたダイシング用粘着フィルム、及び切断片の製造方法 | |
WO2023188521A1 (ja) | ピールテープ及び粘接着材を用いたウエハの製造方法、並びにその方法に用いるピールテープ及び粘接着材 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070801 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20091105 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20091221 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100928 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101125 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110506 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110601 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110802 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110804 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140812 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4800778 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |