JP4781431B2 - 不揮発性半導体記憶装置及びその書き込み方法 - Google Patents
不揮発性半導体記憶装置及びその書き込み方法 Download PDFInfo
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- JP4781431B2 JP4781431B2 JP2008515411A JP2008515411A JP4781431B2 JP 4781431 B2 JP4781431 B2 JP 4781431B2 JP 2008515411 A JP2008515411 A JP 2008515411A JP 2008515411 A JP2008515411 A JP 2008515411A JP 4781431 B2 JP4781431 B2 JP 4781431B2
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- 239000004065 semiconductor Substances 0.000 title claims description 60
- 238000000034 method Methods 0.000 title claims description 39
- 230000015654 memory Effects 0.000 claims description 231
- 238000003860 storage Methods 0.000 claims description 2
- 239000011229 interlayer Substances 0.000 description 23
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 18
- 239000000463 material Substances 0.000 description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 9
- 238000010586 diagram Methods 0.000 description 9
- 239000010410 layer Substances 0.000 description 9
- 229910052697 platinum Inorganic materials 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 229910052814 silicon oxide Inorganic materials 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 230000008859 change Effects 0.000 description 6
- 238000000151 deposition Methods 0.000 description 6
- 238000001312 dry etching Methods 0.000 description 6
- 230000010354 integration Effects 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 238000002955 isolation Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 239000007772 electrode material Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- 229910018125 Al-Si Inorganic materials 0.000 description 2
- 229910018182 Al—Cu Inorganic materials 0.000 description 2
- 229910018520 Al—Si Inorganic materials 0.000 description 2
- 229910019001 CoSi Inorganic materials 0.000 description 2
- 241000877463 Lanio Species 0.000 description 2
- 229910016006 MoSi Inorganic materials 0.000 description 2
- 229910005883 NiSi Inorganic materials 0.000 description 2
- 229910018594 Si-Cu Inorganic materials 0.000 description 2
- 229910008465 Si—Cu Inorganic materials 0.000 description 2
- 229910004121 SrRuO Inorganic materials 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 2
- 229910004166 TaN Inorganic materials 0.000 description 2
- 229910008484 TiSi Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 150000002739 metals Chemical group 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 235000013599 spices Nutrition 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- -1 for example Inorganic materials 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
- H01L27/101—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration including resistors or capacitors only
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0007—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising metal oxide memory material, e.g. perovskites
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B63/00—Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
- G11C2013/0071—Write using write potential applied to access device gate
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
- G11C2013/009—Write using potential difference applied between cell electrodes
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/30—Resistive cell, memory material aspects
- G11C2213/32—Material having simple binary metal oxide structure
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/30—Resistive cell, memory material aspects
- G11C2213/34—Material includes an oxide or a nitride
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/79—Array wherein the access device being a transistor
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Semiconductor Memories (AREA)
- Read Only Memory (AREA)
Description
12…選択トランジスタ
14…抵抗記憶素子
16…コラムセレクタ
18…P型トランジスタ
20…N型トランジスタ
22…電流源
24…センスアンプ
26…書き込み回路
30…シリコン基板
32…素子分離舞う
34…ゲート電極
36,38…ソース/ドレイン領域
40,54,68…層間絶縁膜
42,44,56,70…コンタクトホール
46,48,58,72…コンタクトプラグ
50…グラウンド線
52…中継配線
60…下部電極
62…抵抗記憶層
64…上部電極
66…抵抗記憶素子
74…ビット線
本発明の第1実施形態による不揮発性半導体記憶装置並びにその書き込み方法及び読み出しについて図1乃至図3を用いて説明する。
本発明の第2実施形態による不揮発性半導体記憶装置の書き込み方法について図4及び図5を用いて説明する。なお、図1に示す第1実施形態による不揮発性半導体記憶装置と同様の構成には同一の符号を付し説明を省略し或いは簡潔にする。
本発明の第3実施形態による不揮発性半導体記憶装置及びその製造方法について図6乃至図10を用いて説明する。なお、図1に示す第1実施形態による不揮発性半導体記憶装置と同様の構成には同一の符号を付し説明を省略し或いは簡潔にする。
本発明は上記実施形態に限らず種々の変形が可能である。
Claims (3)
- 高抵抗状態と低抵抗状態とを記憶し、電圧の印加によって前記高抵抗状態と前記低抵抗状態とを切り換える抵抗記憶素子と、ドレイン端子が前記抵抗記憶素子の一方の端部に接続され、ソース端子が基準電圧に接続された第1のトランジスタと、ソース端子が前記抵抗記憶素子の他方の端部に接続された第2のトランジスタとを有する不揮発性半導体記憶装置の書き込み方法であって、
前記第2のトランジスタを介して前記抵抗記憶素子に書き込み電圧を印加して前記低抵抗状態から前記高抵抗状態に切り換える際に、前記第2のトランジスタのゲート端子に印加する電圧を、前記抵抗記憶素子のリセット電圧と前記第2のトランジスタの閾値電圧との合計以上、前記抵抗記憶素子のセット電圧と前記閾値電圧との合計未満の値に設定することにより、前記抵抗記憶素子に印加される電圧を、前記リセット電圧以上、前記セット電圧未満の値に制御する
ことを特徴とする不揮発性半導体記憶装置の書き込み方法。 - 請求項1記載の不揮発性半導体記憶装置の書き込み方法において、
前記第2のトランジスタのドレイン端子に印加する前記書き込み電圧を、前記抵抗記憶素子のリセット電圧と前記閾値電圧との合計以上の値に設定する
ことを特徴とする不揮発性半導体記憶装置の書き込み方法。 - 高抵抗状態と低抵抗状態とを記憶し、電圧の印加によって前記高抵抗状態と前記低抵抗状態とを切り換える抵抗記憶素子と、
ドレイン端子が前記抵抗記憶素子の一方の端部に接続され、ソース端子が基準電圧に接続された第1のトランジスタと、
ソース端子が前記抵抗記憶素子の他方の端部に接続された第2のトランジスタと、
前記抵抗記憶素子を前記高抵抗状態から前記低抵抗状態に切り換える際に、前記第1のトランジスタのチャネル抵抗が、前記抵抗記憶素子が高抵抗状態のときの抵抗値よりも十分に小さく且つ前記抵抗記憶素子が低抵抗状態のときの抵抗値よりも十分に大きくなるように、前記第1のトランジスタのゲート端子に印加する電圧を制御し、前記抵抗記憶素子を前記低抵抗状態から前記高抵抗状態に切り換える際に、前記第2のトランジスタのゲート端子に印加する電圧を、前記抵抗記憶素子のリセット電圧と前記第2のトランジスタの閾値電圧との合計以上、前記抵抗記憶素子のセット電圧と前記閾値電圧との合計未満の値に設定することにより、前記抵抗記憶素子に印加される電圧を、前記リセット電圧以上、前記セット電圧未満の値に制御する制御回路と
を有することを特徴とする不揮発性半導体記憶装置。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2006/309743 WO2007132525A1 (ja) | 2006-05-16 | 2006-05-16 | 不揮発性半導体記憶装置及びその書き込み方法 |
Publications (2)
Publication Number | Publication Date |
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JPWO2007132525A1 JPWO2007132525A1 (ja) | 2009-09-17 |
JP4781431B2 true JP4781431B2 (ja) | 2011-09-28 |
Family
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Application Number | Title | Priority Date | Filing Date |
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JP2008515411A Expired - Fee Related JP4781431B2 (ja) | 2006-05-16 | 2006-05-16 | 不揮発性半導体記憶装置及びその書き込み方法 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8411484B2 (ja) |
JP (1) | JP4781431B2 (ja) |
WO (1) | WO2007132525A1 (ja) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100655440B1 (ko) * | 2005-08-30 | 2006-12-08 | 삼성전자주식회사 | 상변화 기억 소자 및 그 형성 방법 |
JP4823316B2 (ja) * | 2006-09-05 | 2011-11-24 | 富士通株式会社 | 不揮発性半導体記憶装置の書き込み方法 |
CN101636792B (zh) * | 2007-03-13 | 2013-03-13 | 松下电器产业株式会社 | 电阻变化型存储器件 |
KR100967681B1 (ko) | 2008-02-20 | 2010-07-07 | 주식회사 하이닉스반도체 | 상변환 기억 소자 및 그의 제조방법 |
JPWO2009157479A1 (ja) * | 2008-06-26 | 2011-12-15 | 日本電気株式会社 | スイッチング素子およびスイッチング素子の製造方法 |
JP2010212661A (ja) * | 2009-02-13 | 2010-09-24 | Fujitsu Ltd | 磁気ランダムアクセスメモリ |
JP4856202B2 (ja) * | 2009-03-12 | 2012-01-18 | 株式会社東芝 | 半導体記憶装置 |
CN102714210B (zh) | 2010-11-19 | 2015-08-12 | 松下电器产业株式会社 | 非易失性存储元件以及非易失性存储元件的制造方法 |
GB2502568A (en) | 2012-05-31 | 2013-12-04 | Ibm | Memory apparatus with gated phase-change memory cells |
GB2502569A (en) | 2012-05-31 | 2013-12-04 | Ibm | Programming of gated phase-change memory cells |
JP2014010876A (ja) | 2012-07-02 | 2014-01-20 | Toshiba Corp | 半導体記憶装置 |
KR102127486B1 (ko) * | 2013-04-01 | 2020-06-29 | 에스케이하이닉스 주식회사 | 비휘발성 메모리 장치 |
US9373399B2 (en) | 2013-07-22 | 2016-06-21 | Micron Technology, Inc. | Resistance variable element methods and apparatuses |
TWI581264B (zh) * | 2014-05-07 | 2017-05-01 | 旺宏電子股份有限公司 | 電阻式記憶體及其操作方法 |
US9443588B2 (en) * | 2014-10-27 | 2016-09-13 | Industrial Technology Research Institute | Resistive memory system, driver circuit thereof and method for setting resistance thereof |
TWI646531B (zh) * | 2014-10-27 | 2019-01-01 | 財團法人工業技術研究院 | 電阻式記憶體系統、其驅動電路及其阻抗設置方法 |
CN107210064B (zh) * | 2015-06-02 | 2020-02-14 | 华为技术有限公司 | 一种信号处理电路 |
US9536827B1 (en) * | 2016-02-26 | 2017-01-03 | Taiwan Semiconductor Manufacturing Company Ltd. | Semiconductor structures |
US11024355B1 (en) * | 2020-01-31 | 2021-06-01 | International Business Machines Corporation | MRAM bit line write control with source follower |
Citations (1)
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JP2005216387A (ja) * | 2004-01-29 | 2005-08-11 | Sony Corp | 記憶装置 |
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JP4249992B2 (ja) | 2002-12-04 | 2009-04-08 | シャープ株式会社 | 半導体記憶装置及びメモリセルの書き込み並びに消去方法 |
JP4113493B2 (ja) | 2003-06-12 | 2008-07-09 | シャープ株式会社 | 不揮発性半導体記憶装置及びその制御方法 |
JP4192060B2 (ja) | 2003-09-12 | 2008-12-03 | シャープ株式会社 | 不揮発性半導体記憶装置 |
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2006
- 2006-05-16 JP JP2008515411A patent/JP4781431B2/ja not_active Expired - Fee Related
- 2006-05-16 WO PCT/JP2006/309743 patent/WO2007132525A1/ja active Application Filing
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2008
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Patent Citations (1)
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JP2005216387A (ja) * | 2004-01-29 | 2005-08-11 | Sony Corp | 記憶装置 |
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Publication number | Publication date |
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US20090059651A1 (en) | 2009-03-05 |
WO2007132525A1 (ja) | 2007-11-22 |
JPWO2007132525A1 (ja) | 2009-09-17 |
US8411484B2 (en) | 2013-04-02 |
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